公开(公告)号：US06670447B2

公开(公告)日：2003-12-30

申请号：US10070156

申请日：2002-03-04

申请人： Hidetoshi Tsunoda ,  Michiru Sekiguchi ,  Hajime Iizuka ,  Kazuya Sakai

发明人： Hidetoshi Tsunoda ,  Michiru Sekiguchi ,  Hajime Iizuka ,  Kazuya Sakai

IPC分类号： C07K1600

CPC分类号： C07D263/44 ,  C07C231/10 ,  C07C237/22 ,  C07D231/12 ,  C07D233/56 ,  C07D249/08 ,  C07D295/185 ,  C07D413/06 ,  C07D413/14 ,  C07D417/06 ,  C07D417/14 ,  C07D471/04 ,  C07D487/08

摘要： This invention provides amino acid N-carboxyanhydrides, each of which has an N-acyl substituent on its nitrogen atom, is represented by the following formula (1): readily reacts with nucleophilic reagents such as free amino acids, alcohols, anions or the like, and are intermediates useful for the high-yield production of amino acid derivatives, optically active compounds, peptides, polypeptides and the like useful in many fields lead by the fields of pharmaceuticals and agrochemicals, and also provides a process for the production of the amino acid N-carboxyanhydrides. Further, the present invention also provides a process for the production of diamides, which uses the compounds of the formula (1) and amine derivatives represented by the following formula (7): These diamides can also be suitably used for the production of amino acid derivatives, optically active compounds, peptides, polypeptides and the like.

摘要翻译： 本发明提供氨基酸N-羧酸酐，其各自在其氮原子上具有N-酰基取代基，由下式（1）表示：容易与亲核试剂如游离氨基酸，醇，阴离子等反应 并且是用于高产量生产氨基酸衍生物，光学活性化合物，肽，多肽等的中间体，其在许多领域中可用于药物和农用化学品的领域，并且还提供了制备氨基酸的方法 酸性N-羧酸酐。 此外，本发明还提供了使用式（1）的化合物和由下式（7）表示的胺衍生物的二酰胺的制备方法：这些二酰胺也可以适合用于制备氨基酸 衍生物，光学活性化合物，肽，多肽等。

公开(公告)号：US5112841A

公开(公告)日：1992-05-12

申请号：US661981

申请日：1991-02-28

申请人： Akira Matsubara ,  Kazuya Sakai ,  Hideki Tanada ,  Akira Mizuchi ,  Kazutoshi Horikomi ,  Takuma Ohtsu

发明人： Akira Matsubara ,  Kazuya Sakai ,  Hideki Tanada ,  Akira Mizuchi ,  Kazutoshi Horikomi ,  Takuma Ohtsu

IPC分类号： A61K31/42 ,  A61K31/425 ,  A61P25/08 ,  C07D413/14 ,  C07D417/14

CPC分类号： C07D413/14 ,  C07D417/14

摘要： Described herein are imidazole derivatives having a specific structure and satisfactory as antiepileptics from the standpoint of the strength of action, prolonged action and side effects as well as their preparation processes.

公开(公告)号：US5055585A

公开(公告)日：1991-10-08

申请号：US647633

申请日：1991-01-31

申请人： Akira Matsubara ,  Kazuya Sakai ,  Hideki Tanada ,  Hironori Komatsu

发明人： Akira Matsubara ,  Kazuya Sakai ,  Hideki Tanada ,  Hironori Komatsu

IPC分类号： C07D261/08 ,  C07D261/20 ,  C07D275/02 ,  C07D275/04

CPC分类号： C07D275/02 ,  C07D261/08 ,  C07D261/20 ,  C07D275/04

摘要： Novel aminoketones useful as central muscle relaxants and their preparation processes are disclosed. The disclosed processes are novel processes which do not use any heavy metal in view of the facts that their products are will be used as drugs and which require no complex purification step such as liberation of the aminoketones from their hydrochlorides or the like.

