公开(公告)号：US06862090B2

公开(公告)日：2005-03-01

申请号：US09927068

申请日：2001-08-09

申请人： Jianhui Chen ,  David M. Aikens

发明人： Jianhui Chen ,  David M. Aikens

IPC分类号： G01J3/10 ,  G01J3/00 ,  G01J3/28 ,  G01J3/42 ,  G01J4/00 ,  G01N21/00

CPC分类号： G01J3/10

摘要： A method and apparatus for combining the spectral outputs of multiple light sources to provide a high-efficiency broad-band illuminator for optical metrology is disclosed. The illuminator combines the output radiation from a plurality of broad-band lamps in a novel optical arrangement that creates a virtual source and avoids the use of beam-splitters. Consequently, the illuminator offers increased performance at reduced cost. The illuminator can be optimized and configured for application in a broad class of optical metrology instruments.

摘要翻译： 公开了一种用于组合多个光源的光谱输出以提供用于光学测量的高效宽带照明器的方法和装置。 照明器将来自多个宽带灯的输出辐射组合成新颖的光学布置，其创建虚拟源并避免使用光束分离器。 因此，照明器以降低的成本提供更高的性能。 照明器可以进行优化和配置，以应用于广泛的光学计量仪器。

公开(公告)号：US06842259B2

公开(公告)日：2005-01-11

申请号：US10850491

申请日：2004-05-20

申请人： Allan Rosencwaig ,  Jon Opsal

发明人： Allan Rosencwaig ,  Jon Opsal

IPC分类号： G01B11/00 ,  G01B11/02 ,  G01B11/06 ,  G01B11/24

CPC分类号： G01B11/24 ,  G01B11/00 ,  G01B11/02 ,  G01B11/0608

摘要： A method is disclosed for evaluating isolated and aperiodic structure on a semiconductor sample. A probe beam from a coherent laser source is focused onto the structure in a manner to create a spread of angles incidence. The reflected light is monitored with an array detector. The intensity or polarization state of the reflected beam as a function of radial position within the beam is measured. Each measurement includes both specularly reflected light as well as light that has been scattered from the aperiodic structure into that detection position. The resulting output is evaluated using an aperiodic analysis to determine the geometry of the structure.

摘要翻译： 公开了一种用于评估半导体样品上的隔离和非周期结构的方法。 来自相干激光源的探测光束以一定的角度入射的方式聚焦到结构上。 用阵列检测器监测反射光。 测量作为光束内的径向位置的函数的反射光束的强度或极化状态。 每个测量包括镜面反射光以及从非周期结构散射到该检测位置的光。 使用非周期性分析来评估所得到的输出以确定结构的几何形状。

公开(公告)号：US5900939A

公开(公告)日：1999-05-04

申请号：US98880

申请日：1998-06-17

申请人： David E. Aspnes ,  Jon Opsal ,  Jeffrey T. Fanton

发明人： David E. Aspnes ,  Jon Opsal ,  Jeffrey T. Fanton

IPC分类号： G01B11/06 ,  G01J4/00 ,  G01N21/21

CPC分类号： G01B11/0641 ,  G01J4/00 ,  G01N21/211

摘要： An optical measurement system for evaluating a reference sample that has at least a partially known composition. The optical measurement system includes a reference ellipsometer and at least one non-contact optical measurement device. The reference ellipsometer includes a light generator, an analyzer and a detector. The light generator generates a beam of quasimonochromatic light having a known wavelength and a known polarization for interacting with the reference sample. The beam is directed at a non-normal angle of incidence relative to the reference sample to interact with the reference sample. The analyzer creates interference between the S and P polarized components in the light beam after the light beam has interacted with reference sample. The detector measures the intensity of the light beam after it has passed through the analyzer. A processor determines the polarization state of the light beam entering the analyzer from the intensity measured by the detector, and determines an optical property of the reference sample based upon the determined polarization state, the known wavelength of light from the light generator and the composition of the reference sample. The processor also operates the optical measurement device to measure an optical parameter of the reference sample. The processor calibrates the optical measurement device by comparing the measured optical parameter from the optical measurement device to the determined optical property from the reference ellipsometer.

