公开(公告)号：US08748429B2

公开(公告)日：2014-06-10

申请号：US13439096

申请日：2012-04-04

申请人： Guanglin Luo ,  Gene M. Dubowchik ,  John E. Macor ,  Ling Chen

发明人： Guanglin Luo ,  Gene M. Dubowchik ,  John E. Macor ,  Ling Chen

IPC分类号： A61K31/495 ,  A01N43/50 ,  A01N43/54 ,  A01N43/56 ,  A01N43/58

CPC分类号： C07D471/04 ,  C07D487/04

摘要： The disclosure generally relates to the novel compounds of formula I, including pharmaceutically acceptable salts, which are CGRP receptor antagonists. The disclosure also relates to pharmaceutical compositions and methods for using the compounds in the treatment of CGRP related disorders including migraine and other headaches, neurogenic vasodilation, neurogenic inflammation, thermal injury, circulatory shock, flushing associated with menopause, airway inflammatory diseases such as asthma, and chronic obstructive pulmonary disease (COPD).

摘要翻译： 本公开内容通常涉及式I的新化合物，其包括药学上可接受的盐，其为CGRP受体拮抗剂。 本公开还涉及用于治疗CGRP相关疾病（包括偏头痛和其他头痛，神经源性血管舒张，神经源性炎症，热损伤，循环休克，与更年期相关的潮红，气道炎症性疾病如哮喘）的药物组合物和方法， 和慢性阻塞性肺疾病（COPD）。

公开(公告)号：US08641872B2

公开(公告)日：2014-02-04

申请号：US13119672

申请日：2009-09-16

申请人： Rongsheng Ruan ,  Shaobo Deng ,  Zhiping Le ,  Yanling Cheng ,  Xiangyang Lin ,  Ling Chen

发明人： Rongsheng Ruan ,  Shaobo Deng ,  Zhiping Le ,  Yanling Cheng ,  Xiangyang Lin ,  Ling Chen

IPC分类号： B01J19/12 ,  C01C1/04

CPC分类号： C01C1/0494 ,  C01B3/042 ,  Y02E60/364

摘要： The disclosure herein describes a method for producing ammonia by introducing N2, CO and water into a non-thermal plasma in the presence of a catalyst, the catalyst being effective to promote the disassociation of N2, CO and water to form reactants that in turn react to produce NH3 and CH4.This disclosure also describes producing a reactive hydrogen ion or free radical by the method comprising passing water through a non-thermal plasma in the presence of a catalyst, the catalyst being effective to promote the dissociation of water.

公开(公告)号：US08212940B2

公开(公告)日：2012-07-03

申请号：US11567211

申请日：2006-12-06

申请人： Dave Xiao Dong Yang ,  Ling Chen ,  Nien-Tsu Wang ,  Hsi-Chen Wang ,  Chih-Ching Steve Chou

发明人： Dave Xiao Dong Yang ,  Ling Chen ,  Nien-Tsu Wang ,  Hsi-Chen Wang ,  Chih-Ching Steve Chou

IPC分类号： H04N5/455 ,  H04N5/44

CPC分类号： H04N5/46 ,  H04N21/4184 ,  H04N21/4263

摘要： A hybrid architecture of a television (TV) receiving system is disclosed. The architecture includes two portions, a hardware portion and a software portion. The hardware portion includes a minimum amount of hardware to achieve operations of receiving a RF signal, producing an IF signal and outputting data representing the IP signal. The software portion, taking advantage of available computing power (e.g., high-speed microprocessor and a lot of memory) in a computing device and executed therein, includes one or more demodulators, all implemented in software. Each of the demodulators is implemented in accordance with one type of TV standard. Thus depending on the received data, a corresponding demodulator is activated to demodulate the received data and subsequently produces audio and video data. One of the advantages, benefits and objects in the present invention is to have a band of software-based demodulators, any of which may be updated or expanded whenever there is a new TV standard or modification to an existing standard.

