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34 条记录 (耗时 0.043 秒)

    METHOD OF PRODUCING STRUCTURE CONTAINING PHASE-SEPARATED STRUCTURE, METHOD OF FORMING PATTERN AND METHOD OF FORMING FINE PATTERN
    14.
    发明申请
    METHOD OF PRODUCING STRUCTURE CONTAINING PHASE-SEPARATED STRUCTURE, METHOD OF FORMING PATTERN AND METHOD OF FORMING FINE PATTERN 有权
    生产包含相分离结构的结构的方法，形成图案的方法和形成精细图案的方法

    公开(公告)号：US20150034593A1

    公开(公告)日：2015-02-05

    申请号：US14447376

    申请日：2014-07-30

    申请人： Tokyo Ohka Kogyo Co., Ltd.

    发明人： Tasuku Matsumiya ,  Takehiro Seshimo ,  Ken Miyagi ,  Takaya Maehashi ,  Takahiro Dazai ,  Yoshiyuki Utsumi

    IPC分类号： B05D3/10 ,  B05D3/02 ,  B05D3/14 ,  B05D1/36

    CPC分类号： C08L53/00 ,  B05D1/185 ,  B81C1/00031 ,  B81C2201/0149 ,  B82B3/00 ,  C09D153/00

    摘要： A method of producing a structure containing a phase-separated structure, including: forming a layer including a neutralization film on a substrate; forming a layer containing a block copolymer on the layer including the neutralization film, the PA block and PB block being mutually bonded in the block copolymer, and the PB block including a structural unit other than a structural unit constituting the PA block; and subjecting the layer containing the block copolymer to an annealing treatment, such that, in the case where a surface free energy of the PA block, a surface free energy of the PB block and a surface free energy of the neutralization film are represented by a coordinate point A of the PA block, a coordinate point B of the PB block and a coordinate point N of the neutralization film, respectively in the plane of coordinates, the coordinate point N of the neutralization film is within the predetermined range.

    摘要翻译： 一种制造包含相分离结构的结构的方法，包括：在基板上形成包含中和膜的层; 在包含中和膜的层上形成包含嵌段共聚物的层，PA嵌段和PB嵌段相互结合在嵌段共聚物中，PB组分包括构成PA嵌段的结构单元以外的结构单元; 并使含有嵌段共聚物的层进行退火处理，使得在PA嵌段的表面自由能，PB嵌段的表面自由能和中和膜的表面自由能由 PA块的坐标点A，PB块的坐标点B和中和膜的坐标点N分别在坐标平面中，中和膜的坐标点N在预定范围内。

    Resist composition, method of forming resist pattern and polymeric compound
    15.
    发明授权
    Resist composition, method of forming resist pattern and polymeric compound 有权
    抗蚀剂组合物，抗蚀剂图案和高分子化合物的形成方法

    公开(公告)号：US08795948B2

    公开(公告)日：2014-08-05

    申请号：US13847323

    申请日：2013-03-19

    申请人： Tokyo Ohka Kogyo Co., Ltd.

    发明人： Takahiro Dazai ,  Yoshiyuki Utsume ,  Jun Iwashita ,  Kensuke Matsuzawa ,  Kenri Konno

    IPC分类号： G03F7/004 ,  C08F220/38 ,  C07C69/54

    CPC分类号： G03F7/004 ,  G03F7/0045 ,  G03F7/0392 ,  G03F7/20

    摘要： A resist composition including a base component (A) which generates acid upon exposure and exhibits changed solubility in a developing solution under the action of acid, the base component (A) containing a polymeric compound (A1) including a structural unit (a0) represented by general formula (a0-1) shown below, a structural unit (a1) containing an acid decomposable group which exhibits increased polarity by the action of acid and a structural unit (a6) which generates acid upon exposure (wherein R1 represents a hydrogen atom, an alkyl group or a halogenated alkyl group; W represents —COO—, —CONH— or a divalent aromatic hydrocarbon group; Y1 and Y2 represents a divalent linking group or a single bond; R′1 represents a hydrogen atom or an alkyl group of 1 to 6 carbon atoms; R′2 represents a monovalent aliphatic hydrocarbon group; and R2 represents an —SO2— containing cyclic group).

    摘要翻译： 一种抗蚀剂组合物，其包含在暴露时产生酸的基体组分（A），并且在酸的作用下在显影液中显示改变的溶解度，所述基质组分（A）含有包含所述结构单元（a0）的高分子化合物（A1） 通过下述通式（a0-1），含有通过酸作用显示出极性增加的酸分解基团的结构单元（a1）和曝光时产生酸的结构单元（a6）（其中R1表示氢原子 ，烷基或卤代烷基; W表示-COO-，-CONH-或二价芳香族烃基; Y1和Y2表示二价连接基团或单键; R'1表示氢原子或烷基 1〜6个碳原子; R'2表示一价脂族烃基，R2表示含-SO2-的环状基团）。

    RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN, POLYMERIC COMPOUND AND COMPOUND
    17.
    发明申请
    RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN, POLYMERIC COMPOUND AND COMPOUND 有权
    耐蚀组合物，形成耐蚀图案的方法，聚合物和化合物

    公开(公告)号：US20130309614A1

    公开(公告)日：2013-11-21

    申请号：US13895087

    申请日：2013-05-15

    申请人： Tokyo Ohka Kogyo Co., Ltd.