摘要翻译： 一种用于评估至少具有部分已知组成的参考样品的光学测量系统。 光学测量系统包括参考椭偏仪和至少一个非接触式光学测量装置。 参考椭偏仪包括光发生器，分析器和检测器。 光发生器产生具有已知波长和已知极化的准共振色光束，用于与参考样品相互作用。 光束相对于参考样品被引导到非正常入射角，以与参考样品相互作用。 在光束与参考样本相互作用后，分析仪在光束中产生S和P偏振分量之间的干扰。 检测器测量光束通过分析仪后的强度。 处理器根据由检测器测量的强度确定进入分析器的光束的偏振状态，并且基于所确定的偏振状态，来自光发生器的已知的光的波长以及来自光发生器的光的组成，确定参考样品的光学特性 参考样品。 处理器还操作光学测量装置以测量参考样品的光学参数。 处理器通过将来自光学测量装置的测量光学参数与来自参考椭偏仪的所确定的光学特性进行比较来校准光学测量装置。

公开(公告)号：US5864633A

公开(公告)日：1999-01-26

申请号：US649576

申请日：1996-05-17

申请人： Jon Opsal ,  John J. Sidorowich

发明人： Jon Opsal ,  John J. Sidorowich

IPC分类号： G01B11/06 ,  G01N21/84 ,  G01N21/88 ,  H01L21/66 ,  G06K9/00 ,  G06F15/18

CPC分类号： G01N21/8422

摘要： An optical inspection device generates a plurality of measured optical data from inspection of a thin film stack. A processor evolves models of theoretical data, which are compared to the measured data, and a "best fit" solution is provided as the result. Each model of theoretical data is represented by an underlying "genotype" which is an ordered list of "genes." Each gene corresponds to a selected thin film parameter of interest. Many such individual genotypes are created thereby forming a "population" of genotypes, which are evolved through the use of a genetic algorithm. Each genotype has a fitness associated therewith based on how much the theoretical data derived therefrom differs from the measured data. Individual genotypes are selected based on fitness, then a genetic operation is performed on the selected genotypes to produce new genotypes. Multiple generations of genotypes are evolved until an acceptable solution is obtained.

公开(公告)号：US5596406A

公开(公告)日：1997-01-21

申请号：US532871

申请日：1995-08-15

申请人： Allan Rosencwaig ,  David L. Willenborg

发明人： Allan Rosencwaig ,  David L. Willenborg

IPC分类号： G01B11/06 ,  G01J4/04 ,  G01N21/21 ,  G01N21/27 ,  H01L21/66 ,  G01J4/00 ,  G01J3/28

CPC分类号： G01B11/0641 ,  G01N21/211

摘要： An optical measurement device is disclosed for evaluating the parameters of a sample. The device includes a polychromatic source for generating a probe beam. The probe beam is focused on the sample surface. Individual rays within the reflected probe beam are simultaneously analyzed as a function of the position within the beam to provide information at multiple wavelengths. A filter, dispersion element and a two-dimensional photodetector array may be used so that the beam may be simultaneously analyzed at multiple angles of incidence and at multiple wavelengths. A variable image filter is also disclosed which allows a selection to be made as to the size of the area of the sample to be evaluated.

摘要翻译： 公开了一种用于评估样品参数的光学测量装置。 该装置包括用于产生探针光束的多色源。 探针光束聚焦在样品表面上。 反射探测光束内的单个光线作为光束内的位置的函数被同时分析，以提供多个波长的信息。 可以使用滤光器，色散元件和二维光电检测器阵列，使得可以以多个入射角和多个波长同时分析光束。 还公开了可变图像滤波器，其允许对要评估的样本的面积的大小进行选择。

