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公开(公告)号：US08617352B2
公开(公告)日：2013-12-31
申请号：US12968607
申请日：2010-12-15
申请人： Chun Christine Dong , Wayne Thomas McDermott , Alexander Schwarz , Gregory Khosrov Arslanian , Richard E. Patrick , Gary A. Orbeck , Donald A. Seccombe, Jr.
发明人： Chun Christine Dong , Wayne Thomas McDermott , Alexander Schwarz , Gregory Khosrov Arslanian , Richard E. Patrick , Gary A. Orbeck , Donald A. Seccombe, Jr.
IPC分类号： C23F1/08
CPC分类号： H01J37/32431 , B23K1/008 , B23K1/206 , B23K35/268 , B23K35/38 , C23G5/00 , H01L21/31116 , H01L21/67069 , H01L2924/0002 , H01L2924/00
摘要： An apparatus and a method comprising same for removing metal oxides from a substrate surface are disclosed herein. In one particular embodiment, the apparatus comprises an electrode assembly that has a housing that is at least partially comprised of an insulating material and having an internal volume and at least one fluid inlet that is in fluid communication with the internal volume; a conductive base connected to the housing comprising a plurality of conductive tips that extend therefrom into a target area and a plurality of perforations that extend therethrough and are in fluid communication with the internal volume to allow for a passage of a gas mixture comprising a reducing gas.
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12.发明授权Apparatus for removal of surface oxides via fluxless technique involving electron attachment and remote ion generation 有权用于通过无电子技术去除表面氧化物的设备，涉及电子附着和远程离子生成公开(公告)号：US08593778B2
公开(公告)日：2013-11-26
申请号：US13151883
申请日：2011-06-02
IPC分类号： H01T23/00
CPC分类号： C23G5/00 , B08B7/00 , B23K1/0016 , B23K1/008 , B23K1/012 , B23K1/206 , H05K3/3489 , H05K2203/095
摘要： The present invention provides a method and apparatus for the dry fluxing of at least one component and/or solder surface via electron attachment. In one embodiment, there is provided a method for removing oxides from the surface of a component comprising: providing a component on a substrate wherein the substrate is grounded or has a positive electrical potential to form a target assembly; passing a gas mixture comprising a reducing gas through an ion generator comprising a first and a second electrode; supplying an amount of voltage to at least one of the first and second electrodes sufficient to generate electrons wherein the electrons attach to at least a portion of the reducing gas and form a negatively charged reducing gas; and contacting the target assembly with the negatively charged reducing gas to reduce the oxides on the component.
摘要翻译： 本发明提供了一种用于通过电子附件干燥熔化至少一种组分和/或焊料表面的方法和装置。 在一个实施方案中，提供了从组分表面去除氧化物的方法，包括：在基底上提供组分，其中所述基底接地或具有正电位以形成靶组件; 使包含还原气体的气体混合物通过包括第一和第二电极的离子发生器; 向所述第一和第二电极中的至少一个电极供应足以产生电子的电压，其中所述电子附着到所述还原气体的至少一部分并形成带负电荷的还原气体; 并将目标组件与带负电荷的还原气体接触以减少部件上的氧化物。
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13.发明授权Removal of surface oxides by electron attachment for wafer bumping applications 有权通过电子附着去除晶片碰撞应用中的表面氧化物公开(公告)号：US08119016B2
公开(公告)日：2012-02-21
申请号：US12042055
申请日：2008-03-04
申请人： Chun Christine Dong , Wayne Thomas McDermott , Alexander Schwarz , Gregory Khosrov Arslanian , Richard E. Patrick
发明人： Chun Christine Dong , Wayne Thomas McDermott , Alexander Schwarz , Gregory Khosrov Arslanian , Richard E. Patrick
IPC分类号： B23K1/20
CPC分类号： H01J37/32431 , B23K1/008 , B23K1/206 , B23K35/268 , B23K35/38 , C23G5/00 , H01L21/31116 , H01L21/67069 , H01L2924/0002 , H01L2924/00
摘要： The present invention relates to a method for removing metal oxides from a substrate surface. In one particular embodiment, the method comprises: providing a substrate, a first, and a second electrode that reside within a target area; passing a gas mixture comprising a reducing gas through the target area; supplying an amount of energy to the first and/or the second electrode to generate electrons within the target area wherein at least a portion of the electrons attach to a portion of the reducing gas and form a negatively charged reducing gas; and contacting the substrate with the negatively charged reducing gas to reduce the metal oxides on the surface of the substrate.
