-
公开(公告)号：US08368040B2
公开(公告)日：2013-02-05
申请号：US12832258
申请日：2010-07-08
申请人： Erik Roelof Loopstra , Vladimir Vitalevich Ivanov , Johannes Hubertus Josephina Moors , Gerardus Hubertus Petrus Maria Swinkels , Andrei Mikhailovich Yakunin , Dennis De Graaf , Uwe Bruno Heini Stamm
发明人： Erik Roelof Loopstra , Vladimir Vitalevich Ivanov , Johannes Hubertus Josephina Moors , Gerardus Hubertus Petrus Maria Swinkels , Andrei Mikhailovich Yakunin , Dennis De Graaf , Uwe Bruno Heini Stamm
CPC分类号： H05G2/003 , G03F7/70033 , H05G2/005 , H05G2/008
摘要： A radiation system includes a target material supply configured to supply droplets of target material along a trajectory, and a laser system that includes an amplifier and optics. The optics are configured to establish a first beam path which passes through the amplifier and through a first location on the trajectory, and to establish a second beam path which passes through the amplifier and through a second location on the trajectory. The laser system is configured to generate a first pulse of laser radiation when photons emitted from the amplifier are reflected along the first beam path by a droplet of target material at the first location on the trajectory. The laser system is configured to generate a second pulse of laser radiation when photons emitted from the amplifier are reflected along the second beam path by the droplet of target material at the second location on the trajectory.
摘要翻译： 辐射系统包括被配置为沿着轨迹提供目标材料的液滴的目标材料供应，以及包括放大器和光学器件的激光系统。 光学器件被配置成建立穿过放大器并通过轨迹上的第一位置的第一光束路径，并且建立穿过放大器并通过轨迹上的第二位置的第二光束路径。 激光系统被配置为当从放大器发射的光子在轨迹上的第一位置处通过目标材料的液滴沿着第一光束路径反射时，产生激光辐射的第一脉冲。 激光系统被配置为当从放大器发射的光子在轨道上的第二位置处由靶材料的液滴沿着第二光束路径反射时，产生激光辐射的第二脉冲。
-
公开(公告)号：US20110026002A1
公开(公告)日：2011-02-03
申请号：US12830777
申请日：2010-07-06
CPC分类号： G03F7/70941 , G03F7/70033 , G03F7/70575 , H05G2/003 , H05G2/005 , H05G2/008
摘要： An EUV radiation generation apparatus includes an optical gain medium configured to produce laser radiation for interaction with a target material to produce an EUV radiation-emitting plasma, and a structure defining an aperture through which the laser radiation may pass. The structure includes a radiation guide having an outer surface constructed and arranged to guide the laser radiation away from the optical gain medium.
摘要翻译： EUV辐射发生装置包括光学增益介质，该光学增益介质被配置为产生用于与目标材料相互作用的激光辐射以产生EUV辐射发射等离子体，以及限定激光辐射通过的孔径的结构。 该结构包括具有构造和布置成将激光辐射远离光学增益介质的外表面的辐射导向器。
-
3.发明授权Lithographic apparatus, EUV radiation generation apparatus and device manufacturing method 有权光刻设备，EUV辐射发生装置及器件制造方法公开(公告)号：US09110377B2
公开(公告)日：2015-08-18
申请号：US13817792
申请日：2011-08-04
申请人： Erik Roelof Loopstra , Gerardus Hubertus Petrus Maria Swinkels , Erik Petrus Buurman , Uwe Bruno Heini Stamm
发明人： Erik Roelof Loopstra , Gerardus Hubertus Petrus Maria Swinkels , Erik Petrus Buurman , Uwe Bruno Heini Stamm
CPC分类号： G03F7/70033 , B23K26/0643 , G03F7/70025 , G03F7/70191 , G03F7/7055 , H01S3/0071 , H01S3/2308 , H05G2/001 , H05G2/008
摘要： An EUV radiation generation apparatus includes a laser configured to generate pulses of laser radiation, and an optical isolation apparatus that includes a rotatably mounted reflector and a radially positioned reflector. The rotatably mounted reflector and the laser are synchronized such that a reflective surface of the rotatably mounted reflector is in optical communication with the radially positioned reflector when the optical isolation apparatus receives a pulse of laser radiation to allow the pulse of laser radiation to pass to a plasma formation location and cause a radiation emitting plasma to be generated via vaporization of a droplet of fuel material. The rotatably mounted reflector and the laser are further synchronized such that the reflective surface of the rotatably mounted reflector is at least partially optically isolated from the radially positioned reflector when the optical isolation apparatus receives radiation reflected from the plasma formation location.