公开(公告)号：US4592773A

公开(公告)日：1986-06-03

申请号：US762382

申请日：1985-08-05

申请人： Yoshinori Tanaka ,  Kazuya Sakai ,  Toshiyuki Kouno ,  Mithuo Itakura ,  Koichi Takeuchi ,  Yuji Enomoto ,  Hitoshi Shimotori ,  Shunichi Inami ,  Yoshikata Hojo ,  Masahiro Sakakibara

发明人： Yoshinori Tanaka ,  Kazuya Sakai ,  Toshiyuki Kouno ,  Mithuo Itakura ,  Koichi Takeuchi ,  Yuji Enomoto ,  Hitoshi Shimotori ,  Shunichi Inami ,  Yoshikata Hojo ,  Masahiro Sakakibara

IPC分类号： A01N37/34 ,  A01N20060101 ,  A01N31/14 ,  A01N33/18 ,  A01N37/06 ,  A01N37/20 ,  A01N37/46 ,  A01N37/48 ,  A01N43/28 ,  A01N43/30 ,  C07C20060101 ,  C07C5/00 ,  C07C43/166 ,  C07C67/00 ,  C07C253/00 ,  C07C255/24 ,  C07C255/29 ,  C07C255/60 ,  C07D317/68 ,  C07C121/80

CPC分类号： C07C255/00 ,  A01N37/46 ,  A01N37/48 ,  A01N43/28 ,  C07D317/68

摘要： Substituted propargyloxyacetonitrile derivative represented by the general formula (I) ##STR1## wherein R represents a hydrogen atom, a halogen atom, a lower alkyl group, a lower haloalkyl group, a lower alkoxy group, a methylenedioxy group, a nitro group or a cyano group, n represents an integer of 1 to 5 and when n is an integer of 2 or more, R's may be identical or different, R.sup.1 represents a hydrogen atom or a lower alkyl group, and R.sup.2 represents a hydrogen atom, a lower alkyl group, a lower haloalkyl group or a halogen atom, provided that R.sup.1 and R.sup.2 are not simultaneously hydrogen atoms.The compounds have herbicidal and fungicidal activities.

摘要翻译： 由通式（I）表示的取代的炔丙氧基乙腈衍生物其中R表示氢原子，卤素原子，低级烷基，低级卤代烷基，低级烷氧基，亚甲二氧基，硝基 或氰基，n表示1〜5的整数，当n为2以上的整数时，R可以相同或不同，R 1表示氢原子或低级烷基，R 2表示氢原子， 低级烷基，低级卤代烷基或卤素原子，条件是R1和R2不同时为氢原子。 该化合物具有除草和杀真菌活性。

公开(公告)号：US08999609B2

公开(公告)日：2015-04-07

申请号：US13639686

申请日：2011-04-08

申请人： Osamu Nozawa ,  Hiroaki Shishido ,  Kazuya Sakai

发明人： Osamu Nozawa ,  Hiroaki Shishido ,  Kazuya Sakai

IPC分类号： G03F1/32 ,  G03F1/60 ,  C23C14/00 ,  C23C14/06 ,  G03F1/54 ,  G03F7/20 ,  B82Y30/00

CPC分类号： G03F1/32 ,  B82Y30/00 ,  C23C14/0036 ,  C23C14/0641 ,  G03F1/26 ,  G03F1/54 ,  G03F7/2041 ,  Y10S977/755

摘要： Provided are a phase shift mask blank that is improved in the irradiation durability of a light-semitransmissive film (phase shift film), made of a material containing mainly a transition metal, silicon, and nitrogen, to exposure light having a wavelength of 200 nm or less and thus can improve the mask lifetime, a method of manufacturing such a phase shift mask blank, and a phase shift mask. The phase shift mask blank is used for manufacturing a phase shift mask adapted to be applied with ArF excimer laser exposure light. The phase shift mask blank has a light-semitransmissive film on a transparent substrate. The light-semitransmissive film is an incomplete nitride film containing mainly a transition metal, silicon, and nitrogen. The content ratio of the transition metal to the transition metal and the silicon in the light-semitransmissive film is less than 9%.

