SYSTEM AND METHOD FOR X-RAY ABSORPTION SPECTROSCOPY USING SPECTRAL INFORMATION FROM TWO ORTHOGONAL PLANES

    公开(公告)号:US20250146960A1

    公开(公告)日:2025-05-08

    申请号:US18937615

    申请日:2024-11-05

    Applicant: Sigray, Inc.

    Abstract: An apparatus includes an x-ray source configured to generate x-rays, at least some of which impinge a sample and at least one diffractor configured to concurrently diffract at least some of the x-rays from the sample in a first direction and in a second direction substantially orthogonal to the first direction. The apparatus further includes at least one two-dimensional (2D) position-sensitive x-ray detector configured to receive at least some of the diffracted x-rays and to concurrently generate first spectral information of the x-rays diffracted in the first direction and second spectral information of the x-rays diffracted in the second direction. The apparatus further includes circuitry configured to receive the first and second spectral information and to generate a single x-ray absorption spectroscopy (XAS) spectrum using the first and second spectral information.

    MICROFOCUS X-RAY SOURCE FOR GENERATING HIGH FLUX LOW ENERGY X-RAYS

    公开(公告)号:US20230218247A1

    公开(公告)日:2023-07-13

    申请号:US18152973

    申请日:2023-01-11

    Applicant: Sigray, Inc.

    CPC classification number: A61B6/40 A61B6/42

    Abstract: An x-ray source includes at least one housing configured to contain a first region at a pressure less than one atmosphere and configured to separate the first region from an ambient environment outside the at least one housing. The at least one housing includes an x-ray transmissive window having an x-ray transmittance greater than or equal to 20% for at least some x-rays having an x-ray energy less than 1 keV. The x-ray source further includes an electron source within the at least one housing. The electron source is configured to generate at least one electron beam. The x-ray source further includes an anode assembly within the at least one housing and configured to generate x-rays in response to electron bombardment by at least some of the electrons of the at least one electron beam from the electron source. The x-ray source further includes at least one x-ray optic within the at least one housing. The at least one x-ray optic is configured to receive at least some of the x-rays from the anode assembly and to direct at least some of the received x-rays to the window to form an x-ray beam.

    X-RAY EMISSION SPECTROMETER SYSTEM
    16.
    发明申请

    公开(公告)号:US20190302042A1

    公开(公告)日:2019-10-03

    申请号:US16371606

    申请日:2019-04-01

    Applicant: Sigray, Inc.

    Abstract: Systems and methods for x-ray emission spectroscopy are provided in which at least one x-ray analyzer is curved and receives and diffracts fluorescence x-rays emitted from a sample, and at least one spatially-resolving x-ray detector receives the diffracted x-rays. The at least one x-ray analyzer and the at least one spatially-resolving x-ray detector are positioned on the Rowland circle. In some configurations, the fluorescence x-rays are emitted from the same surface of the sample that is irradiated by the x-rays from an x-ray source and the system has an off-Rowland circle geometry. In some other configurations, an x-ray optical train receives the fluorescence x-rays emitted from a sample impinged by electrons within an electron microscope and focuses at least some of the received fluorescence x-rays to a focal spot.

    X-ray illumination system with multiple target microstructures

    公开(公告)号:US10297359B2

    公开(公告)日:2019-05-21

    申请号:US15783855

    申请日:2017-10-13

    Applicant: Sigray, Inc.

    Abstract: An x-ray illumination beam system includes an electron emitter and a target having one or more target microstructures. The one or more microstructures may be the same or different material, and may be embedded or placed atop a substrate formed of a heat-conducting material. The x-ray source may emit x-rays towards an optic system, which can include one or more optics that are matched to one or more target microstructures. The matching can be achieved by selecting optics with the geometric shape, size, and surface coating that collects as many x-rays as possible from the source and at an angle that satisfies the critical reflection angle of the x-ray energies of interest from the target. The x-ray illumination beam system allows for an x-ray source that generates x-rays having different spectra and can be used in a variety of applications.

    Material measurement techniques using multiple X-ray micro-beams

    公开(公告)号:US10247683B2

    公开(公告)日:2019-04-02

    申请号:US15829947

    申请日:2017-12-03

    Applicant: Sigray, Inc.

    Abstract: An x-ray interrogation system having one or more x-ray beams interrogates an object (i.e., object). A structured source producing an array of x-ray micro-sources can be imaged onto the object. Each of the one or more beams may have a high resolution, such as for example a diameter of about 15 microns or less, at the surface of the object. The illuminating one or more micro-beams can be high resolution in one dimension and/or two dimensions, and can be directed at the object to illuminate the object. The incident beam that illuminates the object has an energy that is greater than the x-ray fluorescence energy.

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