Dual-view display panel structure and method for producing the same
    11.
    发明授权
    Dual-view display panel structure and method for producing the same 有权
    双视图显示面板结构及其制造方法

    公开(公告)号:US08508698B2

    公开(公告)日:2013-08-13

    申请号:US12250283

    申请日:2008-10-13

    CPC分类号: G02F1/1333 G02F1/133512

    摘要: A dual view display structure and a method for producing the same are provided. First, a display panel is provided. Then, a patterned barrier layer is formed on a transparent substrate. The transparent substrate with the patterned barrier layer is attached to the display panel. Because there is a gap between the display panel and the patterned barrier layer, a liquid transparent material is injected into the gap to form a transparent material layer to fill the gap. The invention can not only increase the viewing angles of the dual view display, but also increase the production yield.

    摘要翻译: 提供双视图显示结构及其制造方法。 首先,提供显示面板。 然后,在透明基板上形成图案化阻挡层。 具有图案化阻挡层的透明基板附接到显示面板。 由于在显示面板和图案化阻挡层之间存在间隙,液体透明材料被注入到间隙中以形成透明材料层以填充间隙。 本发明不仅可以增加双视图显示的视角,而且可以提高产量。

    APPARATUS AND METHOD FOR REDUCING PHOTO LEAKAGE CURRENT FOR TFT LCD
    12.
    发明申请
    APPARATUS AND METHOD FOR REDUCING PHOTO LEAKAGE CURRENT FOR TFT LCD 审中-公开
    用于降低TFT LCD的照相漏电流的装置和方法

    公开(公告)号:US20120126235A1

    公开(公告)日:2012-05-24

    申请号:US13365395

    申请日:2012-02-03

    IPC分类号: H01L33/08

    摘要: In one aspect of the invention, the method of forming a TFT array panel includes forming a patterned first conductive layer on a substrate, forming a gate insulating layer on the patterned first conductive layer and the substrate, forming a patterned semiconductor layer on the gate insulating layer, forming a patterned second conductive layer, forming a patterned passivation layer on the patterned second conductive layer and the substrate, and forming a patterned transparent conductive layer on the patterned passivation layer.

    摘要翻译: 在本发明的一个方面中,形成TFT阵列面板的方法包括在衬底上形成图案化的第一导电层,在图案化的第一导电层和衬底上形成栅极绝缘层,在栅绝缘层上形成图案化的半导体层 形成图案化的第二导电层,在图案化的第二导电层和衬底上形成图案化的钝化层,以及在图案化的钝化层上形成图案化的透明导电层。

    APPARATUS AND METHOD FOR REDUCING PHOTO LEAKAGE CURRENT FOR TFT LCD
    14.
    发明申请
    APPARATUS AND METHOD FOR REDUCING PHOTO LEAKAGE CURRENT FOR TFT LCD 有权
    用于降低TFT LCD的照相漏电流的装置和方法

    公开(公告)号:US20090101913A1

    公开(公告)日:2009-04-23

    申请号:US11873674

    申请日:2007-10-17

    IPC分类号: H01L33/00 H01L21/84

    摘要: A method of forming a thin film transistor (TFT) array panel, comprising the steps of: (i) forming a patterned first conductive layer, which includes a gate line and a shielding portion, on a substrate, (ii) forming a gate insulating layer on the patterned first conductive layer and the substrate, (iii) forming a patterned semiconductor layer on the gate insulating layer, (iv) forming a patterned second conductive layer, which includes a source electrode, and a drain electrode on the patterned semiconductor layer, and a data line that is electrically connected to the source electrode, (v) forming a patterned passivation layer on the patterned second conductive layer and the substrate, and (vi) forming a patterned transparent conductive layer on the patterned passivation layer.

    摘要翻译: 一种形成薄膜晶体管(TFT)阵列面板的方法,包括以下步骤:(i)在衬底上形成包括栅极线和屏蔽部分的图案化第一导电层,(ii)形成栅极绝缘 (iii)在栅极绝缘层上形成图案化的半导体层,(iv)在图案化的半导体层上形成图案化的第二导电层,其包括源电极和漏电极 以及电连接到所述源电极的数据线,(v)在所述图案化的第二导电层和所述衬底上形成图案化钝化层,以及(vi)在所述图案化钝化层上形成图案化的透明导电层。

    METHOD OF FABRICATING THIN FILM TRANSISTOR
    17.
    发明申请
    METHOD OF FABRICATING THIN FILM TRANSISTOR 有权
    薄膜晶体管的制作方法

    公开(公告)号:US20070275511A1

    公开(公告)日:2007-11-29

    申请号:US11467940

    申请日:2006-08-29

    IPC分类号: H01L21/84

    CPC分类号: H01L29/66765 H01L29/458

    摘要: A method for fabricating a thin film transistor is provided. A conductive layer is formed on a substrate. A patterned mask is formed on the conductive layer to cover a predetermined thin film transistor (TFT) area, and at least one portion of the conductive layer exposed by the patterned mask are removed. A laser is applied to form a laser hole in the patterned mask to expose a portion of the conductive layer and the laser hole substantially corresponds to a channel region of the predetermined TFT area. The exposed conductive layer is etched to form source and drain electrodes on opposite sides of the channel region.

