Abstract:
A cooling apparatus includes: a first air nozzle configured to spray air to the metal strip from above; a first water nozzle configured to spray water to the metal strip from above; and a gas discharging part configured to discharge an air around the metal strip upwardly, wherein the first air nozzle, the first water nozzle and the gas discharging part are aligned along a transport direction of the metal strip in the order of the first air nozzle, the first water nozzle and the gas discharging part, wherein the cooling apparatus is adapted to collide the air from the first air nozzle against the metal strip and then the air moves along a surface of the metal strip to a point at which steam is generated by the water from the first water nozzle, and is adapted to discharge the steam using the gas discharging part.
Abstract:
A vapor circulation regeneration system is provided for utilizing a vapor by circulation and regeneration. The system includes at least: a liquefaction regeneration unit including a liquefaction space where the vapor of an object to be heated is liquefied and a heating part for maintaining a liquid-like state; a vaporization unit for heating the liquid-like material by means of a heating part so as to generate a vapor; a fluid communication part for establishing fluid communication between the liquefaction regeneration unit and the vaporization unit; a processing unit for processing an object to be processed by using the vapor; a return pipe for returning the vapor used in the processing unit to the liquefaction regeneration unit; a liquefaction regeneration temperature control part for controlling the temperature of the liquefaction regeneration unit; and a vaporization temperature control part for controlling the temperature of the vaporization unit.
Abstract:
Provided is a plasma generation apparatus capable of generating uniform plasma over a wide range. The plasma generation apparatus includes two oppositely arranged plasma guns each injecting a discharge gas to be ionized, and having a cathode for emitting electrons, and a converging coil for forming a magnetic flux to guide the emitted electrons, and polarities of the converging coils with respect to the cathodes in the two plasma guns are opposite to each other.
Abstract:
Provided is a burner tile that has good fire resistance, good heat resistance, good erosion resistance, and good thermal shock resistance. A burner tile 1E includes a molded inorganic fiber product and has a burner main hole 3E. The burner tile 1E includes an inner layer 120 including a combination of inorganic fiber rods 121 and 122 such that the inner layer 120 defines an inner circumferential surface of the main hole 3E, and an outer layer 130 formed by surrounding an outer circumferential surface of the inner layer 120 with the molded inorganic fiber product. Part of the burner tile 1E extending along the inner circumferential surface of the main hole 3E has a high bulk density achieved by highly concentrating an inorganic binder in the inorganic fiber in part including the inner circumferential surface.
Abstract:
A thermal processing furnace for workpieces has a blowing hood in which a nozzle is installed, the nozzle blowing a gas flow to thermally process a workpiece, including a driving mechanism that adjusts a distance between the nozzle and a portion of the workpiece facing the nozzle so that the gas flow blown from the nozzle impinges on workpieces of various dimensions at a desired flow velocity, wherein a plurality of nozzles are arranged as the nozzle along a conveying direction of the workpiece in a zone where the thermal processing is performed, and the driving mechanism adjusts a distance between each of the nozzles and a portion of the workpiece facing the nozzle individually in each of the plurality of nozzles.
Abstract:
Provided is a plasma generation apparatus capable of generating uniform plasma over a wide range. The plasma generation apparatus includes two oppositely arranged plasma guns each injecting a discharge gas to be ionized, and having a cathode for emitting electrons, and a converging coil for forming a magnetic flux to guide the emitted electrons, and polarities of the converging coils with respect to the cathodes in the two plasma guns are opposite to each other.
Abstract:
The present invention provides a plasma processing apparatus capable of bringing plasma close to a processing target and separating the plasma from the processing target. The plasma processing apparatus 1 according to the present invention has a chamber internally having a holding space 2a in which a processing target object 5 is held, and a plasma space 2b in which plasma is to be formed, a plasma gun 3 for emitting electrons into the plasma space 2b to form the plasma, and at least one pair of position-adjustable opposed magnets 4 for forming a magnetic flux passing across the chamber 2, between the holding space 2a and the plasma space 2b.