METHOD FOR MANUFACTURING SOLAR CELLS HAVING NANO-MICRO COMPOSITE STRUCTURE ON SILICON SUBSTRATE AND SOLAR CELLS MANUFACTURED THEREBY

    公开(公告)号:US20170084765A1

    公开(公告)日:2017-03-23

    申请号:US15368024

    申请日:2016-12-02

    Abstract: One embodiment of the present invention relates to a method for manufacturing solar cells having a nano-micro composite structure on a silicon substrate and solar cells manufactured thereby. The technical problem to be solved is to provide a method for manufacturing solar cells and solar cells manufactured thereby, the method being capable of forming micro wires in various sizes according to the lithographic design of a photoresist and forming nano wires, which have various sizes and aspect ratios, by adjusting the concentration of a wet etching solution and immersion time. To this end, the present invention provides a method for manufacturing solar cells and solar cells manufactured thereby, the method comprising the steps of: preparing a first conductive semiconductor substrate having a first surface and a second surface; patterning a photoresist on the second surface of the first conductive semiconductor substrate such that the plane form of the photoresist becomes a form in which multiple horizontal lines and multiple vertical lines intersect each other; electrolessly etching the semiconductor substrate so as to form a micro wire having a width of 1-3 μm and a height of 3-5 μm in a region corresponding to the photoresist and to form multiple nano wires having a width of 1-100 nm and a height of 1-3 μm in a region not corresponding to the photoresist; doping the micro wire and nano wires with a second conductive impurity by using POCl3; forming a first electrode on the first surface of the semiconductor substrate; and forming a second electrode on the micro wire, wherein the efficiency of the solar cells is 10-13%, the efficiency being the ratio of output to incident light energy per unit area.

    METHOD FOR MANUFACTURING POLYCRYSTALLINE SILICON THIN-FILM SOLAR CELLS BY MEANS METHOD FOR CRYSTALLIZING LARGE-AREA AMORPHOUS SILICON THIN FILM USING LINEAR ELECTRON BEAM
    13.
    发明申请
    METHOD FOR MANUFACTURING POLYCRYSTALLINE SILICON THIN-FILM SOLAR CELLS BY MEANS METHOD FOR CRYSTALLIZING LARGE-AREA AMORPHOUS SILICON THIN FILM USING LINEAR ELECTRON BEAM 有权
    使用线性电子束结晶大面积无定形硅薄膜的方法制造多晶硅薄膜太阳能电池的方法

    公开(公告)号:US20150280048A1

    公开(公告)日:2015-10-01

    申请号:US14437087

    申请日:2012-12-18

    Abstract: One embodiment of the present invention relates to a method of manufacturing polycrystalline silicon thin-film solar cell by a method of crystallizing a large-area amorphous silicon thin film using a linear electron beam, and the technical problem to be solved is to crystallize an amorphous silicon thin film, which is formed on a low-priced substrate, by means of an electron beam so as for same to easily be of high quality by having high crystallization yield and to be processed at a low temperature. To this end, one embodiment of the present invention provides a method of manufacturing polycrystalline silicon thin-film solar cell by means of a method for crystallizing a large-area amorphous silicon thin film using a linear electron beam, the method comprising: a substrate preparation step for preparing a substrate; a type 1+ amorphous silicon layer deposition step for forming a type 1+ amorphous silicon layer on the substrate; a type 1 amorphous silicon layer deposition step for forming a type 1 amorphous silicon layer on the type 1+ amorphous silicon layer; an absorption layer formation step for forming an absorption layer by radiating a linear electron beam to the type 1 amorphous silicon layer and thus crystallizing the type 1 amorphous layer and the type 1+ amorphous silicon layer; a type 2 amorphous silicon layer deposition step for forming a type 2 amorphous silicon layer on the absorption layer; and an emitter layer formation step for forming an emitter layer by radiating a linear electron beam to the type 2 amorphous silicon layer and thus crystallizing the type 2 amorphous silicon layer, wherein the linear electron beam is radiated from above type 1 and type 2 amorphous silicon layers in a linear scanning manner in which to reciprocate in a predetermined area.

    Abstract translation: 本发明的一个实施方案涉及通过使用线性电子束使大面积非晶硅薄膜结晶的方法制造多晶硅薄膜太阳能电池的方法,并且要解决的技术问题是使无定形 硅薄膜,其通过电子束形成在低价基板上,以便通过具有高结晶产率容易地获得高质量并在低温下进行处理。 为此,本发明的一个实施例提供一种利用线性电子束使大面积非晶硅薄膜结晶的方法制造多晶硅薄膜太阳能电池的方法,该方法包括: 制备底物的步骤; 1类非晶硅层沉积步骤,用于在衬底上形成1型非晶硅层; 1型非晶硅层沉积步骤,用于在1 +非晶硅层上形成1型非晶硅层; 吸收层形成步骤,用于通过将线性电子束照射到1型非晶硅层并因此使1型非晶层和1型非晶硅层结晶而形成吸收层; 用于在吸收层上形成2型非晶硅层的2型非晶硅层沉积步骤; 以及发射极层形成步骤,用于通过将线性电子束照射到2型非晶硅层并因此使2型非晶硅层结晶而形成发射极层,其中线性电子束从上述类型1和2型非晶硅 层,其以预定区域往复运动的线性扫描方式。

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