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公开(公告)号:US20190198316A1
公开(公告)日:2019-06-27
申请号:US16288354
申请日:2019-02-28
Applicant: JSR CORPORATION
Inventor: Hiroyuki KOMATSU , Tomohiro ODA , Hitoshi OSAKI , Masafumi HORI , Takehiko NARUOKA
IPC: H01L21/027 , H01L21/02 , H01L21/311
CPC classification number: H01L21/0271 , C08L25/06 , C08L33/10 , C08L2203/206 , C08L2312/02 , H01L21/02118 , H01L21/02282 , H01L21/02334 , H01L21/02359 , H01L21/28 , H01L21/285 , H01L21/31133
Abstract: A method for selectively modifying a base material surface, includes applying a composition on a surface of a base material to form a coating film. The coating film is heated. The base material includes a surface layer which includes a first region including a metal. The composition includes a first polymer and a solvent. The first polymer includes at an end of a main chain or a side chain thereof, a group including a first functional group capable of forming a bond with the metal. It is preferred that the base material further includes a second region comprising substantially only a non-metal, and the method further includes, after the heating, removing with a rinse agent a portion formed on the second region, of the coating film. The metal is preferably a constituent of a metal substance, an alloy, an oxide, an electrically conductive nitride or a silicide.
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公开(公告)号:US20210157235A1
公开(公告)日:2021-05-27
申请号:US17163675
申请日:2021-02-01
Applicant: JSR CORPORATION
Inventor: Shin-ya NAKAFUJI , Hiroki NAKATSU , Tomoaki TANIGUCHI , Tomohiro ODA
Abstract: A composition that enables a resist underlayer film to be formed, contains: a compound having at least one partial structure represented by formula (1); and a solvent. In the formula (1), for example, Ar1 represents a group obtained by removing (p+1) hydrogen atoms on an aromatic carbon ring from a substituted or unsubstituted arene having 6 to 30 ring atoms, or a group obtained by removing (p+1) hydrogen atoms on an aromatic heteroring from a substituted or unsubstituted heteroarene having 5 to 30 ring atoms; Ar2 represents a substituted or unsubstituted aryl group having 6 to 30 ring atoms, or a substituted or unsubstituted heteroaryl group having 5 to 30 ring atoms, and R2 represents a hydrogen atom or a monovalent organic group having 1 to 20 carbon atoms, and R3 represents an ethynediyl group or a substituted or unsubstituted ethenediyl group.
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公开(公告)号:US20210166935A1
公开(公告)日:2021-06-03
申请号:US17148729
申请日:2021-01-14
Applicant: JSR CORPORATION
Inventor: Hiroyuki KOMATSU , Tomohiro ODA , Hitoshi OSAKI , Masafumi HORI , Takehiko NARUOKA
IPC: H01L21/027 , C08F112/08 , C09D125/06 , H01L21/28 , H01L21/321 , H01L21/285 , C08F8/00 , H01L21/02 , H01L21/311
Abstract: A composition for use in selective modification of a base material surface includes a polymer having, at an end of a main chain or a side chain thereof, a group including a first functional group capable of forming a bond with a metal, and a solvent.
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公开(公告)号:US20190194365A1
公开(公告)日:2019-06-27
申请号:US16289938
申请日:2019-03-01
Applicant: JSR CORPORATION
Inventor: Hiroyuki KOMATSU , Tomohiro ODA , Masafumi HORI , Hitoshi OSAKI , Takehiko NARUOKA
CPC classification number: C08F12/20 , B05D3/02 , B05D3/107 , B05D3/148 , B05D7/14 , B05D7/24 , C08F12/08 , C08F20/22 , C08L101/04 , C23C16/45525
Abstract: A composition includes a first polymer and a solvent. The first polymer includes a first structural unit including a fluorine atom, and a group including a first functional group at an end of a main chain or a side chain of the first polymer. The first functional group is capable of forming a bond with a metal or a metalloid. The first structural unit preferably includes a fluorinated hydrocarbon group. The first structural unit is preferably derived from a (meth)acrylic ester containing a fluorine atom, or a styrene compound containing a fluorine atom. The first structural unit preferably contains 6 or more fluorine atoms.
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