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11.发明申请METHOD FOR PRODUCING POLYALKYLENE GLYCOL DERIVATIVE HAVING AMINO GROUP AT END 审中-公开生产具有氨基的聚亚甲基甘氨酸衍生物的方法公开(公告)号：US20160159831A1
公开(公告)日：2016-06-09
申请号：US14959088
申请日：2015-12-04
发明人： Yuki Suka , Yuji Harada , Takeru Watanabe , Shiori Nonaka
IPC分类号： C07F7/08 , C07C213/08 , C07C213/02 , C08G65/00
CPC分类号： C07F7/0892 , C07F7/10 , C08G65/12 , C08G65/2609 , C08G65/33303 , C08G65/33306 , Y02P20/55
摘要： A method simply produces a narrowly distributed and high-purity polyalkylene glycol derivative having an amino group at an end without using a heavy metal catalyst. A method for producing a polyalkylene glycol derivative having an amino group at the end by reacting a compound represented by the general formula (V) with an alkylene oxide, then reacting a reaction product with an electrophile represented by the general formula (I), and deprotecting the obtained product without using a heavy metal: RA3O(RA4O)k-1RA4O−M+ (V) wherein RA3 represents a linear; branched, or cyclic hydrocarbon group having 1 to 20 carbon atoms; RA4 represents an alkylene group having 2 to 8 carbon atoms; k represents an integer of 2 to 5; and M represents an alkali metal; wherein RA1a and RA1b each independently represent a protective group of the amino group, or one of RA1a and RA1b represents H and the other represents a protective group of the amino group, or RA1a and RA1b bind to each other to form a cyclic protective group, and the protective group is deprotectable without using a heavy metal; RA2 represents a linear, branched, or cyclic hydrocarbon group having 1 to 6 carbon atoms; and X represents a leaving group.
摘要翻译： 一种方法简单地产生在不使用重金属催化剂的情况下在末端具有氨基的窄分布且高纯度的聚亚烷基二醇衍生物。 通过使由通式（V）表示的化合物与烯化氧反应，然后使反应产物与通式（I）表示的亲电子试剂反应，以及通式 不使用重金属使得到的产物脱保护：RA3O（RA4O）k-1RA4O-M +（V）其中RA3表示直链; 具有1〜20个碳原子的支链或环状烃基; RA4表示碳原子数2〜8的亚烷基。 k表示2〜5的整数， M表示碱金属; 其中RA1a和RA1b各自独立地表示氨基的保护基，或者RA1a和RA1b之一表示H，另一个表示氨基的保护基，或RA1a和RA1b彼此结合形成环保护基， 并且保护基团在不使用重金属的情况下可脱保护; RA2表示碳原子数1〜6的直链状，支链状或环状的烃基。 X表示离去基团。
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12.发明授权Compound for forming organic film, and organic film composition using the same, process for forming organic film, and patterning process 有权用于形成有机膜的化合物和使用其的有机膜组合物，用于形成有机膜的方法和图案化工艺公开(公告)号：US09261788B2
公开(公告)日：2016-02-16
申请号：US13916071
申请日：2013-06-12
发明人： Seiichiro Tachibana , Daisuke Kori , Tsutomu Ogihara , Takeru Watanabe , Kazumi Noda , Toshiharu Yano
IPC分类号： G03F7/11 , C07C43/23 , G03F7/09 , H01L21/308 , G03F7/075 , H01L27/12 , H01L21/311 , H01L21/027
CPC分类号： G03F7/094 , C07C39/17 , C07C43/23 , C07C2603/18 , C08F216/10 , C08G61/12 , C08K5/13 , C09D7/63 , C09D129/02 , C09D165/00 , G03F7/0752 , G03F7/091 , G03F7/11 , G03F7/20 , G03F7/32 , G03F7/40 , H01L21/02118 , H01L21/0214 , H01L21/02164 , H01L21/0217 , H01L21/02271 , H01L21/0228 , H01L21/02318 , H01L21/0271 , H01L21/0274 , H01L21/0276 , H01L21/308 , H01L21/3081 , H01L21/3086 , H01L21/31138 , H01L21/31144 , H01L27/1203
摘要： The invention provides a compound for forming an organic film having a partial structure represented by the following formula (i) or (ii), wherein the ring structures Ar1, Ar2 and Ar3 each represent a substituted or unsubstituted benzene ring or naphthalene ring; e is 0 or 1; R0 represents a hydrogen atom or a linear, branched or cyclic monovalent organic group having 1 to 30 carbon atoms; L0 represents a linear, branched or cyclic divalent organic group having 1 to 32 carbon atoms; and the methylene group constituting L0 may be substituted by an oxygen atom or a carbonyl group. There can be provided an organic film composition for forming an organic film having high dry etching resistance as well as advanced filling/planarizing characteristics.
