公开(公告)号：US20200013685A1

公开(公告)日：2020-01-09

申请号：US16572751

申请日：2019-09-17

Applicant: Adriaan Johan VAN LEEST ,  Anagnostis TSIATMA ,  Paul Christiaan HINNEN ,  Elliott Gerard McNAMARA ,  Alok VERMA ,  Thomas THEEUWES ,  Hugo Augustinus Joseph CRAMER

Inventor： Adriaan Johan VAN LEEST ,  Anagnostis TSIATMA ,  Paul Christiaan HINNEN ,  Elliott Gerard McNAMARA ,  Alok VERMA ,  Thomas THEEUWES ,  Hugo Augustinus Joseph CRAMER

IPC: H01L21/66 ,  G03F9/00 ,  G01N21/95

Abstract: A method of determining a parameter of a patterning process, the method including: obtaining a detected representation of radiation redirected by a structure having geometric symmetry at a nominal physical configuration, wherein the detected representation of the radiation was obtained by illuminating a substrate with a radiation beam such that a beam spot on the substrate was filled with the structure; and determining, by a hardware computer system, a value of the patterning process parameter based on optical characteristic values from an asymmetric optical characteristic distribution portion of the detected radiation representation with higher weight than another portion of the detected radiation representation, the asymmetric optical characteristic distribution arising from a different physical configuration of the structure than the nominal physical configuration.

公开(公告)号：US09977340B2

公开(公告)日：2018-05-22

申请号：US13101663

申请日：2011-05-05

Applicant: Maria Johanna Hendrika Aben ,  Hugo Augustinus Joseph Cramer ,  Noelle Martina Wright ,  Ruben Alvarez Sanchez ,  Martijn Jaap Daniel Slob

Inventor： Maria Johanna Hendrika Aben ,  Hugo Augustinus Joseph Cramer ,  Noelle Martina Wright ,  Ruben Alvarez Sanchez ,  Martijn Jaap Daniel Slob

IPC: G06G7/62 ,  G03F7/20

CPC classification number: G03F7/70633 ,  G03F7/70483 ,  G03F7/70491 ,  G03F7/705 ,  G03F7/70625

Abstract: Diffraction models and scatterometry are used to reconstruct a model of a microscopic structure on a substrate. A plurality of candidate structures are defined, each represented by a plurality of parameters (p1, p2, etc.)). A plurality of model diffraction signals are calculated by simulating illumination of each of the candidate structures. The structure is reconstructed by fitting one or more of the model diffraction signals to a signal detected from the structure. In the generation of the candidate structures, a model recipe is used in which parameters are designated as either fixed or variable. Among the variable parameters, certain parameters are constrained to vary together in accordance with certain constraints, such as linear constraints. An optimized set of constraints, and therefore an optimized model recipe, is determined by reference to a user input designating one or more parameters of interest for a measurement, and by simulating the reconstruction process reconstruction. The optimized model recipe can be determined automatically by a parameter advisor process that simulates reconstruction of a set of reference structures, using a plurality of candidate model recipes. In the generation of the reference structures, restrictions can be applied to exclude unrealistic parameter combinations.

公开(公告)号：US08830472B2

公开(公告)日：2014-09-09

申请号：US12920984

申请日：2009-03-30

Applicant: Arie Jeffrey Den Boef ,  Hugo Augustinus Joseph Cramer ,  Marcus Adrianus Van De Kerkhof ,  Henricus Petrus Maria Pellemans ,  Martin Ebert

Inventor： Arie Jeffrey Den Boef ,  Hugo Augustinus Joseph Cramer ,  Marcus Adrianus Van De Kerkhof ,  Henricus Petrus Maria Pellemans ,  Martin Ebert

IPC: G01N21/55 ,  G01N21/956 ,  G01N21/95 ,  G03F7/20 ,  G01N21/47 ,  G01N21/88

CPC classification number: G01N21/9501 ,  G01N21/47 ,  G01N21/95607 ,  G01N2021/8845 ,  G03F7/70625

Abstract: A method of assessing a model of a substrate is presented. A scatterometry measurement is taken using radiation at a first wavelength. The wavelength of the radiation is then changed and a further scatterometry measurement taken. If the scatterometry measurements are consistent across a range of wavelengths then the model is sufficiently accurate. However, if the scatterometry measurements change as the wavelength changes then the model of the substrate is not sufficiently accurate.

