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11.发明授权(Meth)acrylate, raw material alcohol for the (meth)acrylate, method of producing the (meth)acrylate and the alcohol, polymer produced by polymerizing the (meth)acrylate, chemically amplified resist composition, and method of the formation of a pattern 有权（甲基）丙烯酸酯，（甲基）丙烯酸酯的原料醇，（甲基）丙烯酸酯和醇的制造方法，聚合（甲基）丙烯酸酯，化学放大型抗蚀剂组合物，形成图案的方法公开(公告)号：US07339014B2
公开(公告)日：2008-03-04
申请号：US10974876
申请日：2004-10-28
CPC分类号： G03F7/0397 , C07D307/88 , C07D307/93 , C08F220/18 , C08F220/28
摘要： A (meth)acrylate represented by the following formula (1): wherein each of R1, R2, R3 and R4 represents a hydrogen atom, a methyl group or an ethyl group; either one of X1 or X2 represents a (meth)acryloyloxy group and the other represents a hydrogen atom; both A1 and A2 represent hydrogen atoms, or A1 and A2 form —O—, —CH2— or —CH2CH2—, which can be produced by first producing a lactone by reducing an addition product obtained by the Diels-Alder reaction between 1,3-diene and maleic anhydride, and then hydrating the lactone to produce an alcohol followed by (meth)acrylation of the alcohol; a polymer produced by (co)polymerizing a monomer composition comprising the (meth)acrylate of the present invention is excellent in transparency, dry etching resistance, and solubility in organic solvents, and so it is preferably used as a resin for a chemically amplified resist composition.
摘要翻译： 由下式（1）表示的（甲基）丙烯酸酯：其中R 1，R 2，R 3和R 0中的每一个 > 4表示氢原子，甲基或乙基; X 1或X 2中的任一个表示（甲基）丙烯酰氧基，另一个表示氢原子; A 1和A 2都代表氢原子，或者A 1和A 2 O 2 - ， - O - CH 2 - 或-CH 2 CH 2 - ，其可以通过首先通过还原由Diels获得的加成产物来生产内酯来制备 - 1,3-二烯和马来酸酐之间的反应，然后水合内酯以产生醇，然后进行醇的（甲基）丙烯酸酯化; 通过（共）聚合本发明的（甲基）丙烯酸酯的单体组合物而制造的聚合物的透明性，耐干蚀刻性和在有机溶剂中的溶解性优异，因此优选用作化学增幅抗蚀剂的树脂 组成。
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12.发明授权(Meth)acrylate esters, starting alcohols for the preparation thereof, processes for preparing both, polymers of the esters, chemically amplifiable resist compositions, and method for forming patterns 有权（甲基）丙烯酸酯，其制备原料醇，二者的制备方法，酯的聚合物，化学可放大的抗蚀剂组合物和形成图案的方法公开(公告)号：US07041838B2
公开(公告)日：2006-05-09
申请号：US10433570
申请日：2001-12-05
IPC分类号： C07D407/00
CPC分类号： G03F7/0397 , C07D307/88 , C07D307/93 , C08F220/18 , C08F220/28
摘要： A (meth)acrylate represented by the following formula (1): wherein each of R1, R2, R3 and R4 represents a hydrogen atom, a methyl group or an ethyl group; either one of X1 or X2 represents a (meth)acryloyloxy group and the other represents a hydrogen atom; both A1 and A2 represent hydrogen atoms, or A1 and A2 form —O—, —CH2— or —CH2CH2—, which can be produced by first producing a lactone by reducing an addition product obtained by the Diels-Alder reaction between 1,3-diene and maleic anhydride, and then hydrating the lactone to produce an alcohol followed by (meth)acrylation of the alcohol; a polymer produced by (co)polymerizing a monomer composition comprising the (meth)acrylate of the present invention is excellent in transparency, dry etching resistance, and solubility in organic solvents, and so it is preferably used as a resin for a chemically amplified resist composition.
