公开(公告)号：US20240369920A1

公开(公告)日：2024-11-07

申请号：US18774721

申请日：2024-07-16

Applicant: ASML NETHERLANDS B.V.

Inventor： Pieter-Jan VAN ZWOL ,  Sander Baltussen ,  Dennis De Graaf ,  Johannes Christiaan Leonardus Franken ,  Adrianus Johannes Maria Giesbers ,  Alexander Ludwig Klein ,  Johan Hendrik Klootwijk ,  Peter Simon Antonius Knapen ,  Evgenia Kurganova ,  Alexey Sergeevich Kuznetsov ,  Arnoud Willem Notenboom ,  Mahdiar Valefi ,  Marcus Adrianus Van De Kerkhof ,  Wilhelmus Theodorus Anthonius Johannes Van Den Einden ,  Ties Wouter Van Der Woord ,  Hendrikus Jan Wondergem ,  Aleksandar Nikolov Zdravkov

IPC: G03F1/64 ,  G03F7/00

Abstract: A method for manufacturing a membrane assembly for EUV lithography, the method including: providing a stack including: at least one membrane layer supported by a planar substrate, wherein the planar substrate has an inner region and a border region around the inner region; and a first sacrificial layer between the planar substrate and the membrane layer; selectively removing the inner region of the planar substrate such that the membrane assembly has: a membrane formed from the at least one membrane layer, and a border holding the membrane, the border having the border region of the planar substrate and the first sacrificial layer situated between the border region and the membrane layer, wherein the selectively removing the inner region of the planar substrate includes using an etchant which has a similar etch rate for the membrane layer and its oxide and a substantially different etch rate for the first sacrificial layer.

公开(公告)号：US20240302736A1

公开(公告)日：2024-09-12

申请号：US18618406

申请日：2024-03-27

Applicant: ASML NETHERLANDS B.V.

Inventor： Dennis DE GRAAF ,  Richard BEAUDRY ,  Maxime BIRON ,  Paul JANSSEN ,  Thijs KATER ,  Kevin KORNELSEN ,  Michael Alfred Josephus KUIJKEN ,  Jan Hendrik Willem KUNTZEL ,  Stephane MARTEL ,  Maxim Aleksandrovich NASALEVICH ,  Guido SALMASO ,  Pieter-Jan VAN ZWOL

IPC: G03F1/64 ,  G03F1/62 ,  G03F7/00

CPC classification number: G03F1/64 ,  G03F1/62 ,  G03F7/70983

Abstract: A wafer including a mask on one face and at least one layer on an opposite face, wherein the mask has at least one scribeline which overlies at least a portion of the opposite face which is substantially free of the at least one layer is described. Also described is a method of preparing a pellicle, the method including: providing a wafer having a mask on one face and at least one layer on an opposite face, defining a scribeline in the mask, and selectively removing a portion of the at least one layer which at least partially overlies the scribeline as well as a method of preparing a pellicle, the method including: providing a pellicle core, and removing at least some material from at least one face of the pellicle core in a non-oxidizing environment. In any aspect, the pellicle may include a metal nitride layer.

公开(公告)号：US20240027893A1

公开(公告)日：2024-01-25

申请号：US18220799

申请日：2023-07-11

Applicant: ASML NETHERLANDS B.V.

Inventor： David Ferdinand VLES ,  Chaitanya Krishna ANDE ,  Antonius Franciscus Johannes DE GROOT ,  Adrianus Johannes Maria GIESBERS ,  Johannes Joseph JANSSEN ,  Paul JANSSEN ,  Johan Hendrik KLOOTWIJK ,  Peter Simon Antonius KNAPEN ,  Evgenia KURGANOVA ,  Marcel Peter MEIJER ,  Wouter Rogier MEIJERINK ,  Maxim Aleksandrovich NASALEVICH ,  Arnoud Willem NOTENBOOM ,  Raymond OLSMAN ,  Hrishikesh PATEL ,  Mária PÉTER ,  Gerrit VAN DEN BOSCH ,  Wilhelmus Theodorus Anthonius Johannes VAN DEN EINDEN ,  Willem Joan VAN DER ZANDE ,  Pieter-Jan VAN ZWOL ,  Johannes Petrus Martinus Bernardus VERMEULEN ,  Willem-Pieter VOORTHUIJZEN ,  Hendrikus Jan WONDERGEM ,  Aleksandar Nikolov ZDRAVKOV

IPC: G03F1/64

CPC classification number: G03F1/64

Abstract: A pellicle assembly includes a pellicle frame defining a surface onto which a pellicle is, or to be, attached. The pellicle assembly includes one or more three-dimensional expansion structures that allow the pellicle to expand under stress. A pellicle assembly for a patterning device, the pellicle assembly includes one or more actuators for moving the pellicle assembly towards and way from the patterning device.

公开(公告)号：US20210382209A1

公开(公告)日：2021-12-09

申请号：US17282559

申请日：2019-09-13

Applicant: ASML NETHERLANDS B.V.

