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13 条记录 (耗时 0.045 秒)

    Method for removal of flux and other residue in dense fluid systems
    2.
    发明授权
    Method for removal of flux and other residue in dense fluid systems 失效
    在稠密流体系统中去除助焊剂和其他残留物的方法

    公开(公告)号：US07195676B2

    公开(公告)日：2007-03-27

    申请号：US10890502

    申请日：2004-07-13

    申请人： Wayne Thomas McDermott ,  Gene Everad Parris ,  Dean Van-John Roth ,  Hoshang Subawalla

    发明人： Wayne Thomas McDermott ,  Gene Everad Parris ,  Dean Van-John Roth ,  Hoshang Subawalla

    IPC分类号： C23G1/00

    CPC分类号： B08B7/0021 ,  B08B1/00 ,  B08B3/02 ,  B08B3/12 ,  Y10S134/902

    摘要： Method for removing flux residue and defluxing residue from an article using a dense processing fluid and a dense rinse fluid is disclosed herein. In one embodiment, there is provided a method comprising: introducing the article comprising contaminants into a processing chamber; contacting the article with a dense processing fluid comprising a dense fluid, at least one processing agent, and optionally a cosolvent to provide a partially treated article; and contacting the partially treated article with a dense rinse fluid comprising the dense fluid and optionally the cosolvent to provide a treated article wherein an agitation source is introducing during at least a portion of the first and/or the second contacting step.

    摘要翻译： 本文公开了使用致密加工流体和致密冲洗流体从制品中除去助熔剂残余物和脱硫残渣的方法。 在一个实施方案中，提供了一种方法，包括：将包含污染物的制品引入处理室; 使所述制品与包含致密流体，至少一种加工剂和任选的共溶剂的致密加工流体接触以提供部分处理的制品; 以及使所述部分处理的制品与包含所述致密流体和任选的共溶剂的致密冲洗流体接触以提供经处理的制品，其中在所述第一和/或所述第二接触步骤的至少一部分期间引入搅拌源。

    Processing of semiconductor components with dense processing fluids
    4.
    发明申请
    Processing of semiconductor components with dense processing fluids 审中-公开
    用密集加工液加工半导体元件

    公开(公告)号：US20080004194A1

    公开(公告)日：2008-01-03

    申请号：US11834800

    申请日：2007-08-07

    申请人： Wayne McDermott ,  Hoshang Subawalla ,  Andrew Johnson ,  Alexander Schwarz ,  Richard Ockovic

    发明人： Wayne McDermott ,  Hoshang Subawalla ,  Andrew Johnson ,  Alexander Schwarz ,  Richard Ockovic

    IPC分类号： C11D7/00

    CPC分类号： H01L21/6704 ,  H01L21/02101 ,  H01L21/31133

    摘要： Methods for generating a single-phase supercritical dense processing fluid have been disclosed. The single-phase supercritical dense processing fluid may be generated in a separate pressurization vessel and transferred to the processing chamber, or alternatively may be generated directly in the processing chamber. At least one processing agent is added to the pressurization vessel, or to the processing chamber, or to the single-phase supercritical dense fluid during transfer from the pressurization vessel to the processing chamber; to produce the single-phase supercritical dense processing fluid. Methods for processing an article with a single-phase supercritical dense processing fluid in a processing chamber are also disclosed.

    摘要翻译： 已经公开了生产单相超临界致密加工流体的方法。 单相超临界致密加工流体可以在单独的加压容器中产生并转移到处理室，或者可以直接在处理室中产生。 在从加压容器到处理室的转移期间，至少一种加工剂被加入到加压容器或处理室中，或加到单相超临界稠密流体中; 生产单相超临界浓缩加工液。 还公开了在处理室中用单相超临界致密加工流体处理制品的方法。

    Dense fluid compositions and processes using same for article treatment and residue removal
    6.
    发明申请
    Dense fluid compositions and processes using same for article treatment and residue removal 审中-公开
    密集流体组合物和使用它们的方法用于制品处理和残留物去除

    公开(公告)号：US20060081273A1

    公开(公告)日：2006-04-20

    申请号：US10969595

    申请日：2004-10-20

    申请人： Wayne McDermott ,  Hoshang Subawalla ,  Madhukar Rao ,  Dean Roth ,  Keith Fabregas

    发明人： Wayne McDermott ,  Hoshang Subawalla ,  Madhukar Rao ,  Dean Roth ,  Keith Fabregas

    IPC分类号： B08B3/00

    CPC分类号： B08B7/0021 ,  G03F7/422 ,  H01L21/02057 ,  H01L21/02063 ,  H01L21/02101 ,  H05K3/26

    摘要： A method for removing contaminants from an article is described herein. In one embodiment, there is provided a method comprising loosening at least a portion of the contaminants by treating the article with a treatment method involving a processing fluid and/or dense processing fluid to provide a partially treated article comprising loosened contaminants; contacting the partially treated article with a dense rinse fluid comprising a dense fluid, optionally a co-solvent, and optionally an entrainer to remove liquid-based contaminants; and removing at least a portion of the loosened contaminants by exposing the partially treated article with at least one exposure method to provide a treated article wherein the selection of the at least one exposure method depends upon whether the loosened contaminants are wet or dry.

    摘要翻译： 本文描述了从制品中除去污染物的方法。 在一个实施方案中，提供了一种方法，包括通过用涉及加工流体和/或致密加工流体的处理方法处理制品来松散至少一部分污染物，以提供包含松散的污染物的部分处理的制品; 使部分处理的制品与致密的流体，任选的助溶剂和任选的夹带剂一起使用，以除去液体基的污染物; 以及通过用至少一种曝光方法暴露所述部分处理的制品来除去所述松散的污染物的至少一部分，以提供经处理的制品，其中所述至少一种曝光方法的选择取决于松散的污染物是湿的还是干的。