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1.发明申请Inspection method and apparatus, lithographic apparatus, lithographic processing cell and device manufacturing method 有权检测方法和装置，光刻设备，光刻处理单元和器件制造方法公开(公告)号：US20080279442A1
公开(公告)日：2008-11-13
申请号：US11798039
申请日：2007-05-09
CPC分类号： G03F1/84 , G03F7/7065
摘要： A method of measuring a property of a substrate includes generating a patterned mask configured to cause a radiation beam passing through the mask to acquire the pattern, simulating radiating the substrate with a patterned radiation beam that has been patterned using the mask to obtain a simulated pattern, determining at least one location of the simulated pattern that is prone to patterning errors, and irradiating the substrate with the patterned radiation beam using a lithographic process. The method also includes measuring an accuracy of at least one property of the at least one location of the pattern on the substrate that has been determined as being prone to patterning errors, and adjusting the lithographic process according to the measuring.
摘要翻译： 测量衬底性质的方法包括：生成图案化掩模，其被配置为使通过掩模的辐射束获得图案，模拟使用掩模图案化的图案化辐射束来辐射衬底以获得模拟图案 ，确定易于图案化错误的模拟图案的至少一个位置，以及使用光刻工艺用图案化的辐射束照射衬底。 该方法还包括测量已经被确定为易于图案化错误的衬底上的图案的至少一个位置的至少一个特性的精度，以及根据测量来调整光刻处理。
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2.发明授权Inspection method and apparatus, lithographic apparatus, lithographic processing cell and device manufacturing method 有权检测方法和装置，光刻设备，光刻处理单元和器件制造方法公开(公告)号：US08189195B2
公开(公告)日：2012-05-29
申请号：US11798039
申请日：2007-05-09
CPC分类号： G03F1/84 , G03F7/7065
摘要： A method of measuring a property of a substrate includes generating a patterned mask configured to cause a radiation beam passing through the mask to acquire the pattern, simulating radiating the substrate with a patterned radiation beam that has been patterned using the mask to obtain a simulated pattern, determining at least one location of the simulated pattern that is prone to patterning errors, and irradiating the substrate with the patterned radiation beam using a lithographic process. The method also includes measuring an accuracy of at least one property of the at least one location of the pattern on the substrate that has been determined as being prone to patterning errors, and adjusting the lithographic process according to the measuring.
摘要翻译： 测量衬底性质的方法包括：生成图案化掩模，其被配置为使通过掩模的辐射束获得图案，模拟使用掩模图案化的图案化辐射束来辐射衬底以获得模拟图案 ，确定易于图案化错误的模拟图案的至少一个位置，以及使用光刻工艺用图案化的辐射束照射衬底。 该方法还包括测量已经被确定为易于图案化错误的衬底上的图案的至少一个位置的至少一个特性的精度，以及根据测量来调整光刻处理。
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3.发明授权Inspection method and apparatus, lithographic apparatus, lithographic processing cell and device manufacturing method 有权检测方法和装置，光刻设备，光刻处理单元和器件制造方法公开(公告)号：US07916284B2
公开(公告)日：2011-03-29
申请号：US11488170
申请日：2006-07-18
CPC分类号： G03F7/70683 , G03F7/70516 , G03F7/70616 , G03F7/70625 , G03F7/70641
摘要： In a scatterometric method differential targets with different sensitivities to parameters of interest are printed in a calibration matrix and difference spectra obtained. principal component analysis is applied to the difference spectra to obtain a calibration function that is less sensitive to variations in the underlying structure than a calibration function obtained from spectra obtained from a single target.
摘要翻译： 在散射方法中，将具有不同感光度的感光度的差分目标印刷在校准矩阵中并获得差分光谱。 将主成分分析应用于差分光谱，以获得对从单个目标获得的光谱获得的校准函数对底层结构的变化较不敏感的校准函数。
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公开(公告)号：US07112813B2
公开(公告)日：2006-09-26
申请号：US10665720
申请日：2003-09-22
申请人： Arie Jeffrey Den Boef , Frank Bornebroek , Hugo Augustinus Joseph Cramer , Mircea Dusa , Richard Johannes Franciscus Van Haren , Antoine Gaston Marie Kiers , Justin Lloyd Kreuzer , Maurits Van Der Schaar , Paul Jacques Van Wijnen , Everhardus Cornelis Mos , Pieter Willem Herman De Jager , Hans Van Der Laan , Paul Frank Luehrmann
发明人： Arie Jeffrey Den Boef , Frank Bornebroek , Hugo Augustinus Joseph Cramer , Mircea Dusa , Richard Johannes Franciscus Van Haren , Antoine Gaston Marie Kiers , Justin Lloyd Kreuzer , Maurits Van Der Schaar , Paul Jacques Van Wijnen , Everhardus Cornelis Mos , Pieter Willem Herman De Jager , Hans Van Der Laan , Paul Frank Luehrmann
IPC分类号： G01N21/86
CPC分类号： G03F9/7084 , G03F9/7046 , G03F9/7049 , G03F9/7076 , G03F9/7088 , G03F9/7092
摘要： A method of device inspection, the method comprising providing an asymmetric marker on a device to be inspected, the form of asymmetry of the marker being dependent upon the parameter to be inspected, directing light at the marker, obtaining a first measurement of the position of the marker via detection of diffracted light of a particular wavelength or diffraction angle, obtaining a second measurement of the position of the marker via detection of diffracted light of a different wavelength or diffraction angle, and comparing the first and second measured positions to determine a shift indicative of the degree of asymmetry of the marker.
