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公开(公告)号：US20190185368A1
公开(公告)日：2019-06-20
申请号：US16282363
申请日：2019-02-22
Applicant: AGC Inc.
Inventor： Hirofumi TOKUNAGA , Kazutaka ONO , Motoyuki HIROSE
Abstract: To provide an alkali-free glass, of which the compaction is low, the strain point is high, and the ultraviolet transmittance is high, and which is easy to melt.An alkali-free glass, which comprises, as represented by mol % based on oxides, SiO2from 65 to 75, Al2O3from 9 to 15, B2O3from 0 to 3, MgOfrom 0 to 12, CaOfrom 0 to 8, SrOfrom 0 to 6, and BaOfrom 0 to 5, wherein MgO+CaO+SrO+BaO is from 12 to 22, and 4.84[Fe2O3]+5.65[Na2O]+4.03[K2O]+4.55[SnO2] is at most 0.55, and of which the compaction is at most 80 ppm.
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公开(公告)号：US20240368025A1
公开(公告)日：2024-11-07
申请号：US18771189
申请日：2024-07-12
Applicant: AGC Inc.
Inventor： Shuhei NOMURA , Kazutaka ONO
Abstract: The present invention relates to a substrate having a dielectric loss tangent (A) as measured at 20° C. and 10 GHz of 0.1 or less, a dielectric loss tangent (B) as measured at 20° C. and 35 GHz of 0.1 or less, and a ratio [a dielectric loss tangent (C) as measured at an arbitrary temperature in a range of −40 to 150° C. and at 10 GHz]/[the dielectric loss tangent (A)] of 0.90-1.10, or a substrate having a relative permittivity (a) as measured at 20° C. and 10 GHz of 4 or more and 10 or less, a relative permittivity (b) as measured at 20° C. and 35 GHz of 4 or more and 10 or less, and a ratio [a relative permittivity (c) as measured at an arbitrary temperature in a range of −40 to 150° C. and at 10 GHz]/[the relative permittivity (a)] of 0.993-1.007.
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公开(公告)号：US20240300846A1
公开(公告)日：2024-09-12
申请号：US18663496
申请日：2024-05-14
Applicant: AGC Inc.
Inventor： Hirofumi TOKUNAGA , Kazutaka ONO , Motoyuki HIROSE
CPC classification number: C03C3/087 , C03B17/064 , C03C3/091 , C03C4/0085 , C03C2203/10
Abstract: An alkali-free glass having a strain point of 650° C. or more, an average coefficient of thermal expansion at 50 to 350° C. of from 30×10−7 to 45×10−7/° C., and a temperature T2 at which a glass viscosity reaches 102 dPa·s of from 1,500 to 1,800° C. The alkali-free glass contains, as represented by mol % based on oxides, SiO2: from 62 to 70%, Al2O3: from 9 to 16% B2O3: from 0 to 12%, MgO: from 3 to 10%, CaO: from 4 to 12%, SrO: from 0 to 6%, and Fe2O3: from 0.001 to 0.04%, provided that MgO+CaO+SrO+BaO is from 12 to 25%. The alkali-free glass has a β-OH value of from 0.35 to 0.85/mm.
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公开(公告)号：US20230223493A1
公开(公告)日：2023-07-13
申请号：US18182688
申请日：2023-03-13
Applicant: AGC Inc.
Inventor： Hirofumi TOKUNAGA , Kazutaka ONO , Takefumi ABE , Naoya WADA
IPC: H01L33/20 , H01L25/075
CPC classification number: H01L33/20 , H01L25/0753
Abstract: The present invention relates to an LED element substrate on which an LED element is to be provided and which includes a glass, in which at least one main surface of the substrate is black, and one or more LED elements are to be provided on the black main surface, and relates to an LED element substrate on which an LED element is to be provided and which includes a glass, in which at least one main surface of the substrate is black, the substrate comprises a plurality of holes, and one or more LED elements are to be provided on an inside of each of the holes.
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公开(公告)号：US20230118345A1
公开(公告)日：2023-04-20
申请号：US18066505
申请日：2022-12-15
Applicant: AGC INC.
Inventor： Kazutaka ONO , Takatoshi YAOITA , Reo USUI , Kenichi EBATA , Jun AKIYAMA
IPC: H01L27/12 , B32B7/12 , B32B17/00 , B32B17/06 , B32B38/10 , B32B43/00 , C03C3/091 , C03C27/10 , H01L21/683 , H01L29/786 , B32B7/06
Abstract: A carrier substrate to be used, when manufacturing a member for an electronic device on a surface of a substrate, by being bonded to the substrate, includes at least a first glass substrate. The first glass substrate has a compaction described below of 80 ppm or less. Compaction is a shrinkage in a case of subjecting the first glass substrate to a temperature raising from a room temperature at 100° C./hour and to a heat treatment at 600° C. for 80 minutes, and then to a cooling to the room temperature at 100° C./hour.
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Patent Agency Ranking
公开(公告)号：US20230079562A1
公开(公告)日：2023-03-16
申请号：US18054667
申请日：2022-11-11
Applicant: AGC INC.
