公开(公告)号：US09366975B2

公开(公告)日：2016-06-14

申请号：US13959864

申请日：2013-08-06

Applicant: Samsung Display Co., Ltd.

Inventor： Hi Kuk Lee ,  Sang Don Jang ,  Jae Hyuk Chang ,  Hyang-Shik Kong ,  Cha-Dong Kim ,  Chang Hoon Kim ,  Jung-In Park ,  Sang Hyun Yun

IPC: G01B11/02 ,  G03F7/20

CPC classification number: G03F7/70775

Abstract: A stage transferring device invention includes: a transferring stage upon which an object is mounted and which transfers the object in an x-y plane; and a stage position measuring device. The stage position measuring device includes a one-dimensional scale on the transferring stage; a one-dimensional scale reading head which is configured to overlap the one-dimensional scale, irradiate a measuring beam to the overlapped one-dimensional scale and measure a 1D y-axis coordinate of the transferring stage; a two-dimensional encoder on the transferring stage; and a two-dimensional encoder reading head which is configured to overlap the two-dimensional encoder, irradiate a measuring beam to the overlapped two-dimensional encoder and measure a 2D x-axis coordinate and a 2D y-axis coordinate of the transferring stage.

Abstract translation: 舞台转移装置发明包括：传送台，物体安装在该传送台上，并在x-y平面内传送物体; 和台架位置测量装置。 舞台位置测量装置在转印台上包括一维刻度; 被配置为与一维刻度重叠的一维刻度读取头，将测量光束照射到重叠的一维刻度并测量转印台的1Dy轴坐标; 转印台上的二维编码器; 以及被构造成与二维编码器重叠的二维编码器读取头，将测量光束照射到重叠的二维编码器，并测量转印台的2D x轴坐标和2D y轴坐标。

公开(公告)号：US20160116847A1

公开(公告)日：2016-04-28

申请号：US14745366

申请日：2015-06-19

Applicant: SAMSUNG DISPLAY CO., LTD.

Inventor： Hyun-Seok Kim ,  Sang-Hyun Yun ,  Hi-Kuk Lee ,  Jae-Hyuk Chang ,  Sang-Hyun Lee ,  Jung-In Park ,  Jung-Chul Heo ,  Kab-Jong Seo ,  Ki-Beom Lee ,  Jun-Ho Sim

IPC: G03F7/20

CPC classification number: G03F7/70291 ,  G03F7/70358 ,  G03F7/70508

Abstract: A maskless exposure device includes an exposure head including a digital micro-mirror device and an exposure source, the digital micro-mirror device being configured to reflect a source beam outputted from the exposure source to a substrate and a system controller configured to control the digital micro-mirror device by using a graphic data system file. The graphic data system file includes data regarding patterns to be formed on the substrate. A pattern extending in a direction parallel to a scan direction of the exposure head includes a first pattern portion having a first width that is greater than a target width and a second pattern portion alternately disposed with the first pattern portion and having a second width that is less than the target width.

Abstract translation: 无掩模曝光装置包括具有数字微镜装置和曝光源的曝光头，数字微镜装置被配置为将从曝光源输出的源光束反射到基板，以及系统控制器，被配置为控制数字 微镜设备通过使用图形数据系统文件。 图形数据系统文件包括关于要在基板上形成的图案的数据。 在与曝光头的扫描方向平行的方向上延伸的图案包括具有大于目标宽度的第一宽度的第一图案部分和与第一图案部分交替设置的第二图案部分，并且具有第二宽度， 小于目标宽度。

公开(公告)号：US09335631B2

公开(公告)日：2016-05-10

申请号：US14446282

申请日：2014-07-29

Applicant: SAMSUNG DISPLAY CO., LTD.

Inventor： Ki-Beom Lee ,  Sang-Hyun Yun ,  Hi-Kuk Lee ,  Jae-Hyuk Chang ,  Chang-Hoon Kim ,  Jung-In Park

IPC: G03F7/004 ,  G03F7/038 ,  G03F7/40 ,  C08F220/30

CPC classification number: G03F7/0388 ,  C08F220/30 ,  C08F2220/301 ,  C08F2220/303 ,  G03F7/0045 ,  G03F7/0046 ,  G03F7/038 ,  G03F7/0392 ,  G03F7/40

Abstract: A photosensitive resin composition includes an acid-labile resin of about 5 wt % to about 25 wt %, a monomer of about 5 wt % to about 10 wt %, a photoacid generator of about 5 wt % to about 10 wt %, a photoreaction accelerator of about 1 wt % to about 5 wt %, and a solvent of about 50 wt % to about 84 wt %, wherein the acid-labile resin comprises a repeating unit containing an acid group, and a protecting group configured to protect the repeating unit.

Abstract translation: 光敏树脂组合物包括约5重量％至约25重量％的酸不稳定树脂，约5重量％至约10重量％的单体，约5重量％至约10重量％的光酸产生剂，光反应 约1重量％至约5重量％的促进剂和约50重量％至约84重量％的溶剂，其中酸不稳定树脂包含含有酸基的重复单元和被保护重复的保护基 单元。

公开(公告)号：US20150168833A1

公开(公告)日：2015-06-18

申请号：US14446282

申请日：2014-07-29

Applicant: SAMSUNG DISPLAY CO., LTD.

