Systems for improved heat exchanger
    23.
    发明申请
    Systems for improved heat exchanger 有权
    改进换热器的系统

    公开(公告)号:US20060144569A1

    公开(公告)日:2006-07-06

    申请号:US11027384

    申请日:2004-12-31

    Abstract: According to some embodiments, systems for an improved heat exchanger may be provided. In some embodiments, a heat exchanger may comprise a core defining a cavity, a plurality of fins extending outwardly from the core, and an element disposed within the cavity of the core, wherein the element is to direct fluid within the cavity.

    Abstract translation: 根据一些实施例,可以提供用于改进的热交换器的系统。 在一些实施例中,热交换器可以包括限定空腔的芯,从芯部向外延伸的多个翅片以及设置在芯体的空腔内的元件,其中该元件将在腔体内引导流体。

    Clutch mechanism and method for moving media within an image forming apparatus
    24.
    发明申请
    Clutch mechanism and method for moving media within an image forming apparatus 有权
    用于在图像形成装置内移动介质的离合器机构和方法

    公开(公告)号:US20060096826A1

    公开(公告)日:2006-05-11

    申请号:US10983402

    申请日:2004-11-08

    CPC classification number: F16D41/063 F16D41/06 F16D41/064

    Abstract: A clutch adapted for use to move media in an image forming apparatus having an independently rotatable first race, an independently rotatable second race, and an open central section within the interior of the first and second races. The clutch has a bearing movable between an engaged position in simultaneously contact with the first and second races to transmit a rotational torque from the first race to the second race and a second disengaged position moveable through the open central section. During torque transmission, the bearing simultaneously engages one of a plurality of spaced-apart fins disposed around the open central section on the first race and one of a plurality of spaced-apart catches on the second race disposed outside of the plurality of fins.

    Abstract translation: 一种用于在具有独立可旋转的第一座圈,独立可旋转的第二座圈和在第一和第二种族的内部内的敞开的中心区域的成像设备中移动介质的离合器。 离合器具有可在与第一和第二种族同时接触的接合位置之间移动的轴承,以将旋转扭矩从第一座圈传递到第二座圈,以及可移动通过打开的中心部分的第二脱离位置。 在转矩传递期间,轴承同时接合设置在第一座圈上的开放中心部分周围的多个间隔开的翅片中的一个,并且设置在多个翅片外侧的第二座圈上的多个间隔开的卡扣中的一个。

    Wafer probe for measuring plasma and surface characteristics in plasma processing enviroments
    26.
    发明申请
    Wafer probe for measuring plasma and surface characteristics in plasma processing enviroments 审中-公开
    用于测量等离子体处理环境中的等离子体和表面特性的晶圆探针

    公开(公告)号:US20050039852A1

    公开(公告)日:2005-02-24

    申请号:US10951084

    申请日:2004-09-27

    CPC classification number: H01J37/32935 H01L21/67253

    Abstract: There is provided by this invention a wafer probe for measuring plasma and surface characteristics in plasma processing environment that utilizes integrated sensors on a wafer substrate. A microprocessor mounted on the substrate receives input signals from the integrated sensors to process, store, and transmit the data. A wireless communication transceiver receives the data from the microprocessor and transmits information outside of the plasma processing system to a computer that collects the data during plasma processing. The integrated sensors may be dual floating Langmuir probes, temperature measuring devices, resonant beam gas sensors, or hall magnetic sensors. There is also provided a self-contained power source that utilizes the plasma for power that is comprised of a topographically dependent charging device or a charging structure that utilizes stacked capacitors.

    Abstract translation: 本发明提供一种用于测量在晶片衬底上利用集成传感器的等离子体处理环境中的等离子体和表面特性的晶片探针。 安装在基板上的微处理器从集成传感器接收输入信号以处理,存储和发送数据。 无线通信收发器从微处理器接收数据并将等离子体处理系统外的信息传送到在等离子体处理期间收集数据的计算机。 集成传感器可以是双浮动朗缪尔探头,温度测量装置,谐振束气体传感器或霍尔磁传感器。 还提供了一种独立的电源,其利用由等离子体构成的地形学依赖的充电装置或利用堆叠的电容器的充电结构。

    Wafer probe for measuring plasma and surface characteristics in plasma processing environments
    27.
    发明申请
    Wafer probe for measuring plasma and surface characteristics in plasma processing environments 有权
    用于测量等离子体处理环境中的等离子体和表面特性的晶圆探针

