-
公开(公告)号：US08637820B2
公开(公告)日：2014-01-28
申请号：US13521254
申请日：2011-02-18
IPC分类号： H01J37/28 , H01J37/147 , H01J37/09 , H01J37/145
CPC分类号： H01J37/28 , H01J37/09 , H01J37/145 , H01J2237/1506 , H01J2237/1534 , H01J2237/2611
摘要： Provided is a high-resolution scanning electron microscope with minimal aberration, and equipped with an electro-optical configuration that can form a tilted beam having wide-angle polarization and a desired angle, without interfering with an electromagnetic lens. In the scanning electron microscope, an electromagnetic deflector (201) is disposed above a magnetic lens (207), and a control electrode (202) that accelerates or decelerates electrons is provided so at to overlap (in such a manner that the height positions overlap with respect to the vertical direction) with the electromagnetic deflector (201). In wide field polarization, electrodes are accelerated, and in tilted beam formation, electrons are decelerated.
摘要翻译： 提供了一种具有最小像差的高分辨率扫描电子显微镜，并且具有能够形成具有广角偏振和期望角度的倾斜光束而不干扰电磁透镜的电光结构。 在扫描电子显微镜中，电磁偏转器（201）设置在磁性透镜（207）的上方，并且设置使电子加速或减速的控制电极（202）重叠（以使得高度位置重叠 相对于垂直方向）与电磁偏转器（201）。 在宽场极化中，电极被加速，并且在倾斜的波束形成中，电子被减速。
-
公开(公告)号：US20110274341A1
公开(公告)日：2011-11-10
申请号：US13142316
申请日：2010-01-13
IPC分类号： G06K9/00
CPC分类号： G01B15/00 , H01J37/153 , H01J37/21 , H01J37/265 , H01J37/28 , H01J2237/1532 , H01J2237/216 , H01L22/12
摘要： In order to provide a charged beam device capable of obtaining a precise image of a sample surface pattern while improving the accuracy of automatic focus/astigmatism correction, there are provided an electron gun (1), a deflection control portion (8) which allows an electron beam to scan, a focus control portion (10) and an astigmatism correction portion (3) for the electron beam, an image processing portion (11), and a switching portion (9) which switches scan conditions when obtaining pattern information of the sample (1001) surface and scan conditions when performing the automatic focus/astigmatism correction, and a scan speed and scan procedures are switched between when obtaining the pattern information and when performing the automatic focus/astigmatism correction.
摘要翻译： 为了提供能够获得样品表面图案的精确图像的带电束装置，同时提高自动聚焦/像散校正的精度，提供了一种电子枪（1），偏转控制部分（8），其允许 电子束扫描，用于电子束的聚焦控制部分（10）和像散校正部分（3），图像处理部分（11）和切换部分（9），当获得图像信息 进行自动聚焦/像散校正时的样品（1001）表面和扫描条件，并且在获得图案信息和执行自动聚焦/散光校正时切换扫描速度和扫描程序。
-
公开(公告)号：US07655907B2
公开(公告)日：2010-02-02
申请号：US11704227
申请日：2007-02-09
IPC分类号： H01J37/26
CPC分类号： H01J37/265 , H01J37/28 , H01J2237/04735 , H01J2237/216 , H01J2237/2817
摘要： It is to provide a technology that can quickly process many measurement points on a substrate by a primary charged particle beam. In a control system, with respect to each measurement point (irradiation position of the primary charged particle beam) on a wafer, a calculator obtains a probability of a surface potential at a relevant measurement point that is obtained from a surface potential distribution function of the wafer and is stored in a data storage unit. Based on the probability, the calculator determines an amplitude of a set parameter (for example, retarding voltage) of charged particle optics at the relevant measurement point. Then the calculator checks the focus state of the primary charged particle beam by changing the set parameter in the range of the determined amplitude, and determines the set parameter to be used for measurement.