摘要翻译： 由下式（1）表示的（甲基）丙烯酸酯：其中R 1，R 2，R 3和R 0中的每一个 > 4表示氢原子，甲基或乙基; X 1或X 2中的任一个表示（甲基）丙烯酰氧基，另一个表示氢原子; A 1和A 2都代表氢原子，或者A 1和A 2 O 2 - ， - O - CH 2 - 或-CH 2 CH 2 - ，其可以通过首先通过还原由Diels获得的加成产物来生产内酯来制备 - 1,3-二烯与马来酸酐之间的反应，然后水合内酯以产生醇，然后进行醇的（甲基）丙烯酸酯化; 通过（共）聚合本发明的（甲基）丙烯酸酯的单体组合物而制造的聚合物的透明性，耐干蚀刻性和在有机溶剂中的溶解性优异，因此优选用作化学增幅抗蚀剂的树脂 组成。
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公开(公告)号：US06706826B1
公开(公告)日：2004-03-16
申请号：US09646117
申请日：2000-09-27
IPC分类号： C08F200
CPC分类号： G03F7/039 , G03F7/0045
摘要： The present invention relates to a copolymer for use in paints, resists, and the like; a method for manufacturing the same; and a resist composition using the same. The copolymer according to the present invention is obtained by means of polymerizing at least one monomer containing an alicyclic structure and one monomer containing a lactone structure, and the distribution of the copolymer composition of said monomer containing a lactone structure in said copolymer is in the range of −10 to +10 mol % of the average copolymer composition of said monomer containing a lactone structure in said entire copolymer. In addition, the copolymer according to the present invention is obtained by means of polymerizing a monomer containing an alicyclic structure, a monomer containing a lactone structure, and another vinyl monomer comprising a higher polarity than said monomer containing an alicyclic structure, but a lower polarity than said monomer containing a lactone structure. The copolymer according to the present invention exhibits superior adhesion properties to surfaces possessing a high polarity, such as metal surfaces and the like, in addition to excellent hydrophobic and thermal resistance properties, and also displays a favorable solubility in solvents used for paints, resists, and the like.
摘要翻译： 本发明涉及一种用于涂料，抗蚀剂等的共聚物; 其制造方法; 和使用其的抗蚀剂组合物。 本发明的共聚物是通过聚合至少一种含有脂环结构的单体和含有内酯结构的单体而得到的，所述共聚物中含有内酯结构单体的共聚物组成的分布范围为 在所述全部共聚物中含有内酯结构的所述单体的平均共聚物组成为-10〜+ 10mol％。 此外，根据本发明的共聚物是通过使包含脂环结构的单体，含有内酯结构的单体和另外的含有比所述含有脂环结构的单体极性高的极性的乙烯基单体聚合而得到的， 比所述含有内酯结构的单体。 根据本发明的共聚物除了具有优异的疏水和耐热性能之外，还具有对具有高极性的表面，例如金属表面等的优异的粘合性，并且在用于涂料，抗蚀剂， 等等。
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公开(公告)号：US5878106A
公开(公告)日：1999-03-02
申请号：US654920
申请日：1996-05-29
申请人： Tadayuki Fujiwara
发明人： Tadayuki Fujiwara
IPC分类号： G01N23/20 , G01N23/207 , G21K1/06
CPC分类号： G21K1/06 , G01N23/20016 , G01N23/207
摘要： In an x-ray diffractometer having (i) first and second motors 10, 17 for respectively rotating a sample 4 and an x-ray detector 13 around a rotational axis 7 and (ii) .theta.-2.theta. interlock control means 22 for supplying drive signals to the motors 10, 17, such that a .theta.-2.theta. relationship is always maintained between the angles of the sample 4 and the x-ray detector 13 with respect to irradiated x-rays 2, there is disposed a rotational vibration control unit 23 for supplying, to the first motor for rotating the sample holding member 6, a drive signal for rotationally vibrating the sample, in addition to the drive signal for .theta.-2.theta. interlock. Eliminating an individual drive mechanism for rotationally vibrating the sample 4, this arrangement makes it possible that, with a simple and economical structure, diffracted x-rays are efficiently detected even for a sample having an uneven surface, thereby to obtain an accurate measurement result.
