公开(公告)号：US07528914B2

公开(公告)日：2009-05-05

申请号：US10995474

申请日：2004-11-24

申请人： Jae-Hyun Kim ,  Won-Sang Park ,  Sang-Woo Kim ,  Jae-Young Lee ,  Sung-Eun Cha ,  Jae-Ik Lim

发明人： Jae-Hyun Kim ,  Won-Sang Park ,  Sang-Woo Kim ,  Jae-Young Lee ,  Sung-Eun Cha ,  Jae-Ik Lim

IPC分类号： G02F1/1335 ,  G02F1/1337

CPC分类号： G02F1/133555 ,  G02F1/133371 ,  G02F1/1393

摘要： A vertical alignment mode reflective-transmissive liquid crystal display (LCD) includes the first substrate having an upper surface and a lower surface and the second substrate having an upper surface and a lower surface and facing the first substrate. A cell is formed between the upper surface of the first substrate and the lower surface of the second substrate. The cell has a plurality cell-gaps. A vertically aligned liquid crystal layer is disposed in the cell. The reflective region of the LCD has a cell-gap ranging from about 1.8 μm to about 2.2 μm, and the transmissive region of the LCD has a cell-gap ranging from about 3.6 μm to about 4.0 μm. The first optical film assembly including the first polarizer is disposed on the lower surface of the first substrate. The second optical film assembly including the second polarizer is disposed on the upper surface of the second substrate. An absorption axis of the first polarizer is substantially perpendicular to that of the second polarizer.

摘要翻译： 垂直取向模式反射透射型液晶显示器（LCD）包括具有上表面和下表面的第一基板，第二基板具有上表面和下表面并面向第一基板。 在第一基板的上表面和第二基板的下表面之间形成电池。 电池具有多个电池间隙。 垂直取向的液晶层设置在电池中。 LCD的反射区域具有范围从约1.8μm至约2.2μm的单元间隙，并且LCD的透射区域具有范围从约3.6μm至约4.0μm的单元间隙。 包括第一偏振器的第一光学膜组件设置在第一基板的下表面上。 包括第二偏振器的第二光学膜组件设置在第二基板的上表面上。 第一偏振器的吸收轴基本上垂直于第二偏振器的吸收轴。

公开(公告)号：US07511788B2

公开(公告)日：2009-03-31

申请号：US11004152

申请日：2004-12-03

申请人： Jae-Hyun Kim ,  Sung-Eun Cha ,  Sang-Woo Kim ,  Won-Sang Park ,  Jae-Young Lee ,  Jae-Ik Lim

发明人： Jae-Hyun Kim ,  Sung-Eun Cha ,  Sang-Woo Kim ,  Won-Sang Park ,  Jae-Young Lee ,  Jae-Ik Lim

IPC分类号： G02F1/1337

CPC分类号： G02F1/133707 ,  G02F1/133555 ,  G02F1/134336 ,  G02F1/1393

摘要： An array substrate includes a plate, a switching element, an insulating layer and a pixel electrode. The plate includes a pixel region, and the switching element is disposed on the plate. The insulating layer is disposed on the plate to include an opening for a multi-domain disposed in the pixel region and a contact hole. An electrode of the switching element is partially exposed through the contact hole. The pixel electrode is disposed on the insulating layer corresponding to the pixel region, an inner surface of the opening for the multi-domain and an inner surface of the contact hole so that the pixel electrode is electrically connected to the electrode of the switching element. Therefore, the viewing angle and the image display quality of the LCD apparatus are improved, and a manufacturing process is simplified.