摘要翻译： 它是提供一种能够通过初级带电粒子束快速处理衬底上许多测量点的技术。 在控制系统中，对于晶片上的每个测量点（初级带电粒子束的照射位置），计算器获得从相对测量点的表面电位分布函数获得的相关测量点的表面电位的概率， 并存储在数据存储单元中。 基于概率，计算器确定相关测量点处的带电粒子光学器件的设定参数（例如延迟电压）的幅度。 然后，计算器通过在确定的幅度的范围内改变设定参数来检查主要带电粒子束的聚焦状态，并确定要用于测量的设定参数。
-
公开(公告)号：US08766183B2
公开(公告)日：2014-07-01
申请号：US13058712
申请日：2009-09-10
IPC分类号： H01J3/12 , H01J37/153
CPC分类号： H01J37/153 , H01J37/265 , H01J37/28 , H01J2237/004 , H01J2237/1532 , H01J2237/216 , H01J2237/221
摘要： The astigmatism control processing time is decreased to 1 second or less by improving the astigmatic difference measurement accuracy. A charged particle beam device includes: a stage on which a sample is loaded; a transport mechanism which carries the sample onto the stage; a charged particle beam optical system which irradiates the sample on the stage with a charged particle beam and detects secondary charged particles generated from the sample; and a controller which determines setup parameters for the charged particle beam optical system and controls the charged particle beam optical system. The controller registers and holds electro-optical system setup parameters for irradiation with a beam tilted from a normal line on the sample as the charged particle beam, compares observation images obtained by the tilted beam, measures the amount and direction of movement and calculates the amount of astigmatism correction from the amount of movement and the direction.
摘要翻译： 散光控制处理时间通过改善像散差测量精度而降低到1秒以下。 带电粒子束装置包括：加载样品的载物台; 将样品携带到舞台上的运送机构; 带电粒子束光学系统，其用带电粒子束照射台上的样品，并检测从样品产生的二次带电粒子; 以及控制器，其确定带电粒子束光学系统的设置参数并控制带电粒子束光学系统。 控制器注册并保持电子光学系统设置参数，用于照射来自样品上的法线的光束作为带电粒子束，比较通过倾斜光束获得的观察图像，测量移动量和移动方向， 从运动量和方向上矫正散光。
-
公开(公告)号：US08478021B2
公开(公告)日：2013-07-02
申请号：US13142316
申请日：2010-01-13
CPC分类号： G01B15/00 , H01J37/153 , H01J37/21 , H01J37/265 , H01J37/28 , H01J2237/1532 , H01J2237/216 , H01L22/12
摘要： In order to provide a charged beam device capable of obtaining a precise image of a sample surface pattern while improving the accuracy of automatic focus/astigmatism correction, there are provided an electron gun (1), a deflection control portion (8) which allows an electron beam to scan, a focus control portion (10) and an astigmatism correction portion (3) for the electron beam, an image processing portion (11), and a switching portion (9) which switches scan conditions when obtaining pattern information of the sample (1001) surface and scan conditions when performing the automatic focus/astigmatism correction, and a scan speed and scan procedures are switched between when obtaining the pattern information and when performing the automatic focus/astigmatism correction.
摘要翻译： 为了提供能够获得样品表面图案的精确图像的带电束装置，同时提高自动聚焦/像散校正的精度，提供了一种电子枪（1），偏转控制部分（8），其允许 电子束扫描，用于电子束的聚焦控制部分（10）和像散校正部分（3），图像处理部分（11）和切换部分（9），当获得图像信息 进行自动聚焦/像散校正时的样品（1001）表面和扫描条件，并且在获得图案信息和执行自动聚焦/散光校正时切换扫描速度和扫描程序。
-
公开(公告)号：US20110147586A1
公开(公告)日：2011-06-23
申请号：US13058712
申请日：2009-09-10
IPC分类号： H01J37/153 , G01N23/00
CPC分类号： H01J37/153 , H01J37/265 , H01J37/28 , H01J2237/004 , H01J2237/1532 , H01J2237/216 , H01J2237/221
摘要： The astigmatism control processing time is decreased to 1 second or less by improving the astigmatic difference measurement accuracy. A charged particle beam device includes: a stage on which a sample is loaded; a transport mechanism which carries the sample onto the stage; a charged particle beam optical system which irradiates the sample on the stage with a charged particle beam and detects secondary charged particles generated from the sample; and a controller which determines setup parameters for the charged particle beam optical system and controls the charged particle beam optical system. The controller registers and holds electro-optical system setup parameters for irradiation with a beam tilted from a normal line on the sample as the charged particle beam, compares observation images obtained by the tilted beam, measures the amount and direction of movement and calculates the amount of astigmatism correction from the amount of movement and the direction.