摘要翻译： 一种设备检查方法，所述方法包括在要检查的设备上提供不对称标记，标记的不对称形式取决于待检查的参数，将光引导到标记处，获得第一测量位置 通过检测特定波长或衍射角的衍射光，通过检测不同波长或衍射角的衍射光来获得标记的位置的第二测量，并且比较第一和第二测量位置以确定偏移 指示标记物的不对称程度。
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5.发明申请Inspection method and apparatus, lithographic apparatus, lithographic processing cell and device manufacturing method 有权检测方法和装置，光刻设备，光刻处理单元和器件制造方法公开(公告)号：US20080018874A1
公开(公告)日：2008-01-24
申请号：US11488170
申请日：2006-07-18
IPC分类号： G03B27/52
CPC分类号： G03F7/70683 , G03F7/70516 , G03F7/70616 , G03F7/70625 , G03F7/70641
摘要： In a scatterometric method differential targets with different sensitivities to parameters of interest are printed in a calibration matrix and difference spectra obtained. principal component analysis is applied to the difference spectra to obtain a calibration function that is less sensitive to variations in the underlying structure than a calibration function obtained from spectra obtained from a single target.
摘要翻译： 在散射方法中，将具有不同感光度的感光度的差分目标印刷在校准矩阵中并获得差分光谱。 将主成分分析应用于差分光谱，以获得对从单个目标获得的光谱获得的校准函数对底层结构的变化较不敏感的校准函数。
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6.发明授权公开(公告)号：US07440079B2
公开(公告)日：2008-10-21
申请号：US11232236
申请日：2005-09-22
申请人： Arie Jeffrey Den Boef , Andre Bernardus Jeunink , Henricus Petrus Maria Pellemans , Irwan Dani Setija , Cas Johannes Petrus Maria Van Nuenen , Stefan Carolus Jacobus Antonius Keij
发明人： Arie Jeffrey Den Boef , Andre Bernardus Jeunink , Henricus Petrus Maria Pellemans , Irwan Dani Setija , Cas Johannes Petrus Maria Van Nuenen , Stefan Carolus Jacobus Antonius Keij
CPC分类号： G03F9/7088 , G03F9/7092
摘要： A lithographic apparatus according to one embodiment includes an alignment system for aligning a substrate. The alignment system comprises an illuminator system configured to illuminate an alignment mark on the substrate with an illumination spot, the alignment mark comprising a plurality of lines and spaces. The system also includes a combiner system configured to transfer two images of the illuminated alignment mark without spatial filtering of the images, rotate the images 180° relatively to each other, and combine the two images; and a detection system configured to detect an alignment signal from the combined images and to determine a unique alignment position by selecting a specific one of extreme values in the detected alignment signal.
摘要翻译： 根据一个实施例的光刻设备包括用于对准衬底的对准系统。 对准系统包括照明器系统，其被配置为用照明点照射基板上的对准标记，该对准标记包括多个线和间隔。 该系统还包括一个组合器系统，被配置为传送照明对准标记的两个图像，而不对图像进行空间滤波，使图像相对于彼此旋转180度，并组合两个图像; 以及检测系统，被配置为检测来自组合图像的对准信号，并且通过选择检测到的对准信号中的特定值之一来确定唯一的对准位置。
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7.发明授权Lithographic apparatus with alignment subsystem, device manufacturing method, and device manufactured thereby 有权具有对准子系统的光刻设备，器件制造方法以及由此制造的器件公开(公告)号：US07002667B2
公开(公告)日：2006-02-21
申请号：US10736230
申请日：2003-12-16
申请人： Leon Martin Levasier , Arie Jeffrey Den Boef , Ingo Dirnstorfer , Andre Bernardus Jeunink , Stefan Geerte Kruijswijk , Henricus Petrus Maria Pellemans , Irwan Dani Setija , Hoite Pieter Theodoor Tolsma
发明人： Leon Martin Levasier , Arie Jeffrey Den Boef , Ingo Dirnstorfer , Andre Bernardus Jeunink , Stefan Geerte Kruijswijk , Henricus Petrus Maria Pellemans , Irwan Dani Setija , Hoite Pieter Theodoor Tolsma
CPC分类号： G03F9/7003 , G03F9/7049 , G03F9/7076
摘要： A lithographic apparatus according to one embodiment of the invention includes an alignment subsystem configured to align the substrate on the substrate table relative to the patterning structure. The alignment structure comprises a non-periodic feature which may be detectable as e.g. a capture position or a check position using a reference grating in the alignment subsystem. The non-periodic feature may cause a phase effect in the detected signal of the alignment subsystem or an amplitude effect.