摘要翻译： 阵列基板包括板，开关元件，绝缘层和像素电极。 板包括像素区域，并且开关元件设置在板上。 绝缘层设置在板上以包括设置在像素区域中的多畴的开口和接触孔。 开关元件的电极通过接触孔部分露出。 像素电极设置在与像素区域对应的绝缘层上，多畴的开口的内表面和接触孔的内表面，使得像素电极电连接到开关元件的电极。 因此，提高了LCD装置的视角和图像显示质量，并且简化了制造工艺。

公开(公告)号：US20090068585A1

公开(公告)日：2009-03-12

申请号：US12208880

申请日：2008-09-11

申请人： Dong-Woo HAN ,  Jeong-Sik Kim ,  Min-Ja Yoo ,  Jae-Woo Lee ,  Jae-Hyun Kim

发明人： Dong-Woo HAN ,  Jeong-Sik Kim ,  Min-Ja Yoo ,  Jae-Woo Lee ,  Jae-Hyun Kim

IPC分类号： G03C1/38 ,  G03F7/20 ,  C07C69/75 ,  C07C69/74 ,  C07J9/00 ,  C07D401/14

CPC分类号： C07C69/74 ,  C07C69/00 ,  C07C69/75 ,  C07C2601/08 ,  C07C2601/14 ,  C07C2603/74 ,  C07D207/12 ,  C07D209/32 ,  C07D211/40 ,  G03F7/0392 ,  G03F7/0397

摘要： In the formation of a fine pattern using a photolithography process, a dissolution promoter which can increase the difference of solubility between exposed region and unexposed region, and a photoresist composition including the same are disclosed. The dissolution promoter has the structure of the following formula (wherein, R is a hydrocarbon group of 1 to 40 carbon atoms, A is an alkyl group of 1 to 10 carbon atoms, p is 0 or 1, and q is an integer of 1 to 20). Moreover, the photoresist composition comprises 3 to 30 wt % (weight %) of the photosensitive compound; 1 to 30 weight parts of a dissolution promoter represented by the formula, with respect to 100 weight parts of the photosensitive compound; 0.05 to weight parts of a photo-acid generator with respect to 100 weight parts of the photosensitive compound; and a remaining organic solvent.

摘要翻译： 在使用光刻工艺形成精细图案时，公开了可以增加曝光区域和未曝光区域之间的溶解度差的溶解促进剂，以及包含其的光刻胶组合物。 溶解促进剂具有下式的结构（其中，R为碳原子数为1〜40的烃基，A为碳原子数为1〜10的烷基，p为0或1，q为1的整数） 到20）。 此外，光致抗蚀剂组合物含有3〜30重量％（重量）感光性化合物; 1〜30重量份由式表示的溶解促进剂，相对于100重量份的感光性化合物; 相对于100重量份感光性化合物的光酸产生剂为0.05〜 和剩余的有机溶剂。

公开(公告)号：US07501222B2

公开(公告)日：2009-03-10

申请号：US11471838

申请日：2006-06-21

申请人： Jung-Youl Lee ,  Jae-Woo Lee ,  Jae-Hyun Kim

发明人： Jung-Youl Lee ,  Jae-Woo Lee ,  Jae-Hyun Kim

IPC分类号： G03C1/73 ,  G03F7/039 ,  G03F7/20 ,  G03F7/30

CPC分类号： G03F7/0397 ,  C07C69/54 ,  C07C2601/08 ,  C07C2601/14 ,  C07C2602/42 ,  C07C2602/44 ,  C07C2603/74 ,  C08F220/18 ,  G03F7/0395 ,  Y10S430/106 ,  Y10S430/111 ,  Y10S430/115 ,  Y10S430/122 ,  Y10S430/126

摘要： A polymer including a monomer represented by the following Formula and a photoresist composition including the same are disclosed. The polymer and photoresist composition can improve the resolution and the process margin due to the low activation energy of the deprotection reaction of the alcohol ester group including saturated cyclic hydrocarbyl group, and also can produce fine photoresist patterns because they have a stable PEB(Post Exposure Baking) temperature sensitivity, and further, can improve the focus depth margin and the line edge roughness of the resist layer. In the above Formula, R* is a hydrogen or methyl group, R1 is saturated hydrocarbyl group of 1 to 5 carbon atoms, R is mono-cyclic or multi-cyclic homo or hetero saturated hydrocarbyl group of 3 to 50 carbon atoms, and n is an integer of at least 2.

