摘要:
A deposition accuracy determination method, including: capturing an image of a thin film for inspection formed on a substrate by depositing a mask; and converting the image to a color profile to distinguish false measurement data.
摘要:
Disclosed is a defect inspection device that has an illumination optical system; a detection optical system; and a processing unit which includes a defect feature quantity calculation unit that calculates the feature quantities of each defect candidate, a defect candidate grouping unit that groups the aforementioned defect candidates on the basis of the feature quantities, a defect classification evaluation value calculation unit that calculates defect classification evaluation values for the aforementioned defect candidates, a defect classification evaluation value updating unit that, on the basis of instructions, updates the evaluation values, a defect classification threshold determination unit that, on the basis of evaluation valued updated by the aforementioned defect classification evaluation value updating unit, determines a classification boundary that is a threshold for classifying defect types of the aforementioned defect candidates, and a defect detection unit that detects defects using the thresholds.
摘要:
An adjustment device including a camera is connected to a display device. An image of a predetermined image displayed on the display device, and an image of a standard color image are captured by the camera. First chrominance differences and first luminance differences between the image corresponding to the standard color image and the standard color image are computed. Second chrominance differences and second luminance differences between the image corresponding to the predetermined image and the predetermined image are computed. Third chrominance differences between the first chrominance differences and the second chrominance differences, and third luminance differences between the first luminance differences and the second luminance differences are computed. According to third chrominance differences and third luminance differences, first adjustment data is obtained. The first adjustment data is sent to the display device. According to the first adjustment data, c. Chrominance and luminance of the display device is adjusted.
摘要:
In one embodiment, a pattern inspection method is disclosed. The method can include predicting an edge shape at a given future time with respect to the same inspection target pattern, setting a threshold corresponding to a required specification of the inspection target pattern, and predicting the time when the inspection target pattern fails to meet the required specification from the predicted edge shape and the threshold. The method can further include taking a plurality of images concerning the inspection target pattern at different times by use of an imaging apparatus, detecting edges of the obtained images, respectively, matching the detected edges of different imaging times, and obtaining a difference between corresponding edges to generate a difference vector after the matching. The edge shape of the future time can be predicted based on the generated difference vector and an interval between the imaging times.
摘要:
The present invention relates to an automatic optical detection method and an optical automatic detector. The automatic optical detection method includes the following steps: in the step of colored light projection, the lamplight with tricolor light is uniformly projected on an object to be detected to form images with different colors; gray-scale information corresponding to different zones of the images is obtained, then, an automatic optical inspection standard image is generated, and the automatic optical inspection standard image and a prestored reference image are contrastively detected. In the present invention, only the gray-scale information of the images needs processing, so the data quantity and the processing difficulty of an image processing unit and a statistical analysis unit are reduced, which is favorable for increasing the reliability, accuracy, repeatability and speed of data acquisition, and the present invention reduces the requirement of the detector, which is favorable for reducing the input cost of the detector.
摘要:
An image processing system for processing a target pixel to be processed, which target pixel corresponds to inputted image data, a plurality of pixels including the target pixel being arranged in a matrix manner, includes an NR circuit (106). The NR circuit (106) includes a signal processing process circuit (114) for carrying out subtraction or addition, with respect to a pixel value Aij of the target pixel, of a value equivalent to a noise quantity Er calculated in advance, in a case where the pixel value Aij of the target pixel is larger or smaller, respectively, than a first couple of estimated values Bij and Cij for the pixel value Aij of the target pixel, the first couple of estimated values Bij and Cij being estimated from pixel values of respective pixels adjacent to the target pixel, centered at the target pixel, in a temporal axis or in a spatial axis. It is therefore possible to provide an image processing system which further reduces noise and is less likely to blur a video as compared with a conventional noise reduction process.
摘要:
A workpiece inspection apparatus includes a measured image generator unit configured to measure a pattern of a workpiece and generate a measured image; and a comparator unit configured to compare the measured image to a fiducial image, wherein said measured image generator unit includes a light-receiving device having an interconnection of two or more time delay integration (TDI) sensors each being arranged by two or more line sensors each being arranged by two or more pixels, for generating as the measured image an average value of pixel values excluding an abnormal pixel value from pixels of each TDI sensor with respect to a position of the pattern of the workpiece.
摘要:
A system for image analysis and a method thereof are disclosed. In one embodiment, the system includes a detector configured to receive an image of a sample, isolate particles from a background image of the sample image and detect positions of the isolated particles and a first operator configured to calculate a static degree of randomness values of the particles using Lennard-Jones potentials based on the detected positions. The system may further include a second operator configured to obtain a dynamic degree of randomness values of particles based at least in part on the sum of tensile forces between particles by implicit integration added until the particles reach a dynamic equilibrium, and calculate a positional degree of randomness of particles based at least in part on subtraction of the dynamic degree of randomness values from the static degree of randomness values.
摘要:
An uneven area inspection system of the present invention comprises a patterned panel comprising a panel, wherein the panel have a surface on which a pattern is formed, an object with at least one surface reflecting light from the patterned panel, an imaging unit optically coupled to the patterned panel and the object and configured to capture the image of the patterned panel reflected by the surface of the object, and an image processing unit configured to process the captured image to compare the pattern in the patterned panel and the pattern in the captured image. The object can have uneven area and the uneven area of the object is inspected by comparing the pattern in the patterned panel and the pattern in the captured image.
摘要:
A circuit-pattern inspection apparatus and related method provide a highly sensitive defect inspection of an area including the most circumferential portion of a memory mat of a semiconductor chip formed on a semiconductor wafer. In certain examples, an image of a circuit pattern of a die formed on the semiconductor wafer is acquired to judge whether or not the circuit pattern contains a defect.