公开(公告)号：US07371592B2

公开(公告)日：2008-05-13

申请号：US11313150

申请日：2005-12-19

申请人： Jeong-Min Park ,  Hi-kuk Lee ,  Woo-Seok Jeon ,  Joo-Han Kim ,  Doo-Hee Jung

发明人： Jeong-Min Park ,  Hi-kuk Lee ,  Woo-Seok Jeon ,  Joo-Han Kim ,  Doo-Hee Jung

IPC分类号： H01L21/66

CPC分类号： H01L27/1288 ,  H01L27/12 ,  H01L27/1214 ,  H01L27/124 ,  H01L27/14692

摘要： A method for manufacturing a thin film transistor array panel using a photo mask is provided. The photo mask includes: a transmitting area and a translucent area, wherein the translucent area includes a plurality of light blocking portions blocking light, and wherein the light blocking portions have a plurality of areas blocking different amounts of light. By using this type of photo mask, a substantially flat layer of photoresist film can be deposited even on top of an uneven surface to manufacture a thin film transistor array panel. The flat photoresist film reduces processing cost and enhances the reliability of the panel manufacturing process.

摘要翻译： 提供一种使用光掩模制造薄膜晶体管阵列面板的方法。 光掩模包括：透射区域和半透明区域，其中半透明区域包括阻挡光的多个遮光部分，并且其中遮光部分具有阻挡不同量的光的多个区域。 通过使用这种类型的光掩模，即使在不平坦表面的顶部也可沉积基本平坦的光致抗蚀剂层，以制造薄膜晶体管阵列面板。 平坦的光致抗蚀剂膜降低了加工成本并提高了面板制造工艺的可靠性。

公开(公告)号：US20060188808A1

公开(公告)日：2006-08-24

申请号：US11346047

申请日：2006-02-02

申请人： Jeong-Min Park ,  Mi-Sun Ryu ,  Hi-Kuk Lee ,  Woo-Seok Jeon

发明人： Jeong-Min Park ,  Mi-Sun Ryu ,  Hi-Kuk Lee ,  Woo-Seok Jeon

IPC分类号： G03C1/76 ,  G03C1/492 ,  G03C1/494

CPC分类号： H01L27/1288 ,  G03F7/0007 ,  G03F7/0226 ,  G03F7/0236 ,  H01L27/1214 ,  H01L29/458 ,  H01L29/4908

摘要： A photoresist composition includes a novolac resin having where each of R1, R2, R3, and R4 is an alkyl group having a hydrogen atom or between one through six carbon atoms and n is an integer ranging from zero through three; and a mercapto compound having Z1-SH, or SH-Z2-SH, where each of Z1 and Z2 is an alkyl group or an allyl group having one through twenty carbon atoms, a sensitizer, and a solvent.

摘要翻译： 光致抗蚀剂组合物包括其中R 1，R 2，R 3和R 4各自的酚醛清漆树脂 是具有氢原子或1至6个碳原子的烷基，n是0至3的整数; 和具有<？in-line-formula description =“In-line Formulas”end =“lead”？> Z _{-SH的巯基化合物，或<？in-line-formula description =“ 在线公式“end =”tail“？> <？in-line-formula description =”In-line Formulas“end =”lead“？> SH-Z <2> -SH，<？ 在线公式描述=“在线公式”end =“tail”？>其中Z 1和Z 2中的每一个是烷基或烯丙基 具有一至二十个碳原子，敏化剂和溶剂。}

公开(公告)号：US07955784B2

公开(公告)日：2011-06-07

申请号：US11554194

申请日：2006-10-30

申请人： Hi-Kuk Lee ,  Woo-Seok Jeon ,  Doo-Hee Jung ,  Jeong-Min Park ,  Deok-Man Kang ,  Si-Young Jung ,  Jae-Young Choi

发明人： Hi-Kuk Lee ,  Woo-Seok Jeon ,  Doo-Hee Jung ,  Jeong-Min Park ,  Deok-Man Kang ,  Si-Young Jung ,  Jae-Young Choi