摘要翻译： 根据本发明的一个实施例的光刻设备包括对准子系统，该对准子系统被配置为相对于图案化结构对准衬底台上的衬底。 对准结构包括非周期性特征，其可以被检测为例如。 在对准子系统中使用参考光栅的捕获位置或检查位置。 非周期性特征可能导致对准子系统的检测信号中的相位效应或幅度效应。
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8.发明授权Method and apparatus for angular-resolved spectroscopic lithography characterization 失效用于角分辨光谱光刻特征的方法和装置公开(公告)号：US07643666B2
公开(公告)日：2010-01-05
申请号：US11500496
申请日：2006-08-08
CPC分类号： G06K9/4661 , G03F7/70625
摘要： Reconstruction of an object by which radiation is diffracted is disclosed. Specifically, the reconstruction includes: estimating the object shape; deriving a model diffraction pattern from the estimated shape; illuminating the object with radiation; detecting a diffraction pattern of radiation diffracted by the object; comparing the model diffraction pattern and the detected diffraction pattern; and determining the actual object shape from the difference between the model diffraction pattern and the detected diffraction pattern, wherein the model diffraction pattern is determined using Bloch Mode Expansion.
摘要翻译： 公开了辐射衍射的物体的重建。 具体地说，重建包括：估计对象形状; 从估计的形状导出模型衍射图; 用辐射照射物体; 检测被物体衍射的辐射的衍射图案; 比较模型衍射图和检测衍射图; 并根据模型衍射图案和检测到的衍射图案之间的差异确定实际物体形状，其中使用Bloch模式扩展来确定模型衍射图案。
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9.发明授权Lithographic apparatus with alignment subsystem, device manufacturing method, using alignment, and alignment structure 有权具有对准子系统的光刻设备，器件制造方法，使用对准和对准结构公开(公告)号：US06995831B2
公开(公告)日：2006-02-07
申请号：US11068895
申请日：2005-03-02
申请人： Leon Martin Levasier , Arie Jeffrey Den Boef , Ingo Dirnstorfer , Andre Bernardus Jeunink , Stefan Geerte Kruijswijk , Henricus Petrus Maria Pellemans , Irwan Dani Setija , Hoite Pieter Theodoor Tolsma
发明人： Leon Martin Levasier , Arie Jeffrey Den Boef , Ingo Dirnstorfer , Andre Bernardus Jeunink , Stefan Geerte Kruijswijk , Henricus Petrus Maria Pellemans , Irwan Dani Setija , Hoite Pieter Theodoor Tolsma
CPC分类号： G03F9/7003 , G03F9/7049 , G03F9/7076
摘要： A lithographic apparatus according to one embodiment of the invention includes an alignment subsystem configured to align the substrate on the substrate table relative to the patterning structure. The alignment structure comprises a non-periodic feature which may be detectable as e.g. a capture position or a check position using a reference grating in the alignment subsystem. The non-periodic feature may cause a phase effect in the detected signal of the alignment subsystem or an amplitude effect.
摘要翻译： 根据本发明的一个实施例的光刻设备包括对准子系统，该对准子系统被配置为相对于图案化结构对准衬底台上的衬底。 对准结构包括非周期性特征，其可以被检测为例如。 在对准子系统中使用参考光栅的捕获位置或检查位置。 非周期性特征可能导致对准子系统的检测信号中的相位效应或幅度效应。
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10.发明申请Method and apparatus for angular-resolved spectroscopic lithography characterization 失效用于角分辨光谱光刻特征的方法和装置公开(公告)号：US20080069430A1
公开(公告)日：2008-03-20
申请号：US11500496
申请日：2006-08-08
IPC分类号： G06K9/00
CPC分类号： G06K9/4661 , G03F7/70625
摘要： Reconstruction of an object by which radiation is diffracted is disclosed. Specifically, the reconstruction includes: estimating the object shape; deriving a model diffraction pattern from the estimated shape; illuminating the object with radiation; detecting a diffraction pattern of radiation diffracted by the object; comparing the model diffraction pattern and the detected diffraction pattern; and determining the actual object shape from the difference between the model diffraction pattern and the detected diffraction pattern, wherein the model diffraction pattern is determined using Bloch Mode Expansion.
摘要翻译： 公开了辐射衍射的物体的重建。 具体地说，重建包括：估计对象形状; 从估计的形状导出模型衍射图; 用辐射照射物体; 检测被物体衍射的辐射的衍射图案; 比较模型衍射图和检测衍射图; 并根据模型衍射图案和检测到的衍射图案之间的差异确定实际物体形状，其中使用Bloch模式扩展来确定模型衍射图案。
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