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公开(公告)号:US20240065118A1
公开(公告)日:2024-02-22
申请号:US18068821
申请日:2022-12-20
Applicant: Samsung Electronics Co., Ltd.
Inventor: Hajun SUNG , Youngjae Kang , Changyup Park , Kiyeon Yang , Wooyoung Yang , Changseung Lee , Minwoo Choi
CPC classification number: H10N70/231 , H10N70/861 , H10N70/8828 , H10N70/8845 , H10B63/84
Abstract: Provided are a phase change heterostructure and a phase change memory device including the same. The phase change memory device including the phase change heterostructure may include a plurality of memory cells. Each of the plurality of memory cells may include a first electrode and a second electrode, which may be spaced apart from each other, and a phase change heterostructure between the first electrode and the second electrode. The phase change heterostructure may include a plurality of phase change material layers and a plurality of thermal barrier layers alternately stacked on each other. A material of the plurality of thermal barrier layers have a thermal conductivity lower than a materials of the plurality of phase change material layers.
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公开(公告)号:US20230088249A1
公开(公告)日:2023-03-23
申请号:US17717611
申请日:2022-04-11
Applicant: Samsung Electronics Co., Ltd.
Inventor: Wooyoung YANG , Segab KWON , Hajun SUNG , Dongho AHN , Changseung LEE , Minwoo CHOI
Abstract: Provided are a semiconductor device and a semiconductor apparatus. The semiconductor device may include a first electrode; a second electrode spaced apart from the first electrode; and a selection device layer including a chalcogen compound layer between the first electrode and the second electrode and a metal oxide doped in the chalcogen compound layer. In the semiconductor device, by doping the metal oxide, an off-current value (leakage current value) of the selection device layer may be reduced, and static switching characteristics may be implemented.
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公开(公告)号:US20230042262A1
公开(公告)日:2023-02-09
申请号:US17522197
申请日:2021-11-09
Applicant: Samsung Electronics Co., Ltd.
Inventor: Minwoo CHOI , Bonwon KOO , Yongyoung PARK , Hajun SUNG , Dongho AHN , Kiyeon YANG , Wooyoung YANG , Changseung LEE
Abstract: Provided are a switching device and a memory device including the switching device. The switching device includes first and second electrodes, and a switching material layer provided between the first and second electrodes and including a chalcogenide. The switching material layer includes a core portion and a shell portion covering a side surface of the core portion. The switching layer includes a material having an electrical resistance greater than an electrical resistance of the core portion, for example in at least one of the core portion or the shell portion.
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公开(公告)号:US20220406842A1
公开(公告)日:2022-12-22
申请号:US17523363
申请日:2021-11-10
Applicant: Samsung Electronics Co., Ltd.
Inventor: Hajun SUNG , Bonwon KOO , Segab KWON , Yongyoung PARK , Dongho AHN , Kiyeon YANG , Wooyoung YANG , Changseung LEE , Minwoo CHOI
Abstract: Provided are a chalcogenide material, and a device and a memory device each including the same. The chalcogenide material may include: germanium (Ge) as a first component; arsenic (As) as a second component; at least one element selected from selenium (Se) and tellurium (Te) as a third component; and at least one element selected from the elements of Groups 2, 16, and 17 of the periodic table as a fourth component, wherein a content of the first component may be from 5 at % to 30 at %, a content of the second component may be from 20 at % to 40 at %, a content of the third component may be from 25 at % to 75 at %, and a content of the fourth component may be from 0.5 at % to 5 at %.
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15.
公开(公告)号:US20220140003A1
公开(公告)日:2022-05-05
申请号:US17244212
申请日:2021-04-29
Applicant: Samsung Electronics Co., Ltd.
Inventor: Wooyoung YANG , Bonwon KOO , Chungman KIM , Kwangmin PARK , Hajun SUNG , Dongho AHN , Changseung LEE , Minwoo CHOI
Abstract: A chalcogen compound layer exhibiting ovonic threshold switching characteristics, a switching device, a semiconductor device, and/or a semiconductor apparatus including the same are provided. The switching device and/or the semiconductor device may include two or more chalcogen compound layers having different energy band gaps. Alternatively, the switching device and/or semiconductor device may include a chalcogen compound layer having a concentration gradient of an element of boron (B), aluminum (Al), scandium (Sc), manganese (Mn), strontium (Sr), and/or indium (In) in a thickness direction thereof. The switching device and/or a semiconductor device may exhibit stable switching characteristics while having a low off-current value (leakage current value).
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