公开(公告)号：US4854710A

公开(公告)日：1989-08-08

申请号：US76876

申请日：1987-07-23

申请人： Jon Opsal ,  Allan Rosencwaig ,  Walter L. Smith

发明人： Jon Opsal ,  Allan Rosencwaig ,  Walter L. Smith

IPC分类号： G01N23/203 ,  G01N21/17 ,  G01R31/265

CPC分类号： G01R31/2656 ,  G01N21/171

摘要： A method and apparatus are disclosed for evaluating surface and subsurface features in a semiconductor sample. In operation, a periodic energy source is applied to the surface of the semiconductor sample to generate a periodic electron-hole plasma. This plasma interacts with features in the sample as it diffuses. The plasma affects the index of refraction of the sample and the changing plasma density is monitored using a radiation probe. In the preferred embodiment, the radiation probe measures the plasma induced periodic changes of reflectivity of the surface of the sample to yield information about the sample, such as ion dopant concentrations, residue deposits and defects.

摘要翻译： 公开了一种用于评估半导体样品中的表面和地下特征的方法和装置。 在操作中，将周期性能量源施加到半导体样品的表面以产生周期性电子空穴等离子体。 这种等离子体在扩散时与样品中的特征相互作用。 等离子体影响样品的折射率，并且使用辐射探针监测改变的等离子体密度。 在优选实施例中，辐射探针测量等离子体诱导的样品表面的反射率的周期性变化，以产生关于样品的信息，例如离子掺杂剂浓度残余物沉积物和缺陷。

公开(公告)号：US4750822A

公开(公告)日：1988-06-14

申请号：US845606

申请日：1986-03-28

申请人： Allan Rosencwaig ,  Jon Opsal ,  Walter L. Smith

发明人： Allan Rosencwaig ,  Jon Opsal ,  Walter L. Smith

IPC分类号： G01B11/30 ,  G01N21/17 ,  G01N21/21 ,  G01N21/88 ,  G01N21/94 ,  G01N21/956 ,  G01N21/41

CPC分类号： G01N21/88 ,  G01N21/17 ,  G01N2021/1744 ,  G01N2021/178 ,  G01N2021/1789 ,  G01N21/21 ,  G01N21/4738

摘要： A method and apparatus is disclosed for detecting defect surface states in any material and in particular semiconductors. In the subject device, a periodic localized excitation is generated at the surface of the sample with an intensity modulated pump laser beam. A probe laser beam is directed to the surface of the sample and changes in the probe beam which are in phase with the modulated pump frequency are detected. In the preferred embodiment, periodic changes in the optical reflectivity of the surface of the sample induced by an intensity modulated excitation beam are detected by measuring the corresponding modulations in the reflected power of the probe beam. Any time dependence of the probe beam modulated reflectance signal is monitored. An evaluation of defect surface states is then made by investigating the time dependence of the magnitude and/or phase of this probe beam modulated reflectance signal.

摘要翻译： 公开了用于检测任何材料，特别是半导体中的缺陷表面状态的方法和装置。 在本装置中，在强度调制的泵浦激光束的样品表面产生周期性局部激发。 探针激光束被引导到样品的表面，并且检测到与调制的泵频率同相的探针光束的变化。 在优选实施例中，通过测量探针光束的反射功率的相应调制来检测由强度调制的激发光束引起的样品的表面的光学反射率的周期性变化。 监测探测光束调制反射信号的任何时间依赖性。 然后通过研究该探测光束调制反射信号的幅度和/或相位的时间依赖性来进行缺陷表面状态的评估。

公开(公告)号：US4521118A

公开(公告)日：1985-06-04

申请号：US401511

申请日：1982-07-26

申请人： Allan Rosencwaig

发明人： Allan Rosencwaig

IPC分类号： G01N21/00 ,  G01N21/17 ,  G01N25/00 ,  G01N25/18 ,  G01N25/20 ,  G01N21/41 ,  G01N25/72

CPC分类号： G01N21/171 ,  G01N25/00

摘要： A method for measuring thermal waves in a sample is disclosed. More particularly, thermal waves, which may be used for imaging, are generated in a sample through local periodic heating as, for example, by impinging an intensity modulated beam of energy on the surface of the sample. A laser probe is focused on a portion of the heated area on the surface of the sample in a manner such that the beam is reflected from the surface. The angular displacement of the reflected beam, resulting from the local angular change in surface conditions of the sample due to the thermal waves are monitored. By this arrangement, the displacement of the reflected beam can be used to detect the thermal waves.

