公开(公告)号：US5272501A

公开(公告)日：1993-12-21

申请号：US934340

申请日：1992-08-25

Applicant: Kenji Nishi ,  Saburo Kamiya ,  Naomasa Shiraishi

Inventor： Kenji Nishi ,  Saburo Kamiya ,  Naomasa Shiraishi

IPC: G03F9/00 ,  G03B27/42

CPC classification number: G03F9/7049

Abstract: A projection exposure apparatus having an irradiation optical system for irradiating a pattern formed on a mask with first irradiation light, a projection optical system for imaging and projecting the image of the pattern of the mask onto a photosensitive substrate, and a mark detection device for irradiating a predetermined mark formed on the photosensitive substrate with second irradiation light in a wavelength region which is different from that of the first irradiation light by the projection optical system and detecting light generated from the mark, the projection exposure apparatus including: a deflection member disposed on a pupil surface of the projection optical system or in a periphery in an adjacent plane of the same, shielding a beam, which is a portion of the first irradiation light generated from the mask and incident on the projection optical system, and which passes through the peripheral portion of the pupil surface of the projection optical system, deflecting the second irradiation light by a predetermined quantity and passing the deflected second irradiation light, wherein the mark detection device includes an irradiation system for emitting the second irradiation light to travel toward the deflection member.

Abstract translation: 一种投影曝光装置，具有用于用第一照射光照射形成在掩模上的图案的照射光学系统，用于将掩模图案的图像成像并投射到感光基板上的投影光学系统，以及用于照射的标记检测装置 在所述感光基板上形成有与所述投影光学系统不同于所述第一照射光的波长区域的第二照射光，并且检测从所述标记产生的光的所述感光性基板上的规定标记，所述投影曝光装置包括：偏转构件， 投影光学系统的光瞳表面或其相邻平面中的周边，屏蔽作为从掩模产生并入射在投影光学系统上的第一照射光的一部分并且穿过投影光学系统的光束 投影光学系统的光瞳表面的周边部分， 以及通过所述偏转的第二照射光，其中所述标记检测装置包括用于发射所述第二照射光以朝向所述偏转构件行进的照射系统。

公开(公告)号：US4853745A

公开(公告)日：1989-08-01

申请号：US210808

申请日：1988-06-24

Applicant: Saburo Kamiya ,  Kazuaki Suzuki ,  Akikazu Tanimoto

Inventor： Saburo Kamiya ,  Kazuaki Suzuki ,  Akikazu Tanimoto

IPC: G01B11/00 ,  G03F9/00 ,  H01L21/027 ,  H01L21/30 ,  H01L21/68

CPC classification number: G03F9/70

Abstract: An exposure apparatus for exposing to a substrate the image of the desired pattern of a mask having a mark and a desired pattern formed thereon. Light source for illuminating the mask by at least part of the laser light from the light source, a projection optical system, movable stage, position detecting for detecting the relative position of the stage and the mask and outputting a position signal, a fiducial member formed integrally with the stage, the fiducial member having a fiducial pattern disposed thereon. A second illuminating optical system for illuminating the fiducial pattern from the opposite side of the projection optical system with respect to the fiducial member. The second illuminating optical system having a plurality of reflecting members for directing at least part of the laser light from the light source to the fiducial pattern. Normalizing a second detection signal on the basis of a first detection signal, and processing for determining the position of the image of the mark formed on the predetermined surface by the projection optical system, on the basis of a position signal and the second normalized detection signal.

Abstract translation: 一种曝光装置，用于将形成有标记和期望图案的掩模的期望图案的图像曝光于基板。 用于通过来自光源的至少一部分激光照射掩模的光源，投影光学系统，可移动台，用于检测平台和掩模的相对位置并输出位置信号的位置检测，形成的基准部件 与舞台一体地，具有设置在其上的基准图案的基准构件。 第二照明光学系统，用于相对于基准构件从投影光学系统的相对侧照射基准图案。 第二照明光学系统具有多个反射构件，用于将来自光源的至少一部分激光引导到基准图案。 基于第一检测信号对第二检测信号进行归一化，以及基于位置信号和第二归一化检测信号来确定由投影光学系统形成在预定表面上的标记的图像的位置的处理 。