摘要翻译： 提供一种相位移掩模坯料，其将由主要包含过渡金属，硅和氮的材料制成的光半透射膜（相移膜）的照射耐久性提高到具有200nm波长的曝光光 或更小，从而可以改善掩模寿命，制造这种相移掩模坯料的方法和相移掩模。 相移掩模空白用于制造适于施加ArF准分子激光曝光光的相移掩模。 相移掩模空白在透明基板上具有轻半透射膜。 轻半透射膜是主要包含过渡金属，硅和氮的不完全氮化物膜。 过渡金属与过渡金属和轻半透射膜中的硅的含量比小于9％。

公开(公告)号：US20130273738A1

公开(公告)日：2013-10-17

申请号：US13995751

申请日：2011-12-22

申请人： Kazuya Sakai ,  Masahiro Hashimoto

发明人： Kazuya Sakai ,  Masahiro Hashimoto

IPC分类号： G03F1/50 ,  H01L21/308

CPC分类号： G03F1/50 ,  G03F1/46 ,  G03F1/82 ,  H01L21/3065 ,  H01L21/3081 ,  H01L21/3213 ,  H01L21/32136

摘要： Provided is a method of manufacturing a mask blank that is improved in cleaning resistance to ozone cleaning or the like, thus capable of preventing degradation of the mask performance due to the cleaning. The method is for manufacturing a mask blank having, on a substrate, a thin film which is formed at its surface with an antireflection layer made of a material containing a transition metal, and carries out a treatment of causing a highly concentrated ozone gas with a concentration of 50 to 100 vol % to act on the antireflection layer to thereby form a surface modified layer comprising a strong oxide film containing an oxide of the transition metal at a surface of the antireflection layer.

公开(公告)号：US20130071777A1

公开(公告)日：2013-03-21

申请号：US13639686

申请日：2011-04-08

申请人： Osamu Nozawa ,  Hiroaki Shishido ,  Kazuya Sakai

发明人： Osamu Nozawa ,  Hiroaki Shishido ,  Kazuya Sakai

IPC分类号： G03F1/32 ,  G03F7/20

CPC分类号： G03F1/32 ,  B82Y30/00 ,  C23C14/0036 ,  C23C14/0641 ,  G03F1/26 ,  G03F1/54 ,  G03F7/2041 ,  Y10S977/755

摘要： Provided are a phase shift mask blank that is improved in the irradiation durability of a light-semitransmissive film (phase shift film), made of a material containing mainly a transition metal, silicon, and nitrogen, to exposure light having a wavelength of 200 nm or less and thus can improve the mask lifetime, a method of manufacturing such a phase shift mask blank, and a phase shift mask. The phase shift mask blank is used for manufacturing a phase shift mask adapted to be applied with ArF excimer laser exposure light. The phase shift mask blank has a light-semitransmissive film on a transparent substrate.The light-semitransmissive film is an incomplete nitride film containing mainly a transition metal, silicon, and nitrogen. The content ratio of the transition metal to the transition metal and the silicon in the light-semitransmissive film is less than 9%.

公开(公告)号：US08278916B2

公开(公告)日：2012-10-02

申请号：US12886054

申请日：2010-09-20

申请人： Kazuya Sakai

发明人： Kazuya Sakai

IPC分类号： G01B7/30

CPC分类号： G01D5/145

摘要： A rotational angle sensor includes: a magnet rotor in which multiple magnetic poles are formed along the circumferential direction of the magnet rotor; and three sensor devices that are arranged on a circle concentric with the magnet rotor at regular angle intervals. Each of the sensor devices includes three half-bridge circuits each of which has a pair of spin valve magnetic resistances that are connected in series in such a manner that the magnetization directions of spin fixed layers of the spin valve magnetic resistances are opposite to each other. Each of the sensor devices is formed in such a manner that phases of the sensor signals output from the respective half-bridge circuits based on a change in magnetic flux caused by the rotation of the magnet rotor are offset from each other by an electrical angle of 120°.