摘要翻译： 本发明涉及从衬底表面去除金属氧化物的方法。 在一个特定实施例中，该方法包括：提供驻留在目标区域内的衬底，第一和第二电极; 将包含还原气体的气体混合物通过所述目标区域; 向第一和/或第二电极提供一定量的能量以在目标区域内产生电子，其中至少一部分电子附着到一部分还原气体并形成带负电荷的还原气体; 并使基板与带负电荷的还原气体接触以减少基板表面上的金属氧化物。
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14.发明授权公开(公告)号：US07883602B2
公开(公告)日：2011-02-08
申请号：US12188667
申请日：2008-08-08
申请人： Chun Christine Dong , Wayne Thomas McDermott , Alexander Schwarz , Gregory Khosrov Arslanian , Richard E. Patrick , Gary A. Orbeck , Donald A. Seccombe, Jr.
发明人： Chun Christine Dong , Wayne Thomas McDermott , Alexander Schwarz , Gregory Khosrov Arslanian , Richard E. Patrick , Gary A. Orbeck , Donald A. Seccombe, Jr.
CPC分类号： H01J37/32431 , B23K1/008 , B23K1/206 , B23K35/268 , B23K35/38 , C23G5/00 , H01L21/31116 , H01L21/67069 , H01L2924/0002 , H01L2924/00
摘要： An apparatus and a method comprising same for removing metal oxides from a substrate surface are disclosed herein. In one particular embodiment, the apparatus comprises an electrode assembly that has a housing that is at least partially comprised of an insulating material and having an internal volume and at least one fluid inlet that is in fluid communication with the internal volume; a conductive base connected to the housing comprising a plurality of conductive tips that extend therefrom into a target area and a plurality of perforations that extend therethrough and are in fluid communication with the internal volume to allow for a passage of a gas mixture comprising a reducing gas.
摘要翻译： 本文公开了一种用于从衬底表面去除金属氧化物的装置和方法。 在一个特定实施例中，该装置包括电极组件，该电极组件至少部分地由绝缘材料构成并具有内部容积和与内部容积流体连通的至少一个流体入口的壳体; 连接到壳体的导电基座包括从其延伸到目标区域中的多个导电尖端和穿过其延伸并与内部体积流体连通的多个穿孔，以允许包含还原气体的气体混合物通过 。
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15.发明授权Apparatus and method for removal of surface oxides via fluxless technique involving electron attachment and remote ion generation 有权通过涉及电子附着和远程离子生成的无通量技术去除表面氧化物的装置和方法公开(公告)号：US07977598B2
公开(公告)日：2011-07-12
申请号：US10819277
申请日：2004-04-07
IPC分类号： B23K1/00
CPC分类号： C23G5/00 , B08B7/00 , B23K1/0016 , B23K1/008 , B23K1/012 , B23K1/206 , H05K3/3489 , H05K2203/095
摘要： The present invention provides a method and apparatus for the dry fluxing of at least one component and/or solder surface via electron attachment. In one embodiment, there is provided a method for removing oxides from the surface of a component comprising: providing a component on a substrate wherein the substrate is grounded or has a positive electrical potential to form a target assembly; passing a gas mixture comprising a reducing gas through an ion generator comprising a first and a second electrode; supplying an amount of voltage to at least one of the first and second electrodes sufficient to generate electrons wherein the electrons attach to at least a portion of the reducing gas and form a negatively charged reducing gas; and contacting the target assembly with the negatively charged reducing gas to reduce the oxides on the component.
摘要翻译： 本发明提供了一种用于通过电子附件干燥熔化至少一种组分和/或焊料表面的方法和装置。 在一个实施方案中，提供了从组分表面去除氧化物的方法，包括：在基底上提供组分，其中所述基底接地或具有正电位以形成靶组件; 使包含还原气体的气体混合物通过包括第一和第二电极的离子发生器; 向所述第一和第二电极中的至少一个电极供应足以产生电子的电压，其中所述电子附着到所述还原气体的至少一部分并形成带负电荷的还原气体; 并将目标组件与带负电荷的还原气体接触以减少部件上的氧化物。
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16.发明申请公开(公告)号：US20110094679A1
公开(公告)日：2011-04-28
申请号：US12968607
申请日：2010-12-15
申请人： Chun Christine Dong , Wayne Thomas McDermott , Alexander Schwarz , Gregory Khosrov Arslanian , Richard E. Patrick , Gary A. Orbeck , Donald A. Seccombe, JR.