摘要翻译： EUV辐射发生装置包括被配置为产生激光辐射脉冲的激光器，以及包括可旋转地安装的反射器和径向定位的反射器的光隔离装置。 可旋转地安装的反射器和激光器是同步的，使得当光隔离装置接收到激光辐射脉冲以允许激光辐射脉冲传递到一个激光辐射脉冲时，可旋转安装的反射器的反射表面与径向定位的反射器光学连通 等离子体形成位置并且通过燃料材料液滴的蒸发而产生辐射发射等离子体。 可旋转地安装的反射器和激光器进一步同步，使得当光学隔离装置接收从等离子体形成位置反射的辐射时，可旋转安装的反射器的反射表面至少部分地与径向定位的反射器光学隔离。
-
4.发明授权公开(公告)号：US09091944B2
公开(公告)日：2015-07-28
申请号：US13497741
申请日：2010-09-24
申请人： Erik Roelof Loopstra , Vadim Yevgenyevich Banine , Gerardus Hubertus Petrus Maria Swinkels , Sven Pekelder , Dzmitry Labetski , Uwe Bruno Heini Stamm , William N. Partlo
发明人： Erik Roelof Loopstra , Vadim Yevgenyevich Banine , Gerardus Hubertus Petrus Maria Swinkels , Sven Pekelder , Dzmitry Labetski , Uwe Bruno Heini Stamm , William N. Partlo
CPC分类号： G03F7/70933 , G03F7/70033 , G03F7/70175 , G03F7/70808 , G03F7/70908 , G03F7/70916 , G03F7/70925 , H05G2/003 , H05G2/005
摘要： An EUV lithographic apparatus includes a source collector apparatus in which the extreme ultraviolet radiation is generated by exciting a fuel to provide a plasma emitting the radiation. The source collector apparatus includes a chamber in fluid communication with a guide way external to the chamber. A pump for circulating buffer gas is part of the guide way, and provides a closed loop buffer gas flow. The gas flowing through the guide way traverses a gas decomposer wherein a compound of fuel material and buffer gas material is decomposed, so that decomposed buffer gas material can be fed back into the closed loop flow path.
摘要翻译： EUV光刻设备包括源极收集器装置，其中通过激发燃料产生极紫外辐射以提供发射辐射的等离子体。 源极收集器装置包括与腔室外部的引导方式流体连通的腔室。 用于循环缓冲气体的泵是引导方式的一部分，并提供闭环缓冲气体流。 流过引导方式的气体穿过气体分解器，其中燃料和缓冲气体材料的化合物被分解，使得分解的缓冲气体材料可以反馈回闭环流动路径。
-
5.发明申请公开(公告)号：US20120182536A1
公开(公告)日：2012-07-19
申请号：US13497741
申请日：2010-09-24
申请人： Erik Roelof Loopstra , Vadim Yevgenyevich Banine , Gerardus Hubertus Petrus Maria Swinkels , Sven Pekelder , Dzmitry Labetski , Uwe Bruno Heini Stamm , William N. Partlo
发明人： Erik Roelof Loopstra , Vadim Yevgenyevich Banine , Gerardus Hubertus Petrus Maria Swinkels , Sven Pekelder , Dzmitry Labetski , Uwe Bruno Heini Stamm , William N. Partlo
CPC分类号： G03F7/70933 , G03F7/70033 , G03F7/70175 , G03F7/70808 , G03F7/70908 , G03F7/70916 , G03F7/70925 , H05G2/003 , H05G2/005
摘要： An EUV lithographic apparatus includes a source collector apparatus in which the extreme ultraviolet radiation is generated by exciting a fuel to provide a plasma emitting the radiation. The source collector apparatus includes a chamber in fluid communication with a guide way external to the chamber. A pump for circulating buffer gas is part of the guide way, and provides a closed loop buffer gas flow. The gas flowing through the guide way traverses a gas decomposer wherein a compound of fuel material and buffer gas material is decomposed, so that decomposed buffer gas material can be fed back into the closed loop flow path.
