Abstract:
Methods of fabricating high-k dielectric layers having reduced impurities for use in semiconductor applications are disclosed. The methods include the steps of: forming a stacked dielectric layer having a first dielectric layer and a second dielectric layer formed on a semiconductor substrate using an ALD method, in combination with a post-treatment step performed to the stacked dielectric layer. The steps of forming the stacked dielectric layer and performing the post-treatment are repeated at least once, thereby fabricating the high-k dielectric layer.
Abstract:
The present invention relates to a nano-scale flash memory device having a saddle structure, and a fabrication method thereof. Particularly, the invention relates to a highly integrated, high-performance flash memory device having a saddle structure for improving the scaling-down characteristic and performance of the MOS-based flash memory device. According to the invention, a portion of an insulating film around a recessed channel is selectively removed to expose the surface and sides of the recessed channel. A tunneling insulating film is formed on the exposed surface and sides of the recessed channel. On the resulting structure, a floating electrode, an inter-electrode insulating film and a control electrode are formed, thus fabricating the device. Particularly when the floating electrode is made of an insulating nitride film or pluralities of nano-scale dots, an excellent memory device can be made without using an additional mask. According to the invention, the scaling-down characteristic of the device is excellent, and current drive capability can be greatly increased since a channel through which current can flow is formed on the surface and sides of the recessed channel. Also, the ability of the control electrode to control the channel can be enhanced, so that memory write/erase characteristics can be improved.
Abstract:
An apparatus for providing multiple screens and a method of dynamically configuring multiple screens are provided. The apparatus for providing multiple screens includes a screen generating module that generates a logical screen including at least one of a background still image, a video raster, and a graphic raster, each represented as an HScreen Device, and a service selecting module that adds a predetermined player to at least one of the HScreen Devices representing the background still image, the video raster, and the graphic raster included in the logical screen.
Abstract:
An apparatus for providing multiple screens and a method of dynamically configuring multiple screens are provided. The method of dynamically configuring multiple screens includes generating a plurality of logical screens; associating a service context with a first logical screen selected from the generated logical screens; and moving the service context from the first logical screen to a second logical screen selected from the generated logical screens.
Abstract:
Provided are an apparatus for providing multiple screens and a method of dynamically configuring multiple screens in which a plurality of screens for providing a plurality of content items are dynamically configured using flags included in received packets. The apparatus includes a digital signal processing module which determines whether an application included in received data information supports a plurality of logical screens for representing a plurality of services based on a signal included in the received data information, and an operational module which maps the plurality of logical screens to a display screen according to a result of the determination performed by the digital signal processing module.
Abstract:
A semiconductor device and a method of manufacturing the semiconductor device, in which the semiconductor device includes a semiconductor substrate in which PMOS transistor regions and NMOS transistor regions are formed, a PMOS transistor including P-type source and drain regions and a gate electrode, and an NMOS transistor formed on an Si channel region between N-type source and drain regions. The PMOS transistor is formed in each PMOS transistor region, and the gate electrode is formed on a high-dielectric gate insulating film formed on an SiGe channel region between the P-type source and drain regions. Further, the NMOS transistor includes a high-dielectric gate insulating film and a gate electrode formed on the gate insulating film, and the NMOS transistor is formed in each NMOS transistor region.
Abstract:
An air conditioner is provided. The air conditioner includes a main and sub drain pan, a first and second heat exchanger, a condensed water pipe, and a pipe coupling element. The main drain pan is provided between a front frame and a rear frame, to divide a space between the rear frame and the front frame into an upper and lower section. The first and second heat exchangers are respectively provided at a lower and upper portion of the main drain pan, to allow heat exchange to occur between air and coolant. The sub-drain pan is provided at the lower portion of the main drain pan, to collect condensed water generated by the first and second heat exchangers. The condensed water pipe guides condensed water collected in a base pan to the sub-drain pan. The pipe coupling element detachably couples one end of the condensed water pipe to the sub-drain pan.
Abstract:
A semiconductor package and a method of fabricating the same are provided. The semiconductor package includes a semiconductor chip and a circuit board. The semiconductor chip has a bond pad. The circuit board has a base substrate with a throughole, and a conductive film pattern placed on a sidewall of the throughole. The throughole is aligned with the bond pad to expose the bond pad. A connector located within the throughole electrically connects the conductive film pattern to the bond pad. A sealing layer covers the connector.
Abstract:
Example embodiments of the present invention relate to an alloy solder and a semiconductor device using the alloy solder. Other example embodiments relate to an alloy solder capable of increasing reliability of a junction between a semiconductor chip and a substrate. According to still other example embodiments of the present invention, there may be a tin-bismuth (Sn—Bi) family alloy solder between a semiconductor chip and a substrate, and a semiconductor device using the alloy solder. The semiconductor device may include a semiconductor chip formed with a plurality of gold (Au) bumps, a substrate having metal wirings connected to the gold (Au) bumps, and a junction including a tin-bismuth (Sn—Bi) family alloy solder interposed between and connecting the gold (Au) bump and the metal wiring.The formation of a relatively large amount of AuSn4 intermetallic compound may be inhibited in the junction because gold (Au) may not easily diffuse into a tin-bismuth (Sn—Bi) family alloy solder of a liquid state during a reflow process for connecting the semiconductor chip and substrate. Therefore, most of the junction may be retained as the tin-bismuth (Sn—Bi) family alloy solder.
Abstract:
The present invention discloses a paste for screen printing which is used in a process of fabricating an anode functional layer, an electrolyte layer and a cathode layer of an anode-supported solid oxide fuel cell. The paste for the solid oxide fuel cell contains raw material powder of each layer, ethyl cellulose which is a binder, alpha terpineol which is a solvent, and an alcoholic solvent which has solubility to a thermosetting binder contained in an anode support and which is added by 0.5 to 20 wt % of alpha terpineol as an additional solvent. The present invention also discloses a fabricating method of an anode-supported solid oxide fuel cell which forms each layer of the fuel cell by screen printing by using the paste. According to the present invention, in the highly efficient pore structure anode support fabricated by thermosetting molding, the composition of the paste for screen printing is controlled to improve weftability, and the movement of the elements is restricted by curing, thereby reducing surface defects of the layers and interfacial defects between the layers in fabrication and improving the interface strength. As a result, the high performance large area solid oxide fuel cell can be economically and efficiently fabricated, and reliability of the product can be remarkably improved.