摘要翻译： 公开了包含由下式表示的单体的聚合物和包含其的光致抗蚀剂组合物。 聚合物和光致抗蚀剂组合物由于具有饱和环状烃基的醇酯基的脱保护反应的活化能低而能够提高分辨率和工艺余量，并且由于它们具有稳定的PEB（曝光后） 烘烤）温度敏感性，并且还可以提高抗蚀剂层的聚焦深度和线边缘粗糙度。 在上式中，R *为氢或甲基，R 1为1〜5个碳原子的饱和烃基，R为3〜50个碳原子的单环或多环均基或杂饱和烃基，n 是至少为2的整数。

公开(公告)号：US20080213701A1

公开(公告)日：2008-09-04

申请号：US11952324

申请日：2007-12-07

申请人： Sang-Jeoung Kim ,  Hyo-Jung Roh ,  Jong-Kyoung Park ,  Jeong-Sik Kim ,  Hyun-Jin Kim ,  Jae-Hyun Kim

发明人： Sang-Jeoung Kim ,  Hyo-Jung Roh ,  Jong-Kyoung Park ,  Jeong-Sik Kim ,  Hyun-Jin Kim ,  Jae-Hyun Kim

IPC分类号： G03F7/30 ,  F21V9/04 ,  C08G77/04

CPC分类号： G03F7/091 ,  C08G77/045 ,  C08G77/38 ,  C09D183/04 ,  G03F7/0752 ,  Y10S438/952

摘要： A polymer which has siloxane group at a main chain thereof and a composition including the same, for forming an organic anti-reflective coating layer are disclosed. The polymer for forming an organic anti-reflective coating layer is represented by following Formula. In Formula, R is hydrogen atom, C1˜C20 alkyl group, C1˜C10 alcohol group or epoxy group, R1 is independently hydrogen atom, n is an integer of 1-50, R2 is C1˜C20 alkyl group, C3˜C20 cycloalkyl group, C6˜C20 aryl group or C7˜C12 arylalkyl group, R3 is hydrogen atom, C1˜C10 alcohol group or epoxy group and POSS is a polyhedral oligosilsesquioxane.

摘要翻译： 公开了一种在其主链上具有硅氧烷基团的聚合物及其组合物，用于形成有机抗反射涂层。 用于形成有机抗反射涂层的聚合物由下式表示。 在式中，R是氢原子，C 1 -C 20烷基，C 1 -C 10烷基 基团或环氧基团，R 1独立地是氢原子，n是1-50的整数，R 2是C 1 -C 6烷基， C 20 -C 20烷基，C 3 -C 20环烷基，C 6 -C 20烷基，C 1 -C 20烷基，C 3 -C 20环烷基，C 6 -C 20 >芳基或C 7-12 C 12芳烷基，R 3是氢原子，C 1 -C 4 醇基或环氧基，POSS是多面体低聚倍半硅氧烷。

公开(公告)号：US20080193877A1

公开(公告)日：2008-08-14

申请号：US12025823

申请日：2008-02-05

申请人： Ju-Young Kim ,  Joon-Seok Oh ,  Jae-Hyun Kim

发明人： Ju-Young Kim ,  Joon-Seok Oh ,  Jae-Hyun Kim

IPC分类号： G03F7/004 ,  G03F7/30

CPC分类号： G03F7/40 ,  Y10S430/11

摘要： In a composition for forming an interfacial layer on a photoresist pattern, and a method of forming a pattern using the composition, the composition includes a water-soluble polymer, a cross-linking agent and a water-miscible solvent. The water-soluble polymer includes a repeating unit represented by Formula 1, wherein R1, R2, R3, R4 and R5 independently denote a hydrogen atom, a hydroxyl group, an alkyl group, a hydroxyalkyl group, an aminoalkyl group, a mercaptoalkyl group, an amino group, a mercapto group or an ammonium salt, R6 denotes a hydrogen atom or an alkyl group, m denotes an integer of 1 to 4 both inclusive, and x denotes an integer of 1 to 1,000 both inclusive. Also, at least one of R1, R2, R3, R4 and R5 is a hydroxyl group, a hydroxyalkyl group, an aminoalkyl group, a mercaptoalkyl group, an amino group, a mercapto group or an ammonium salt.