IPC分类号： G03F7/30

CPC分类号： H01L27/1288 ,  G03F7/0233 ,  G03F7/0236 ,  H01L27/1214

摘要： A photoresist composition includes about 100 parts by weight of resin mixture including novolak resin and acryl resin and about 10 parts to about 50 parts by weight of naphthoquinone diazosulfonic acid ester. A weight-average molecular weight of the novolak resin is no less than about 30,000. A weight-average molecular weight of the acryl resin is no less than about 20,000. The acryl resin makes up about 1% to about 15% of the total weight of the resin mixture. When a photoresist film formed using the photoresist composition is heated, a profile variation of the photoresist composition is relatively small. Therefore, a residual photoresist film has a uniform thickness, and a short circuit and/or an open defect in a TFT substrate may be reduced.

摘要翻译： 光致抗蚀剂组合物包括约100重量份的包括酚醛清漆树脂和丙烯酸树脂的树脂混合物和约10重量份至约50重量份的萘醌重氮磺酸酯。 酚醛清漆树脂的重均分子量不小于约30,000。 丙烯酸树脂的重均分子量不小于约20,000。 丙烯酸树脂占树脂混合物总重量的约1％至约15％。 当使用光致抗蚀剂组合物形成的光致抗蚀剂膜被加热时，光致抗蚀剂组合物的轮廓变化相对较小。 因此，残留的光致抗蚀剂膜具有均匀的厚度，并且可能减小TFT基板中的短路和/或开路缺陷。

公开(公告)号：US07763415B2

公开(公告)日：2010-07-27

申请号：US11430414

申请日：2006-05-09

申请人： Jeong-Min Park ,  Jang-Soo Kim ,  Hi-Kuk Lee

发明人： Jeong-Min Park ,  Jang-Soo Kim ,  Hi-Kuk Lee

IPC分类号： G03F7/00 ,  H01L21/00

CPC分类号： H01L27/1288 ,  G03F7/40 ,  H01L21/0273 ,  H01L27/1214 ,  H01L29/66765

摘要： A method of fabricating a semiconductor device is provided. The method includes forming at least one etch target film on a substrate, forming a first reflowable etch mask on the at least one etch target film, patterning the etch target film using the first reflowable etch mask. The method further includes reflowing the first reflowable etch mask to form a second etch mask and patterning the etch target film using the second etch mask.

摘要翻译： 提供一种制造半导体器件的方法。 该方法包括在衬底上形成至少一个蚀刻目标膜，在至少一个蚀刻靶膜上形成第一可回流蚀刻掩模，使用第一可回流蚀刻掩模对蚀刻目标膜进行构图。 该方法还包括回流第一可回流蚀刻掩模以形成第二蚀刻掩模，并使用第二蚀刻掩模对蚀刻目标膜进行图案化。

公开(公告)号：US07291439B2

公开(公告)日：2007-11-06

申请号：US11483794

申请日：2006-07-07

申请人： Jeong-Min Park ,  Hi-Kuk Lee ,  Jin-Ho Ju ,  Woo-Seok Jeon ,  Doo-Hee Jung ,  Dong-Min Kim ,  Ki-Sik Choi

发明人： Jeong-Min Park ,  Hi-Kuk Lee ,  Jin-Ho Ju ,  Woo-Seok Jeon ,  Doo-Hee Jung ,  Dong-Min Kim ,  Ki-Sik Choi

IPC分类号： G03F7/004

CPC分类号： G03F7/022 ,  G03F7/0045

摘要： A photoresist composition, a method for forming a film pattern using the photoresist composition, and a method for manufacturing a thin film transistor array panel using the photoresist composition are provided. In one embodiment, a photoresist composition includes an alkali-soluble resin, a photosensitive compound, and an additive, for advantageously providing a uniform photoresist in a channel region.

