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    HYDROGEN SENSOR HAVING VERTICAL NANOGAP STRUCTURE AND METHOD FOR MANUFACTURING THE SAME
    11.
    发明申请
    HYDROGEN SENSOR HAVING VERTICAL NANOGAP STRUCTURE AND METHOD FOR MANUFACTURING THE SAME 有权

    公开(公告)号：US20210239666A1

    公开(公告)日：2021-08-05

    申请号：US17148242

    申请日：2021-01-13

    Applicant: KOREA INSTITUTE OF SCIENCE AND TECHNOLOGY

    Inventor： Deok Ha WOO ,  Yusin PAK

    IPC: G01N33/00

    Abstract: The present disclosure relates to a hydrogen sensor and a method for manufacturing the same, and more particularly, to a hydrogen sensor having a vertical nanogap structure, in which a nanogap is formed below a sensor portion to bring the sensor portion and an electrode into contact with each other when the sensor portion reacts with hydrogen, so as to allow the sensor portion to expand and contract freely without resistance on a substrate, thereby improving hydrogen sensing accuracy, and it is possible to form a precise nanogap with uniformity and reproducibility at a low cost and a method for manufacturing the same.

    OPTICAL IMAGING APPARATUS USING METAMATERIAL AND OPTICAL IMAGING METHOD USING METAMATERIAL
    13.
    发明申请
    OPTICAL IMAGING APPARATUS USING METAMATERIAL AND OPTICAL IMAGING METHOD USING METAMATERIAL 审中-公开

    公开(公告)号：US20200284660A1

    公开(公告)日：2020-09-10

    申请号：US16809275

    申请日：2020-03-04

    Applicant: KOREA INSTITUTE OF SCIENCE AND TECHNOLOGY ,  Center for Advanced Meta-Materials

    Inventor： Minah SEO ,  Sang-Hun LEE ,  Chulki KIM ,  Jae Hun KIM ,  Taikjin LEE ,  Deok Ha WOO

    IPC: G01J5/08 ,  G02B1/00

    Abstract: One embodiment of the present invention provides an optical imaging apparatus using a metamaterial including a metamaterial array sensor which includes a plurality of unit cells made of a metamaterial and is positioned adjacent to an observation object, an imaging beam providing unit which provides an imaging beam toward the metamaterial array sensor, a control beam providing unit which controls a control beam provided to the unit cell to block the imaging beam incident on the unit cell, and an imaging beam measuring unit which measures a unit cell imaging beam transmission amount passing through the unit cell by measuring an imaging beam transmission amount of the metamaterial array sensor when the imaging beam passes through the unit cell and an imaging beam transmission amount of the metamaterial array sensor when the control beam is focused on the unit cell to block the imaging beam incident on the unit cell.

    APPARATUS AND METHOD FOR EXTREME ULTRAVIOLET SPECTROMETER CALIBRATION
    14.
    发明申请
    APPARATUS AND METHOD FOR EXTREME ULTRAVIOLET SPECTROMETER CALIBRATION 有权
    超声波紫外光谱仪校准的装置和方法

    公开(公告)号：US20150346029A1

    公开(公告)日：2015-12-03

    申请号：US14490948

    申请日：2014-09-19

    Applicant: KOREA INSTITUTE OF SCIENCE AND TECHNOLOGY

    Inventor： Sun Ho KIM ,  Yong Soo KIM ,  Jae Hun KIM ,  Min-Chul PARK ,  Young Tae BYUN ,  Min Ah SEO ,  Joon Mo AHN ,  Deok Ha WOO ,  Seok LEE ,  Taik Jin LEE ,  Young Min JHON

    IPC: G01J3/02 ,  G01J3/28 ,  G01J3/10

    CPC classification number: G01J3/0297 ,  G01J3/10 ,  G01J3/28 ,  G01J3/2803 ,  G01J2003/282

    Abstract: Disclosed are herein an apparatus and method for extreme ultraviolet (EUV) spectroscope calibration. The apparatus for EUV spectroscope calibration includes an EUV generating module, an Al filter, a diffraction grating, a CCD camera, a spectrum conversion module, and a control module that compares a wavelength value corresponding to a maximum peak among peaks of the spectrum depending on the order of the EUV light converted from the spectrum conversion module with a predetermined reference wavelength value depending on an order of high-order harmonics to calculate a difference value with the closest reference wavelength value, and controls the spectrum depending on the order of the EUV light converted from the spectrum conversion module to be moved in a direction of wavelength axis by the calculated difference value. Thus, it is possible to accurately measure a wavelength of a spectrum of EUV light used in EUV exposure technology and mask inspection technology.