摘要翻译： 本发明提供一种形成具有由下式（i）或（ii）表示的部分结构的有机膜的化合物，其中环结构Ar1，Ar2和Ar3各自表示取代或未取代的苯环或萘环; e为0或1; R 0表示氢原子或碳原子数为1〜30的直链状，支链状或环状的一价有机基团， L0表示碳原子数为1〜32的直链状，支链状或环状的二价有机基团， 构成L0的亚甲基可以被氧原子或羰基取代。 可以提供一种用于形成具有高耐干蚀刻性以及高级填充/平坦化特性的有机膜的有机膜组合物。
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公开(公告)号：US20220411363A1
公开(公告)日：2022-12-29
申请号：US17751974
申请日：2022-05-24
发明人： Takeshi Kinsho , Yusuke Nagae , Shogo Tsukaguchi , Yasuhiko Kutsuwada , Tatsuya Hojo , Takeru Watanabe
IPC分类号： C07C231/14 , C07C231/20
摘要： The present invention provides a process for preparing 2-methyl-N-(2′-methylbutyl)butanamide of the following formula (1):the process comprising: subjecting an α-arylethyl-2-methylbutylamine compound of the following general formula (2): wherein Ar represents a substituted or unsubstituted aryl group having 6 to 20 carbon atoms, to N-2-methylbutyrylation to form an N-α-arylethyl-2-methyl-N-(2′-methylbutyl)butanamide compound of the following general formula (3): wherein Ar is as defined above, and removing the α-arylethyl group of the resulting compound (3) to form 2-methyl-N-(2′-methylbutyl)butanamide (1).
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公开(公告)号：US20220411358A1
公开(公告)日：2022-12-29
申请号：US17848592
申请日：2022-06-24
IPC分类号： C07C47/222 , C07C47/21 , A01N31/04
摘要： There are provided a composition which has a larger attracted number than (9Z)-9,13-tetradecadien-11-ynal alone; and others. More specifically, there are provided a composition bioactive to Stenoma catenifer (STENCA), the composition including (9Z)-9,13-tetradecadien-11-ynal and (9E)-9,13-tetradecadien-11-ynal; a sustained release preparation for controlling STENCA, the preparation including the composition and a carrier or container for sustainedly releasing the (9Z)-9,13-tetradecadien-11-ynal and the (9E)-9,13-tetradecadien-11-ynal; and a method for controlling STENCA, the method including a step of installing the sustained release preparation in a field to release the (9Z)-9,13-tetradecadien-11-ynal and the (9E)-9,13-tetradecadien-11-ynal into the field.
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公开(公告)号：US11492337B2
公开(公告)日：2022-11-08
申请号：US16800447
申请日：2020-02-25
IPC分类号： C07D303/06 , G03F7/004 , G03F7/038 , G03F7/039 , C08F212/08 , C08F220/38 , C08L33/14
摘要： An epoxy compound of formula (1) is provided. A resist composition comprising the epoxy compound is capable of adequately controlling the diffusion length of acid generated from an acid generator without sacrificing sensitivity.
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公开(公告)号：US20200283400A1
公开(公告)日：2020-09-10
申请号：US16800447
申请日：2020-02-25
IPC分类号： C07D303/06 , G03F7/004 , G03F7/038 , C08L33/14 , C08F212/08 , C08F220/38 , G03F7/039
摘要： An epoxy compound of formula (1) is provided. A resist composition comprising the epoxy compound is capable of adequately controlling the diffusion length of acid generated from an acid generator without sacrificing sensitivity.
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公开(公告)号：US10550136B2
公开(公告)日：2020-02-04
申请号：US16454552
申请日：2019-06-27
发明人： Yuki Suka , Yuji Harada , Takeru Watanabe , Shiori Nonaka
IPC分类号： C07F7/08 , C07F7/10 , C08G65/12 , C08G65/26 , C08G65/333
摘要： A method simply produces a narrowly distributed and high-purity polyalkylene glycol derivative having an amino group at an end without using a heavy metal catalyst. A method for producing a polyalkylene glycol derivative having an amino group at the end by reacting a compound represented by the general formula (V) with an alkylene oxide, then reacting a reaction product with an electrophile represented by the general formula (I), and deprotecting the obtained product without using a heavy metal: RA3O(RA4O)k−1RA4O−M+ (V) wherein RA3 represents a linear, branched, or cyclic hydrocarbon group having 1 to 20 carbon atoms; RA4 represents an alkylene group having 2 to 8 carbon atoms; k represents an integer of 2 to 5; and M represents an alkali metal: wherein RA1a and RA1b each independently represent a protective group of the amino group, or one of RA1a and RA1b represents H and the other represents a protective group of the amino group, or RA1a and RA1b bind to each other to form a cyclic protective group, and the protective group is deprotectable without using a heavy metal; RA2 represents a linear, branched, or cyclic hydrocarbon group having 1 to 6 carbon atoms; and X represents a leaving group.