摘要翻译： 公开了一种用于测量样品中的热波的方法。 更具体地，可以用于成像的热波通过局部周期性加热在样品中产生，例如通过在样品的表面上照射强度调制的能量束。 激光探针以使得光束从表面反射的方式聚焦在样品表面上的加热区域的一部分上。 监测由于热波而由样品的表面状态的局部角度变化引起的反射光束的角位移。 通过这种布置，可以使用反射光束的位移来检测热波。

公开(公告)号：US4513384A

公开(公告)日：1985-04-23

申请号：US389623

申请日：1982-06-18

申请人： Allan Rosencwaig

发明人： Allan Rosencwaig

IPC分类号： G01B11/06 ,  G01B15/02 ,  G01B21/08 ,  G01N21/17 ,  G01N21/71 ,  G01N25/00 ,  H01L21/66 ,  G01N29/04 ,  G06F15/00

CPC分类号： G01N25/00 ,  G01B11/0633 ,  G01N21/1702

摘要： The subject invention discloses a method for non-destructively determining the thickness of layers deposited on a substrate by analyzing thermal waves generated in a sample. The methods are particularly suited for use with integrated circuit manufacturing. In the subject method, the sample is subjected to a focused periodic heat source which generates thermal waves. Either the magnitude or phase of the thermal waves generated in the sample are measured. The values obtained are normalized relative to a reference sample. The normalized values are analyzed with respect to a theoretical model of the sample to calculate the thickness of the unknown layers. In an alternate embodiment, thermal characteristics can be determined in a sample as a function of depth. The latter approach is useful for nondestructively determining dopant concentrations or lattice defects in semiconductor devices as a function of depth beneath the surface.

摘要翻译： 本发明公开了一种通过分析样品中产生的热波来非破坏性地确定沉积在基底上的层的厚度的方法。 该方法特别适用于集成电路制造。 在本方法中，样品经受聚焦周期性热源，其产生热波。 测量样品中产生的热波的大小或相位。 所获得的值相对于参考样品归一化。 对样品的理论模型分析归一化值，以计算未知层的厚度。 在替代实施例中，热特性可以在样本中作为深度的函数来确定。 后一种方法对于非破坏性地确定半导体器件中的掺杂剂浓度或晶格缺陷是有用的，作为表面下方深度的函数。

公开(公告)号：US07251036B2

公开(公告)日：2007-07-31

申请号：US11334999

申请日：2006-01-19

申请人： James Hendrix ,  David Wang ,  Michael Ellison ,  Joel Ng

发明人： James Hendrix ,  David Wang ,  Michael Ellison ,  Joel Ng

IPC分类号： G01N21/45

CPC分类号： G01B11/0625 ,  G01N21/211 ,  G01N21/255 ,  G01N21/55 ,  G01N21/9501

摘要： A combiner for optical beams includes a substrate overlaid by a multi-layer dielectric film stack. The substrate is a clear material and the dielectric film stack is a series of alternating layer of high and low refractive index. This gives the combiner relatively high reflectivity across UV wavelengths and relatively high transmissivity in the visible and longer wavelengths and allows visible light to pass through the combiner while UV light is reflected. At the same time dielectric film stack has minimal absorption and scatter. This means that the intensity of visible light maintains at least 90% of its intensity as it passes through combiner and UV light retains at least 90% of its intensity as it is reflected by combiner.

摘要翻译： 用于光束的组合器包括由多层电介质膜叠层覆盖的衬底。 衬底是透明材料，电介质膜堆叠是一系列具有高低折射率的交替层。 这使得组合器在UV波长上相对较高的反射率和可见光和较长波长的相对高的透射率，并且允许可见光在反射UV光的同时通过组合器。 同时电介质薄膜叠层具有最小的吸收和散射。 这意味着当可见光通过组合器时，可见光的强度保持其强度的至少90％，并且当光被组合器反射时，紫外光保持其强度的至少90％。