摘要翻译： 公开了一种电视（TV）接收系统的混合架构。 该架构包括两部分，一个硬件部分和一个软件部分。 硬件部分包括最小量的硬件以实现接收RF信号的操作，产生IF信号并输出​​表示IP信号的数据。 利用计算设备中可执行的计算能力（例如，高速微处理器和大量存储器）并在其中执行的软件部分包括全部以软件实现的一个或多个解调器。 每个解调器根据一种类型的电视标准来实现。 因此，取决于所接收的数据，相应的解调器被激活以解调所接收的数据，并随后产生音频和视频数据。 本发明的一个优点，优点和目的是具有基于软件的解调器频带，其中任何一个可以在有新的TV标准或现有标准的修改时被更新或扩展。

公开(公告)号：US07892602B2

公开(公告)日：2011-02-22

申请号：US11422826

申请日：2006-06-07

申请人： Hua Chung ,  Ling Chen ,  Barry L. Chin

发明人： Hua Chung ,  Ling Chen ,  Barry L. Chin

IPC分类号： C23C16/34

CPC分类号： C23C16/45531 ,  C23C16/34 ,  H01L21/28562 ,  H01L21/76843

摘要： Methods for depositing a metal silicon nitride layer on a substrate during an atomic layer deposition (ALD) process. The methods provide positioning a substrate within a process chamber containing a centralized expanding channel that conically tapers towards and substantially covers the substrate, flowing a process gas into the centralized expanding channel to form a circular flow pattern, exposing the substrate to the process gas having the circular flow pattern, and exposing the substrate sequentially to chemical precursors during an ALD process to form a metal silicon nitride material. In one example, the ALD process provides sequentially pulsing a metal precursor, a nitrogen precursor, and a silicon precursor into the process gas having the circular flow pattern. The metal silicon nitride material may contain tantalum or titanium. In other examples, the process gas or the substrate may be exposed to a plasma.

摘要翻译： 在原子层沉积（ALD）工艺中在衬底上沉积金属氮化硅层的方法。 该方法提供了将处理室中的衬底定位在处理室内，该处理室包含集中的扩展通道，该通道朝向并基本上覆盖衬底呈锥形锥形，将工艺气体流入集中扩展通道以形成圆形流动图案，将衬底暴露于具有 圆形流动图案，并且在ALD工艺期间将衬底依次暴露于化学前体以形成金属氮化硅材料。 在一个实例中，ALD工艺顺序地将金属前体，氮前体和硅前体顺序地引入到具有圆形流动图案的工艺气体中。 金属氮化硅材料可以包含钽或钛。 在其它实例中，工艺气体或衬底可以暴露于等离子体。

公开(公告)号：US07747751B2

公开(公告)日：2010-06-29

申请号：US12087286

申请日：2007-01-02

申请人： Ling Chen

发明人： Ling Chen

IPC分类号： G06F15/173 ,  G06F15/16

CPC分类号： H04L29/12311 ,  H04L29/12018 ,  H04L61/10 ,  H04L61/2015 ,  H04L61/2084

摘要： A DHCP server allocates IP addresses to DHCP clients and the IP address validation process is moved from the client to the DHCP server. The DHCP server is required to periodically select a predefined number of validated IP addresses from its unused IP addresses. When a client applies for an IP address, the DHCP server allocates an IP address from its selected validated IP addresses to the client, and the client then directly uses the IP address allocated by the DHCP server. This method may be used for providing VoIP in mobile phones, wherein the voice session interruption is shortened sufficiently before the mobile terminal acquires a new IP address through the fast IP address re-allocation to a mobile terminal, thereby ensuring mobile VoIP communication quality.

摘要翻译： DHCP服务器为DHCP客户端分配IP地址，IP地址验证过程从客户端移动到DHCP服务器。 DHCP服务器需要从其未使用的IP地址周期性地选择预定义数量的经过验证的IP地址。 当客户端申请IP地址时，DHCP服务器从其选定的验证IP地址分配IP地址给客户端，然后客户端直接使用DHCP服务器分配的IP地址。 该方法可以用于在移动电话中提供VoIP，其中在移动终端通过对移动终端的快速IP地址重新分配获取新的IP地址之前，语音会话中断被充分缩短，从而确保移动VoIP通信质量。

公开(公告)号：US07699023B2

公开(公告)日：2010-04-20

申请号：US11925667

申请日：2007-10-26

申请人： Ling Chen ,  Vincent Ku ,  Dien-Yeh Wu ,  Hua Chung ,  Alan Ouye ,  Norman Nakashima ,  Mei Chang

发明人： Ling Chen ,  Vincent Ku ,  Dien-Yeh Wu ,  Hua Chung ,  Alan Ouye ,  Norman Nakashima ,  Mei Chang

IPC分类号： C23C16/455 ,  C23C16/448 ,  C23F1/00 ,  H01L21/306 ,  C23C16/06 ,  C23C16/22

CPC分类号： C23C16/34 ,  C23C16/4404 ,  C23C16/4411 ,  C23C16/45504 ,  C23C16/45508 ,  C23C16/45512 ,  C23C16/45525 ,  C23C16/45544 ,  C23C16/45563 ,  C23C16/45582 ,  H01L21/28562 ,  H01L21/76841 ,  H01L21/76843 ,  H01L21/76846 ,  H01L21/76871 ,  Y10T137/0396