摘要翻译： 在具有（i）第一和第二马达10,17的X射线衍射仪中，分别旋转旋转轴线7上的样品4和X射线检测器13，以及（ii）用于提供驱动力的θ-θ互锁控制装置22 信号到电动机10,17，使得在样品4和X射线检测器13相对于照射的x射线2的角度之间始终维持θ-θ关系，设置旋转振动控制单元 23，除了用于θ-θ互锁的驱动信号之外，还提供用于旋转样品保持构件6的第一马达用于使样品旋转振动的驱动信号。 消除用于旋转振动样品4的单独的驱动机构，这种布置使得可以以简单和经济的结构，即使对于具有不平坦表面的样品也有效地检测衍射的X射线，从而获得准确的测量结果。
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公开(公告)号：US08580481B2
公开(公告)日：2013-11-12
申请号：US13242879
申请日：2011-09-23
申请人： Hikaru Momose , Atsushi Ootake , Akifumi Ueda , Tadayuki Fujiwara , Masaru Takeshita , Ryotaro Hayashi , Takeshi Iwai
发明人： Hikaru Momose , Atsushi Ootake , Akifumi Ueda , Tadayuki Fujiwara , Masaru Takeshita , Ryotaro Hayashi , Takeshi Iwai
CPC分类号： C08F220/28 , G03F7/0397 , Y10S430/111
摘要： The resist polymer of the present invention comprises a specific constitutional unit having a cyano group, a constitutional unit having an acid-dissociable group, and a specific constitutional unit having a lactone skeleton. When the above polymer is used as a resist resin in DUV excimer laser lithography or electron beam lithography, it exhibits high sensitivity and high resolution, and provides a good resist pattern shape, having a small degree of occurrence of line edge roughness or generation of microgels.
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公开(公告)号：US08092979B2
公开(公告)日：2012-01-10
申请号：US12496232
申请日：2009-07-01
申请人： Hikaru Momose , Atsushi Ootake , Akifumi Ueda , Tadayuki Fujiwara , Masaru Takeshita , Ryotaro Hayashi , Takeshi Iwai
发明人： Hikaru Momose , Atsushi Ootake , Akifumi Ueda , Tadayuki Fujiwara , Masaru Takeshita , Ryotaro Hayashi , Takeshi Iwai
IPC分类号： G03F7/039 , C08F222/14 , C08F222/20 , C08F222/22
CPC分类号： C08F220/28 , G03F7/0397 , Y10S430/111
摘要： The resist polymer of the present invention comprises a specific constitutional unit having a cyano group, a constitutional unit having an acid-dissociable group, and a specific constitutional unit having a lactone skeleton. When the above polymer is used as a resist resin in DUV excimer laser lithography or electron beam lithography, it exhibits high sensitivity and high resolution, and provides a good resist pattern shape, having a small degree of occurrence of line edge roughness or generation of microgels.
摘要翻译： 本发明的抗蚀剂聚合物包含具有氰基的特定结构单元，具有酸解离基的结构单元和具有内酯骨架的特定结构单元。 当在DUV准分子激光光刻或电子束光刻中使用上述聚合物作为抗蚀剂树脂时，其表现出高灵敏度和高分辨率，并且提供良好的抗蚀剂图案形状，线边缘粗糙度的发生程度小或微凝胶的产生 。
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公开(公告)号：US20090263743A1
公开(公告)日：2009-10-22
申请号：US12496232
申请日：2009-07-01
申请人： Hikaru MOMOSE , Atsushi Ootake , Akifumi Ueda , Tadayuki Fujiwara , Masaru Takeshita , Ryotaro Hayashi , Takeshi Iwai
发明人： Hikaru MOMOSE , Atsushi Ootake , Akifumi Ueda , Tadayuki Fujiwara , Masaru Takeshita , Ryotaro Hayashi , Takeshi Iwai
CPC分类号： C08F220/28 , G03F7/0397 , Y10S430/111
摘要： The resist polymer of the present invention comprises a specific constitutional unit having a cyano group, a constitutional unit having an acid-dissociable group, and a specific constitutional unit having a lactone skeleton. When the above polymer is used as a resist resin in DUV excimer laser lithography or electron beam lithography, it exhibits high sensitivity and high resolution, and provides a good resist pattern shape, having a small degree of occurrence of line edge roughness or generation of microgels.