摘要翻译： 提供光致抗蚀剂组合物，使用光致抗蚀剂组合物形成膜图案的方法，以及使用光致抗蚀剂组合物制造薄膜晶体管阵列面板的方法。 在一个实施方案中，光致抗蚀剂组合物包括碱溶性树脂，光敏化合物和添加剂，用于在沟道区域中有利地提供均匀的光致抗蚀剂。

公开(公告)号：US20110269253A1

公开(公告)日：2011-11-03

申请号：US13179436

申请日：2011-07-08

申请人： Seung-Ha CHOI ,  Min-Seok Oh ,  Jeong-Min Park ,  Doo-Hee Jung ,  Hi-Kuk Lee ,  Sang-Gab Kim

发明人： Seung-Ha CHOI ,  Min-Seok Oh ,  Jeong-Min Park ,  Doo-Hee Jung ,  Hi-Kuk Lee ,  Sang-Gab Kim

IPC分类号： H01L33/08

CPC分类号： H01L27/1288 ,  G02F1/133512 ,  G02F1/136209 ,  H01L27/1214 ,  H01L27/124 ,  H01L29/78633

摘要： A thin film transistor array panel for a flat panel display includes a substrate, a first signal line formed on the substrate, a second signal line intersecting and insulated from the first signal line, a switching element having a first terminal connected to the first signal line, a second terminal connected to the second signal line, and a third terminal, a pixel electrode connected to the third terminal of the switching element, and first and second light blocking members extending parallel to the second signal line, each being disposed on an opposite side of and partially overlapping an respective edge of the second signal line, an interval between the first and second light blocking members being in a range of from more than 1.5 μm to less than 4 μm. The array panel prevents light leakage from the display and improves its transmittance, aperture ratio and color reproducibility.

摘要翻译： 一种用于平板显示器的薄膜晶体管阵列面板包括：衬底，形成在衬底上的第一信号线，与第一信号线相交和绝缘的第二信号线;开关元件，具有连接到第一信号线 ，连接到第二信号线的第二端子，以及第三端子，连接到开关元件的第三端子的像素电极，以及平行于第二信号线延伸的第一和第二遮光部件， 并且部分地与第二信号线的相应边缘重叠，第一和第二遮光构件之间的间隔在大于1.5μm至小于4μm的范围内。 阵列面板可防止显示屏漏光，提高透光率，开口率和色彩再现性。

公开(公告)号：US08004636B2

公开(公告)日：2011-08-23

申请号：US12220145

申请日：2008-07-22

申请人： Seung-Ha Choi ,  Min-Seok Oh ,  Jeong-Min Park ,  Doo-Hee Jung ,  Hi-Kuk Lee ,  Sang-Gab Kim

发明人： Seung-Ha Choi ,  Min-Seok Oh ,  Jeong-Min Park ,  Doo-Hee Jung ,  Hi-Kuk Lee ,  Sang-Gab Kim

IPC分类号： G02F1/1333 ,  G02F1/136 ,  G02F1/1343

CPC分类号： H01L27/1288 ,  G02F1/133512 ,  G02F1/136209 ,  H01L27/1214 ,  H01L27/124 ,  H01L29/78633

摘要： A thin film transistor array panel for a flat panel display includes a substrate, a first signal line formed on the substrate, a second signal line intersecting and insulated from the first signal line, a switching element having a first terminal connected to the first signal line, a second terminal connected to the second signal line, and a third terminal, a pixel electrode connected to the third terminal of the switching element, and first and second light blocking members extending parallel to the second signal line, each being disposed on an opposite side of and partially overlapping an respective edge of the second signal line, an interval between the first and second light blocking members being in a range of from more than 1.5 μm to less than 4 μm. The array panel prevents light leakage from the display and improves its transmittance, aperture ratio and color reproducibility.

摘要翻译： 一种用于平板显示器的薄膜晶体管阵列面板包括：衬底，形成在衬底上的第一信号线，与第一信号线相交和绝缘的第二信号线;开关元件，具有连接到第一信号线 ，连接到第二信号线的第二端子，以及第三端子，连接到开关元件的第三端子的像素电极，以及平行于第二信号线延伸的第一和第二遮光部件， 并且部分地与第二信号线的相应边缘重叠，第一和第二遮光构件之间的间隔在大于1.5μm至小于4μm的范围内。 阵列面板可防止显示屏漏光，提高透光率，开口率和色彩再现性。