Inventor： Ki-Beom Lee ,  Sang-Hyun Yun ,  Hi-Kuk Lee ,  Jae-Hyuk Chang ,  Chang-Hoon Kim ,  Jung-In Park

IPC: G03F7/038 ,  G03F7/40

CPC classification number: G03F7/0388 ,  C08F220/30 ,  C08F2220/301 ,  C08F2220/303 ,  G03F7/0045 ,  G03F7/0046 ,  G03F7/038 ,  G03F7/0392 ,  G03F7/40

Abstract: A photosensitive resin composition includes an acid-labile resin of about 5 wt % to about 25 wt %, a monomer of about 5 wt % to about 10 wt %, a photoacid generator of about 5 wt % to about 10 wt %, a photoreaction accelerator of about 1 wt % to about 5 wt %, and a solvent of about 50 wt % to about 84 wt %, wherein the acid-labile resin comprises a repeating unit containing an acid group, and a protecting group configured to protect the repeating unit.

Abstract translation: 光敏树脂组合物包括约5重量％至约25重量％的酸不稳定树脂，约5重量％至约10重量％的单体，约5重量％至约10重量％的光酸产生剂，光反应 约1重量％至约5重量％的促进剂和约50重量％至约84重量％的溶剂，其中酸不稳定树脂包含含有酸基的重复单元和被保护重复的保护基 单元。

公开(公告)号：US09046779B2

公开(公告)日：2015-06-02

申请号：US13861039

申请日：2013-04-11

Applicant: SAMSUNG DISPLAY CO., LTD.

Inventor： Sang Hyun Yun ,  Cha-Dong Kim ,  Jung-In Park ,  Jae Hyuk Chang ,  Hi Kuk Lee

IPC: B32B3/00 ,  G03F7/20 ,  G03F7/00 ,  G02F1/1335 ,  G02F1/1339

CPC classification number: G03F7/2022 ,  G02F1/133512 ,  G02F1/13394 ,  G03F7/0007 ,  G03F7/203 ,  G03F7/70475 ,  Y10T428/24851

Abstract: The present invention relates to a method of fabricating a display device using a maskless exposure apparatus, and the display device, and more particularly, to a method of fabricating a display device by using a maskless exposure apparatus, which is capable of preventing a stain from being viewed, and the display device. An exemplary embodiment of the present invention provides a method of fabricating a display device, including: forming a first exposure region on a substrate by performing exposure while scanning the substrate with a first exposure head irradiating an exposure beam according to pattern information of a first pattern in a scanning direction; and forming a second exposure region adjacent to the first exposure region on the substrate by performing exposure while scanning the substrate with a second exposure head irradiating an exposure beam according to the pattern information of the first pattern in the scanning direction; in which an exposure boundary region between the first exposure region and the second exposure region is extended in the scanning direction, and the exposure boundary region overlaps a light blocking region.

Abstract translation: 本发明涉及使用无掩模曝光装置和显示装置制造显示装置的方法，更具体地说，涉及一种使用无掩模曝光装置制造显示装置的方法，该无掩模曝光装置能够防止 被观看，以及显示装置。 本发明的一个示例性实施例提供了一种制造显示装置的方法，包括：通过在用基于第一图案的图案信息的照射曝光光束的第一曝光头扫描基板的同时进行曝光来在基板上形成第一曝光区域 在扫描方向; 以及根据所述第一图案在所述扫描方向上的图案信息，利用照射曝光光束的第二曝光头对所述基板进行曝光，同时在所述基板上形成与所述第一曝光区域相邻的第二曝光区域; 其中第一曝光区域和第二曝光区域之间的曝光边界区域在扫描方向上延伸，并且曝光边界区域与遮光区域重叠。

公开(公告)号：US08902414B2

公开(公告)日：2014-12-02

申请号：US13669751

申请日：2012-11-06

Applicant: Samsung Display Co., Ltd.

Inventor： Jung-In Park ,  Cha-Dong Kim ,  Su-Yeon Sim ,  Sang-Hyun Yun ,  Hi-Kuk Lee

IPC: G01J1/00 ,  G03F7/20

CPC classification number: G01J1/00 ,  G03F7/20 ,  G03F7/70133

Abstract: An exposure system includes an exposure apparatus, a mask, a test pattern portion and a uniformity measuring part. The exposure apparatus includes a first module and a second module. The first and second modules each emit light and are overlapped in an overlapping area. The mask includes a plurality of transmission portions which are spaced apart from each other. Each of the transmission portions has a width less than a width of the overlapping area. The test pattern portion includes a plurality of test patterns which are patterned by using the light transmitted through the transmission portions of the mask. The uniformity measuring part measures a uniformity of the test patterns.

Abstract translation: 曝光系统包括曝光装置，掩模，测试图案部分和均匀度测量部分。 曝光装置包括第一模块和第二模块。 第一和第二模块各自发光并且在重叠区域中重叠。 掩模包括彼此间隔开的多个传输部分。 每个传输部分具有小于重叠区域的宽度的宽度。 测试图形部分包括通过使用透过掩模的透射部分的光而构图的多个测试图案。 均匀度测量部件测量测试图案的均匀性。