Abstract translation: 提出了一种评估底物模型的方法。 使用第一波长的辐射进行散射测量。 然后改变辐射的波长，并进行进一步的散射测量。 如果散射测量在波长范围内是一致的，则模型是足够准确的。 然而，如果散射测量值随着波长的变化而变化，则衬底的模型不够准确。

公开(公告)号：US08294907B2

公开(公告)日：2012-10-23

申请号：US11580265

申请日：2006-10-13

Applicant: Hugo Augustinus Joseph Cramer ,  Antoine Gaston Marie Kiers

Inventor： Hugo Augustinus Joseph Cramer ,  Antoine Gaston Marie Kiers

IPC: G01B11/14

CPC classification number: G01N21/47 ,  G01N21/9501 ,  G01N21/956 ,  G03F7/70516 ,  G03F7/70625 ,  G03F7/70633

Abstract: In a scatterometric method, different targets with different sensitivities to a parameter of interest are printed in a calibration matrix and different spectra obtained. Principal component analysis is applied to the different spectra to obtain a calibration function that is less sensitive to variation in the underlying structure than a calibration function obtained from spectra obtained from a single target.

Abstract translation: 在散射测量方法中，将不同的感兴趣参数的目标印刷在校准矩阵中，并获得不同的光谱。 将主成分分析应用于不同的光谱，以获得对从单个目标获得的光谱获得的校准函数对底层结构的变化较不敏感的校准函数。

公开(公告)号：US20120123748A1

公开(公告)日：2012-05-17

申请号：US13101663

申请日：2011-05-05

Applicant: Maria Johanna Hendrika Aben ,  Hugo Augustinus Joseph Cramer ,  Noelle Martina Wright ,  Ruben Alvarez Sanchez ,  Martijn Jaap Daniel Slob

Inventor： Maria Johanna Hendrika Aben ,  Hugo Augustinus Joseph Cramer ,  Noelle Martina Wright ,  Ruben Alvarez Sanchez ,  Martijn Jaap Daniel Slob

IPC: G06F17/50

CPC classification number: G03F7/70633 ,  G03F7/70483 ,  G03F7/70491 ,  G03F7/705 ,  G03F7/70625

Abstract: Diffraction models and scatterometry are used to reconstruct a model of a microscopic structure on a substrate. A plurality of candidate structures are defined, each represented by a plurality of parameters (p1, p2, etc.)). A plurality of model diffraction signals are calculated by simulating illumination of each of the candidate structures. The structure is reconstructed by fitting one or more of the model diffraction signals to a signal detected from the structure. In the generation of the candidate structures, a model recipe is used in which parameters are designated as either fixed or variable. Among the variable parameters, certain parameters are constrained to vary together in accordance with certain constraints, such as linear constraints. An optimized set of constraints, and therefore an optimized model recipe, is determined by reference to a user input designating one or more parameters of interest for a measurement, and by simulating the reconstruction process reconstruction. The optimized model recipe can be determined automatically by a parameter advisor process that simulates reconstruction of a set of reference structures, using a plurality of candidate model recipes. In the generation of the reference structures, restrictions can be applied to exclude unrealistic parameter combinations.