摘要翻译： 本发明的抗蚀剂聚合物包含具有氰基的特定结构单元，具有酸解离基的结构单元和具有内酯骨架的特定结构单元。 当在DUV准分子激光光刻或电子束光刻中使用上述聚合物作为抗蚀剂树脂时，其表现出高灵敏度和高分辨率，并且提供良好的抗蚀剂图案形状，线边缘粗糙度的发生程度小或微凝胶的产生 。
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公开(公告)号：US20060127801A1
公开(公告)日：2006-06-15
申请号：US10543914
申请日：2004-01-29
申请人： Hikaru Momose , Atsushi Ootake , Akifumi Ueda , Tadayuki Fujiwara , Masaru Takeshita , Ryotaro Kayashi , Takeshi Iwai
发明人： Hikaru Momose , Atsushi Ootake , Akifumi Ueda , Tadayuki Fujiwara , Masaru Takeshita , Ryotaro Kayashi , Takeshi Iwai
IPC分类号： G03C1/76
CPC分类号： C08F220/28 , G03F7/0397 , Y10S430/111
摘要： The resist polymer of the present invention comprises a specific constitutional unit having a cyano group, a constitutional unit having an acid-dissociable group, and a specific constitutional unit having a lactone skeleton. When the above polymer is used as a resist resin in DUV excimer laser lithography or electron beam lithography, it exhibits high sensitivity and high resolution, and provides a good resist pattern shape, having a small degree of occurrence of line edge roughness or generation of microgels.
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公开(公告)号：US06887646B1
公开(公告)日：2005-05-03
申请号：US10030430
申请日：2000-07-11
CPC分类号： G03F7/0045 , G03F7/039 , G03F7/0397 , Y10S430/106 , Y10S430/111
摘要： The present invention discloses a chemically amplified resist composition comprising: a resin which becomes soluble in an aqueous alkali solution in the presence of an acid, a photo acid generator, and an amine derivative which shows, in water of 25° C., such a basicity as to form a conjugate acid and has a medium polarity. The amine derivative acts as a quencher. Therefore, the chemically amplified resist composition of the present invention enables formation of a very precise and fine resist pattern and can be suitably used particularly in a lithography using an ArF excimer laser beam.
摘要翻译： 本发明公开了一种化学放大抗蚀剂组合物，其包含：在酸存在下溶于碱水溶液的树脂，光酸产生剂和胺衍生物，其在25℃的水中显示出 碱性以形成共轭酸并具有中等极性。 胺衍生物用作猝灭剂。 因此，本发明的化学放大抗蚀剂组合物能够形成非常精确和精细的抗蚀剂图案，并且可以特别适用于使用ArF准分子激光束的光刻中。
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公开(公告)号：US06844559B2
公开(公告)日：2005-01-18
申请号：US10673820
申请日：2003-09-29
申请人： Tadayuki Fujiwara
发明人： Tadayuki Fujiwara
IPC分类号： G01R31/00 , G01R31/302 , G02F1/13 , H01J37/20 , H01J37/28 , H01J37/302
CPC分类号： H01J37/20 , H01J37/28 , H01J2237/20285 , H01J2237/2814 , H01J2237/2817
摘要： A substrate testing apparatus for testing a substrate by irradiation of electron beam comprises a scan parameter calculating unit, a stage control unit for controlling the movement of a stage, and an electron beam control unit for controlling an irradiating position of electron beam. The scan parameter calculating unit calculates a stage speed and the irradiating position of electron beam on the basis of an array of measurement points in a unit area set for each substrate species of object to be tested. The scan parameters for the substrate species are automatically calculated, and the driving of the testing apparatus is controlled in accordance with the calculated parameters, whereby it is unnecessary to restart the software.
摘要翻译： 用于通过电子束的照射来测试衬底的衬底测试装置包括扫描参数计算单元，用于控制台的移动的台控制单元和用于控制电子束的照射位置的电子束控制单元。 扫描参数计算单元基于针对待测试物体的每个基底种类设置的单位面积中的测量点阵列来计算电子束的载物台速度和照射位置。 自动计算基板种类的扫描参数，根据计算出的参数来控制测试装置的驱动，由此不需要重新启动软件。
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