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公开(公告)号:US20180037017A1
公开(公告)日:2018-02-08
申请号:US15730922
申请日:2017-10-12
Applicant: TOPPAN PRINTING CO., LTD.
Inventor: Jin Sato , Mitsuru Kano
IPC: B32B37/02 , B32B27/06 , B32B27/28 , C23C16/455 , C23C14/08
CPC classification number: B32B37/02 , B32B9/00 , B32B27/06 , B32B27/281 , B32B2255/205 , B32B2379/08 , B32B2457/14 , B32B2457/202 , B32B2553/00 , C23C14/083 , C23C16/0245 , C23C16/403 , C23C16/45542 , C23C16/45553 , C23C16/45555 , C23C16/545 , C23C28/042 , H01L51/5253
Abstract: A laminate includes a substrate made of an organic polymer having a functional group containing an oxygen atom or a nitrogen atom, a functional layer bonded to the functional group of the organic polymer contained in the substrate and formed by an atomic layer deposition process, and an overcoat layer provided to cover the functional layer and containing transition metal atoms. Because the adhesion between the substrate and the functional layer is improved and the functional layer is protected by the overcoat layer, it is possible to achieve both improved gas barrier properties and/or improved durability against an environmental stress such as heat, humidity and the like.
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公开(公告)号:US09687868B2
公开(公告)日:2017-06-27
申请号:US14556608
申请日:2014-12-01
Applicant: TOPPAN PRINTING CO., LTD.
Inventor: Yasuhiro Sasaki , Mitsuru Kano
CPC classification number: B05B13/0221 , B65H20/02 , B65H2301/51145 , C23C14/562 , C23C16/45551 , C23C16/545
Abstract: A rolled film formation apparatus including a first chamber in which a first precursor is applied to a substrate, a second chamber in which a second precursor is applied to the substrate such that the first and second precursors react with each other and that an atomic layer is deposited on the substrate, a third chamber in which a purge gas is applied to the substrate, and conveyance roller pairs which are positioned in the first, second and third chambers, and convey the substrate. Each conveyance roller pair includes a first roller and a second roller which sandwich the substrate in a thickness direction of the substrate. At least one of the first and second rollers has an outer peripheral surface having a surface unevenness. The substrate is moved back and forth among the first, second and third chambers. The atomic layer is deposited more than once on the substrate.
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