Abstract translation: 衍射模型和散射法用于重建基底上微观结构的模型。 定义多个候选结构，每个候选结构由多个参数（p1，p2等）表示）。 通过模拟每个候选结构的照明来计算多个模型衍射信号。 通过将一个或多个模型衍射信号拟合到从结构检测的信号来重构该结构。 在候选结构的生成中，使用模型配方，其中参数被指定为固定的或可变的。 在可变参数中，某些参数被限制为根据某些约束（诸如线性约束）一起变化。 通过参考指定用于测量的感兴趣的一个或多个参数的用户输入以及通过模拟重建过程重建来确定优化的约束集合以及因此优化的模型配方。 优化的模型配方可以由使用多个候选模型配方模拟一组参考结构的重建的参数顾问程序自动确定。 在生成参考结构时，可以应用限制来排除不切实际的参数组合。

公开(公告)号：US07738103B2

公开(公告)日：2010-06-15

申请号：US12258719

申请日：2008-10-27

Applicant: Antione Gaston Marie Kiers ,  Arie Jeffrey Den Boef ,  Hugo Augustinus Joseph Cramer

Inventor： Antione Gaston Marie Kiers ,  Arie Jeffrey Den Boef ,  Hugo Augustinus Joseph Cramer

IPC: G01B9/08 ,  G01B11/00 ,  G01N21/00

CPC classification number: G03F7/70633 ,  G01N21/47 ,  G03F1/36 ,  G03F1/68

Abstract: In a method for determining a structure parameter of a target pattern, a first series of calibration spectra are determined from at least one reference pattern, each spectra being determined using a different known value of at least one structure parameter of the respective reference pattern. The first series of calibration spectra does not take into account parameters of an apparatus used to produce the reference pattern. A representation of each of the first series calibration spectra is stored in a central library. A second series of calibration spectra corresponding to at least one of the stored spectra for a target spectrum is determined using the parameters of the apparatus for measuring the target spectrum. A measured target spectrum is produced by directing a beam of radiation onto the target pattern. The measured target spectrum and the second series of calibration spectra are compared, where this comparison is used to derive a value for the structure parameter of the target pattern.

Abstract translation: 在用于确定目标图案的结构参数的方法中，从至少一个参考图案确定第一系列校准光谱，每个光谱使用相应参考图案的至少一个结构参数的不同已知值来确定。 第一系列校准光谱没有考虑用于产生参考图案的装置的参数。 每个第一系列校准光谱的表示存储在中央库中。 使用用于测量目标光谱的装置的参数来确定对应于目标光谱的存储光谱中的至少一个的第二系列校准光谱。 通过将辐射束引导到目标图案上来产生测量的目标光谱。 比较测量的目标光谱和第二系列校准光谱，其中该比较用于导出目标图案的结构参数的值。

公开(公告)号：US20090094005A1

公开(公告)日：2009-04-09

申请号：US12247371

申请日：2008-10-08

Applicant: Arie Jeffrey DEN BOEF ,  Hugo Augustinus Joseph Cramer ,  Jouke Krist ,  Willem Jan Grootjans

Inventor： Arie Jeffrey DEN BOEF ,  Hugo Augustinus Joseph Cramer ,  Jouke Krist ,  Willem Jan Grootjans

IPC: G06F17/10

CPC classification number: G03F7/70625 ,  G01B11/24 ,  G01N21/255 ,  G01N21/47 ,  G01N21/95607 ,  G06F17/10 ,  G06F17/5009

Abstract: A set of parameters used in a model of a spectrometer includes free parameters and fixed parameters. A first set of values for the parameters is set and the model is used to generate a first spectrum. A value of one of the fixed parameters is changed and a second spectrum is generated. An inverse of the model of the spectrometer is then applied to the second spectrum to generate a set of values for the parameters, the values being the same as the first set of values except for one or more of the free parameters. If the free parameter has significantly changed the fixed parameter is designated a free parameter.