摘要翻译： 散光控制处理时间通过改善像散差测量精度而降低到1秒以下。 带电粒子束装置包括：加载样品的载物台; 将样品携带到舞台上的运送机构; 带电粒子束光学系统，其用带电粒子束照射台上的样品，并检测从样品产生的二次带电粒子; 以及控制器，其确定带电粒子束光学系统的设置参数并控制带电粒子束光学系统。 控制器注册并保持电子光学系统设置参数，用于用作为带电粒子束的样品上从法线上倾斜的光束照射，比较通过倾斜光束获得的观察图像，测量移动量和移动方向， 从运动量和方向上矫正散光。
-
17.发明授权公开(公告)号：US07679056B2
公开(公告)日：2010-03-16
申请号：US11687002
申请日：2007-03-16
CPC分类号： G01N23/2258 , H01J37/026 , H01J37/28 , H01J2237/0044 , H01J2237/0047 , H01J2237/204 , H01J2237/221 , H01J2237/2817 , H01L21/67207 , H01L21/67253
摘要： The present invention provides a pattern inspection technique that enables measurement and inspection of a fine pattern by a charged particle beam to be performed with high throughput. A metrology system of fine pattern according to the pattern inspection technique has: a the column that includes a charged particle source, an electron optics for scanning a desired observation area on a sample with a charged particle beam emitted from the charged particle source, and a detector for detecting charged particles generated secondarily from the sample scanned by the charged particle beam; information processing means for measuring information about geometry of a pattern formed on the sample based on information on the intensity of the charged particles obtained by the detector; and a sample introduction unit for introducing the sample into the inside of the column; wherein a charge neutralizer unit for generating ions and charge neutralizing the sample with the ions and surface potential measuring means for measuring a surface potential of the sample surface are provided on a path that is inside the sample introduction unit and transports the sample to the column.
摘要翻译： 本发明提供一种图案检查技术，其能够通过以高产量进行的带电粒子束来测量和检查精细图案。 根据图案检查技术的精细图案的计量系统具有：包括带电粒子源的列，用于从带电粒子源发射的带电粒子束扫描样品上的期望观察区域的电子光学器件，以及 检测器，用于检测由带电粒子束扫描的样品二次产生的带电粒子; 信息处理装置，用于根据关于由检测器获得的带电粒子的强度的信息来测量关于样品上形成的图案的几何形状的信息; 以及用于将样品引入柱内的样品引入单元; 其中，用于产生离子的电荷中和装置，用于测量样品表面电位的表面电位测量装置的离子和表面电位测量装置，并在样品引入单元内部的路径上传送样品至柱。
-
公开(公告)号：US20070272858A1
公开(公告)日：2007-11-29
申请号：US11704227
申请日：2007-02-09
IPC分类号： G01N23/22
CPC分类号： H01J37/265 , H01J37/28 , H01J2237/04735 , H01J2237/216 , H01J2237/2817
摘要： It is to provide a technology that can quickly process many measurement points on a substrate by a primary charged particle beam. In a control system, with respect to each measurement point (irradiation position of the primary charged particle beam) on a wafer, a calculator obtains a probability of a surface potential at a relevant measurement point that is obtained from a surface potential distribution function of the wafer and is stored in a data storage unit. Based on the probability, the calculator determines an amplitude of a set parameter (for example, retarding voltage) of charged particle optics at the relevant measurement point. Then the calculator checks the focus state of the primary charged particle beam by changing the set parameter in the range of the determined amplitude, and determines the set parameter to be used for measurement.