公开(公告)号：US07876452B2

公开(公告)日：2011-01-25

申请号：US12042253

申请日：2008-03-04

Applicant: Michael R. Sogard ,  Bausan Yuan ,  Masahiko Okumura ,  Yosuke Shirata ,  Kiyoshi Uchikawa ,  Saburo Kamiya ,  Akikazu Tanimoto

Inventor： Michael R. Sogard ,  Bausan Yuan ,  Masahiko Okumura ,  Yosuke Shirata ,  Kiyoshi Uchikawa ,  Saburo Kamiya ,  Akikazu Tanimoto

IPC: G01B11/02

CPC classification number: G01B9/02027 ,  G01B9/02021 ,  G03F7/70775 ,  G03F7/709

Abstract: Process tools and methods are disclosed that involve interferometric and other measurements of movements and positions relative to a process position, such as movements and positions of a stage relative to a lithographic optical system. An exemplary apparatus includes a stage that places a workpiece relative to the tool, and that is movable in at least one direction relative to the tool. At least one first interferometer system is situated relative to the stage to determine stage position in a movement direction relative to the process position. A movement-measuring device determines displacement of the tool from the process position. Using data from the interferometer system and movement-measuring device a processor determines a position of the stage relative to the tool. The processor also corrects the determined position for displacement of the tool.

Abstract translation: 公开了涉及相对于处理位置的移动和位置的干涉测量和其它测量的处理工具和方法，例如相对于平版印刷光学系统的平台的移动和位置。 一种示例性的设备包括：相对于工具放置工件并相对于工具在至少一个方向上可移动的平台。 至少一个第一干涉仪系统相对于台架设置以确定相对于处理位置的运动方向的台阶位置。 移动测量装置确定工具从过程位置的位移。 使用来自干涉仪系统和运动测量装置的数据，处理器确定舞台相对于工具的位置。 处理器还校正所确定的工具位移的位置。

公开(公告)号：US20100033694A1

公开(公告)日：2010-02-11

申请号：US12458898

申请日：2009-07-27

Applicant: Saburo Kamiya ,  Shigeru Hagiwara

Inventor： Saburo Kamiya ,  Shigeru Hagiwara

IPC: G03B27/52

CPC classification number: G03F7/70858 ,  G03F7/70808 ,  G03F7/70908 ,  G03F7/70991

Abstract: An exposure apparatus which exposes a wafer with an illumination light via a reticle includes a vortex tube which generates a cool gas and a warm gas from a compressed gas injected from a compressed gas supply tube; a flow rate control valve and a Y-shaped joint which mix the cool gas and the warm gas generated from the vortex tube at a variable mixing ratio to output a temperature-controlled gas; and a gas supply duct which supplies the temperature-controlled gas to a heat source or a vicinity thereof. It is possible to perform the local temperature control or the local cooling by the simple mechanism without using any refrigerant or any cooling medium.

Abstract translation: 通过分划板曝光具有照明光的晶片的曝光装置包括产生冷气体的涡流管和从压缩气体供给管喷射的压缩气体的温气体; 流量控制阀和Y形接头，其以可变的混合比将冷气体和从涡流管产生的暖气混合以输出温度控制的气体; 以及将温度控制气体供给到热源或其附近的气体供给管道。 可以通过简单的机构执行局部温度控制或局部冷却，而不使用任何制冷剂或任何冷却介质。

公开(公告)号：US20050012918A1

公开(公告)日：2005-01-20

申请号：US10623004

申请日：2003-07-17

Applicant: Alex Poon ,  Leonard Kho ,  Toru Kawaguchi ,  Hisashi Tazawa ,  Saburo Kamiya ,  Yasuhiro Hidaka

Inventor： Alex Poon ,  Leonard Kho ,  Toru Kawaguchi ,  Hisashi Tazawa ,  Saburo Kamiya ,  Yasuhiro Hidaka

IPC: G03B27/58 ,  G03B27/62 ,  G03F7/20

CPC classification number: G03F7/70775

Abstract: A measurement system (222) for measuring the position of a stage (248) along a first axis includes a first system (260) having a first beam source (260A) that directs a first beam (260H) on a first path that is parallel with a second axis and a first redirector (260D) that redirects the first beam so that the redirected first beam (260H) is on a first redirected path that is parallel with the first axis irrespective to the orientation of the first redirector (260D) about a third axis. The measurement system (222) can include a shield (380) that protects the first beam (260H) from environmental conditions.

