摘要:
In particular embodiments, the present disclosure provides targets including a metal layer and defining a hollow inner surface. The hollow inner surface has an internal apex. The distance between at least two opposing points of the internal apex is less than about 15 μm. In particular examples, the distance is less than about 1 μm. Particular implementations of the targets are free standing. The targets have a number of disclosed shaped, including cones, pyramids, hemispheres, and capped structures. The present disclosure also provides arrays of such targets. Also provided are methods of forming targets, such as the disclosed targets, using lithographic techniques, such as photolithographic techniques. In particular examples, a target mold is formed from a silicon wafer and then one or more sides of the mold are coated with a target material, such as one or more metals.
摘要:
A shaping apparatus for shaping a workpiece. The apparatus comprises first and second pairs of shaping members and a spacer located between the first and second pairs of shaping members. The first pair of shaping members comprises a material having a first linear coefficient of thermal expansion, and the second pair of shaping members comprises a material having a third linear coefficient of thermal expansion. The first linear coefficient of thermal expansion is higher than the second linear coefficient of thermal expansion such that on heating of the apparatus, thermal expansion of the shaping members causes the first pair of shaping members to expand outwardly, and the second pair of shaping members to expand inwardly.