Abstract translation: 在光谱仪模型中使用的一组参数包括自由参数和固定参数。 设置参数的第一组值，并使用该模型生成第一个频谱。 固定参数中的一个的值被改变并产生第二个频谱。 然后将光谱仪的模型的反相应用于第二光谱以生成参数的一组值，该值与除了一个或多个空闲参数之外的第一组值相同。 如果自由参数明显改变，则固定参数被指定为空闲参数。

公开(公告)号：US07460237B1

公开(公告)日：2008-12-02

申请号：US11882610

申请日：2007-08-02

Applicant: Hugo Augustinus Joseph Cramer

Inventor： Hugo Augustinus Joseph Cramer

IPC: G01N21/55

CPC classification number: G03F7/70625

Abstract: In a method of determining a structure parameter of a target pattern in a lithographic process, a series of calibration spectra are calculated from a reference pattern. Spectral analysis is performed on each calculated spectra, the spectral components and associated weighting being derived and stored in a library or used as the basis of an iterative search method. A spectrum is measured from the target pattern and spectral analysis of the measured spectrum is performed. The derived weighting factors of the principal components are compared with the weighting factors of the measured spectrum to determine the structure parameter.

Abstract translation: 在确定光刻工艺中的目标图案的结构参数的方法中，从参考图案计算出一系列校准光谱。 对每个计算的光谱，光谱分量和相关加权进行光谱分析，并将其存储在库中或用作迭代搜索方法的基础。 从目标图案测量光谱，并执行测量光谱的光谱分析。 将主成分的导出加权因子与测量光谱的加权因子进行比较，以确定结构参数。

公开(公告)号：US20080279442A1

公开(公告)日：2008-11-13

申请号：US11798039

申请日：2007-05-09

Applicant: Arie Jeffrey Den Boef ,  Hugo Augustinus Joseph Cramer ,  Mircea Dusa ,  Irwan Dani Setija

Inventor： Arie Jeffrey Den Boef ,  Hugo Augustinus Joseph Cramer ,  Mircea Dusa ,  Irwan Dani Setija

IPC: G06K9/00 ,  G03F7/00

CPC classification number: G03F1/84 ,  G03F7/7065

Abstract: A method of measuring a property of a substrate includes generating a patterned mask configured to cause a radiation beam passing through the mask to acquire the pattern, simulating radiating the substrate with a patterned radiation beam that has been patterned using the mask to obtain a simulated pattern, determining at least one location of the simulated pattern that is prone to patterning errors, and irradiating the substrate with the patterned radiation beam using a lithographic process. The method also includes measuring an accuracy of at least one property of the at least one location of the pattern on the substrate that has been determined as being prone to patterning errors, and adjusting the lithographic process according to the measuring.

Abstract translation: 测量衬底性质的方法包括：生成图案化掩模，其被配置为使通过掩模的辐射束获得图案，模拟使用掩模图案化的图案化辐射束来辐射衬底以获得模拟图案 ，确定易于图案化错误的模拟图案的至少一个位置，以及使用光刻工艺用图案化的辐射束照射衬底。 该方法还包括测量已经被确定为易于图案化错误的衬底上的图案的至少一个位置的至少一个特性的精度，以及根据测量来调整光刻处理。

公开(公告)号：US20080239277A1

公开(公告)日：2008-10-02

申请号：US11727648

申请日：2007-03-27

Applicant: Hugo Augustinus Joseph Cramer ,  Antoine Gaston Marie Kiers ,  Gerardus Maria Johannes Wijnand Janssen

Inventor： Hugo Augustinus Joseph Cramer ,  Antoine Gaston Marie Kiers ,  Gerardus Maria Johannes Wijnand Janssen

IPC: G03B27/42

CPC classification number: G03F7/70425 ,  G03F7/70516 ,  G03F7/70616

Abstract: The present invention provides a method for forming a substrate for use in calibrating a metrology tool in order to compensate for orientation-dependent variations within the metrology tool.

Abstract translation: 本发明提供了一种用于形成用于校准计量工具的基板的方法，以便补偿计量工具内的取向相关变化。