摘要： Embodiments as described herein provide an apparatus and a method for performing an atomic layer deposition process. In one embodiment, a deposition chamber assembly contains a substrate support having a substrate receiving surface, and a chamber lid containing a tapered passageway extending from a central portion of the chamber lid, and a bottom surface extending from the passageway to a peripheral portion of the chamber lid, the bottom surface shaped and sized to substantially cover the substrate receiving surface. The system also includes one or more valves coupled to the gradually expanding channel, and one or more gas sources coupled to each valve. In one example, the gas source is a gas box assembly which is attached to the deposition chamber by at least one disconnect fitting and contains an inlet tube directed away from the gas outlet.

摘要翻译： 本文所述的实施例提供了用于执行原子层沉积工艺的装置和方法。 在一个实施例中，沉积室组件包含具有基板接收表面的基板支撑件和包含从腔室盖的中心部分延伸的锥形通道的腔室盖，以及从通道延伸到外部部分的底部表面 室盖，底表面的形状和尺寸以基本上覆盖基板接收表面。 该系统还包括联接到逐渐扩展的通道的一个或多个阀，以及耦合到每个阀的一个或多个气体源。 在一个示例中，气体源是气体箱组件，其通过至少一个分离配件附接到沉积室，并且包含远离气体出口的入口管。

公开(公告)号：US07655762B2

公开(公告)日：2010-02-02

申请号：US11327844

申请日：2006-01-06

申请人： E-Chiang Lee ,  Gregory M. Landes ,  Kyu Chung ,  Ling Chen ,  Urvi Desai ,  David Reed Powell ,  Seokjoo Hong

发明人： E-Chiang Lee ,  Gregory M. Landes ,  Kyu Chung ,  Ling Chen ,  Urvi Desai ,  David Reed Powell ,  Seokjoo Hong

IPC分类号： C07K16/18

CPC分类号： C07K16/22 ,  A61K2039/505 ,  C07K14/515 ,  C07K2317/33 ,  C07K2317/34 ,  C07K2317/56 ,  C07K2317/76 ,  C07K2317/92

摘要： Monoclonal antibodies that specifically bind to ANGPTL4 are provided. Monoclonal antibodies that neutralize at least one activity of ANGPTL4 are provided. Methods of treating a disorder of lipid metabolism using neutralizing monoclonal antibodies are provided.

摘要翻译： 提供特异性结合ANGPTL4的单克隆抗体。 提供中和至少一种ANGPTL4活性的单克隆抗体。 提供了使用中和单克隆抗体治疗脂质代谢紊乱的方法。

公开(公告)号：US07597758B2

公开(公告)日：2009-10-06

申请号：US11849125

申请日：2007-08-31

申请人： Ling Chen ,  Vincent W. Ku ,  Hua Chung ,  Christophe Marcadal ,  Seshadri Ganguli ,  Jenny Lin ,  Dien-Yeh Wu ,  Alan Ouye ,  Mei Chang

发明人： Ling Chen ,  Vincent W. Ku ,  Hua Chung ,  Christophe Marcadal ,  Seshadri Ganguli ,  Jenny Lin ,  Dien-Yeh Wu ,  Alan Ouye ,  Mei Chang

IPC分类号： C30B23/08

CPC分类号： C23C16/45544 ,  C23C16/18 ,  C23C16/34 ,  C23C16/4402 ,  C23C16/4481 ,  C23C16/4482 ,  C23C16/4487 ,  Y10T117/10 ,  Y10T117/1004 ,  Y10T117/1008

摘要： Embodiments of the invention provide chemical precursor ampoules that may be used during vapor deposition processes. In one embodiment, an apparatus for generating a chemical precursor gas used in a vapor deposition processing system is provided which includes a canister having a sidewall, a top, and a bottom forming an interior volume and a solid precursor material at least partially contained within a lower region of the interior volume. The apparatus further contains an inlet port and an outlet port in fluid communication with the interior volume and an inlet tube connected to the inlet port and positioned to direct a carrier gas towards the sidewall and away form the outlet port. In one example, the solid precursor contains pentakis(dimethylamido) tantalum (PDMAT). In another example, the apparatus contains a plurality of baffles that form an extended mean flow path between the inlet port and the outlet port.