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公开(公告)号：US20190315777A1
公开(公告)日：2019-10-17
申请号：US16454552
申请日：2019-06-27
发明人： Yuki Suka , Yuji Harada , Takeru Watanabe , Shiori Nonaka
IPC分类号： C07F7/08 , C08G65/333 , C07F7/10 , C08G65/26 , C08G65/12
摘要： A method simply produces a narrowly distributed and high-purity polyalkylene glycol derivative having an amino group at an end without using a heavy metal catalyst. A method for producing a polyalkylene glycol derivative having an amino group at the end by reacting a compound represented by the general formula (V) with an alkylene oxide, then reacting a reaction product with an electrophile represented by the general formula (I), and deprotecting the obtained product without using a heavy metal: RA3O(RA4O)k-1RA4O−M+ (V) wherein RA3 represents a linear, branched, or cyclic hydrocarbon group having 1 to 20 carbon atoms; RA4 represents an alkylene group having 2 to 8 carbon atoms; k represents an integer of 2 to 5; and M represents an alkali metal: wherein RA1a and RA1b each independently represent a protective group of the amino group, or one of RA1a and RA1b represents H and the other represents a protective group of the amino group, or RA1a and RA1b bind to each other to form a cyclic protective group, and the protective group is deprotectable without using a heavy metal; RA2 represents a linear, branched, or cyclic hydrocarbon group having 1 to 6 carbon atoms; and X represents a leaving group.
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19.发明授权公开(公告)号：US10241412B2
公开(公告)日：2019-03-26
申请号：US15915748
申请日：2018-03-08
发明人： Hiroko Nagai , Takeru Watanabe , Daisuke Kori , Tsutomu Ogihara
IPC分类号： G03F7/11 , G03F7/09 , C07C39/14 , C07C39/15 , C07C49/83 , C08F220/28 , C08F220/32 , G03F7/16 , G03F7/20 , G03F7/32 , G03F7/38 , H01L21/266 , H01L21/308 , H01L21/311
摘要： Provided is a resist underlayer film composition which is excellent in resistance to a basic hydrogen peroxide aqueous solution, in gap-filling and planarization characteristics, and in dry etching characteristic, wherein the resist underlayer film composition is used for a multilayer resist method, comprising: (A1) a polymer (1A) comprising one, or two or more, of a repeating unit represented by following general formula (1); (A2) one, or two or more, of a polyphenol compound having a formula weight of 2,000 or less and not having a 3,4-dihydroxy phenyl group; and (B) an organic solvent.
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公开(公告)号：US20170275305A1
公开(公告)日：2017-09-28
申请号：US15621272
申请日：2017-06-13
发明人： Yuki Suka , Yuji Harada , Takeru Watanabe , Shiori Nonaka
IPC分类号： C07F7/10 , C08G65/329 , C08G65/26
CPC分类号： C07F7/10 , C08G65/2609 , C08G65/2618 , C08G65/2639 , C08G65/329 , Y02P20/55
摘要： A method for producing a narrowly distributed and high-purity polyalkylene glycol derivative having an amino group at an end, a polymerization initiator for use in the method, and a precursor of the polymerization initiator are provided.The present invention provides: a method for producing a polyalkylene glycol derivative having an amino group at an end, using, as a polymerization initiator, a compound represented by the general formula (I); a compound represented by the following general formula (I); and a precursor thereof: wherein RA1a and RA1b each independently represent a protective group of the amino group, or one of RA1a and RA1b represents H and the other represents a protective group of the amino group, or RA1a and RA1b bind to each other to represent a cyclic protective group forming a ring; RA2 represents a linear, branched, or cyclic hydrocarbon group having 1 to 6 carbon atoms; RA3 represents a single bond, or a linear, branched, or cyclic hydrocarbon group having 1 to 20 carbon atoms, and the hydrocarbon group may contain a heteroatom; the total number of carbon atoms (or the total number of carbon atoms and heteroatoms) of RA2 and RA3 is 4 or more; and M represents an alkali metal.
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