摘要翻译： 在用于在光致抗蚀剂图案上形成界面层的组合物和使用该组合物形成图案的方法中，该组合物包括水溶性聚合物，交联剂和水混溶性溶剂。 水溶性聚合物包括由式1表示的重复单元，其中R 1，R 2，R 3，R 4 R 5和R 5独立地表示氢原子，羟基，烷基，羟基烷基，氨基烷基，巯基烷基，氨基，巯基或铵 盐，R 6表示氢原子或烷基，m表示1〜4的整数，x表示1〜1000的整数。 此外，R 1，R 2，R 3，R 4和R 3中的至少一个， 羟基，羟基烷基，氨基烷基，巯基烷基，氨基，巯基或铵盐。

公开(公告)号：US07411148B2

公开(公告)日：2008-08-12

申请号：US11356947

申请日：2006-02-16

申请人： Gi-Chung Kwon ,  Sang-Won Lee ,  Sae-Hoon Uhm ,  Jae-Hyun Kim ,  Bo-Han Hong ,  Yong-Kwan Lee

发明人： Gi-Chung Kwon ,  Sang-Won Lee ,  Sae-Hoon Uhm ,  Jae-Hyun Kim ,  Bo-Han Hong ,  Yong-Kwan Lee

IPC分类号： B23K9/00 ,  B23K9/02

CPC分类号： H01J37/32935 ,  H01J37/321 ,  H05H1/46

摘要： A plasma generation apparatus includes: a chamber having a chamber lid and defining an airtight reaction region; a susceptor in the chamber; a gas supplier supplying a process gas to the chamber; and a toroidal core vertically disposed with respect to the susceptor through the chamber lid, including: a toroidal ferromagnetic core combined with the chamber, the toroidal ferromagnetic core having a first portion outside the chamber and a second portion inside the chamber, the second portion having an opening portion; a radio frequency (RF) power supply connected to the chamber; an induction coil electrically connected to the RF power supply, the induction coil rolling the first portion; and a matching circuit matching an impedance between the RF power supply and the induction coil.

摘要翻译： 等离子体产生装置包括：具有室盖并限定气密反应区域的室; 室内的一个感受器; 供应处理气体的气体供应器; 以及相对于所述基座通过所述室盖垂直设置的环形芯，包括：与所述室结合的环形铁磁芯，所述环形铁磁芯具有在所述室外部的第一部分和所述室内的第二部分，所述第二部分具有 开口部; 连接到所述室的射频（RF）电源; 感应线圈，其电连接到所述RF电源，所述感应线圈滚动所述第一部分; 以及与RF电源和感应线圈之间的阻抗匹配的匹配电路。

公开(公告)号：US07368219B2

公开(公告)日：2008-05-06

申请号：US11312788

申请日：2005-12-20

申请人： Sang-Jung Kim ,  Jong-Yong Kim ,  Deog-Bae Kim ,  Jae-Hyun Kim

发明人： Sang-Jung Kim ,  Jong-Yong Kim ,  Deog-Bae Kim ,  Jae-Hyun Kim

IPC分类号： G03C1/76

CPC分类号： G03F7/091 ,  C08G65/22

摘要： A polymer for forming an organic anti-reflective coating layer between an etching layer and a photoresist layer to absorb an exposure light in a photolithography process and a composition comprising the same are disclosed. The polymer for forming an organic anti-reflective coating layer has a repeating unit represented by wherein, R1 is hydrogen or methyl group, and R2 is a substituted or non-substituted alky group of C1 to C5. The composition for forming the organic anti-reflective coating layer includes the polymer having the repeating unit represented by above Formulas; a light absorber; and a solvent.