Inventor： Andrey NIKIPELOV ,  Marcus Adrianus VAN DE KERKHOF ,  Pieter-Jan VAN ZWOL ,  Laurentius Cornelius DE WINTER ,  Wouter Joep ENGELEN ,  Alexey Olegovich POLYAKOV

IPC: G02B5/02 ,  G03F7/20

Abstract: A first diffusor configured to receive and transmit radiation has a plurality of layers, each layer arranged to change an angular distribution of EUV radiation passing through it differently. A second diffusor configured to receive and transmit radiation has a first layer and a second layer. The first layer is formed from a first material, the first layer including a nanostructure on at least one surface of the first layer. The second layer is formed from a second material adjacent to the at least one surface of the first layer such that the second layer also includes a nanostructure. The second material has a refractive index that is different to a refractive index of the first layer. The diffusors may be configured to receive and transmit EUV radiation.

公开(公告)号：US20210181618A1

公开(公告)日：2021-06-17

申请号：US16761683

申请日：2018-11-05

Applicant: ASML NETHERLANDS B.V.

Inventor： Pieter-Jan VAN ZWOL ,  Adrianus Johannes Maria GIESBERS ,  Johan Hendrik KLOOTWIJK ,  Evgenia KURGANOVA ,  Maxim Aleksandrovich NASALEVICH ,  Arnoud Willem NOTENBOOM ,  Mária PÉTER ,  Leonid Aizikovitsj SJMAENOK ,  Ties Wouter VAN DER WOORD ,  David Ferdinand VLES

IPC: G03F1/62

Abstract: A pellicle for a lithographic apparatus, the pellicle including nitridated metal silicide or nitridated silicon as well as a method of manufacturing the same. Also disclosed is the use of a nitridated metal silicide or nitridated silicon pellicle in a lithographic apparatus. Also disclosed is a pellicle for a lithographic apparatus including at least one compensating layer selected and configured to counteract changes in transmissivity of the pellicle upon exposure to EUV radiation as well as a method of controlling the transmissivity of a pellicle and a method of designing a pellicle.

公开(公告)号：US20200319546A1

公开(公告)日：2020-10-08

申请号：US16754865

申请日：2018-08-28

Applicant: ASML NETHERLANDS B.V.

Inventor： Anton Wilhelmus DUYS ,  Maxim Aleksandrovich NASALEVICH ,  Arnoud Willem NOTENBOOM ,  Mária PÉTER ,  Pieter-Jan VAN ZWOL ,  David Ferdinand VLES

IPC: G03F1/64

Abstract: A pellicle frame for supporting a pellicle, the frame having a first surface and a second surface opposite the first surface, and a structure provided between the first and the second surfaces, wherein the first and second surfaces and the structure at least partially define at least one volume therebetween that is devoid of the material that forms the frame.

公开(公告)号：US20190129299A1

公开(公告)日：2019-05-02

申请号：US16093537

申请日：2017-04-12

Applicant: ASML NETHERLANDS B.V.

Inventor： Maxim Aleksandrovich NASALEVICH ,  Erik Achilles ABEGG ,  Nirupam BANERJEE ,  Michiel Alexander BLAUW ,  Derk Servatius Gertruda BROUNS ,  Paul JANSSEN ,  Matthias KRUIZINGA ,  Egbert LENDERINK ,  Nicolae MAXIM ,  Andrey NIKIPELOV ,  Arnoud Willem NOTENBOOM ,  Claudia PILIEGO ,  Mária PÉTER ,  Gijsber RISPENS ,  Nadja SCHUH ,  Marcus Adrianus VAN DE KERKHOF ,  Willem Joan VAN DER ZANDE ,  Pieter-Jan VAN ZWOL ,  Antonius Willem VERBURG ,  Johannes Petrus Martinus Bernardus VERMEULEN ,  David Ferdinand VLES ,  Willem-Pieter VOORTHUIJZEN ,  Aleksandar Nikolov ZDRAVICOV

IPC: G03F1/62 ,  G03F7/20 ,  G02B5/28

Abstract: Membranes for EUV lithography are disclosed. In one arrangement, a membrane has a stack having layers in the following order: a first capping layer including an oxide of a first metal; a base layer including a compound having a second metal and an additional element selected from the group consisting of Si, B, C and N; and a second capping layer including an oxide of a third metal, wherein the first metal is different from the second metal and the third metal is the same as or different from the first metal.

公开(公告)号：US20180307146A1

公开(公告)日：2018-10-25

申请号：US15766225

申请日：2016-10-25

Applicant: ASML Netherlands B.V.

Inventor： Hendrikus Gijsbertus SCHIMMEL ,  Jeroen Marcel HUIJBREGTSE ,  Maarten VAN KAMPEN ,  Pieter-Jan VAN ZWOL

IPC: G03F7/20 ,  G21K1/06 ,  H05G2/00

CPC classification number: G03F7/70883 ,  G03F7/70033 ,  G03F7/70908 ,  G03F7/70925 ,  G21K1/062 ,  H05G2/00 ,  H05G2/001 ,  H05G2/005 ,  H05G2/008

Abstract: A radiation system comprises a fuel emitter configured to provide fuel to a plasma formation region, a laser arranged to provide a laser beam at the plasma formation region incident on the fuel to generate a radiation emitting plasma, and a reflective or transmissive device (30) arranged to receive radiation emitted by the plasma and to reflect or transmit at least some of the received radiation along a desired path, wherein the reflective or transmissive device comprises a body configured to reflect and/or transmit said at least some of the radiation, and selected secondary electron emission (SEE) material (34) arranged relative to the body such as to emit secondary electrons in response to the received radiation, thereby to clean material from a surface of the device.32