公开(公告)号：US20250015098A1

公开(公告)日：2025-01-09

申请号：US18890313

申请日：2024-09-19

Applicant: Samsung Display Co., LTD. ,  UBmaterials lnc.

Inventor： Joon-Hwa BAE ,  Jin Hyung PARK ,  Bonggu KANG ,  Seungbae KANG ,  Heesung YANG ,  Woojin CHO ,  Byoung Kwon CHOO

IPC: H01L27/12 ,  C09G1/02 ,  C09K3/14 ,  H01L21/3105

Abstract: A polishing slurry is disclosed which includes about 0.01 wt % to about 10 wt % of polishing particles, about 0.005 wt % to about 0.1 wt % of a dispersing agent, about 0.001 wt % to about 1 wt % of an oxide-polishing promoter including a pyridine compound, about 0.05 wt % to about 0.1 wt % of a nitride-polishing inhibitor including an amino acid or an anionic organic acid, and water. A method for manufacturing a display device including an active pattern disposed on a base substrate, a gate metal pattern including a gate electrode overlapping the active pattern, a planarized insulation layer disposed on the gate metal pattern, and a source metal pattern disposed on the planarized insulation layer is also disclosed.

公开(公告)号：US20220415985A1

公开(公告)日：2022-12-29

申请号：US17903003

申请日：2022-09-05

Applicant: Samsung Display Co., LTD.

Inventor： Jae Sik KIM ,  Woo Yong SUNG ,  Byoung Kwon CHOO

IPC: H01L27/32 ,  H01L51/00 ,  H01L51/56

Abstract: A display device includes: a substrate; an inorganic insulating layer disposed on the substrate; a conductor disposed on the inorganic insulating layer; and an organic insulating layer disposed on the conductor, where an opening is defined through the organic insulating layer to expose a part of the upper surface of the conductor, and at least one material selected from a siloxane, a thiol, a phosphate, a disulfide including a sulfur series, and an amine is bonded on the part of the upper surface of the conductor exposed through the opening.

公开(公告)号：US20220199694A1

公开(公告)日：2022-06-23

申请号：US17552198

申请日：2021-12-15

Applicant: Samsung Display Co., LTD.

Inventor： Joon Hwa BAE ,  Bong Gu KANG ,  Woo Jin CHO ,  Seung Bae KANG ,  Hee Sung YANG ,  Byoung Kwon CHOO

IPC: H01L27/32 ,  H01L51/52 ,  H01L25/16 ,  B29C59/02

Abstract: A method of fabricating a display device includes: preparing a substrate including emission areas and a non-emission area between the emission areas; forming a bank on the non-emission area to a first height; forming light conversion patterns on the emission areas to a height equal to or less than the first height; polishing a surface of a light conversion layer including the bank and the light conversion patterns so that the surface of the light conversion layer is flat; and forming a filler layer on a surface of the substrate on which the light conversion layer is provided. The polishing of the light conversion layer includes planarizing the surface of the light conversion layer so that the bank and the light conversion patterns have a second height through chemical mechanical polishing utilizing a metallic slurry.

公开(公告)号：US20220077260A1

公开(公告)日：2022-03-10

申请号：US17332933

申请日：2021-05-27

Applicant: Samsung Display Co., Ltd.

Inventor： Byoung Kwon CHOO ,  Seung Bae KANG ,  Bong Gu KANG ,  Tae Joon KIM ,  Jeong Min PARK ,  Joon-Hwa BAE ,  Hee Sung YANG ,  Woo Jin CHO

IPC: H01L27/32 ,  H01L51/52 ,  H01L51/56

Abstract: A display device according to an embodiment includes: a substrate; a transistor that is disposed on the substrate; a light emitting diode that is disposed on the substrate, and connected to the transistor; and a passivation layer that is disposed between the transistor and the light emitting diode, wherein a surface step of the passivation layer is within a range of and including 1 nm to 30 nm.

公开(公告)号：US20210273208A1

公开(公告)日：2021-09-02

申请号：US17324626

申请日：2021-05-19

Applicant: Samsung Display Co., LTD.

Inventor： Heesung YANG ,  Seung Bae KANG ,  Bonggu KANG ,  Tae Wook KANG ,  Joon-Hwa BAE ,  Woojin CHO ,  Byoung Kwon CHOO

IPC: H01L51/56 ,  H01L21/311 ,  H01L21/3105

Abstract: A display device includes a planarization layer covering transistors in a display area on a substrate, an organic light emitting diode on the planarization layer, a pad electrode in a non-display area on the substrate surrounding the display area, and a sacrificial layer remnant capping a side surface of the pad electrode.

公开(公告)号：US20190157627A1

公开(公告)日：2019-05-23

申请号：US16007788

申请日：2018-06-13

Applicant: Samsung Display Co., Ltd.

Inventor： Joon Hwa BAE ,  Hyun Jin CHO ,  Byoung Kwon CHOO ,  Woo Jin CHO

IPC: H01L51/56 ,  H01L27/32

Abstract: In a method of manufacturing a display device, the method includes: forming a conductive layer on a base; forming an organic layer, with a hole partially exposing the conductive layer, on the conductive layer; polishing an upper surface of the organic layer; and forming a light emitting element on the polished organic layer.

公开(公告)号：US20180114819A1

公开(公告)日：2018-04-26

申请号：US15605431

申请日：2017-05-25

Applicant: SAMSUNG DISPLAY CO., LTD.

Inventor： Byung Hoon KANG ,  Kwang Suk KIM ,  Joon-Hwa BAE ,  Woo Jin CHO ,  Hyun Jin CHO ,  Jun Hyuk CHEON ,  Byoung Kwon CHOO

IPC: H01L27/32

CPC classification number: H01L27/3248 ,  H01L27/3276 ,  H01L2227/323

Abstract: A method of manufacturing a display device includes: forming an active layer on a substrate; forming a first insulation layer covering the active layer; forming a gate metal line on the first insulation layer; forming a third insulation layer covering the gate metal line and including a silicon oxide; forming a fourth insulation layer including a silicon nitride on the third insulation layer; forming a fifth insulation layer including a silicon oxide on the fourth insulation layer; arranging a blocking member over a region in which the active layer and the gate metal line overlap; forming a fifth auxiliary insulation layer by doping nitrogen ions in the fifth insulation layer; and exposing a part of an upper surface of the fourth insulation layer by removing a portion of a fifth main insulation layer of the fifth insulation layer which does not overlap the fifth auxiliary insulation layer.

公开(公告)号：US20180043501A1

公开(公告)日：2018-02-15

申请号：US15664166

申请日：2017-07-31

Applicant: Samsung Display Co., Ltd.

Inventor： Hyun Jin CHO ,  Joon-Hwa BAE ,  Byoung Kwon CHOO ,  Byung Hoon KANG ,  Jun Hyuk CHEON ,  Jeong-Hye CHOI ,  Young Ho JEONG ,  Woo Jin CHO

IPC: B24B37/34 ,  B24B53/017 ,  B24B37/10

CPC classification number: B24B37/345 ,  B24B37/10 ,  B24B53/017

Abstract: A substrate polishing system includes: a polishing machine and a substrate transporter. The polishing machine includes: a lower surface plate to which a substrate is mounted, and an upper surface plate which faces the lower surface plate and polishes the substrate in cooperation with the lower surface plate, the upper surface plate having a larger area than the substrate mounted on the lower surface plate. The substrate transporter is adjacent to the polishing machine and commonly transports the substrate to and from the polishing machine in a first direction, attaches the substrate to the lower surface plate before polishing thereof, and separates from the lower surface plate the substrate after polishing thereof.