摘要翻译： 本发明的实施方案提供可在气相沉积工艺期间使用的化学前体安瓿。 在一个实施例中，提供了一种用于产生在气相沉积处理系统中使用的化学前体气体的装置，其包括具有侧壁，顶部和形成内部容积的底部的罐，以及固体前体材料，其至少部分地包含在 内部体积的较低区域。 该装置还包括与内部空间流体连通的入口端口和出口端口，以及连接到入口端口的入口管，并且定位成将载气朝向侧壁引导并从出口端口移开。 在一个实例中，固体前体含有五（二甲基氨基）钽（PDMAT）。 在另一示例中，该装置包含多个挡板，其在入口和出口之间形成延伸的平均流动路径。

公开(公告)号：US07588736B2

公开(公告)日：2009-09-15

申请号：US11383642

申请日：2006-05-16

申请人： Ling Chen ,  Vincent W. Ku ,  Hua Chung ,  Christophe Marcadal ,  Seshadri Ganguli ,  Jenny Lin ,  Dien-Yeh Wu ,  Alan Ouye ,  Mei Chang

发明人： Ling Chen ,  Vincent W. Ku ,  Hua Chung ,  Christophe Marcadal ,  Seshadri Ganguli ,  Jenny Lin ,  Dien-Yeh Wu ,  Alan Ouye ,  Mei Chang

IPC分类号： F27B15/08

CPC分类号： C23C16/45544 ,  C23C16/18 ,  C23C16/34 ,  C23C16/4402 ,  C23C16/4481 ,  C23C16/4482 ,  C23C16/4487 ,  Y10T117/10 ,  Y10T117/1004 ,  Y10T117/1008

摘要： Embodiments of an apparatus for generating a chemical precursor used in a vapor deposition processing system are provide which include a canister having a sidewall, a top, and a bottom forming an interior volume which is in fluid communication with an inlet port and an outlet port. The canister contains a plurality of baffles that extend from the bottom to an upper portion of the interior volume and form an extended mean flow path between the inlet port and the outlet port. In one embodiment, the baffles are contained on a prefabricated insert positioned on the bottom of the canister. In one example, an inlet tube may extend from the inlet port into the interior region and be positioned substantially parallel to the baffles. An outlet end of the inlet tube may be adapted to direct a gas flow away from the outlet port, such as towards the sidewall or top of the canister.

摘要翻译： 提供了一种用于生成在气相沉积处理系统中使用的化学前体的装置的实施例，其包括具有侧壁，顶部和底部的罐，该罐形成与入口端口和出口端口流体连通的内部容积。 罐包含多个挡板，其从内部容积的底部延伸到上部，并且在入口和出口之间形成延伸的平均流动路径。 在一个实施例中，挡板包含在位于罐底部的预制插入件上。 在一个示例中，入口管可以从入口端口延伸到内部区域中并且基本平行于挡板定位。 入口管的出口端可以适于将气流引导离开出口，例如朝向罐的侧壁或顶部。

公开(公告)号：US07582213B2

公开(公告)日：2009-09-01

申请号：US11435221

申请日：2006-05-16

申请人： Brock Lundberg ,  Lin Gu ,  Rongsheng Roger Ruan ,  Ling Chen ,  Paul Bradley Addis ,  Jack Edgar Johnson

发明人： Brock Lundberg ,  Lin Gu ,  Rongsheng Roger Ruan ,  Ling Chen ,  Paul Bradley Addis ,  Jack Edgar Johnson

IPC分类号： B01D61/00 ,  B01D39/00

CPC分类号： B01D39/1692 ,  C08L1/02 ,  D21B1/16 ,  D21C9/001 ,  Y10T428/1324

摘要： The present invention comprises an improved method for refining cellulose that produces a highly refined cellulosic material. The method comprises soaking raw material in a mild NaOH using reduced temperatures and pressures, and refining the material with a plate refiner so that a waste water stream is reduced in volume and has a pH within a range of 8 to 9. The present invention also comprises a HRC gel having a lignin concentration of at least about one (1)% by weight, and a water retention capacity of about 25 to at least about 56 g H2O/g dry HRC.

摘要翻译： 本发明包括用于精制纤维素的改进方法，其生产高度精制的纤维素材料。 该方法包括使用降低的温度和压力将原料浸泡在温和的NaOH中，并用平板磨浆机精炼该材料，使得废水流体积减小并且pH在8至9的范围内。本发明还 包括具有至少约1重量％的木质素浓度和约25至至少约56g H 2 O / g干燥HRC的保水能力的HRC凝胶。