Inventor： Shuhei NOMURA , Kazutaka ONO
IPC: C03C3/091 , H01L21/02 , H01L27/12 , H01L29/786 , G02F1/1333 , H01L21/762 , C03C4/20
Abstract: A glass substrate has a compaction of 0.1 to 100 ppm. An absolute value |Δα50/100| of a difference between an average coefficient of thermal expansion α50/100 of the glass substrate and an average coefficient of thermal expansion of single-crystal silicon at 50° C. to 100° C., an absolute value |Δα100/200| of a difference between an average coefficient of thermal expansion α100/200 of the glass substrate and an average coefficient of thermal expansion of the single-crystal silicon at 100° C. to 200° C., and an absolute value |Δα200/300| of a difference between an average coefficient of thermal expansion α200/300 of the glass substrate and an average coefficient of thermal expansion of the single-crystal silicon at 200° C. to 300° C. are 0.16 ppm/° C. or less.
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公开(公告)号：US20220340477A1
公开(公告)日：2022-10-27
申请号：US17860443
申请日：2022-07-08
Applicant: AGC Inc.
Inventor： Hirofumi TOKUNAGA , Kazutaka ONO
Abstract: An alkali free glass has an average coefficient of thermal expansion at 50 to 350° C. of 30×10−7 to 43×10−7/° C., a Young's modulus of 88 GPa or more, a strain point of 650 to 725° C., a temperature T4 at which a viscosity reaches 104 dPa·s of 1,290° C. or lower, a glass surface devitrification temperature (Tc) of T4+20° C. or lower, and a temperature T2 at which the viscosity reaches 102 dPa·s of 1,680° C. or lower. The alkali free glass contains, as represented by mol % based on oxides, 62 to 67% of SiO2, 12.5 to 16.5% of Al2O3, 0 to 3% of B2O3, 8 to 13% of MgO, 6 to 12% of CaO, 0.5 to 4% of SrO, and 0 to 0.5% of BaO. MgO+CaO+SrO+BaO is 18 to 22%, and MgO/CaO is 0.8 to 1.33.
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公开(公告)号：US20220002183A1
公开(公告)日：2022-01-06
申请号：US17480440
申请日：2021-09-21
Applicant: AGC INC.
Inventor： Yu HANAWA , Kazutaka ONO , Shigeki SAWAMURA
IPC: C03C3/087 , B32B7/06 , H01L21/683 , B32B17/06 , H01L21/78
Abstract: A glass substrate contains, as a glass matrix composition as represented by mole percentage based on oxides, SiO2: 58-75%, Al2O3: 4.5-16%, B2O3: 0-6%, MgO: 0-6%, CaO: 0-6%, SrO: 5-20%, BaO: 5-20%, and MgO+CaO+SrO+BaO:15-40%. The glass substrate has an alkali metal oxide content of 0-0.1% as represented by mole percentage based on oxides. The glass substrate has an average coefficient of thermal expansion α of 56-90 (×10−7/° C.) at 50° C.-350° C.
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公开(公告)号：US20190317376A1
公开(公告)日：2019-10-17
申请号：US16454858
申请日：2019-06-27
Applicant: AGC Inc.
Inventor： Kazutaka ONO , Yasumasa KATO , Masaya KUNIGITA
IPC: G02F1/1362 , C03C17/36 , G02F1/1343 , C03C3/091
Abstract: The present invention relates to a liquid crystal display panel having a predetermined size, containing a wiring film formed of a metal, an insulating film containing an inorganic substance and a substrate formed of a non-alkali glass, in which the metal has the product of a Young's modulus (E) and a thermal expansion coefficient (α) at room temperature falling within a predetermined range, α of the inorganic substance is smaller than that of the non-alkali glass, the non-alkali glass has E of from 70 GPa to 95 GPa and α of from 32×10−7 to 45×10−7 (1/° C.) in which E and α satisfies a predetermined formula, and has a predetermined composition.
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30.发明申请公开(公告)号：US20190210911A1
公开(公告)日：2019-07-11
申请号：US16351007
申请日：2019-03-12
Applicant: AGC Inc.
Inventor： Kazutaka ONO , Shuhei Nomura , Nobutaka Kidera , Nobuhiko Takeshita
CPC classification number: C03C3/118 , C03B17/02 , C03B17/064 , C03C3/078 , C03C3/083 , C03C3/089 , C03C3/091 , C03C4/16 , C03C13/046 , C03C19/00 , H05K1/024 , H05K1/03
Abstract: The present invention relates to a glass substrate for a high-frequency device, which includes SiO2 as a main component, the glass substrate having a total content of alkali metal oxides in the range of 0.001-5% in terms of mole percent on the basis of oxides, the alkali metal oxides having a molar ratio represented by Na2O/(Na2O+K2O) in the range of 0.01-0.99, and the glass substrate having a total content of Al2O3 and B2O3 in the range of 1-40% in terms of mole percent on the basis of oxides and having a molar ratio represented by Al2O3/(Al2O3+B2O3) in the range of 0-0.45, in which at least one main surface of the glass substrate has a surface roughness of 1.5 nm or less in terms of arithmetic average roughness Ra, and the glass substrate has a dielectric dissipation factor at 35 GHz of 0.007 or less.
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