公开(公告)号：US20230313791A1

公开(公告)日：2023-10-05

申请号：US18105878

申请日：2023-02-05

Applicant: SEMES CO., LTD.

Inventor： Young Jun SON ,  Woo Sin Jung ,  Woo Ram Lee ,  Byoung Doo Choi ,  Sung Chul Jung

IPC: F04B43/10 ,  F04B43/00 ,  B05B9/04

CPC classification number: F04B43/10 ,  F04B43/0072 ,  B05B9/0406

Abstract: Provided are a pump, an apparatus for supplying a chemical liquid and an apparatus for processing a substrate. The pump includes a tube having elasticity and having a flow path through which a chemical liquid flows in; and a case having an internal space partitioned into at least two chambers through which gas is supplied or discharged, where the at least two chambers cover an outer circumference of the tube. Using the pump, the apparatus for supplying a chemical liquid and the apparatus for processing a substrate, by an operation in which gas is supplied or discharged into each partitioned chamber in the case, by applying or releasing pressure to the outer circumference of each corresponding tube independently without interfering between the internal pressures between the chambers, efficient pumping operation of the pump may be obtained, and precise control of the discharge pressure of the liquid may be implemented.

公开(公告)号：US20230215742A1

公开(公告)日：2023-07-06

申请号：US17986894

申请日：2022-11-15

Applicant: SEMES CO., LTD.

Inventor： Young Jun SON ,  Tae Hoon LEE ,  Sung Gyu LEE ,  Hyun YOON ,  Do Yeon KIM

IPC: H01L21/67 ,  B01D35/02

CPC classification number: H01L21/67051 ,  B01D35/02

Abstract: A substrate processing apparatus includes: a nozzle unit configured to discharge a processing liquid to a substrate; a pipe connected to the nozzle unit and a processing liquid supply unit supplying the processing liquid; a charge amount control unit disposed at the pipe, including a filter unit charged with positive charges or negative charges, and including at least one of a control valve, controlling a flow rate of the processing liquid passing through an inside of the filter unit, and a power supply unit, applying a voltage to the filter unit, to control a charge amount of the processing liquid; and a control unit connected to the charge amount control unit.

公开(公告)号：US20230195030A1

公开(公告)日：2023-06-22

申请号：US18084381

申请日：2022-12-19

Applicant: SEMES CO., LTD.

Inventor： Young Jun SON ,  Tae Hoon LEE ,  Hyun YOON ,  Do Yeon KIM

IPC: G03G21/18 ,  G03G15/02 ,  G03G15/00

CPC classification number: G03G21/1842 ,  G03G15/0233 ,  G03G15/60 ,  G03G15/80 ,  G03G2215/0872 ,  G03G2221/0084 ,  G03G2221/1651

Abstract: Proposed are a home port and a substrate processing apparatus using the same. The home port is installed in the substrate processing apparatus to temporarily mount a nozzle for discharging a process liquid to a substrate, and includes a main body having a space therein, a nozzle holder provided at an upper portion of the main body and configured to mount the nozzle, an inclined surface formed below the nozzle holder in the space, a first supply pipe configured to discharge a rinse liquid to a tip of the nozzle, a second supply pipe configured to inject the rinse liquid into the main body, a conductive wire configured to electrically connect the inclined surface and the first supply pipe, and a first switch installed on the conductive wire.

公开(公告)号：US20230194175A1

公开(公告)日：2023-06-22

申请号：US18083898

申请日：2022-12-19

Applicant: SEMES CO., LTD.

Inventor： Young Jun SON ,  Young Jun LEE ,  Ki Sang EUM ,  Tae Hoon LEE

IPC: F27D9/00

CPC classification number: F27D9/00 ,  F27D2009/001 ,  F27D2009/0056 ,  F27D2009/0051 ,  F27D2009/0005 ,  F27D2009/0029

Abstract: Proposed are a chilling unit, a heat treatment apparatus including same, and a heat treatment method. More particularly, proposed is a technology capable of rapidly and effectively lowering the temperature of a heating plate by bringing a heat exchange medium of a chilling unit into contact with the heating plate and then circulating a refrigerant after performing a heat treatment process of a substrate through a heat treatment apparatus.

公开(公告)号：US20230178389A1

公开(公告)日：2023-06-08

申请号：US17989690

申请日：2022-11-18

Applicant: SEMES CO., LTD.

Inventor： Young Jun SON ,  Young Un YUN ,  Sung Chul JUNG

IPC: H01L21/67 ,  H01L21/66

CPC classification number: H01L21/67051 ,  H01L22/14

Abstract: An apparatus for inspecting a chemical solution of the present invention comprises a base unit having an inlet, through which a chemical solution is introduced, a flow path unit, in which the chemical solution introduced through the inlet is moved while a velocity of its fluid is changed, and including a first region unit provided adjacent to the inlet of the base unit and a second region unit being in series communication with the first region unit, in which the chemical solution discharged from the first region unit is moved, a detecting unit including a first detecting member for detecting a first signal that is an electrical signal of the first region unit, and a second detecting member for detecting a second signal that is an electrical signal of the second region unit, and a determining unit for receiving a signal from the detecting unit and determining that a particle and a bubble are detected if a current of the first signal and the second signal is changed compared to a reference value, and discriminating and determining a particle and a bubble according to a difference in a current between the first signal and the second signal or a time difference, in which a current is changed.

公开(公告)号：US20230173526A1

公开(公告)日：2023-06-08

申请号：US18073483

申请日：2022-12-01

Applicant: SEMES CO., LTD.

Inventor： Young Jun SON ,  Hyung Seok KANG ,  Min Woo KIM

IPC: B05B16/80 ,  B05B16/20 ,  B08B3/04

CPC classification number: B05B16/80 ,  B05B16/20 ,  B08B3/047

Abstract: Proposed are a home port, and a substrate processing apparatus and a home port cleaning method using the same. The home port includes a housing supported by a holder and having a space therein, a nozzle holder provided at an upper portion of the housing and mounting a nozzle for discharging a process liquid to a substrate, an inclined surface formed below the nozzle holder in the space, an exhaust hole exhausting fumes generated in the space of the housing, a rinse supply hole supplying a rinse liquid for removing a residual process liquid remaining on the inclined surface, a hinge provided at a lower portion of the housing and hingedly coupling the housing and the holder to enable rotation of the housing, and an actuating means rotating the housing in a direction in which the inclined surface is parallel to a ground surface on which the housing is installed.