Abstract:
A pulse voltage generating circuit incorporated in an ion source device of the type so as to supply a pulse voltage to an intermediate electrode of the device thereby to allow discharge to occur in said device with high efficiency.
Abstract:
An ion source device of the Duoplasmatron type has a current reduction resistor in the filament circuit thereof for reducing the filament current during steady state operation thereof, and a relay adapted to normally short-circuit both terminals of the current reduction resistor, which relay is energized by a current flowing through an intermediate electrode circuit so as to open both of these terminals of the resistor thereby making it possible to reduce the steady state filament current.
Abstract:
Certain configurations of plasma discharge chambers and plasma ionization sources comprising a plasma discharge chamber are described. In some examples, the discharge chamber comprises a conductive area and is configured to sustain a plasma discharge within the discharge chamber. In other examples, the discharge chamber comprises at least one inlet configured to receive a plasma gas and at least one outlet configured to provide ionized analyte from the discharge chamber. Systems and methods using the discharge chambers are also described.
Abstract:
A duoplasmatron is provided having a cathode, an anode with linear slit, and an intermediate electrode (IE) between the cathode and the anode where the IE has an opening that is aligned with the anode slit. A magnet forms a magnetic field that passes through the anode slit. A discharge passes from the cathode to the anode through the IE opening and the anode slit. The discharge is constricted through the IE opening and the magnetic field in the anode slit. An extractor external to the anode accelerates ions through an ion emitting slit aligned with the anode slit. A process of generating an accelerated ion beam is provided that includes flowing a gas into the IE and then energizing at least one power supply to induce electron flow to the anode. Ionizing the gas in the gap between the IE and anode. The ions are accelerated from the anode through the extractor ion emitting slit forming a linear ion beam.
Abstract:
After adhesive resin is applied to a surface of a flat panel, a front panel is glued thereto. One side of the front panel is contacted to the adhesive resin layer with the front panel tilted toward the surface of the flat panel. Then, the front panel is moved slowly to be close and parallel to the front panel. Finally, the front panel is pressed to the surface of the flat panel. Afterward, the adhesive resin is hardened. It is preferable that the thickness of the adhesive resin applied to the surface of the flat panel is decreasing from the side to which the side of the front panel is contacted, to the opposite side. By the above-mentioned method, an image display apparatus having multilayer structure comprising of a flat panel for displaying image, an adhesive resin layer and a front panel can be manufactured efficiently.
Abstract:
In an ion beam source, the plasma is contained near the extraction front by a cup-shaped magnetic field for improved stability and uniformity. The intermediate electrode has a profiled electron beam aperture having a first narrowest section, a second slightly wider section, and the third, known, conical section. The anode electrode or anode insert has a very narrow entrance aperture followed by outwardly flared, longer, section.
Abstract:
A duopigatron ion source is modified by replacing the normal oxide-coated wire filament cathode of the ion source with a hot tungsten oven through which hydrogen gas is fed into the arc chamber. The hydrogen gas is predissociated in the hot oven prior to the arc discharge, and the recombination rate is minimized by hot walls inside of the arc chamber. With the use of the above modifications, the atomic H.sub.1.sup.+ ion fraction output can be increased from the normal 50% to greater than 70% with a corresponding decrease in the H.sub.2.sup.+ and H.sub.3.sup.+ molecular ion fraction outputs from the ion source.
Abstract:
An ion source modified by an additional electrode, designated as a scraper electrode, positioned between the anode and extractor electrode, having an aperture slightly less than the source plasma aperture, and adapted to carry a pre-determined voltage in reference to the anode. It has been found that the scraper electrode intercepts and removes ions at the periphery of the beam cross-sectional area and this is the region that contains ions that contribute most greatly to the increased emittance. The central, non-intercepted cross-sectional area therefore has a much reduced emittance. The voltage on the scraper electrode should be such as to not disturb or distract the electric field between anode and extractor electrode.