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343 条记录 (耗时 0.043 秒)

    Laser device
    22.
    发明授权
    Laser device 有权
    激光设备

    公开(公告)号：US08462826B2

    公开(公告)日：2013-06-11

    申请号：US12683612

    申请日：2010-01-07

    申请人： Erik Roelof Loopstra ,  Gerardus Hubertus Petrus Maria Swinkels ,  Erik Petrus Buurman

    发明人： Erik Roelof Loopstra ,  Gerardus Hubertus Petrus Maria Swinkels ,  Erik Petrus Buurman

    IPC分类号： H01S3/00

    CPC分类号： G21K1/025 ,  G03B27/54 ,  G03F7/70033 ,  G03F7/70175 ,  H01S3/2232 ,  H01S3/2316 ,  H05G2/001

    摘要： A laser device includes a seed laser, an amplifier, a detector, and an optical element arranged to direct radiation emitted by the seed laser towards a plasma generation site. The optical element is arranged to direct towards the detector amplified spontaneous emission radiation which has been emitted by the seed laser and has been reflected from a droplet of fuel material. The detector is arranged to trigger generation of a laser radiation pulse by the seed laser when the reflected amplified spontaneous emission radiation is detected.

    摘要翻译： 激光装置包括种子激光器，放大器，检测器和布置成将种子激光器发射的辐射引导到等离子体产生部位的光学元件。 光学元件被布置成朝着检测器引导已经由种子激光器发射并且已经从燃料材料液滴反射的放射自发辐射。 检测器被布置成当检测到反射的放大的自发发射辐射时，通过种子激光器触发激光辐射脉冲的产生。

    Source module, radiation source and lithographic apparatus
    23.
    发明授权
    Source module, radiation source and lithographic apparatus 有权
    源模块，辐射源和光刻设备

    公开(公告)号：US08405055B2

    公开(公告)日：2013-03-26

    申请号：US12566060

    申请日：2009-09-24

    申请人： Dzmitry Labetski ,  Vadim Yevgenyevich Banine ,  Erik Roelof Loopstra ,  Johannes Hubertus Josephina Moors ,  Gerardus Hubertus Petrus Maria Swinkels

    发明人： Dzmitry Labetski ,  Vadim Yevgenyevich Banine ,  Erik Roelof Loopstra ,  Johannes Hubertus Josephina Moors ,  Gerardus Hubertus Petrus Maria Swinkels

    IPC分类号： H05H1/42

    CPC分类号： H05G2/001 ,  H05G2/003

    摘要： A radiation source is configured to generate extreme ultraviolet radiation. The radiation source includes a fuel supply configured to supply a fuel to a plasma formation site; a laser configured to emit a beam of radiation to the plasma formation site so that a plasma that emits extreme ultraviolet radiation is generated when the beam of radiation impacts the fuel; a fuel particulate interceptor constructed and arranged to shield at least part of the radiation source from fuel particulates that are emitted by the plasma, the fuel particulate interceptor comprising a first portion and a second portion, the second portion being positioned closer to the plasma formation site than the first portion, and the first portion being rotatable; and a fuel particulate remover constructed and arranged to remove fuel particulates from a surface of the fuel particulate interceptor and to direct the fuel particulates towards a collection location.

    摘要翻译： 辐射源被配置成产生极紫外辐射。 辐射源包括构造成将燃料供应到等离子体形成位置的燃料供应; 激光器被配置为向等离子体形成位置发射辐射束，使得当辐射束影响燃料时产生发射极紫外辐射的等离子体; 燃料颗粒拦截器，其被构造和布置成将辐射源的至少一部分屏蔽在由等离子体发射的燃料颗粒中，所述燃料颗粒拦截器包括第一部分和第二部分，所述第二部分位于更靠近等离子体形成位置 并且所述第一部分可旋转; 以及构造和布置成从燃料颗粒拦截器的表面去除燃料颗粒并将燃料颗粒引导到收集位置的燃料颗粒去除器。

    EUV RADIATION SOURCE AND LITHOGRAPHIC APPARATUS
    25.
    发明申请
    EUV RADIATION SOURCE AND LITHOGRAPHIC APPARATUS 审中-公开
    EUV辐射源和光刻设备