公开(公告)号：US20070031763A1

公开(公告)日：2007-02-08

申请号：US11430414

申请日：2006-05-09

申请人： Jeong-Min Park ,  Jang-Soo Kim ,  Hi-Kuk Lee

发明人： Jeong-Min Park ,  Jang-Soo Kim ,  Hi-Kuk Lee

IPC分类号： G03F7/26

CPC分类号： H01L27/1288 ,  G03F7/40 ,  H01L21/0273 ,  H01L27/1214 ,  H01L29/66765

摘要： A method of fabricating a semiconductor device is provided. The method includes forming at least one etch target film on a substrate, forming a first reflowable etch mask on the at least one etch target film, patterning the etch target film using the first reflowable etch mask. The method further includes reflowing the first reflowable etch mask to form a second etch mask and patterning the etch target film using the second etch mask.

摘要翻译： 提供一种制造半导体器件的方法。 该方法包括在衬底上形成至少一个蚀刻目标膜，在至少一个蚀刻靶膜上形成第一可回流蚀刻掩模，使用第一可回流蚀刻掩模对蚀刻目标膜进行构图。 该方法还包括回流第一可回流蚀刻掩模以形成第二蚀刻掩模，并使用第二蚀刻掩模对蚀刻目标膜进行图案化。

公开(公告)号：US20070009833A1

公开(公告)日：2007-01-11

申请号：US11483794

申请日：2006-07-07

申请人： Jeong-Min Park ,  Hi-Kuk Lee ,  Jin-Ho Ju ,  Woo-Seok Jeon ,  Doo-Hee Jung ,  Dong-Min Kim ,  Ki-Sik Choi

发明人： Jeong-Min Park ,  Hi-Kuk Lee ,  Jin-Ho Ju ,  Woo-Seok Jeon ,  Doo-Hee Jung ,  Dong-Min Kim ,  Ki-Sik Choi

IPC分类号： G03C1/00

CPC分类号： G03F7/022 ,  G03F7/0045

摘要： A photoresist composition, a method for forming a film pattern using the photoresist composition, and a method for manufacturing a thin film transistor array panel using the photoresist composition are provided. In one embodiment, a photoresist composition includes an alkali-soluble resin, a photosensitive compound, and an additive, for advantageously providing a uniform photoresist in a channel region.

公开(公告)号：US08203674B2

公开(公告)日：2012-06-19

申请号：US13179436

申请日：2011-07-08

申请人： Seung-Ha Choi ,  Min-Seok Oh ,  Jeong-Min Park ,  Doo-Hee Jung ,  Hi-Kuk Lee ,  Sang-Gab Kim

发明人： Seung-Ha Choi ,  Min-Seok Oh ,  Jeong-Min Park ,  Doo-Hee Jung ,  Hi-Kuk Lee ,  Sang-Gab Kim

IPC分类号： G02F1/1333 ,  G02F1/136 ,  G02F1/1343

CPC分类号： H01L27/1288 ,  G02F1/133512 ,  G02F1/136209 ,  H01L27/1214 ,  H01L27/124 ,  H01L29/78633

摘要： A thin film transistor array panel for a flat panel display includes a substrate, a first signal line formed on the substrate, a second signal line intersecting and insulated from the first signal line, a switching element having a first terminal connected to the first signal line, a second terminal connected to the second signal line, and a third terminal, a pixel electrode connected to the third terminal of the switching element, and first and second light blocking members extending parallel to the second signal line, each being disposed on an opposite side of and partially overlapping an respective edge of the second signal line, an interval between the first and second light blocking members being in a range of from more than 1.5 μm to less than 4 μm. The array panel prevents light leakage from the display and improves its transmittance, aperture ratio and color reproducibility.

摘要翻译： 一种用于平板显示器的薄膜晶体管阵列面板包括：衬底，形成在衬底上的第一信号线，与第一信号线相交和绝缘的第二信号线;开关元件，具有连接到第一信号线 ，连接到第二信号线的第二端子，以及第三端子，连接到开关元件的第三端子的像素电极，以及平行于第二信号线延伸的第一和第二遮光部件， 并且部分地与第二信号线的相应边缘重叠，第一和第二遮光构件之间的间隔在大于1.5μm至小于4μm的范围内。 阵列面板可防止显示屏漏光，提高透光率，开口率和色彩再现性。