Sewage treatment system using granule

    公开(公告)号:US10384965B2

    公开(公告)日:2019-08-20

    申请号:US15790262

    申请日:2017-10-23

    Abstract: The present invention relates to a sewage treatment system using granules, and more particularly, the sewage treatment system includes: an anoxic tank which has a sewage inlet port into which sewage is introduced; an anaerobic tank which is connected to the anoxic tank; intermittent aeration tanks which are connected to the anaerobic tank, have two or more separately divided spaces, and have, in the spaces, granules and aeration devices that alternately operate; and a settling tank which is connected to the intermittent aeration tanks, and the sewage treatment system is operated by a method including: a first step of introducing sewage; a second step of allowing the introduced sewage to pass through the anoxic tank and to be supplied with carbon; a third step of allowing the sewage passing through the anoxic tank to be introduced into the anaerobic tank; a fourth step of allowing the sewage passing through the anaerobic tank to be introduced into a first intermittent aeration tank and a second intermittent aeration tank which include the aeration devices and the granules including nitrogen treatment microorganisms; a fifth step of allowing the first intermittent aeration tank to be in an aeration state and the second intermittent aeration tank to be in a non-aeration state; and a sixth step of allowing the first intermittent aeration tank to be in the non-aeration state and the second intermittent aeration tank to be in the aeration state.

    Apparatus and method for coating inner wall of metal tube

    公开(公告)号:US10337099B2

    公开(公告)日:2019-07-02

    申请号:US15240253

    申请日:2016-08-18

    Abstract: An apparatus and a method for coating an inner wall of a metal tube are provided. The apparatus for coating an inner wall of a metal tube includes mounting posts on which both end openings of a metal tube are mounted and configured to block the inside of the metal tube from the ambient air so that a pressure in the metal tube is adjustable by the vacuum exhaust and inflow of process gases, a sputtering target metal tube installed inside the metal tube coaxially with the metal tube, a pulse electromagnet installed around an outside perimeter of the metal tube coaxially with the metal tube to apply a pulse magnetic field in an axial direction of the metal tube, an electromagnetic pulse power supply unit configured to apply pulse power to the pulse electromagnet, and a sputtering pulse power supply unit configured to synchronize a negative high-voltage pulse with the pulse power applied to the pulse electromagnet and apply to the sputtering target metal tube.

    SPIN ORBIT TORQUE MAGNETIC RAM
    250.
    发明申请

    公开(公告)号:US20190165254A1

    公开(公告)日:2019-05-30

    申请号:US16196659

    申请日:2018-11-20

    Abstract: A spin torque magnetic RAM according to the present invention includes at least one row selection line positioned on a silicon substrate to induce a spin orbit interaction therein; at least one first magnetic pattern positioned on the row selection line; a second magnetic pattern positioned on the first magnetic pattern; a tunnel barrier positioned on the second magnetic pattern; and a third magnetic pattern positioned on the tunnel barrier, wherein the first magnetic pattern is made of a cobalt film, the first magnetic pattern and the second magnetic pattern have a total thickness of 5 nm to form a free layer, and the third magnetic pattern is formed with a pinned layer in which a magnetization direction is fixed.

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