公开(公告)号：US20190272971A1

公开(公告)日：2019-09-05

申请号：US16289872

申请日：2019-03-01

Applicant: JEOL Ltd.

Inventor： Shigeyuki Morishita ,  Takeo Sasaki ,  Tomohiro Nakamichi

IPC: H01J37/153 ,  H01J37/26 ,  G01M11/02

Abstract: An electron microscope includes: an optical system including an aberration correction device; and a control unit that controls the aberration correction device, wherein the control unit performs: processing for displaying, on a display unit, an image for designating a direction of aberration in superposition on an aberration pattern representing a state of aberration, processing for specifying the direction of aberration from the image that has been subjected to a rotation operation, and processing for controlling the aberration correction device to cause the aberration correction device to introduce an aberration in the specified direction.

公开(公告)号：US09892886B2

公开(公告)日：2018-02-13

申请号：US15617186

申请日：2017-06-08

Applicant: JEOL Ltd.

Inventor： Shigeyuki Morishita

IPC: H01J37/153 ,  H01J37/28

CPC classification number: H01J37/153 ,  H01J37/28 ,  H01J2237/1534 ,  H01J2237/2802

Abstract: There is provided a charged particle beam system for reducing phase variations in a charged particle beam due to sixth order three-lobe aberration. The charged particle beam system (100) is equipped with an aberration corrector (30) for correcting aberrations in the optical system, and includes: an aberration measuring section (44) for measuring sixth order three-lobe aberration of sixth order geometric aberration, a computing section (46) for computing the magnitude of at least one of fourth order three-lobe aberration of fourth order geometric aberration and three-fold astigmatism of second order geometric aberration for reducing phase variations in the charged particle beam due to the sixth order three-lobe aberration on the basis of the measured sixth order three-lobe aberration, and a controller (48) for controlling the aberration corrector (30) to produce at least one of the fourth order three-lobe aberration and the three-fold astigmatism on the basis of the computed magnitude.

公开(公告)号：US20170365442A1

公开(公告)日：2017-12-21

申请号：US15617186

申请日：2017-06-08

Applicant: JEOL Ltd.

Inventor： Shigeyuki Morishita

IPC: H01J37/153 ,  H01J37/28

CPC classification number: H01J37/153 ,  H01J37/28 ,  H01J2237/1534 ,  H01J2237/2802

Abstract: There is provided a charged particle beam system for reducing phase variations in a charged particle beam due to sixth order three-lobe aberration. The charged particle beam system (100) is equipped with an aberration corrector (30) for correcting aberrations in the optical system, and includes: an aberration measuring section (44) for measuring sixth order three-lobe aberration of sixth order geometric aberration, a computing section (46) for computing the magnitude of at least one of fourth order three-lobe aberration of fourth order geometric aberration and three-fold astigmatism of second order geometric aberration for reducing phase variations in the charged particle beam due to the sixth order three-lobe aberration on the basis of the measured sixth order three-lobe aberration, and a controller (48) for controlling the aberration corrector (30) to produce at least one of the fourth order three-lobe aberration and the three-fold astigmatism on the basis of the computed magnitude.

公开(公告)号：US12255041B2

公开(公告)日：2025-03-18

申请号：US17869117

申请日：2022-07-20

Applicant: JEOL Ltd.

Inventor： Keito Aibara ,  Tomohiro Nakamichi ,  Shigeyuki Morishita ,  Motofumi Saito ,  Ryusuke Sagawa ,  Fuminori Uematsu

IPC: H01J37/153 ,  H01J37/244 ,  H01J37/28

Abstract: Prior to execution of primary correction, a first centering process, an in-advance correction of a particular aberration, and a second centering process are executed stepwise. In the first centering process and the second centering process, a ronchigram center is identified based on a ronchigram variation image, and is matched with an imaging center. In the in-advance correction and the post correction of the particular aberration, a particular aberration value is estimated based on a ronchigram, and the particular aberration is corrected based on the particular aberration value.

公开(公告)号：US11842880B2

公开(公告)日：2023-12-12

申请号：US17671896

申请日：2022-02-15

Applicant: JEOL Ltd.

Inventor： Ryusuke Sagawa ,  Shigeyuki Morishita ,  Fuminori Uematsu ,  Tomohiro Nakamichi ,  Keito Aibara

IPC: H01J37/153 ,  H01J37/26 ,  H01J37/28

CPC classification number: H01J37/153 ,  H01J37/265 ,  H01J37/28 ,  H01J2237/1534 ,  H01J2237/2487 ,  H01J2237/2802

Abstract: An aberration value estimator has a learned estimation model for estimating an aberration value set based on a Ronchigram. In a machine learning sub-system, a simulation is repeatedly executed while changing a simulation condition, and calculated Ronchigrams are generated in a wide variety and in a large number. By machine learning using the calculated Ronchigrams, the learned estimation model is generated.

