CALIBRATION MARKERS FOR A PHOTONICS CHIP

    公开(公告)号:US20240427094A1

    公开(公告)日:2024-12-26

    申请号:US18212754

    申请日:2023-06-22

    Abstract: Structures including a calibration marker adjacent to a photonic structure and methods of forming such structures. The structure comprises a semiconductor substrate, a photonic structure, and a back-end-of-line stack over the semiconductor substrate. The back-end-of-line stack includes a plurality of fill features, an exclusion area surrounded by the plurality of fill features, and a calibration marker in the exclusion area. The calibration marker is disposed adjacent to the photonic structure, and the calibration marker includes a feature having a predetermined dimension.

    Photonics chips including a fully-depleted silicon-on-insulator field-effect transistor

    公开(公告)号:US12176351B2

    公开(公告)日:2024-12-24

    申请号:US17973618

    申请日:2022-10-26

    Abstract: Structures for a photonics chip that include a fully-depleted silicon-on-insulator field-effect transistor and related methods. A first device region of a substrate includes a first device layer, a first portion of a second device layer, and a buried insulator layer separating the first device layer from the first portion of the second device layer. A second device region of the substrate includes a second portion of the second device layer. The first device layer, which has a thickness in a range of about 4 to about 20 nanometers, transitions in elevation to the second portion of the second device layer with a step height equal to a sum of the thicknesses of the first device layer and the buried insulator layer. A field-effect transistor includes a gate electrode on the top surface of the first device layer. An optical component includes the second portion of the second device layer.

    PIC DIE AND PACKAGE WITH MULTIPLE LEVEL AND MULTIPLE DEPTH CONNECTIONS OF FIBERS TO ON-CHIP OPTICAL COMPONENTS

    公开(公告)号:US20240402421A1

    公开(公告)日:2024-12-05

    申请号:US18802210

    申请日:2024-08-13

    Abstract: A photonic integrated circuit (PIC) die are provided. The PIC die includes a set of optical connect grooves including a first groove aligning a core of a first optical fiber positioned with a first optical component in a first layer at a first vertical depth in a plurality of layers of a body of the die, and a second groove aligning a core of a second optical fiber positioned therein with a second optical component in a second, different layer at a second different vertical depth in the plurality of layers. The grooves may also have end faces at different lateral depths from an edge of the body of the PIC die. Any number of the first and second grooves can be used to communicate an optical signal to any number of layers at different vertical and/or lateral depths within the body of the PIC die.

    PHOTODETECTORS INTEGRATED WITH A SEGMENTED COUPLING-ASSISTANCE FEATURE

    公开(公告)号:US20240377583A1

    公开(公告)日:2024-11-14

    申请号:US18196796

    申请日:2023-05-12

    Inventor: Yusheng Bian

    Abstract: Structures including a photodetector and methods of forming a structure including a photodetector. The structure comprises a photodetector including a pad and a semiconductor layer on the pad, a first waveguide core including a tapered section adjacent to a sidewall of the semiconductor layer, and a second waveguide core including a curved section adjacent to the sidewall of the semiconductor layer. The curved section includes a plurality of segments, and the tapered section of the first waveguide core is overlapped by at least one of the plurality of segments in the curved section of the second waveguide core.

    PHOTONIC INTEGRATED CIRCUIT STRUCTURE WITH POLARIZATION DEVICE FOR HIGH POWER APPLICATIONS

    公开(公告)号:US20240241313A1

    公开(公告)日:2024-07-18

    申请号:US18619985

    申请日:2024-03-28

    Inventor: Yusheng Bian

    CPC classification number: G02B6/1228 G02B6/126

    Abstract: Disclosed is a structure including a polarization device with first and second waveguides. The first waveguide includes a core (e.g., a silicon nitride (SiN) core) suitable for high-power applications. The second waveguide includes: a primary core (e.g., another SiN core), which is positioned laterally adjacent to the core of the first waveguide and suitable for high-power applications, and secondary core(s) stacked vertically with the primary core to steer the optical mode and ensure that mode matching occurs between adjacent first and second coupling sections of the first and second waveguides, respectively, in order to achieve high-power splitter and/or combiner functions. Optionally, the primary and secondary cores of the second waveguide can be tapered at least within the second coupling section to increase the likelihood of mode matching.

    Edge couplers with consecutively-arranged tapers

    公开(公告)号:US12038615B2

    公开(公告)日:2024-07-16

    申请号:US17701918

    申请日:2022-03-23

    Inventor: Yusheng Bian

    CPC classification number: G02B6/4203 G02B6/42

    Abstract: Structures for an edge coupler and methods of fabricating such structures. The structure includes a substrate, a first waveguide core, and a second waveguide core positioned in a vertical direction between the first waveguide core and the substrate. The second waveguide core includes a taper and an inverse taper longitudinally positioned adjacent to the taper.

    Light coupling between stacked photonics chips

    公开(公告)号:US12001056B2

    公开(公告)日:2024-06-04

    申请号:US17834375

    申请日:2022-06-07

    CPC classification number: G02B6/2934 G02B6/4215

    Abstract: Structures including stacked photonics chips and methods of fabricating a structure including stacked photonics chips. The structure comprises a first chip including a first waveguide core, a ring resonator adjacent to a portion of the first waveguide core, and a first dielectric layer over the first waveguide core and the ring resonator. The first dielectric layer has a first surface. The structure further comprises a second chip including a second waveguide core and a second dielectric layer over the second waveguide core. The second dielectric layer has a second surface adjacent to the first surface of the first dielectric layer, and the second waveguide core is positioned adjacent to the ring resonator.

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