    公开(公告)号:US20050034812A1

    公开(公告)日:2005-02-17

    申请号:US10951162

    申请日:2004-09-27

    CPC classification number: H01J37/32935 H01L21/67253

    Abstract: There is provided by this invention a wafer probe for measuring plasma and surface characteristics in plasma processing environment that utilizes integrated sensors on a wafer substrate. A microprocessor mounted on the substrate receives input signals from the integrated sensors to process, store, and transmit the data. A wireless communication transceiver receives the data from the microprocessor and transmits information outside of the plasma processing system to a computer that collects the data during plasma processing. The integrated sensors may be dual floating Langmuir probes, temperature measuring devices, resonant beam gas sensors, or hall magnetic sensors. There is also provided a self-contained power source that utilizes the plasma for power that is comprised of a topographically dependent charging device or a charging structure that utilizes stacked capacitors.

    Abstract translation: 本发明提供一种用于测量在晶片衬底上利用集成传感器的等离子体处理环境中的等离子体和表面特性的晶片探针。 安装在基板上的微处理器从集成传感器接收输入信号以处理,存储和发送数据。 无线通信收发器从微处理器接收数据并将等离子体处理系统外的信息传送到在等离子体处理期间收集数据的计算机。 集成传感器可以是双浮动朗缪尔探头,温度测量装置,谐振束气体传感器或霍尔磁传感器。 还提供了一种独立的电源,其利用由等离子体构成的地形学依赖的充电装置或利用堆叠的电容器的充电结构。

    Systems and methods for calibrating a switched mode ion energy distribution system
    28.
    发明授权
    Systems and methods for calibrating a switched mode ion energy distribution system 有权
    用于校准开关模式离子能量分配系统的系统和方法

    公开(公告)号:US09210790B2

    公开(公告)日:2015-12-08

    申请号:US13597032

    申请日:2012-08-28

    Abstract: Systems, methods and apparatus for regulating ion energies and ion energy distributions along with calibrating a bias source and a plasma processing chamber are disclosed. An exemplary method includes applying a periodic voltage function to a load emulator, which emulates electrical characteristics of a plasma load and associated electronics such as an e-chuck. The load emulator can be measured for various electrical parameters and compared to expected parameters generated by the bias source. Differences between measured and expected values can be used to identify and correct faults and abnormalities in the bias supply, the chamber, or a power source used to ignite and sustain the plasma. Once the bias supply is calibrated, the chamber can be calibrated by measuring and calculating an effective capacitance comprising a series and parallel capacitance of the substrate support and optionally the substrate.

    Abstract translation: 公开了用于调节离子能量和离子能量分布以及校准偏压源和等离子体处理室的系统,方法和装置。 一种示例性方法包括将周期性电压函数应用于负载仿真器,负载仿真器模拟等离子体负载的电特性和相关联的电子设备例如电动卡盘。 可以测量负载仿真器的各种电气参数,并与偏置源产生的预期参数进行比较。 测量值和预期值之间的差异可用于识别和纠正偏置电源,腔室或用于点燃和维持等离子体的电源的故障和异常。 一旦偏置电源被校准,可以通过测量和计算包括衬底支撑件和任选的衬底的串联和并联电容的有效电容来校准腔室。

    Retrieving a user data set from multiple memories
    29.
    发明授权
    Retrieving a user data set from multiple memories 有权
    从多个存储器检索用户数据集

    公开(公告)号:US08959297B2

    公开(公告)日:2015-02-17

    申请号:US13488189

    申请日:2012-06-04

    Abstract: An apparatus and associated methodology for a data storage system having a data storage space operably transferring user data via input/output (I/O) commands between the data storage system and another device. The data storage space includes a first memory device operably storing location information for a selected user data set corresponding to one of the I/O commands. The first memory also operably stores a first amount of the selected user data set. The data storage space also includes a second memory device different than the first memory device and operably storing a different second amount of the selected user data set. The data storage system has a controller that interleaves an entirety of the selected user data set from the first and second memory devices during execution of another of the I/O commands.

    Abstract translation: 一种用于具有数据存储空间的数据存储系统的装置和相关方法,所述数据存储空间通过数据存储系统和另一设备之间的输入/输出(I / O)命令可操作地传送用户数据。 数据存储空间包括可操作地存储对应于I / O命令之一的所选用户数据集的位置信息的第一存储器设备。 第一存储器还可操作地存储所选择的用户数据集的第一数量。 数据存储空间还包括与第一存储器设备不同的第二存储器件,并可操作地存储所选择的用户数据集的不同的第二量。 数据存储系统具有控制器,该控制器在执行另一个I / O命令期间,从第一和第二存储器装置交织所选择的用户数据集的整体。

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