公开(公告)号：US20140030966A1

公开(公告)日：2014-01-30

申请号：US14021300

申请日：2013-09-09

Applicant: Lam Research Corporation

Inventor： Armen Avoyan ,  Duane Outka ,  Catherine Zhou ,  Hong Shih

IPC: B24B41/06

CPC classification number: B24B41/06 ,  B08B3/08 ,  B08B3/12 ,  C11D7/08 ,  C11D7/261 ,  C11D7/265 ,  C11D11/0047

Abstract: A process is provided for polishing a silicon electrode utilizing a polishing turntable and a dual function electrode platen secured to the polishing, which can comprise a plurality of electrode mounts arranged to project from an electrode engaging face of the dual function electrode platen. The electrode mounts and mount receptacles can be configured to permit non-destructive engagement and disengagement of the electrode engaging face of the electrode platen and the platen engaging face of the silicon electrode. The silicon electrode can be polished by (i) engaging the electrode engaging face of the electrode platen and the platen engaging face of the silicon electrode via the electrode mounts and mount receptacles, (ii) utilizing the polishing turntable to impart rotary, and (iii) contacting an exposed face of the silicon electrode with a polishing surface as the silicon electrode. Additional embodiments are contemplated, disclosed and claimed.

Abstract translation: 提供了一种利用抛光转盘和固定到抛光的双功能电极压板来抛光硅电极的工艺，其可以包括布置成从双功能电极压板的电极接合面突出的多个电极安装件。 电极安装座和安装座可构造为允许电极台板的电极接合面和硅电极的台板接合面的非破坏性接合和分离。 可以通过（i）通过电极座和安装座接合电极台板的电极接合面和硅电极的台板接合面，（ii）利用抛光转台来旋转，并（iii） ）使硅电极的暴露面与作为硅电极的抛光表面接触。 预期，公开和要求保护附加实施例。

公开(公告)号：US20130146095A1

公开(公告)日：2013-06-13

申请号：US13650429

申请日：2012-10-12

Applicant: LAM RESEARCH CORPORATION

Inventor： Armen Avoyan ,  Cliff La Croix ,  Hong Shih ,  Allan Ronne ,  John Daugherty ,  Catherine Zhou

IPC: B08B9/032 ,  B08B3/02

CPC classification number: B08B9/0328

Abstract: An injector cleaning apparatus with a concentric dual flow introducer and a flow-dispersing injector seat along with a method of cleaning an injector. The concentric dual flow introducer has concentric cleaning fluid flowpaths configured to communicate with a central passage and a plurality of peripheral passages of a gas injector. The input-side injector engaging interface of the concentric dual flow introducer and the flow-dispersing injector seat each have a compressible sealing portion having compressibility sufficient to yield under fluid cleaning surges attributable to initiation and termination of cleaning fluid flow through the injector cleaning apparatus along with resiliency sufficient to prevent abutment of the gas injector and a rigid facing portion of the input-side injector engaging interface and output-side injector engaging interface respectively.

Abstract translation: 具有同心双流引导器和分流喷射器座的喷射器清洁装置以及清洁喷射器的方法。 同心双流引导器具有配置成与气体注射器的中心通道和多个外围通道连通的同心清洁流体流动路径。 同心双流引导器和流量分散注射器座的输入侧注射器接合界面各自具有可压缩的密封部分，该密封部分具有足够的压缩性，足以产生由于通过喷射器清洁装置的清洁流体流动的起始和终止引起的流体清洁浪涌 其弹性足以防止气体注射器和输入侧注射器接合界面和输出侧注射器接合界面的刚性面对部分的邻接。

公开(公告)号：US10967407B2

公开(公告)日：2021-04-06

申请号：US15969626

申请日：2018-05-02

Applicant: Lam Research Corporation

Inventor： Amir A. Yasseri ,  Hong Shih ,  John Daugherty ,  Duane Outka ,  Lin Xu ,  Armen Avoyan ,  Cliff La Croix ,  Girish Hundi

IPC: B08B7/00 ,  B08B7/04 ,  B08B5/02 ,  B08B3/04 ,  B08B3/14 ,  B08B3/12 ,  H01J37/32

Abstract: An apparatus for conditioning a component of a processing chamber is provided. A tank for holding a megasonic conditioning solution is provided. A mount holds the component immersed in a megasonic conditioning solution, when the tank is filled with the megasonic conditioning solution. A megasonic conditioning solution inlet system delivers the megasonic conditioning solution to the tank. A megasonic transducer head comprises at least one megasonic transducer to provide megasonic energy to the megasonic conditioning solution, wherein the megasonic energy is delivered to the component via the megasonic conditioning solution. A megasonic conditioning solution drain system drains the megasonic conditioning solution from the tank at a location above where the component is held in the megasonic conditioning solution. An actuator moves the megasonic transducer head across the tank.

公开(公告)号：US10391526B2

公开(公告)日：2019-08-27

申请号：US14104356

申请日：2013-12-12

Applicant: Lam Research Corporation

Inventor： Armen Avoyan ,  Cliff LaCroix ,  Hong Shih ,  Kennet Baylon

IPC: H01L21/683 ,  B08B3/12 ,  B08B3/02 ,  B08B17/04 ,  H01L21/67 ,  B08B9/00

Abstract: A cleaning fixture assembly for protecting an electrostatic chuck suitable for supporting semiconductor substrates during a cleaning process contains a plate configured to align with and engage a backside of the electrostatic chuck, the plate having an annular seal portion surrounding a pocket. The cleaning fixture assembly also contains a first O-ring engaging the annular seal portion of the plate, a plurality of through-holes in the pocket of the plate, and a plurality of O-rings surrounding the plurality of through-holes in the pocket of the plate. The plurality of through-holes are configured to be aligned with and in fluid communication with lift pin holes and helium holes in the backside of the electrostatic chuck, and the plurality of O-rings are positioned to allow cleaning media to engage the lift pin holes and helium holes in the electrostatic chuck during a cleaning process while sealing the cleaning media from reaching the backside of the electrostatic chuck.