发明人： Chun Christine Dong , Wayne Thomas McDermott , Alexander Schwarz , Gregory Khosrov Arslanian , Richard E. Patrick , Gary A. Orbeck , Donald A. Seccombe, JR.
IPC分类号： C23F1/08
CPC分类号： H01J37/32431 , B23K1/008 , B23K1/206 , B23K35/268 , B23K35/38 , C23G5/00 , H01L21/31116 , H01L21/67069 , H01L2924/0002 , H01L2924/00
摘要： An apparatus and a method comprising same for removing metal oxides from a substrate surface are disclosed herein. In one particular embodiment, the apparatus comprises an electrode assembly that has a housing that is at least partially comprised of an insulating material and having an internal volume and at least one fluid inlet that is in fluid communication with the internal volume; a conductive base connected to the housing comprising a plurality of conductive tips that extend therefrom into a target area and a plurality of perforations that extend therethrough and are in fluid communication with the internal volume to allow for a passage of a gas mixture comprising a reducing gas.
摘要翻译： 本文公开了一种用于从衬底表面去除金属氧化物的装置和方法。 在一个特定实施例中，该装置包括电极组件，该电极组件至少部分地由绝缘材料构成并具有内部容积和与内部容积流体连通的至少一个流体入口的壳体; 连接到壳体的导电基座包括从其延伸到目标区域中的多个导电尖端和穿过其延伸并与内部体积流体连通的多个穿孔，以允许包含还原气体的气体混合物通过 。
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17.发明申请Apparatus for Removal of Surface Oxides via Fluxless Technique Involving Electron Attachment and Remote Ion Generation 有权用于通过无电极技术去除表面氧化物的装置，涉及电子附件和远程离子生成公开(公告)号：US20110229377A1
公开(公告)日：2011-09-22
申请号：US13151883
申请日：2011-06-02
IPC分类号： B01J19/08
CPC分类号： C23G5/00 , B08B7/00 , B23K1/0016 , B23K1/008 , B23K1/012 , B23K1/206 , H05K3/3489 , H05K2203/095
摘要： The present invention provides a method and apparatus for the dry fluxing of at least one component and/or solder surface via electron attachment. In one embodiment, there is provided a method for removing oxides from the surface of a component comprising: providing a component on a substrate wherein the substrate is grounded or has a positive electrical potential to form a target assembly; passing a gas mixture comprising a reducing gas through an ion generator comprising a first and a second electrode; supplying an amount of voltage to at least one of the first and second electrodes sufficient to generate electrons wherein the electrons attach to at least a portion of the reducing gas and form a negatively charged reducing gas; and contacting the target assembly with the negatively charged reducing gas to reduce the oxides on the component.
摘要翻译： 本发明提供了一种用于通过电子附件干燥熔化至少一种组分和/或焊料表面的方法和装置。 在一个实施方案中，提供了从组分表面去除氧化物的方法，包括：在基底上提供组分，其中所述基底接地或具有正电位以形成靶组件; 使包含还原气体的气体混合物通过包括第一和第二电极的离子发生器; 向所述第一和第二电极中的至少一个电极供应足以产生电子的电压，其中所述电子附着到所述还原气体的至少一部分并形成带负电荷的还原气体; 并将目标组件与带负电荷的还原气体接触以减少部件上的氧化物。
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18.发明授权Removal of surface oxides by electron attachment for wafer bumping applications 有权通过电子附着去除晶片碰撞应用中的表面氧化物公开(公告)号：US07387738B2
公开(公告)日：2008-06-17
申请号：US10425405
申请日：2003-04-28
申请人： Chun Christine Dong , Wayne Thomas McDermott , Alexander Schwarz , Gregory Khosrov Arslanian , Richard E. Patrick
发明人： Chun Christine Dong , Wayne Thomas McDermott , Alexander Schwarz , Gregory Khosrov Arslanian , Richard E. Patrick
IPC分类号： B23H3/00
CPC分类号： H01J37/32431 , B23K1/008 , B23K1/206 , B23K35/268 , B23K35/38 , C23G5/00 , H01L21/31116 , H01L21/67069 , H01L2924/0002 , H01L2924/00
摘要： The present invention relates to a method for removing metal oxides from a substrate surface. In one particular embodiment, the method comprises: providing a substrate, a first, and a second electrode that reside within a target area; passing a gas mixture comprising a reducing gas through the target area; supplying an amount of energy to the first and/or the second electrode to generate electrons within the target area wherein at least a portion of the electrons attach to a portion of the reducing gas and form a negatively charged reducing gas; and contacting the substrate with the negatively charged reducing gas to reduce the metal oxides on the surface of the substrate.