公开(公告)号：US20230268155A1

公开(公告)日：2023-08-24

申请号：US18169270

申请日：2023-02-15

Applicant: JEOL Ltd.

Inventor： Shigeyuki Morishita ,  Hidetaka Sawada

IPC: H01J37/153 ,  H01J37/28

CPC classification number: H01J37/153 ,  H01J37/28

Abstract: An aberration correcting device includes a first multipole which generates a hexapole field; a second multipole which generates a hexapole field with a polarity opposite to a polarity of the hexapole filed generated by the first multipole; a third multipole which is disposed between the first multipole and the second multipole and generates an octupole field; a first transfer lens system disposed between the first multipole and the third multipole; and a second transfer lens system disposed between the third multipole and the second multipole. The first transfer lens system includes a plurality of fourth multipoles which generate a field in which an electromagnetic-field superposed quadrupole field and an octupole field are superposed; and the second transfer lens system includes a plurality of fifth multipoles which generate a field in which an electromagnetic-field superposed quadrupole field and an octupole field are superposed.

公开(公告)号：US20220262595A1

公开(公告)日：2022-08-18

申请号：US17671896

申请日：2022-02-15

Applicant: JEOL Ltd.

Inventor： Ryusuke Sagawa ,  Shigeyuki Morishita ,  Fuminori Uematsu ,  Tomohiro Nakamichi ,  Keito Aibara

IPC: H01J37/153 ,  H01J37/28 ,  H01J37/26

Abstract: An aberration value estimator has a learned estimation model for estimating an aberration value set based on a Ronchigram. In a machine learning sub-system, a simulation is repeatedly executed while changing a simulation condition, and calculated Ronchigrams are generated in a wide variety and in a large number. By machine learning using the calculated Ronchigrams, the learned estimation model is generated.

公开(公告)号：US10755888B2

公开(公告)日：2020-08-25

申请号：US16364726

申请日：2019-03-26

Applicant: JEOL Ltd.

Inventor： Shigeyuki Morishita

IPC: H01J37/10 ,  H01J37/28 ,  H01J37/153

Abstract: An aberration corrector includes: a first multipole, a second multipole, a third multipole, and a fourth multipole arranged along an optical axis A; a first transfer lens system arranged between the first multipole and the second multipole; a second transfer lens system arranged between the second multipole and the third multipole; and a third transfer lens system arranged between the third multipole and the fourth multipole, wherein each of the first multipole, the second multipole, the third multipole, and the fourth multipole generates a three-fold symmetric field.

公开(公告)号：US10446362B2

公开(公告)日：2019-10-15

申请号：US16012057

申请日：2018-06-19

Applicant: JEOL Ltd.

Inventor： Shigeyuki Morishita

IPC: H01J37/153 ,  H01J37/22 ,  H01J37/14 ,  H01J37/28 ,  H01J37/302

Abstract: There is provided a method which is for use in a charged particle beam system including an illumination system equipped with an aberration corrector having a plurality of stages of multipole elements and a transfer lens system disposed between the multipole elements, the method being capable of correcting distortion in a shadow of an aperture of the illumination system. The method involves varying excitations of the transfer lens system to correct distortion in the shadow of the aperture of the illumination system.

公开(公告)号：US20160020066A1

公开(公告)日：2016-01-21

申请号：US14743086

申请日：2015-06-18

Applicant: JEOL Ltd.

Inventor： Shigeyuki Morishita

IPC: H01J37/22 ,  H01J37/28

CPC classification number: H01J37/222 ,  H01J37/28 ,  H01J2237/1534 ,  H01J2237/2802 ,  H01J2237/2809

Abstract: A device which computes an angular range of illumination of an electron beam in which aberrations in an optical system can be measured efficiently by a tableau method. The device (100) includes an aberration coefficient information acquisition portion (112) for obtaining information about aberration coefficients of the optical system, a phase distribution computing portion (114) for finding a distribution of phases in the electron beam passed through the optical system on the basis of the information about the aberration coefficients, and an angular range computing portion (116) for finding the angular range of illumination on the basis of the distribution of phases found by the phase distribution computing portion (114).

Abstract translation: 计算电子束的照明角度范围的装置，其中可以通过台面方法有效地测量光学系统中的像差。 设备（100）包括用于获得关于光学系统的像差系数的信息的像差系数信息获取部分（112），用于找到通过光学系统的电子束中的相位分​​布的相位分布计算部分（114） 关于像差系数的信息的基础，以及用于基于由相位分布计算部分（114）发现的相位分布来找出照明的角度范围的角度范围计算部分（116）。