摘要翻译： 它是提供一种能够通过初级带电粒子束快速处理衬底上许多测量点的技术。 在控制系统中，对于晶片上的每个测量点（初级带电粒子束的照射位置），计算器获得从相对测量点的表面电位分布函数获得的相关测量点的表面电位的概率， 并存储在数据存储单元中。 基于概率，计算器确定相关测量点处的带电粒子光学器件的设定参数（例如延迟电压）的幅度。 然后，计算器通过在确定的幅度的范围内改变设定参数来检查主要带电粒子束的聚焦状态，并确定要用于测量的设定参数。
-
19.发明申请公开(公告)号：US20070221844A1
公开(公告)日：2007-09-27
申请号：US11687002
申请日：2007-03-16
CPC分类号： G01N23/2258 , H01J37/026 , H01J37/28 , H01J2237/0044 , H01J2237/0047 , H01J2237/204 , H01J2237/221 , H01J2237/2817 , H01L21/67207 , H01L21/67253
摘要： The present invention provides a pattern inspection technique that enables measurement and inspection of a fine pattern by a charged particle beam to be performed with high throughput. A metrology system of fine pattern according to the pattern inspection technique has: a the column that includes a charged particle source, an electron optics for scanning a desired observation area on a sample with a charged particle beam emitted from the charged particle source, and a detector for detecting charged particles generated secondarily from the sample scanned by the charged particle beam; information processing means for measuring information about geometry of a pattern formed on the sample based on information on the intensity of the charged particles obtained by the detector; and a sample introduction unit for introducing the sample into the inside of the column; wherein a charge neutralizer unit for generating ions and charge neutralizing the sample with the ions and surface potential measuring means for measuring a surface potential of the sample surface are provided on a path that is inside the sample introduction unit and transports the sample to the column.
摘要翻译： 本发明提供一种图案检查技术，其能够通过以高产量进行的带电粒子束来测量和检查精细图案。 根据图案检查技术的精细图案的计量系统具有：包括带电粒子源的列，用于从带电粒子源发射的带电粒子束扫描样品上的期望观察区域的电子光学器件，以及 检测器，用于检测由带电粒子束扫描的样品二次产生的带电粒子; 信息处理装置，用于根据关于由检测器获得的带电粒子的强度的信息来测量关于样品上形成的图案的几何形状的信息; 以及用于将样品引入柱内的样品引入单元; 其中，用于产生离子的电荷中和装置，用于测量样品表面电位的表面电位测量装置的离子和表面电位测量装置，并在样品引入单元内部的路径上传送样品至柱。
-
公开(公告)号：US20120286158A1
公开(公告)日：2012-11-15
申请号：US13521254
申请日：2011-02-18
CPC分类号： H01J37/28 , H01J37/09 , H01J37/145 , H01J2237/1506 , H01J2237/1534 , H01J2237/2611
摘要： Provided is a high-resolution scanning electron microscope with minimal aberration, and equipped with an electro-optical configuration that can form a tilted beam having wide-angle polarization and a desired angle, without interfering with an electromagnetic lens. In the scanning electron microscope, an electromagnetic deflector (201) is disposed above a magnetic lens (207), and a control electrode (202) that accelerates or decelerates electrons is provided so at to overlap (in such a manner that the height positions overlap with respect to the vertical direction) with the electromagnetic deflector (201). In wide field polarization, electrodes are accelerated, and in tilted beam formation, electrons are decelerated.
摘要翻译： 提供了一种具有最小像差的高分辨率扫描电子显微镜，并且具有能够形成具有广角偏振和期望角度的倾斜光束而不干扰电磁透镜的电光结构。 在扫描电子显微镜中，电磁偏转器（201）设置在磁性透镜（207）的上方，并且设置使电子加速或减速的控制电极（202）重叠（以使得高度位置重叠 相对于垂直方向）与电磁偏转器（201）。 在宽场极化中，电极被加速，并且在倾斜的波束形成中，电子被减速。
-
-
-
-
-
-
-
-
-
搜索结果
85 条记录 (耗时 0.024 秒)