摘要翻译： 本发明涉及从衬底表面去除金属氧化物的方法。 在一个特定实施例中，该方法包括：提供驻留在目标区域内的衬底，第一和第二电极; 将包含还原气体的气体混合物通过所述目标区域; 向第一和/或第二电极提供一定量的能量以在目标区域内产生电子，其中至少一部分电子附着到一部分还原气体并形成带负电荷的还原气体; 并使基板与带负电荷的还原气体接触以减少基板表面上的金属氧化物。
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19.发明授权公开(公告)号：US07267727B2
公开(公告)日：2007-09-11
申请号：US10737458
申请日：2003-12-16
IPC分类号： B08B7/04
CPC分类号： H01L21/02052 , B08B3/12 , B08B7/0021 , C11D7/241 , C11D7/261 , C11D7/263 , C11D7/264 , C11D7/3209 , C11D7/3263 , C11D7/3281 , C11D7/5013 , C11D7/5022 , C11D11/007 , G03F1/82 , H01L21/31133 , H01L21/67057
摘要： Method for processing an article with a dense processing fluid in a processing chamber while applying ultrasonic energy during processing. The dense fluid may be generated in a separate pressurization vessel and transferred to the processing chamber, or alternatively may be generated directly in the processing chamber. A processing agent may be added to the pressurization vessel, to the processing chamber, or to the dense fluid during transfer from the pressurization vessel to the processing chamber. The ultrasonic energy may be generated continuously at a constant frequency or at variable frequencies. Alternatively, the ultrasonic energy may be generated intermittently.
摘要翻译： 在加工过程中施加超声波能量的同时，在处理室中处理具有致密加工流体的制品的方法。 致密流体可以在单独的加压容器中产生并转移到处理室，或者可以直接在处理室中产生。 在从加压容器转移到处理室的过程中，加压剂可以加入到加压容器中，或者加到致密流体中。 超声能量可以以恒定频率或以可变频率连续生成。 或者，可以间歇地产生超声波能量。
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20.发明授权公开(公告)号：US07201018B2
公开(公告)日：2007-04-10
申请号：US10753315
申请日：2004-01-09
申请人： Vladimir Yliy Gershtein , Alexander Schwarz , Wayne Thomas McDermott , John Frederick Cirucci , John Christopher Ivankovits
发明人： Vladimir Yliy Gershtein , Alexander Schwarz , Wayne Thomas McDermott , John Frederick Cirucci , John Christopher Ivankovits
CPC分类号： F17C7/04 , C01B32/50 , F04B15/08 , F04B19/24 , F04D7/00 , F17C6/00 , F17C7/02 , F17C2221/013 , F17C2223/0153 , F17C2223/035 , F17C2223/036
摘要： The invention relates to a process and apparatus for delivering an ultra high purity fluid comprising at least one component to a point of use at a required pressure without mechanical pumping. In one embodiment, a high purity feed comprising at least one component in gaseous or liquid form is charged into a vessel and at least partially converted to a solid phase source. As the feed is converted to a solid phase source, additional feed may be added until the vessel is at least substantially filled with a solid phase source or slush. Once filled, the solid phase source or slush may be isochorically heated whereby the solid phase source is converted to a product at an elevated pressure.
摘要翻译： 本发明涉及用于将包含至少一种组分的超高纯度流体在所需压力下输送到使用点而不进行机械泵送的方法和装置。 在一个实施方案中，将包含至少一种气态或液态组分的高纯度原料装入容器中，并至少部分转化成固相源。 当进料转化为固相源时，可以加入另外的进料，直到容器至少基本上用固相源或浆料填充。 一旦填充，固相源或浆液可以被等压加热，从而固相源在升高的压力下转化成产物。
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