Abstract:
One embodiment of the present invention relates to a method for manufacturing solar cells having a nano-micro composite structure on a silicon substrate and solar cells manufactured thereby. The technical problem to be solved is to provide a method for manufacturing solar cells and solar cells manufactured thereby, the method being capable of forming micro wires in various sizes according to the lithographic design of a photoresist and forming nano wires, which have various sizes and aspect ratios, by adjusting the concentration of a wet etching solution and immersion time. To this end, the present invention provides a method for manufacturing solar cells and solar cells manufactured thereby, the method comprising the steps of: preparing a first conductive semiconductor substrate having a first surface and a second surface; patterning a photoresist on the second surface of the first conductive semiconductor substrate such that the plane form of the photoresist becomes a form in which multiple horizontal lines and multiple vertical lines intersect each other; electrolessly etching the semiconductor substrate so as to form a micro wire having a width of 1-3 μm and a height of 3-5 μm in a region corresponding to the photoresist and to form multiple nano wires having a width of 1-100 nm and a height of 1-3 μm in a region not corresponding to the photoresist; doping the micro wire and nano wires with a second conductive impurity by using POCl3; forming a first electrode on the first surface of the semiconductor substrate; and forming a second electrode on the micro wire, wherein the efficiency of the solar cells is 10-13%, the efficiency being the ratio of output to incident light energy per unit area.
Abstract:
This disclosure synthesizes an anodic composite material Li(LixNiyCozMnwO2+α) of Li2MnO3 series whose theoretical capacity is a level of about 460 mAh/g, and to produce an electrode of a high capacity using the synthesized anodic composite material. Also provided is a method for charging and discharging the electrode. Here, the method for producing an anodic composite material for a lithium secondary battery includes the steps of: mixing a nickel nitrate solution, a manganese nitrate solution, and a cobalt nitrate solution to produce a starting material solution; and mixing the starting material solution with a complexing agent so as to produce an anodic composite material Li(LixNiyCozMnwO2+α) of Li2MnO3 series by means of coprecipitation.
Abstract translation:本公开内容合成了理论容量为约460mAh / g的Li2MnO3系列的阳极复合材料Li(LixNiyCozMnwO2 +α),并使用合成的阳极复合材料制造高容量的电极。 还提供了一种用于充电和放电电极的方法。 这里,用于制造锂二次电池用阳极复合材料的方法包括以下步骤:将硝酸镍溶液,硝酸锰溶液和硝酸钴溶液混合以制备原料溶液; 并将原料溶液与络合剂混合,通过共沉淀法制备Li2MnO3系列的阳极复合材料Li(Li x Ni y Co z Mn O 2 +α)。
Abstract:
One embodiment of the present invention relates to a method of manufacturing polycrystalline silicon thin-film solar cell by a method of crystallizing a large-area amorphous silicon thin film using a linear electron beam, and the technical problem to be solved is to crystallize an amorphous silicon thin film, which is formed on a low-priced substrate, by means of an electron beam so as for same to easily be of high quality by having high crystallization yield and to be processed at a low temperature. To this end, one embodiment of the present invention provides a method of manufacturing polycrystalline silicon thin-film solar cell by means of a method for crystallizing a large-area amorphous silicon thin film using a linear electron beam, the method comprising: a substrate preparation step for preparing a substrate; a type 1+ amorphous silicon layer deposition step for forming a type 1+ amorphous silicon layer on the substrate; a type 1 amorphous silicon layer deposition step for forming a type 1 amorphous silicon layer on the type 1+ amorphous silicon layer; an absorption layer formation step for forming an absorption layer by radiating a linear electron beam to the type 1 amorphous silicon layer and thus crystallizing the type 1 amorphous layer and the type 1+ amorphous silicon layer; a type 2 amorphous silicon layer deposition step for forming a type 2 amorphous silicon layer on the absorption layer; and an emitter layer formation step for forming an emitter layer by radiating a linear electron beam to the type 2 amorphous silicon layer and thus crystallizing the type 2 amorphous silicon layer, wherein the linear electron beam is radiated from above type 1 and type 2 amorphous silicon layers in a linear scanning manner in which to reciprocate in a predetermined area.