公开(公告)号：US09748078B2

公开(公告)日：2017-08-29

申请号：US15003485

申请日：2016-01-21

Applicant: Lam Research Corporation

Inventor： Armen Avoyan ,  Cliff La Croix ,  Hong Shih

IPC: B08B3/00 ,  B08B3/02 ,  H01J21/00 ,  H01J37/32 ,  H01L21/00

CPC classification number: H01J37/32862 ,  B08B3/00 ,  B08B3/02 ,  H01J21/00 ,  H01J37/32532 ,  H01L21/00

Abstract: In one embodiment, a dual phase cleaning chamber may include a turbulent mixing chamber, a fluid diffuser, an isostatic pressure chamber and a rupture mitigating nozzle. The turbulent mixing chamber may be in fluid communication with a first fluid inlet and a second fluid inlet. The fluid diffuser may be in fluid communication with the turbulent mixing chamber. The rupture mitigating nozzle may include a first fluid collecting offset, a second fluid collecting offset, and a displacement damping projection. The displacement damping projection may be disposed between the first and second fluid collecting offset and may be offset away from each of the first fluid collecting offset and the second fluid collecting offset, and towards the fluid diffuser. A pressurized cleaning fluid introduced from the first fluid inlet, the second fluid inlet, or both flows through the outlet passage of the first and second fluid collecting offset.

公开(公告)号：US09505036B2

公开(公告)日：2016-11-29

申请号：US13833487

申请日：2013-03-15

Applicant: Lam Research Corporation

Inventor： Armen Avoyan ,  Cliff LaCroix ,  Hong Shih ,  John Daugherty

IPC: B08B3/12 ,  C11D11/00 ,  H01L21/67

CPC classification number: B08B3/12 ,  C11D11/0041 ,  C11D11/0047 ,  C11D11/007 ,  H01L21/67017 ,  H01L21/67051

Abstract: A particle removal tool having a sound field transducer, a cleaning chamber, and an open sealing face. The cleaning chamber having a cleaning fluid guiding chamber extending from the sound field transducer to the open sealing face, a cleaning fluid delivery channel in fluid communication with the cleaning fluid guiding chamber, and a cleaning fluid return channel. The open sealing face has a cleaning portal disposed contiguous with a plane formed by the open sealing face and a chamber-to-surface interface seal which forms a fluid tight seal with a cleaning surface plane. The sound field transducer is disposed within a line-of-sight of the cleaning portal and generates acoustic waves with a frequency between approximately 20 kHz and approximately 2 MHz.

Abstract translation: 具有声场换能器，清洁室和开口密封面的颗粒去除工具。 清洁室具有从声场换能器延伸到打开的密封面的清洁流体引导室，与清洁流体引导室流体连通的清洁流体输送通道和清洁流体返回通道。 敞开的密封面具有与由开口密封面形成的平面邻接的清洁入口和与清洁表面平面形成流体密封的腔到表面的界面密封件。 声场传感器设置在清洁门口的视线内，并产生频率在大约20kHz到大约2MHz之间的声波。

公开(公告)号：US20150165492A1

公开(公告)日：2015-06-18

申请号：US14104356

申请日：2013-12-12

Applicant: Lam Research Corporation

Inventor： Armen Avoyan ,  Cliff LaCroix ,  Hong Shih ,  Kennet Baylon

IPC: B08B3/12 ,  H01L21/683

CPC classification number: B08B3/12 ,  B08B3/02 ,  B08B9/00 ,  B08B17/04 ,  H01L21/67051 ,  H01L21/6831 ,  Y10T137/0402 ,  Y10T137/4238

Abstract: A cleaning fixture assembly for protecting an electrostatic chuck suitable for supporting semiconductor substrates during a cleaning process contains a plate configured to align with and engage a backside of the electrostatic chuck, the plate having an annular seal portion surrounding a pocket. The cleaning fixture assembly also contains a first O-ring engaging the annular seal portion of the plate, a plurality of through-holes in the pocket of the plate, and a plurality of O-rings surrounding the plurality of through-holes in the pocket of the plate. The plurality of through-holes are configured to be aligned with and in fluid communication with lift pin holes and helium holes in the backside of the electrostatic chuck, and the plurality of O-rings are positioned to allow cleaning media to engage the lift pin holes and helium holes in the electrostatic chuck during a cleaning process while sealing the cleaning media from reaching the backside of the electrostatic chuck.

Abstract translation: 一种用于在清洁过程中保护适合于支撑半导体衬底的静电吸盘的清洁固定装置包括配置成与静电吸盘的背面对准并与其接合的板，该板具有环绕袋的环形密封部分。 清洁固定组件还包括接合板的环形密封部分的第一O形环，在板的凹槽中的多个通孔和围绕袋中的多个通孔的多个O形环 的盘子。 多个通孔被构造成与静电卡盘的后侧中的提升销孔和氦孔对准并与其成流体连通，并且多个O形环被定位成允许清洁介质接合提升销孔 以及在清洁过程期间在静电卡盘中的氦孔，同时密封清洁介质到达静电卡盘的后侧。