Abstract translation: 用于测量载物台（248）沿着第一轴线的位置的测量系统（222）包括第一系统（260），该第一系统（260）具有第一光束源（260A），该第一光束源引导第一光束（260H） 具有重定向第一光束的第二轴和第一重定向器（260D），使得重定向的第一光束（260H）在与第一重定向器（260D）的取向相关的第一重定向路径上，与第一重定向器（260D）的取向无关 第三轴。 测量系统（222）可以包括保护第一光束（260H）免受环境条件影响的屏蔽（380）。

公开(公告)号：US06714278B2

公开(公告)日：2004-03-30

申请号：US09907763

申请日：2001-07-19

Applicant: Saburo Kamiya

Inventor： Saburo Kamiya

IPC: G03B2752

CPC classification number: G03F7/70858 ,  G03F7/2002 ,  G03F7/70866 ,  G03F7/70875 ,  G03F7/70891

Abstract: An exposure apparatus for transferring a pattern on a reticle, through a projection optical system, onto a wafer having a photosensitive material coated thereon. The exposure apparatus includes a vacuum heat insulation panel which is applied to at least a part of the structure of the exposure apparatus so as to improve performance of temperature-control in the exposure apparatus.

Abstract translation: 一种曝光装置，用于通过投影光学系统将掩模版上的图案转印到其上涂覆感光材料的晶片上。 曝光装置包括：真空隔热板，其被施加到曝光装置的结构的至少一部分，以提高曝光装置的温度控制性能。

公开(公告)号：US5790253A

公开(公告)日：1998-08-04

申请号：US820502

申请日：1997-04-04

Applicant: Saburo Kamiya

Inventor： Saburo Kamiya

IPC: G01B11/30 ,  G03F7/20 ,  G03F9/00 ,  H01L21/027 ,  G01B9/02

CPC classification number: G03F7/70691 ,  G01B11/306

Abstract: To accurately correct the deformation component of a moving mirror on a wafer stage measure the curving data of the moving mirrors prior to the installation onto the wafer stage and store the data as a function of the distance from one end of the mirror. Then, measure the discrete curving error data of the moving mirrors after installation onto the wafer stage at every distance, d, using two laser interferometers arranged in parallel at a distance, d. Store the measurement results in the memory. Finally, a main controller creates a continuous curving error data of the moving mirror after installation onto the wafer stage based on the relationship between curving data and curving error data of the moving mirror before and after installation onto the above wafer stage to use it as the correction data.

Abstract translation: 为了精确地校正晶片台上的移动镜的变形分量，在安装到晶片台之前测量移动镜的弯曲数据，并将数据作为距反射镜一端的距离的函数存储。 然后，使用两个平行放置一定距离的激光干涉仪d，在每隔距离d安装到晶片台上后，测量移动后视镜的离散弯曲误差数据。 将测量结果存储在存储器中。 最后，主控制器基于弯曲数据与安装到上述晶片台上前后的移动镜的弯曲误差数据之间的关系，在安装到晶片台上之后，产生移动镜的连续弯曲误差数据，将其用作 校正数据。

公开(公告)号：US07471372B2

公开(公告)日：2008-12-30

申请号：US10788332

申请日：2004-03-01

Applicant: Saburo Kamiya

Inventor： Saburo Kamiya

IPC: G03B27/42 ,  G03B27/58

CPC classification number: G03F7/70483 ,  G01B9/02003 ,  G01B9/02018 ,  G01B2290/70 ,  G03F9/7026 ,  G03F9/703

Abstract: An exposure apparatus which transfers a pattern image formed on a mask on to a substrate through a projection optical system, comprising a substrate table which holds said substrate, a first sensor which measures a gap between said substrate surface held by said substrate table and a control target position, and a second sensor which measures a distance between said projection optical system and said substrate table in an optical axis direction and corrects the control target position of said first sensor.

