公开(公告)号：US20200013617A1

公开(公告)日：2020-01-09

申请号：US16504581

申请日：2019-07-08

Applicant: JSR CORPORATION

Inventor： Hiroyuki KOMATSU ,  Miki TAMADA ,  Hitoshi OSAKI ,  Motohiro SHIRATANI ,  Tomoki NAGAI

IPC: H01L21/02 ,  C23C16/40 ,  C23C16/455 ,  C07C255/09 ,  C07C255/34 ,  C07C255/31

Abstract: A substrate treatment method includes: overlaying a film on a surface of a substrate which includes a first region including a metal atom in a surface layer thereof, using a directed self-assembling material which contains a compound having no less than 6 carbon atoms and including at least one cyano group. After the overlaying, the film on a region other than the first region is removed. After the removing, a pattern principally containing a metal oxide is formed by an Atomic Layer Deposition process or a Chemical Vapor Deposition process on the region other than the first region, of the surface of the substrate.

公开(公告)号：US20190194365A1

公开(公告)日：2019-06-27

申请号：US16289938

申请日：2019-03-01

Applicant: JSR CORPORATION

Inventor： Hiroyuki KOMATSU ,  Tomohiro ODA ,  Masafumi HORI ,  Hitoshi OSAKI ,  Takehiko NARUOKA

IPC: C08F12/20 ,  C23C16/455 ,  C08F12/08 ,  C08F20/22 ,  B05D7/24 ,  B05D7/14 ,  B05D3/10 ,  B05D3/14

CPC classification number: C08F12/20 ,  B05D3/02 ,  B05D3/107 ,  B05D3/148 ,  B05D7/14 ,  B05D7/24 ,  C08F12/08 ,  C08F20/22 ,  C08L101/04 ,  C23C16/45525

Abstract: A composition includes a first polymer and a solvent. The first polymer includes a first structural unit including a fluorine atom, and a group including a first functional group at an end of a main chain or a side chain of the first polymer. The first functional group is capable of forming a bond with a metal or a metalloid. The first structural unit preferably includes a fluorinated hydrocarbon group. The first structural unit is preferably derived from a (meth)acrylic ester containing a fluorine atom, or a styrene compound containing a fluorine atom. The first structural unit preferably contains 6 or more fluorine atoms.

公开(公告)号：US20170255096A1

公开(公告)日：2017-09-07

申请号：US15058621

申请日：2016-03-02

Applicant: JSR CORPORATION

Inventor： Hitoshi OSAKI

IPC: G03F7/039 ,  G03F7/16

CPC classification number: H01L21/0273 ,  C09D4/06 ,  C09D133/00 ,  C09D133/02 ,  C08F265/06

Abstract: A pattern-forming method enables a resist pattern having a favorable shape with a desired size to be conveniently formed while generation of defects is inhibited, and by using such a superior resist pattern as a mask, a pattern having a favorable shape and arrangement can be formed. The pattern-forming method including: overlaying a base pattern on a front face side of a substrate directly or via other layer; applying a first composition on at least a lateral face of the base pattern; forming a polymer layer by graft polymerization on a surface of the coating film formed after the applying; and etching the substrate by one or a plurality of etching operations by using a resist pattern that includes the base pattern, the coating film and the polymer layer.

公开(公告)号：US20150093704A1

公开(公告)日：2015-04-02

申请号：US14498256

申请日：2014-09-26

Applicant: JSR CORPORATION

Inventor： Hitoshi OSAKI

IPC: G03F7/038 ,  G03F7/30

CPC classification number: G03F7/0397 ,  C08F214/186 ,  G03F7/0046 ,  G03F7/0392 ,  G03F7/0757 ,  G03F7/0758 ,  G03F7/11 ,  G03F7/2041 ,  G03F7/30

Abstract: A radiation-sensitive resin composition includes (A) a block copolymer, and (B) an acid-generating agent. The block copolymer (A) includes a polymer block (I), a polymer block (II), and a moiety contained in the polymer block (I), the polymer block (2), or both thereof. The polymer block (I) includes an acid-dissociable group. The polymer block (II) includes an alkali-dissociable group. The moiety provides water repellency.

Abstract translation: 辐射敏感性树脂组合物包括（A）嵌段共聚物和（B）酸产生剂。 嵌段共聚物（A）包括聚合物嵌段（I），聚合物嵌段（II）和聚合物嵌段（I）中所含的部分，聚合物嵌段（2）或其二者。 聚合物嵌段（I）包括酸解离基团。 聚合物嵌段（II）包括碱解离基团。 该部分提供防水性。