公开(公告)号：US20230112447A1

公开(公告)日：2023-04-13

申请号：US17910752

申请日：2021-03-09

Applicant: ASML Netherlands B.V.

Inventor： Weiming REN ,  Yongxin WANG

IPC: H01J37/244 ,  G01N23/2251 ,  G01N23/203 ,  G01N23/2206 ,  H01J37/10 ,  H01J37/147

Abstract: Systems and methods of observing a sample using an electron beam apparatus are disclosed. The electron beam apparatus comprises an electron source configured to generate a primary electron beam along a primary optical axis, and a first electron detector having a first detection layer substantially parallel to the primary optical axis and configured to detect a first portion of a plurality of signal electrons generated from a probe spot on a sample. The method may comprise generating a plurality of signal electrons and detecting the signal electrons using the first electron detector substantially parallel to the primary optical axis of the primary electron beam. A method of configuring an electrostatic element or a magnetic element to detect backscattered electrons may include disposing an electron detector on an inner surface of the electrostatic or magnetic element and depositing a conducting layer on the inner surface of the electron detector.

公开(公告)号：US20230071801A1

公开(公告)日：2023-03-09

申请号：US17878113

申请日：2022-08-01

Applicant: Hitachi High-Tech Corporation

Inventor： Momoyo ENYAMA ,  Akira IKEGAMI ,  Takeshi MORIMOTO ,  Shun KIZAWA

IPC: H01J37/10 ,  H01J37/285 ,  H01J37/22 ,  H01J37/21

Abstract: An electron beam application apparatus includes: an optical system configured to irradiate a sample with excitation light; an electron optical system configured to project, onto a camera, a photoelectron image formed by photoelectrons emitted from the sample irradiated with the excitation light; and a control unit. The optical system includes a light source configured to generate the excitation light and a pattern forming unit. The excitation light forms an optical pattern on a surface of the sample when the pattern forming unit is turned on, and the excitation light is emitted to the sample without forming the optical pattern on the surface of the sample when the pattern forming unit is turned off. The control unit adjusts the electron optical system based on feature data of a bright and dark pattern formed by the optical pattern in the photoelectron image obtained by turning on the pattern forming unit.

公开(公告)号：US11551907B2

公开(公告)日：2023-01-10

申请号：US17263017

申请日：2019-07-26

Applicant: RIKEN ,  UNIVERSITY PUBLIC CORPORATION OSAKA

Inventor： Ken Harada ,  Keiko Shimada ,  Shigeo Mori ,  Atsuhiro Kotani

IPC: H01J37/26 ,  G01N23/201 ,  H01J37/09 ,  H01J37/10 ,  H01J37/147 ,  H01J37/20 ,  H01J37/22

Abstract: An observation apparatus and method that avoids drawbacks of a Lorentz method and observes a weak scatterer or a phase object with in-focus, high resolution, and no azimuth dependency, by a Foucault method observation using a hollow-cone illumination that orbits and illuminates an incident electron beam having a predetermined inclination angle, an electron wave is converged at a position (height) of an aperture plate downstream of a sample, and a bright field condition in which a direct transmitted electron wave of the sample passes through the aperture plate, a dark field condition in which the transmitted electron wave is shielded, and a Schlieren condition in which approximately half of the transmitted wave is shielded as a boundary condition of both of the above conditions are controlled, and a spatial resolution of the observation image is controlled by selecting multiple diameters and shapes of the opening of the aperture plate.

公开(公告)号：US11462384B2

公开(公告)日：2022-10-04

申请号：US17017840

申请日：2020-09-11

Applicant: JEOL Ltd.

Inventor： Yuji Kohno

IPC: H01J37/28 ,  H01J37/10 ,  H01J37/147 ,  H01J37/153 ,  H01J37/244 ,  H01J37/26

Abstract: A method of acquiring a dark-field image for a scanning transmission electron microscope is provided. The scanning transmission electron microscope includes a dark-field detector having an annular detection region which is capable of detecting electrons scattered at a specimen in a predetermined angular range, an objective lens, and an imaging lens group disposed at a stage following the objective lens. The method includes reducing an influence of a geometrical aberration on the electrons scattered in the predetermined angular range by shifting a focus of the imaging lens group from a diffraction plane of the objective lens.

公开(公告)号：US11462380B2

公开(公告)日：2022-10-04

申请号：US17266792

申请日：2019-07-03

Applicant: ASML NETHERLANDS B. V.

Inventor： Pieter Willem Herman De Jager

IPC: H01J37/153 ,  H01J37/10 ,  H01J37/147 ,  H01J37/20 ,  H01J37/28

Abstract: Systems, methods, and programming are described for inspecting a substrate having a pattern imaged thereon, including obtaining a plurality of selected target locations on the substrate, the selected target locations dependent on characteristics of the pattern, scanning the substrate with a plurality of electron beamlets, wherein the scanning includes individually addressing the beamlets to impinge on the selected target locations independently, detecting a reflected or a transmitted portion of the beamlets, and generating images of the selected target locations.