摘要翻译： 公开了一种用于在蚀刻层和光致抗蚀剂层之间形成有机抗反射涂层以在光刻工艺中吸收曝光光的聚合物和包含其的组合物。 用于形成有机抗反射涂层的聚合物具有由下式表示的重复单元，其中R 1是氢或甲基，R 2是取代或未取代的， C1至C5的取代烷基。 用于形成有机抗反射涂层的组合物包括具有由上式表示的重复单元的聚合物; 光吸收器 和溶剂。

公开(公告)号：US20070285600A1

公开(公告)日：2007-12-13

申请号：US11675300

申请日：2007-02-15

申请人： Yong-Suk Yeo ,  Jae-Hyun Kim ,  Seung-Kyu Lee ,  Won-Sang Park

发明人： Yong-Suk Yeo ,  Jae-Hyun Kim ,  Seung-Kyu Lee ,  Won-Sang Park

IPC分类号： G02F1/1343 ,  G02F1/1335

CPC分类号： G02F1/133512 ,  G02F1/13394 ,  G02F1/134309 ,  G02F2001/134318 ,  G02F2001/134345

摘要： A liquid crystal display includes: a first substrate; a gate line formed on the first substrate; a data line intersecting the gate line; a thin film transistor connected to the gate line and to the data line; a pixel electrode electrically connected to the thin firm transistor, including first and second sub-electrodes, and overlapping with a portion of the data line; a storage electrode line formed on the first substrate, disposed between the first and second sub-electrodes, and including an overlapped portion with the pixel electrode; a second substrate arranged facing the first substrate; a common electrode formed on the second substrate and including a cutout corresponding to the first and second sub-electrodes; and a liquid crystal layer formed between the common electrode and the pixel electrode.

摘要翻译： 液晶显示器包括：第一基板; 形成在第一基板上的栅极线; 与栅极线相交的数据线; 连接到栅极线和数据线的薄膜晶体管; 电连接到薄的牢固晶体管的像素电极，包括第一和第二子电极，并与数据线的一部分重叠; 存储电极线，形成在所述第一基板上，设置在所述第一和第二子电极之间，并且包括与所述像素电极重叠的部分; 布置成面对所述第一基板的第二基板; 形成在所述第二基板上并具有对应于所述第一和第二子电极的切口的公共电极; 以及形成在公共电极和像素电极之间的液晶层。

公开(公告)号：US20070249117A1

公开(公告)日：2007-10-25

申请号：US11730323

申请日：2007-03-30

申请人： Kyong-Rim Kang ,  Sun-Yul Ahn ,  Young-Ho Kim ,  Jae-Hyun Kim ,  Joo-Hyung Yang ,  Tae-Sung Kim

发明人： Kyong-Rim Kang ,  Sun-Yul Ahn ,  Young-Ho Kim ,  Jae-Hyun Kim ,  Joo-Hyung Yang ,  Tae-Sung Kim

IPC分类号： H01L21/8242 ,  C08G69/44 ,  H01L21/31

CPC分类号： H01L21/32139 ,  C08F220/06 ,  C08F220/18 ,  C08F220/28 ,  G03F7/038 ,  G03F7/40 ,  H01L27/10814 ,  H01L27/10852 ,  H01L27/10894 ,  H01L27/10897

摘要： A polymer resin composition, a method for forming a pattern using the polymer resin composition, and a method for fabricating a capacitor using the polymer resin composition are disclosed. The polymer resin composition includes about 75 to 93 percent by weight of a copolymer prepared from benzyl methacrylate, methacrylic acid, and hydroxyethyl methacrylate; about 1 to 7 percent by weight of a cross-linking agent; about 0.01 to 0.5 percent by weight of a thermal acid generator; about 0.01 to 1 percent by weight of a photoacid generator; about 0.00001 to 0.001 percent by weight of an organic base; and a solvent.

摘要翻译： 公开了一种聚合物树脂组合物，使用该聚合物树脂组合物形成图案的方法，以及使用该聚合物树脂组合物制造电容器的方法。 聚合物树脂组合物包含约75至93重量％的由甲基丙烯酸苄酯，甲基丙烯酸和甲基丙烯酸羟乙酯制备的共聚物; 约1至7重量％的交联剂; 约0.01〜0.5重量％的热酸发生剂; 约0.01至1重量％的光酸产生剂; 约0.00001至0.001重量％的有机碱; 和溶剂。