公开(公告)号：US20220333230A1

公开(公告)日：2022-10-20

申请号：US17854232

申请日：2022-06-30

Applicant: Universal Display Corporation

Inventor： Matthew KING ,  Gregg KOTTAS ,  Gregory MCGRAW ,  William E. QUINN

IPC: C23C14/24 ,  H01L51/56 ,  C23C14/12

Abstract: Embodiments of the disclosed subject matter provide an apparatus having a device with a micronozzle array disposed on a micro-fabricated fluidic die. The device may include a first gas distribution plate and a second opposing plate, where the micro-fabricated fluidic die is disposed between the first gas distribution plate and the second opposing plate, wherein the first gas distribution plate is irreversibly joined to the micronozzle array with a seal that is gas-tight, and where the first gas distribution plate includes a plurality of sealed flow paths. A manifold may be reversibly joined to the first gas distribution plate, where the micro-fabricated fluidic die and the first gas distribution plate and the second opposing plate are disposed between the manifold. A thermally conductive plate may have at least one window that provides a clearance fit for the device across a range of motion relative to the thermally conductive plate.

公开(公告)号：US20220143642A1

公开(公告)日：2022-05-12

申请号：US17582071

申请日：2022-01-24

Applicant: Universal Display Corporation

Inventor： Gregory MCGRAW ,  William E. QUINN ,  Matthew KING ,  Elliot H. HARTFORD ,  Siddharth HARIKRISHNA MOHAN

IPC: B05B12/18 ,  C23C14/22 ,  C23C14/04 ,  C23C14/12

Abstract: Embodiments of the disclosed subject matter provide a device including a nozzle, a source of material to be deposited on a substrate in fluid communication with the nozzle, a delivery gas source in fluid communication with the source of material to be deposited with the nozzle, an exhaust channel disposed adjacent to the nozzle, and a confinement gas source in fluid communication with the nozzle and the exhaust channel, and disposed adjacent to the exhaust channel.

公开(公告)号：US20210054495A1

公开(公告)日：2021-02-25

申请号：US17082169

申请日：2020-10-28

Applicant: Universal Display Corporation

Inventor： Gregory McGRAW ,  William E. QUINN ,  Matthew KING ,  Elliot H. HARTFORD, JR. ,  Siddharth HARIKRISHNA MOHAN ,  Benjamin SWEDLOVE ,  Gregg KOTTAS

IPC: C23C14/12 ,  C23C14/54 ,  C23C14/22 ,  B41J2/045 ,  C23C14/04

Abstract: Embodiments of the disclosed subject matter provide methods and systems including a nozzle, a source of material to be deposited on a substrate in fluid communication with the nozzle, a delivery gas source in fluid communication with the source of material to be deposited with the nozzle, an exhaust channel disposed adjacent to the nozzle, a confinement gas source in fluid communication with the nozzle and the exhaust channel, and disposed adjacent to the exhaust channel, and an actuator to adjust a fly height separation between a deposition nozzle aperture of the nozzle and a deposition target. The adjustment of the fly height separation may stop and/or start the deposition of the material from the nozzle.

公开(公告)号：US20190217610A1

公开(公告)日：2019-07-18

申请号：US16243393

申请日：2019-01-09

Applicant: Universal Display Corporation

Inventor： Gregory MCGRAW ,  Matthew KING ,  William E. QUINN

IPC: B41J2/14 ,  B05B1/16 ,  B41J2/16

CPC classification number: B41J2/1433 ,  B05B1/1609 ,  B41J2/162 ,  B41J2/1623 ,  H01L51/0004

Abstract: Embodiments of the disclosed subject matter provide a micronozzle array formed from monolithic silicon. The micronozzle array may have a plurality of nozzles, where each nozzle of the plurality of nozzles including an integrated plug valve that allows flow from the nozzle to be attenuated separately from each other nozzle of the plurality of nozzles. Each of the plurality of nozzles may include a microchannel, formed from the monolithic silicon, having a first channel portion and a second channel portion, where the first channel portion is narrower than the second channel portion, and where the first channel portion forms an aperture of the nozzle that is configured to eject vapor from the microchannel. Each of the plurality of nozzles may include a stem, formed from the monolithic silicon that includes the integrated plug valve is suspended in the microchannel to attenuate the flow from the nozzle.

公开(公告)号：US20180340253A1

公开(公告)日：2018-11-29

申请号：US15982187

申请日：2018-05-17

Applicant: Universal Display Corporation

Inventor： Gregory MCGRAW ,  Edwin VAN DEN TILLAART ,  William E. QUINN ,  Sven PEKELDER ,  Matthew KING

IPC: C23C14/24 ,  B05D1/00 ,  H01L51/50 ,  H01L51/52 ,  C23C14/12

Abstract: Designs and arrangements for sublimation cells are provided, which enriches an inert carrier gas with organic vapor such that the partial pressure of the organic vapor is highly stable in time. Stability is achieved by controlling the local rates of evaporation along the solid-gas interface through one or more crucibles, thereby reducing the effects of greater headspace and lowering interfacial area as the source depletes. Local evaporation rates also can be controlled using either temperature distribution or convective flow fields.

公开(公告)号：US20180331327A9

公开(公告)日：2018-11-15

申请号：US15441331

申请日：2017-02-24

Applicant: Universal Display Corporation

Inventor： William E. QUINN ,  Gregory McGRAW ,  Siddharth HARIKRISHNA MOHAN ,  Matthew KING ,  Elliot H. HARTFORD, Jr.