公开(公告)号：US20220199352A1

公开(公告)日：2022-06-23

申请号：US17540169

申请日：2021-12-01

Applicant: KLA Corporation

Inventor： Tomas Plettner ,  Doug Larson ,  Mark Cawein ,  Jason W. Huang

IPC: H01J37/10 ,  H01J37/28 ,  H01J37/20

Abstract: A multi-beam electronics scanning system using swathing. The system includes an electron emitter source configured to emit an illumination beam. The illumination beam is split into multiple electron beams by a beam splitter lens array. The system also includes an electronic deflection system configured to deflect each of the electron beams in a plurality of directions, including a first direction, along two different axes. Last, a swathing stage is used to move a sample with a constant velocity in a second direction that is parallel to the first direction.

公开(公告)号：US11322335B2

公开(公告)日：2022-05-03

申请号：US16801555

申请日：2020-02-26

Applicant: EBARA CORPORATION

Inventor： Shinichi Okada

IPC: H01J37/317 ,  H01J37/10 ,  H01J37/063 ,  H01J37/32 ,  H01J37/30

Abstract: A charged particle multi-beam device includes a charged particle source, a collimator lens, a multi-light-source forming unit, and a reduction projection optical system. The multi-light-source forming unit has first to third porous electrodes disposed side by side in an optical axis direction. A plurality of holes for causing the multi-beams to pass is formed in each of the first to third porous electrodes. The first porous electrode and the third porous electrode have the same potential and the second porous electrode has potential different from the potential of the first porous electrode and the third porous electrode. A diameter of the holes on the second porous electrode is formed larger further away from an optical axis such that a surface on which the multi-light sources are located is formed in a shape convex to the charged particle source side.

公开(公告)号：US11276551B2

公开(公告)日：2022-03-15

申请号：US16823658

申请日：2020-03-19

Applicant: Hitachi, Ltd.

Inventor： Atsuko Shintani ,  Yasunari Sohda ,  Noritsugu Takahashi ,  Hikaru Koyama

IPC: H01J37/22 ,  H01J37/28 ,  H01J37/244 ,  H01J37/10 ,  H01J37/30 ,  H01J37/21

Abstract: An inspection device includes a charged particle optical system that includes a charged particle beam source emitting a charged particle beam and plural lenses focusing the charged particle beam on a sample, a detector that detects secondary charged particles emitted by an interaction of the charged particle beam and the sample, and a calculation unit that executes auto-focusing at a time a field of view of the charged particle optical system moves over plural inspection spots, the calculation unit irradiates the charged particle beam to the sample under an optical condition that is obtained by introducing astigmatism of a predetermined specification to an optical condition that is for observing a pattern by the charged particle optical system, and executes the auto-focusing using an image formed from a signal outputted by the detector in detecting the secondary charged particles.

公开(公告)号：US11158482B2

公开(公告)日：2021-10-26

申请号：US16993392

申请日：2020-08-14

Applicant: Carl Zeiss MultiSEM GmbH

Inventor： Dirk Zeidler ,  Stefan Schubert

IPC: H01J37/09 ,  H01J37/05 ,  H01J37/10 ,  H01J37/244 ,  H01J37/28

Abstract: A multi-beam particle microscope includes a multi-beam particle source, an objective lens, a detector arrangement, and a multi-aperture plate with a multiplicity of openings. The multi-aperture plate is between the objective lens and the object plane. The multi-aperture plate includes a multiplicity of converters which convert backscattered electrons which are generated by primary particle beams at an object into electrons with a lower energy, which provide electrons that form electron beams detected by the detector arrangement.

公开(公告)号：US11145483B2

公开(公告)日：2021-10-12

申请号：US16214603

申请日：2018-12-10

Applicant: NuFlare Technology, Inc.

Inventor： Takahito Nakayama ,  Takanao Touya

IPC: H01J37/04 ,  H01J37/10 ,  H01J37/317 ,  B82Y10/00 ,  B82Y40/00

Abstract: A charged particle beam writing apparatus according to one aspect of the present invention includes an emission unit to emit a charged particle beam, an electron lens to converge the charged particle beam, a blanking deflector, arranged backward of the electron lens with respect to a direction of an optical axis, to deflect the charged particle beam in the case of performing a blanking control of switching between beam-on and beam-off, a blanking aperture member, arranged backward of the blanking deflector with respect to the direction of the optical axis, to block the charged particle beam having been deflected to be in a beam-off state, and a magnet coil, arranged in a center height position of the blanking deflector, to deflect the charged particle beam.