摘要翻译： EUV光刻设备包括源极收集器装置，其中通过激发燃料产生极紫外辐射以提供发射辐射的等离子体。 源极收集器装置包括与腔室外部的引导方式流体连通的腔室。 用于循环缓冲气体的泵是引导方式的一部分，并提供闭环缓冲气体流。 流过引导方式的气体穿过气体分解器，其中燃料和缓冲气体材料的化合物被分解，使得分解的缓冲气体材料可以反馈回闭环流动路径。
-
公开(公告)号：US20110013166A1
公开(公告)日：2011-01-20
申请号：US12832258
申请日：2010-07-08
申请人： Erik Roelof Loopstra , Vladimir Vitalevich Ivanov , Johannes Hubertus Josephina Moors , Gerardus Hubertus Petrus Maria Swinkels , Andrei Mikhailovich Yakunin , Dennis De Graaf , Uwe Bruno Heini Stamm
发明人： Erik Roelof Loopstra , Vladimir Vitalevich Ivanov , Johannes Hubertus Josephina Moors , Gerardus Hubertus Petrus Maria Swinkels , Andrei Mikhailovich Yakunin , Dennis De Graaf , Uwe Bruno Heini Stamm
CPC分类号： H05G2/003 , G03F7/70033 , H05G2/005 , H05G2/008
摘要： A radiation system includes a target material supply configured to supply droplets of target material along a trajectory, and a laser system that includes an amplifier and optics. The optics are configured to establish a first beam path which passes through the amplifier and through a first location on the trajectory, and to establish a second beam path which passes through the amplifier and through a second location on the trajectory. The laser system is configured to generate a first pulse of laser radiation when photons emitted from the amplifier are reflected along the first beam path by a droplet of target material at the first location on the trajectory. The laser system is configured to generate a second pulse of laser radiation when photons emitted from the amplifier are reflected along the second beam path by the droplet of target material at the second location on the trajectory.
摘要翻译： 辐射系统包括被配置为沿着轨迹提供目标材料的液滴的目标材料供应，以及包括放大器和光学器件的激光系统。 光学器件被配置成建立穿过放大器并通过轨迹上的第一位置的第一光束路径，并且建立穿过放大器并通过轨迹上的第二位置的第二光束路径。 激光系统被配置为当从放大器发射的光子在轨迹上的第一位置处通过目标材料的液滴沿着第一光束路径反射时，产生激光辐射的第一脉冲。 激光系统被配置为当从放大器发射的光子在轨道上的第二位置处由靶材料的液滴沿着第二光束路径反射时，产生激光辐射的第二脉冲。
-
公开(公告)号：US08547525B2
公开(公告)日：2013-10-01
申请号：US12830777
申请日：2010-07-06
CPC分类号： G03F7/70941 , G03F7/70033 , G03F7/70575 , H05G2/003 , H05G2/005 , H05G2/008
摘要： An EUV radiation generation apparatus includes an optical gain medium configured to produce laser radiation for interaction with a target material to produce an EUV radiation-emitting plasma, and a structure defining an aperture through which the laser radiation may pass. The structure includes a radiation guide having an outer surface constructed and arranged to guide the laser radiation away from the optical gain medium.
摘要翻译： EUV辐射发生装置包括光学增益介质，该光学增益介质被配置为产生用于与目标材料相互作用的激光辐射以产生EUV辐射发射等离子体，以及限定激光辐射通过的孔径的结构。 该结构包括具有构造和布置成将激光辐射远离光学增益介质的外表面的辐射导向器。
-
8.发明申请LITHOGRAPHIC APPARATUS, EUV RADIATION GENERATION APPARATUS AND DEVICE MANUFACTURING METHOD 有权光刻设备，EUV辐射发生装置和装置制造方法公开(公告)号：US20130141709A1
公开(公告)日：2013-06-06
申请号：US13817792
申请日：2011-08-04
申请人： Erik Roelof Loopstra , Gerardus Hubertus Petrus Maria Swinkels , Erik Petrus Buurman , Uwe Bruno Heini Stamm
发明人： Erik Roelof Loopstra , Gerardus Hubertus Petrus Maria Swinkels , Erik Petrus Buurman , Uwe Bruno Heini Stamm
IPC分类号： G03F7/20
CPC分类号： G03F7/70033 , B23K26/0643 , G03F7/70025 , G03F7/70191 , G03F7/7055 , H01S3/0071 , H01S3/2308 , H05G2/001 , H05G2/008
摘要： An EUV radiation generation apparatus includes a laser configured to generate pulses of laser radiation, and an optical isolation apparatus that includes a rotatably mounted reflector and a radially positioned reflector. The rotatably mounted reflector and the laser are synchronized such that a reflective surface of the rotatably mounted reflector is in optical communication with the radially positioned reflector when the optical isolation apparatus receives a pulse of laser radiation to allow the pulse of laser radiation to pass to a plasma formation location and cause a radiation emitting plasma to be generated via vaporization of a droplet of fuel material. The rotatably mounted reflector and the laser are further synchronized such that the reflective surface of the rotatably mounted reflector is at least partially optically isolated from the radially positioned reflector when the optical isolation apparatus receives radiation reflected from the plasma formation location.