IPC: H01L51/56 ,  B05B15/02 ,  C23C14/12 ,  C23C14/22

CPC classification number: H01L51/56 ,  B05B12/18 ,  B05B15/555 ,  B41J2/1433 ,  B41J2/162 ,  B41J2/1628 ,  B41J2/1631 ,  B41J2/1642 ,  B41J2002/14475 ,  C23C14/12 ,  C23C14/22 ,  C23C14/228 ,  C23C14/24 ,  H01L51/0004 ,  H01L51/0005 ,  H01L51/50

Abstract: Embodiments of the disclosed subject matter provide a nozzle assembly and method of making the same, the nozzle assembly including a first aperture formed on a first aperture plate to eject a carrier gas flow having organic vapor onto a substrate in a deposition chamber, second apertures formed on a second aperture plate disposed adjacent to the first aperture to form a vacuum aperture, where the first aperture plate and the second aperture plate are separated by a first separator plate, third apertures formed on a third aperture plate to eject purge gas that are disposed adjacent to the second aperture plate, where the second aperture plate and the third aperture plate are separated by second separator plate, and a third separator plate is disposed adjacent to the one or more third aperture plates to form a gas channel in the one or more third aperture plates.

公开(公告)号：US20240360542A1

公开(公告)日：2024-10-31

申请号：US18765683

申请日：2024-07-08

Applicant: Universal Display Corporation

Inventor： Matthew KING ,  Gregg KOTTAS ,  Gregory MCGRAW ,  William E. QUINN

IPC: C23C14/24 ,  B05B1/00 ,  B05B1/24 ,  B05B1/28 ,  B41J2/005 ,  B41J2/14 ,  C23C14/12 ,  H10K50/11 ,  H10K71/00 ,  H10K71/18 ,  H10K101/10

CPC classification number: C23C14/24 ,  B05B1/005 ,  B05B1/24 ,  B05B1/28 ,  B41J2/005 ,  B41J2/14 ,  B41J2/14145 ,  C23C14/12 ,  H10K71/00 ,  H10K50/11 ,  H10K71/18 ,  H10K2101/10

Abstract: Embodiments of the disclosed subject matter provide an apparatus having a device with a micronozzle array disposed on a micro-fabricated fluidic die. The device may include a first gas distribution plate and a second opposing plate, where the micro-fabricated fluidic die is disposed between the first gas distribution plate and the second opposing plate, wherein the first gas distribution plate is irreversibly joined to the micronozzle array with a seal that is gas-tight, and where the first gas distribution plate includes a plurality of sealed flow paths. A manifold may be reversibly joined to the first gas distribution plate, where the micro-fabricated fluidic die and the first gas distribution plate and the second opposing plate are disposed between the manifold. A thermally conductive plate may have at least one window that provides a clearance fit for the device across a range of motion relative to the thermally conductive plate.

公开(公告)号：US20230363244A1

公开(公告)日：2023-11-09

申请号：US18311550

申请日：2023-05-03

Applicant: Universal Display Corporation

Inventor： Steven Shigeki AOCHI ,  Vadim BOGUSLAVSKIY ,  Evan HERNANDEZ ,  Kent Khuong NGUYEN ,  Michael FILIPPI ,  Matthew KING ,  Daniel TOET

IPC: H10K71/13 ,  H10K71/40 ,  H10K71/20 ,  H10K85/30

CPC classification number: H10K71/13 ,  H10K71/40 ,  H10K71/221 ,  H10K85/341 ,  H10K85/324

Abstract: An organic vapor jet printing (OVJP) device is provided that includes an OVJP print die having one or more delivery channels to deliver organic material and carrier gas to a region below the print die and one or more exhaust channels to remove material from below the print die. A directly-heated delivery line connected to the one or more delivery channels and a source of the organic material external to the OVJP print die includes a resistive material and a plurality of electrical connections to the resistive material. When a current is applied to the resistive material via the plurality of electrical connections, the resistive material heats the interior of the directly-heated delivery line.

公开(公告)号：US20230189626A1

公开(公告)日：2023-06-15

申请号：US18101416

申请日：2023-01-25

Applicant: Universal Display Corporation

Inventor： Gregory MCGRAW ,  William E. QUINN ,  Gregg KOTTAS ,  Matthew KING ,  Benjamin SWEDLOVE ,  Tomasz TROJACKI

IPC: H10K71/00 ,  C23C16/455 ,  C23C16/44 ,  H10K71/13

CPC classification number: H10K71/00 ,  C23C16/4412 ,  C23C16/4551 ,  C23C16/45563 ,  H10K71/13

Abstract: Devices for deposition of material via organic vapor jet printing (OVJP) and similar techniques are provided. The depositor includes delivery channels ending in delivery apertures, where the delivery channels are flared as they approach the delivery apertures, and/or have a trapezoidal shape. The depositors are suitable for fabricating OLEDs and OLED components and similar devices.

公开(公告)号：US20210355575A1

公开(公告)日：2021-11-18

申请号：US17389694

申请日：2021-07-30

Applicant: Universal Display Corporation

Inventor： William E. QUINN ,  Gregory MCGRAW ,  Matthew KING ,  Gregg KOTTAS

IPC: C23C14/22 ,  C23C14/12 ,  C23C14/24

Abstract: Embodiments of the disclosed subject matter provide a vapor distribution manifold that ejects organic vapor laden gas into a chamber and withdraws chamber gas, where vapor ejected from the manifold is incident on, and condenses onto, a deposition surface within the chamber that moves relative to one or more print heads in a direction orthogonal to a platen normal and a linear extent of the manifold. The volumetric flow of gas withdrawn by the manifold from the chamber may be greater than the volumetric flow of gas injected into the chamber by the manifold. The net outflow of gas from the chamber through the manifold may prevent organic vapor from diffusing beyond the extent of the gap between the manifold and deposition surface. The manifold may be configured so that long axes of delivery and exhaust apertures are perpendicular to a print direction.