    摘要翻译: 提供一种制造薄膜晶体管的方法。 在基板上形成导电层。 在导电层上形成图案化掩模以覆盖预定的薄膜晶体管(TFT)区域,并且去除由图案化掩模暴露的导电层的至少一部分。 施加激光以在图案化掩模中形成激光孔,以暴露导电层的一部分,并且激光孔基本对应于预定TFT区域的沟道区域。 蚀刻暴露的导电层以在沟道区域的相对侧上形成源极和漏极。

    Methods for fabricating thin film transistors
    18.
    发明授权
    Methods for fabricating thin film transistors 有权
    制造薄膜晶体管的方法

    公开(公告)号:US07157323B2

    公开(公告)日:2007-01-02

    申请号:US11142930

    申请日:2005-06-02

    摘要: Fabrication methods for thin film transistors. A metal gate stack structure is formed on an insulating substrate. The substrate is performed using thermal annealing to create an oxide layer on the sidewalls of the metal gate stack structure. A gate insulating layer is formed on the substrate covering the metal gate stack structure. A semiconductor layer is formed on the gate insulating layer. A source/drain layer is formed on the semiconductor.

    摘要翻译: 薄膜晶体管的制造方法。 在绝缘基板上形成金属栅堆叠结构。 使用热退火进行衬底,以在金属栅极堆叠结构的侧壁上产生氧化物层。 在覆盖金属栅堆叠结构的基板上形成栅极绝缘层。 在栅极绝缘层上形成半导体层。 在半导体上形成源极/漏极层。

    THIN FILM TRANSISTOR AND METHOD OF MAKING THE SAME
    19.
    发明申请
    THIN FILM TRANSISTOR AND METHOD OF MAKING THE SAME 审中-公开
    薄膜晶体管及其制造方法

    公开(公告)号:US20060124930A1

    公开(公告)日:2006-06-15

    申请号:US10908077

    申请日:2005-04-27

    IPC分类号: H01L31/0376 H01L29/04

    摘要: A thin film transistor is characterized by having an island-in structure having a semiconductor layer with a channel region, a bottom heavily-doped semiconductor layer, and a top heavily-doped semiconductor layer. The bottom heavily-doped semiconductor layer is positioned on two opposite sides of the surface of the semiconductor layer beyond the channel region. The top heavily-doped semiconductor layer, positioned on the bottom heavily-doped semiconductor layer, covers two opposite side walls of the bottom heavily-doped semiconductor layer and the semiconductor layer so that current leakage from the drain electrode to the source electrode is prevented.

    摘要翻译: 薄膜晶体管的特征在于具有岛状结构,其具有具有沟道区的半导体层,底部重掺杂半导体层和顶部重掺杂半导体层。 底部重掺杂半导体层位于超过沟道区的半导体层表面的相对两侧。 位于底部重掺杂半导体层上的顶部重掺杂半导体层覆盖底部重掺杂半导体层和半导体层的两个相对的侧壁,从而防止从漏电极到源电极的电流泄漏。

    Thin film transistors and fabrication methods thereof
    20.
    发明申请
    Thin film transistors and fabrication methods thereof 审中-公开
    薄膜晶体管及其制造方法

    公开(公告)号:US20060108585A1

    公开(公告)日:2006-05-25

    申请号:US11143405

    申请日:2005-06-02

    IPC分类号: H01L29/76

    摘要: Thin film transistors and fabrication methods thereof. A gate is formed overlying a portion of a substrate. A gate-insulating layer is formed overlying the gate. A vanadium oxide layer is formed between the gate and the substrate and/or the gate and the gate-insulating layer. A semiconductor layer is formed on a portion of the gate-insulating layer. A source and a drain are formed on a portion of the semiconductor layer.

    摘要翻译: 薄膜晶体管及其制造方法。 形成覆盖衬底的一部分的栅极。 栅极绝缘层形成在栅极上方。 在栅极和衬底和/或栅极和栅极绝缘层之间形成氧化钒层。 半导体层形成在栅极绝缘层的一部分上。 源极和漏极形成在半导体层的一部分上。