摘要翻译： 旋转角度传感器包括：磁体转子，沿着磁体转子的圆周方向形成有多个磁极; 和三个传感器装置，它们以等角度的间隔排列在与磁体转子同心的圆周上。 每个传感器装置包括三个半桥电路，每个半桥电路具有一对自旋阀磁阻，其以自旋阀磁阻的旋转固定层的磁化方向彼此相反的方式串联连接 。 每个传感器装置的形成方式是使得基于由磁体转子的旋转引起的磁通量的变化从各半桥电路输出的传感器信号的相位相互偏移电位角 120°。

公开(公告)号：US20110068780A1

公开(公告)日：2011-03-24

申请号：US12886054

申请日：2010-09-20

申请人： Kazuya Sakai

发明人： Kazuya Sakai

IPC分类号： G01B7/30

CPC分类号： G01D5/145

摘要： A rotational angle sensor includes: a magnet rotor in which multiple magnetic poles are formed along the circumferential direction of the magnet rotor; and three sensor devices that are arranged on a circle concentric with the magnet rotor at regular angle intervals. Each of the sensor devices includes three half-bridge circuits each of which has a pair of spin valve magnetic resistances that are connected in series in such a manner that the magnetization directions of spin fixed layers of the spin valve magnetic resistances are opposite to each other. Each of the sensor devices is formed in such a manner that phases of the sensor signals output from the respective half-bridge circuits based on a change in magnetic flux caused by the rotation of the magnet rotor are offset from each other by an electrical angle of 120°.

摘要翻译： 旋转角度传感器包括：磁体转子，沿着磁体转子的圆周方向形成有多个磁极; 和三个传感器装置，它们以等角度的间隔排列在与磁体转子同心的圆周上。 每个传感器装置包括三个半桥电路，每个半桥电路具有一对自旋阀磁阻，其以自旋阀磁阻的旋转固定层的磁化方向彼此相反的方式串联连接 。 每个传感器装置的形成方式是使得基于由磁体转子的旋转引起的磁通量的变化从各半桥电路输出的传感器信号的相位相互偏移电位角 120°。

公开(公告)号：US20060179954A1

公开(公告)日：2006-08-17

申请号：US11342535

申请日：2006-01-31

申请人： Kazushi Suzuki ,  Kazuya Sakai ,  Isamu Kandori

发明人： Kazushi Suzuki ,  Kazuya Sakai ,  Isamu Kandori

IPC分类号： G01L7/00

CPC分类号： G01L19/0645 ,  G01L19/146

摘要： A pressure sensor is composed of a pressure housing having a pressure chamber inside and a pressure sensitive element arranged in the pressure chamber, and a joint housing having a fluid passage for leading fluid into the pressure housing, wherein the pressure housing and the joint housing are jointed by brazing with an insulating member interposed at a joint section therebetween. A stress relieving member is interposed at least either between the metal housing and the insulating member or between the joint housing and the insulating member, so that the insulating member can be relieved of a stress which is caused by the braze jointing to act on the insulating member.

摘要翻译： 压力传感器由在内部具有压力室的压力壳体和布置在压力室中的压力敏感元件组成，以及具有用于将流体引导到压力壳体中的流体通道的接头壳体，其中压力壳体和接头壳体 通过钎焊与插入其间的接合部分处的绝缘构件接合。 应力消除部件至少插入在金属壳体和绝缘构件之间或者在接头壳体和绝缘构件之间，使得绝缘构件能够消除由钎焊接合作用于绝缘体上的应力 会员。