Abstract translation: 一种曝光装置，其通过投影光学系统将掩模上形成的图案图像转印到基板上，该投影光学系统包括保持所述基板的基板台，测量由所述基板台保持的基板表面之间的间隙的第一传感器， 目标位置和第二传感器，其测量所述投影光学系统和所述基板台之间在光轴方向上的距离，并校正所述第一传感器的控制目标位置。

公开(公告)号：US06897963B1

公开(公告)日：2005-05-24

申请号：US09593800

申请日：2000-06-15

Applicant: Tetsuo Taniguchi ,  Saburo Kamiya

Inventor： Tetsuo Taniguchi ,  Saburo Kamiya

IPC: G03F7/20 ,  H01L21/00 ,  H01L21/68 ,  G01B9/02

CPC classification number: G03F7/70775 ,  G03F7/70716 ,  G03F7/70733 ,  G03F7/70741

Abstract: A stage device suitable for exposure apparatus used to produce semiconductor devices, is movable in an area wider than the measurement area of interferometer for position measurement, and is capable of measuring the position with high precision. When a movable stage moves from the position where the laser beams from laser interferometers are not applied into the measurement area of the laser interferometer, the position of reference mark is measured by a wafer alignment sensor, and the measurement value measured by the laser interferometer is corrected based on the results of the measurement by the wafer alignment sensor. When another movable stage enters the measurement area of the laser interferometer, the position of the reference mark is similarly measured by a wafer alignment sensor, and the measurement value measured by the laser interferometer is corrected based on the results of the measurement by the wafer alignment sensor.

Abstract translation: 适用于制造半导体装置的曝光装置的舞台装置，可以在比用于位置测量的干涉仪的测量区域宽的区域中移动，能够高精度地测量位置。 当可移动台从激光干涉仪的激光束不被施加到激光干涉仪的测量区域的位置移动时，通过晶片对准传感器测量参考标记的位置，并且由激光干涉仪测量的测量值为 基于晶片对准传感器的测量结果进行校正。 当另一可移动台进入激光干涉仪的测量区域时，基准标记的位置由晶圆对准传感器类似地测量，并且由激光干涉仪测得的测量值基于晶片对准的测量结果来校正 传感器。

公开(公告)号：US06784972B2

公开(公告)日：2004-08-31

申请号：US09994053

申请日：2001-11-27

Applicant: Yoshitomo Nagahashi ,  Saburo Kamiya ,  Koichi Katsura

Inventor： Yoshitomo Nagahashi ,  Saburo Kamiya ,  Koichi Katsura

IPC: G03B2752

CPC classification number: G03F7/70858 ,  G03F7/70875 ,  G03F7/70883 ,  G03F7/70891

Abstract: An air conditioner arranged in a machine chamber supplies gas for air conditioning into an exposure chamber via a supply path, and performs air conditioning of the exposure chamber. Then, the gas for air conditioning that has performed air conditioning returns to the machine chamber via an exhaust path. A chemical filter is provided in part of the exhaust path returning to the machine chamber from the exposure chamber. This filter securely removes contaminants that are introduced by outgassing and the like in an exposure apparatus main body and that are contained in the gas for air conditioning returning to the machine chamber from the exposure chamber. Accordingly, the inside of the exposure chamber can be kept chemically clean. Therefore, highly accurate exposure quantity control and thus highly accurate exposure can be performed for a long period of time, and high throughput can be maintained for a long period of time.

Abstract translation: 布置在机器室中的空调机通过供给路径将用于空调的气体供给到曝光室，并进行曝光室的空调。 然后，进行空调的空调用气体经由排气路返回到机械室。 在从曝光室返回到机器室的排气路径的一部分中设置有化学过滤器。 该过滤器可靠地清除在曝光装置主体中通过除气等引入的污染物，并且被包含在从曝光室返回机器室的用于空调的气体中。 因此，可以使曝光室的内部保持化学清洁。 因此，可以长时间地进行高精度的曝光量控制，从而高度准确的曝光，并且可以长时间保持高通量。