    发明人： Yoshiyuki Utsumi ,  Masatoshi Arai ,  Takahiro Dazai ,  Yoshitaka Komuro

    IPC分类号： G03F7/004

    CPC分类号： G03F7/004 ,  G03F7/0045 ,  G03F7/0397

    摘要： There is provided a resist composition which generates acid upon exposure and exhibits changed solubility in a developing solution by the action of acid, including a base component (A) which exhibits changed solubility in a developing solution by the action of acid, wherein the base component (A) contains a polymeric compound (A1) having a structural unit (a0) represented by general formula (a0) shown below. In the formula, A″ represents an oxygen atom, a sulfur atom or an alkylene group of 1 to 5 carbon atoms which may contain an oxygen atom or a sulfur atom; R1 represents a lactone-containing cyclic group, an —SO2— containing cyclic group or a carbonate-containing cyclic group; and W2 represents a group which is formed by polymerization reaction of a group containing a polymerizable group.

    摘要翻译： 提供一种抗蚀剂组合物，其在曝光时产生酸，并且通过酸的作用在显影液中显示出改变的溶解性，包括在酸的作用下在显影液中显示改变的溶解度的碱成分（A），其中， （A）含有具有下述通式（a0）表示的结构单元（a0）的高分子化合物（A1）。 式中，A“表示可含有氧原子或硫原子的1〜5个碳原子的氧原子，硫原子或亚烷基， R1表示含内酯的环状基团，含-SO 2的环状基团或含碳酸酯的环状基团; W2表示通过含有聚合性基团的基团的聚合反应形成的基团。

    RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN AND POLYMERIC COMPOUND
    18.
    发明申请
    RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN AND POLYMERIC COMPOUND 有权
    耐蚀组合物，形成耐蚀图案和聚合物的方法

    公开(公告)号：US20130252180A1

    公开(公告)日：2013-09-26

    申请号：US13847323

    申请日：2013-03-19

    申请人： TOKYO OHKA KOGYO CO., LTD.

    发明人： Takahiro Dazai ,  Yoshiyuki Utsumi ,  Jun Iwashita ,  Kensuke Matsuzawa ,  Kenri Konno

    IPC分类号： G03F7/004 ,  G03F7/20

    CPC分类号： G03F7/004 ,  G03F7/0045 ,  G03F7/0392 ,  G03F7/20

    摘要： A resist composition including a base component (A) which generates acid upon exposure and exhibits changed solubility in a developing solution under the action of acid, the base component (A) containing a polymeric compound (A1) including a structural unit (a0) represented by general formula (a0-1) shown below, a structural unit (a1) containing an acid decomposable group which exhibits increased polarity by the action of acid and a structural unit (a6) which generates acid upon exposure (wherein R1 represents a hydrogen atom, an alkyl group or a halogenated alkyl group; W represents —COO—, —CONH— or a divalent aromatic hydrocarbon group; Y1 and Y2 represents a divalent linking group or a single bond; represents a hydrogen atom or an alkyl group of 1 to 6 carbon atoms; R′2 represents a monovalent aliphatic hydrocarbon group; and R2 represents an —SO2— containing cyclic group).

    摘要翻译： 一种抗蚀剂组合物，其包含在暴露时产生酸的基体组分（A），并且在酸的作用下在显影液中显示改变的溶解度，所述基质组分（A）含有包含所述结构单元（a0）的高分子化合物（A1） 通过下述通式（a0-1），含有通过酸作用显示出极性增加的酸分解基团的结构单元（a1）和曝光时产生酸的结构单元（a6）（其中R1表示氢原子 ，烷基或卤代烷基; W表示-COO-，-CONH-或二价芳香族烃基; Y1和Y2表示二价连接基团或单键;表示氢原子或1〜 6个碳原子; R'2表示一价脂族烃基; R2表示含-SO2-的环状基团）。

    METHOD OF PRODUCING BLOCK COPOLYMER, AND BLOCK COPOLYMER
    20.
    发明公开
    METHOD OF PRODUCING BLOCK COPOLYMER, AND BLOCK COPOLYMER 审中-公开

    公开(公告)号：US20240182623A1

    公开(公告)日：2024-06-06

    申请号：US18512901

    申请日：2023-11-17

    申请人： TOKYO OHKA KOGYO CO., LTD.

    发明人： Toshifumi Satoh ,  Takuya Isono ,  Kazushige Suzuki ,  Toi Iizuka ,  Ken Miyagi ,  Takahiro Dazai

    IPC分类号： C08F299/00

    CPC分类号： C08F299/00

    摘要： A method of producing a triblock copolymer, the method including reacting a diblock copolymer that contains a first block formed from a repeating structure including a constituent unit containing an aromatic hydrocarbon group, and a second block formed from a repeating structure including a constituent unit derived from an α-substituted acrylic acid ester with a homopolymer that contains a third block formed from a repeating structure including a constituent unit containing an aromatic hydrocarbon group and containing a hydroxy group bonded to a terminal of a main chain in the third block to obtain a triblock copolymer, in which the reaction is transesterification of the constituent unit derived from an (α-substituted) acrylic acid ester at a terminal of a main chain of the diblock copolymer with the homopolymer.