Abstract:
Provided are a display panel and an electronic apparatus including the display panel. The display panel includes a substrate including a polymer resin; first and second pixel circuits each including a thin-film transistor, a first light-emitting diode connected to the first pixel circuit and located in a first display area; a second light-emitting diode connected to the second pixel circuit and located in a sub-display area of a second display area, a bottom metal layer in the second display area and between the substrate and the second pixel circuit; and a protective layer between the substrate and the bottom metal layer and corresponding to the first and second display areas, wherein the bottom metal layer includes a first opening in a transmissive area, and the protective layer includes a second opening in the transmissive area and overlapping the first opening of the bottom metal layer.
Abstract:
A display apparatus includes a first substrate, a main pixel circuit located on the first substrate and including a first semiconductor layer, an auxiliary pixel circuit located on the first substrate and including a second semiconductor layer, a buffer layer located between the first substrate and the first semiconductor layer and between the first substrate and the second semiconductor layer, and a barrier layer located between the first substrate and the buffer layer, including one material from among silicon nitride (SiNx), aluminum oxide (Al2O3), and zirconium oxide (Zr2O3), and having a density ranging from about 2 g/cm3 to about 6 g/cm3.
Abstract:
A display apparatus for displaying a high-resolution image and having a low occurrence rate of defects caused by a voltage drop. The display apparatus includes a substrate, a first conductive layer arranged on the substrate and including an auxiliary data line extending in a first direction, a first semiconductor layer arranged on the first conductive layer, a first gate layer arranged on the first semiconductor layer, a first connection electrode layer arranged on the first gate layer and including a first connection electrode electrically connected to the first semiconductor layer and the auxiliary data line, and a second connection electrode layer arranged on the first connection electrode layer and including a data line electrically connected to the first connection electrode.
Abstract:
Provided is a method of manufacturing a display apparatus, the method including forming an amorphous silicon layer on a substrate; changing amorphous silicon in the amorphous silicon layer into crystalline silicon by irradiating the amorphous silicon with a laser beam emitted through a phase shift mask; and forming a display device, the phase shift mask including a base substrate; a barrier layer on the base substrate and including a plurality of transmissive portions which are spaced apart from each other in a first direction; and phase shift portions which alternately fill the plurality of transmissive portions in the first direction.
Abstract:
A thin film transistor includes a semiconductor layer disposed on a base substrate and including an oxide semiconductor material, a source electrode and a drain electrode, which respectively extend from opposing ends of the semiconductor layer, a plurality of low carrier concentration areas respectively disposed between the source electrode and the semiconductor layer and between the drain electrode and the semiconductor layer, a gate insulating layer disposed on the semiconductor layer, and a gate electrode disposed on the gate insulating layer.
Abstract:
A display apparatus includes: a first substrate including a polymer resin; a first barrier layer on the first substrate and including a portion doped with ions, wherein the portion includes an upper surface of the first barrier layer; a second substrate on the upper surface of the first barrier layer and including a polymer resin; a buffer layer on the second substrate; a first thin-film transistor on the buffer layer; and a light-emitting diode electrically connected to the first thin-film transistor.
Abstract:
A display device may include a substrate, an organic light emitting element on the substrate, a pixel circuit between the substrate and the organic light emitting element, electrically connected to the organic light emitting element, and including a first transistor and a second transistor, a first metal layer between the substrate and the pixel circuit, overlapping the first transistor, and configured to receive a first voltage, and a second metal layer between the substrate and the pixel circuit, overlapping the second transistor, and configured to receive a second voltage different from the first voltage.
Abstract:
A display substrate includes a first conductive layer on a base substrate, a first insulation layer on the first conductive layer, a second conductive layer on the first insulation layer, a second insulation layer on the second conductive layer, and a third conductive layer on the second insulation layer. The third conductive layer is connected to the first conductive layer and the second conductive layer through a contact hole passing through the first insulation layer, the second conductive layer, and the second insulation layer. A sidewall of the contact hole has a stepped shape.
Abstract:
A display apparatus has a display area and a non-display area around the display area, the display apparatus includes, in the non-display area, a first power line, a driving circuit on a layer over the first power line, and a second power line electrically connected to the first power line and on a same layer on which one electrode of the driving circuit is arranged.
Abstract:
A thin film transistor includes a polysilicon layer on a substrate, which includes a first area between second and third areas. A polysilicon layer is formed on the substrate, and a source electrode and a drain electrode are formed on the polysilicon layer in the first and third areas. Each of the source electrode and the drain electrode includes a metal silicide layer adjacent the polysilicon layer.