    公开(公告)号：US20120280148A1

    公开(公告)日：2012-11-08

    申请号：US13520982

    申请日：2010-11-30

    申请人： Erik Roelof Loopstra ,  Gerardus Hubertus Petrus Maria Swinkels ,  Erik Petrus Buurman ,  Wilbert Jan Mestrom

    发明人： Erik Roelof Loopstra ,  Gerardus Hubertus Petrus Maria Swinkels ,  Erik Petrus Buurman ,  Wilbert Jan Mestrom

    IPC分类号： H05G2/00

    CPC分类号： H05G2/003 ,  H05G2/006 ,  H05G2/008

    摘要： An EUV radiation source that includes a fuel supply configured to supply fuel to a plasma formation location. The fuel supply includes a reservoir configured to hold fuel at a temperature that is sufficiently high to maintain the fuel in liquid form, and a pressure vessel configured to contain the reservoir, the pressure vessel being at least partially thermally isolated from the reservoir. The EUV radiation source also includes a laser radiation source configured to irradiate fuel supplied by the fuel supply at the plasma formation location.

    摘要翻译： EUV辐射源，其包括配置成向等离子体形成位置供应燃料的燃料供应。 燃料供应包括储存器，其构造成将燃料保持在足够高的温度以将燃料保持为液体形式;以及压力容器，其构造成容纳储存器，压力容器至少部分地与储存器热隔离。 EUV辐射源还包括被配置为照射由等离子​​体形成位置处的燃料供应供应的燃料的激光辐射源。

    LITHOGRAPHIC APPARATUS, EUV RADIATION GENERATION APPARATUS AND DEVICE MANUFACTURING METHOD
    28.
    发明申请
    LITHOGRAPHIC APPARATUS, EUV RADIATION GENERATION APPARATUS AND DEVICE MANUFACTURING METHOD 有权
    光刻设备，EUV辐射发生装置和装置制造方法

    公开(公告)号：US20130141709A1

    公开(公告)日：2013-06-06

    申请号：US13817792

    申请日：2011-08-04

    申请人： Erik Roelof Loopstra ,  Gerardus Hubertus Petrus Maria Swinkels ,  Erik Petrus Buurman ,  Uwe Bruno Heini Stamm

    发明人： Erik Roelof Loopstra ,  Gerardus Hubertus Petrus Maria Swinkels ,  Erik Petrus Buurman ,  Uwe Bruno Heini Stamm

    IPC分类号： G03F7/20

    CPC分类号： G03F7/70033 ,  B23K26/0643 ,  G03F7/70025 ,  G03F7/70191 ,  G03F7/7055 ,  H01S3/0071 ,  H01S3/2308 ,  H05G2/001 ,  H05G2/008

    摘要： An EUV radiation generation apparatus includes a laser configured to generate pulses of laser radiation, and an optical isolation apparatus that includes a rotatably mounted reflector and a radially positioned reflector. The rotatably mounted reflector and the laser are synchronized such that a reflective surface of the rotatably mounted reflector is in optical communication with the radially positioned reflector when the optical isolation apparatus receives a pulse of laser radiation to allow the pulse of laser radiation to pass to a plasma formation location and cause a radiation emitting plasma to be generated via vaporization of a droplet of fuel material. The rotatably mounted reflector and the laser are further synchronized such that the reflective surface of the rotatably mounted reflector is at least partially optically isolated from the radially positioned reflector when the optical isolation apparatus receives radiation reflected from the plasma formation location.

    摘要翻译： EUV辐射发生装置包括被配置为产生激光辐射脉冲的激光器，以及包括可旋转地安装的反射器和径向定位的反射器的光隔离装置。 可旋转地安装的反射器和激光器是同步的，使得当光隔离装置接收到激光辐射脉冲以允许激光辐射脉冲传递到一个激光辐射脉冲时，可旋转安装的反射器的反射表面与径向定位的反射器光学连通 等离子体形成位置并且通过燃料材料液滴的蒸发而产生辐射发射等离子体。 可旋转地安装的反射器和激光器进一步同步，使得当光学隔离装置接收从等离子体形成位置反射的辐射时，可旋转安装的反射器的反射表面至少部分地与径向定位的反射器光学隔离。