    Abstract translation: 本文公开了用于极紫外（EUV）分光仪校准的装置和方法。 用于EUV分光仪校准的装置包括EUV生成模块，Al滤光片，衍射光栅，CCD照相机，光谱转换模块和控制模块，该模块将与频谱峰值中的最大峰值对应的波长值与 根据高次谐波的顺序，从频谱转换模块转换成具有预定参考波长值的EUV光的顺序，以计算具有最接近参考波长值的差值，并根据EUV的顺序来控制光谱 从光谱转换模块转换为沿波长轴方向移动计算出的差值的光。 因此，可以精确地测量在EUV曝光技术和掩模检查技术中使用的EUV光的光谱的波长。

    PULSE LASER APPARATUS
    17.
    发明申请
    PULSE LASER APPARATUS 有权
    脉冲激光装置

    公开(公告)号：US20150049775A1

    公开(公告)日：2015-02-19

    申请号：US14448227

    申请日：2014-07-31

    Applicant: KOREA INSTITUTE OF SCIENCE AND TECHNOLOGY

    Inventor： Young Min JHON ,  Joon Mo AHN ,  Jae Hun KIM ,  Seok LEE ,  Min Chul PARK ,  Deok Ha WOO ,  Young Tae BYUN ,  Taik Jin LEE ,  Sun Ho KIM

    IPC: H01S3/117

    CPC classification number: H01S3/117 ,  H01S3/08027 ,  H01S3/1062 ,  H01S3/1068 ,  H01S3/11 ,  H01S3/1103 ,  H01S3/1106 ,  H01S3/1109 ,  H01S3/1112 ,  H01S3/1623

    Abstract: Provided is a pulse laser apparatus for generating laser light. The apparatus includes a first mirror and a second mirror which are disposed at both ends of a resonator and configured to reflect the laser light, a gain medium disposed between the first and second mirrors and configured to amplify and output light incident from an outside, an etalon configured to adjust a pulse width of the laser light, and an acousto-optic modulator disposed between the first and second mirrors and configured to form a mode-locked and Q-switched signal from the laser light, in which some of the laser light is output through either the first or second mirror to outside the resonator.

    Abstract translation: 提供了一种用于产生激光的脉冲激光装置。 该装置包括：第一反射镜和第二反射镜，其设置在谐振器的两端并被配置为反射激光;增益介质，设置在第一和第二反射镜之间并且被配置为放大并输出从外部入射的光， 标准准则被配置为调整激光的脉冲宽度，以及声光调制器，其布置在第一和第二反射镜之间并被配置为从激光形成锁模和Q开关信号，其中一些激光 通过第一或第二反射镜输出到谐振器外部。

    FABRICATING METHOD OF CARBON NANOTUBE-BASED FIELD EFFECT TRANSISTOR AND CARBON NANOTUBE-BASED FIELD EFFECT TRANSISTOR FABRICATED THEREBY
    18.
    发明申请
    FABRICATING METHOD OF CARBON NANOTUBE-BASED FIELD EFFECT TRANSISTOR AND CARBON NANOTUBE-BASED FIELD EFFECT TRANSISTOR FABRICATED THEREBY 有权
    基于碳纳米管的场效应晶体管的制备方法和基于碳纳米管的场效应晶体管的制备方法

    公开(公告)号：US20140367632A1

    公开(公告)日：2014-12-18

    申请号：US14048197

    申请日：2013-10-08

    Applicant: KOREA INSTITUTE OF SCIENCE AND TECHNOLOGY

    Inventor： Young Tae BYUN ,  Sun Ho KIM ,  Young Min JHON ,  Eun Gyeong KIM ,  Jae Seong KIM ,  Deok Ha WOO

    IPC: H01L51/00 ,  H01L51/05

    CPC classification number: H01L51/0003 ,  H01L51/0026 ,  H01L51/0048 ,  H01L51/0508 ,  H01L51/0545 ,  Y10S977/742

    Abstract: There are provided a fabricating method of a carbon nanotube-based field effect transistor having an improved binding force with a substrate and a carbon nanotube-based field effect transistor fabricated by the fabricating method. The method includes forming an oxide film on a substrate, forming a photoresist pattern on the oxide film, forming a metal film on the entire surface of the oxide film having the photoresist pattern, removing the photoresist by lifting off, adsorbing carbon nanotubes on the substrate from which the photoresist is removed, performing an annealing process to the substrate to which the carbon nanotubes are adsorbed, and removing the metal film. Since an adhesive strength between a substrate and carbon nanotubes increases, stability and reliability of a field effect transistor can be improved. If the field effect transistor is applied to a liquid sensor or the like, a lifespan of the sensor can be extended and reliability of a measurement result obtained by the sensor can be improved.

    Abstract translation: 提供了一种通过制造方法制造的具有与衬底和基于碳纳米管的场效应晶体管的结合力提高的基于碳纳米管的场效应晶体管的制造方法。 该方法包括在基板上形成氧化膜，在氧化膜上形成光致抗蚀剂图案，在具有光致抗蚀剂图案的氧化膜的整个表面上形成金属膜，通过剥离除去光致抗蚀剂，在基板上吸附碳纳米管 从中除去光致抗蚀剂，对吸附有碳纳米管的基板进行退火处理，并除去金属膜。 由于衬底和碳纳米管之间的粘合强度增加，所以可以提高场效应晶体管的稳定性和可靠性。 如果将场效应晶体管施加到液体传感器等，则可以延长传感器的寿命，并且可以提高由传感器获得的测量结果的可靠性。

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