摘要翻译： EUV辐射发生装置包括被配置为产生激光辐射脉冲的激光器，以及包括可旋转地安装的反射器和径向定位的反射器的光隔离装置。 可旋转地安装的反射器和激光器是同步的，使得当光隔离装置接收到激光辐射脉冲以允许激光辐射脉冲传递到一个激光辐射脉冲时，可旋转安装的反射器的反射表面与径向定位的反射器光学连通 等离子体形成位置并且通过燃料材料液滴的蒸发而产生辐射发射等离子体。 可旋转地安装的反射器和激光器进一步同步，使得当光学隔离装置接收从等离子体形成位置反射的辐射时，可旋转安装的反射器的反射表面至少部分地与径向定位的反射器光学隔离。
-
公开(公告)号：US20140253894A1
公开(公告)日：2014-09-11
申请号：US14346530
申请日：2012-08-23
申请人： Jan Bernard Plechelmus Van Schoot , Hermanus Johannes Maria Kreuwel , Vadim Yevgenyevich Banine , Andrei Mikhailovich Yakunin , Johannes Hubertus Josephina Moors , Olav Waldimir Frijns , Gerardus Hubertus Petrus Maria Swinkels , Ivo Vanderhallen , Uwe Bruno Heini Stamm
发明人： Jan Bernard Plechelmus Van Schoot , Hermanus Johannes Maria Kreuwel , Vadim Yevgenyevich Banine , Andrei Mikhailovich Yakunin , Johannes Hubertus Josephina Moors , Olav Waldimir Frijns , Gerardus Hubertus Petrus Maria Swinkels , Ivo Vanderhallen , Uwe Bruno Heini Stamm
CPC分类号： G03F7/70058 , G03F7/70033 , H05G2/005 , H05G2/008
摘要： A radiation source having a fuel stream generator (110) that generates and directs a fuel stream (102) along a trajectory towards a plasma formation location (104). A pre-pulse laser radiation assembly directs a first beam of laser radiation (100) at the fuel stream at the plasma formation location to generate a modified fuel target (106). A main pulse laser radiation assembly directs a second beam of laser radiation (108) at the modified fuel target at the plasma formation location to generate a radiation generating plasma (117). A collector (122) collects the radiation and directs it along an optical axis (105) of the radiation source. The first beam of laser radiation being directed toward the fuel stream substantially along the optical axis.
摘要翻译： 一种具有燃料流发生器（110）的辐射源，其产生并引导燃料流（102）沿轨迹朝向等离子体形成位置（104）。 预脉冲激光辐射组件将等离子体形成位置处的燃料流处的第一激光辐射束（100）引导以产生经修改的燃料靶（106）。 主脉冲激光辐射组件在等离子体形成位置处引导在修改的燃料靶处的第二激光辐射束（108）以产生辐射产生等离子体（117）。 收集器（122）收集辐射并沿辐射源的光轴（105）引导辐射。 激光辐射的第一束基本上沿着光轴指向燃料流。
-
公开(公告)号：US09632419B2
公开(公告)日：2017-04-25
申请号：US14346530
申请日：2012-08-23
申请人： Jan Bernard Plechelmus Van Schoot , Vadim Yevgenyevich Banine , Olav Waldemar Vladimir Frijns , Hermanus Kreuwel , Johannes Hubertus Josephina Moors , Uwe Bruno Heini Stamm , Gerardus Hubertus Petrus Maria Swinkels , Ivo Vanderhallen , Andrei Mikhailovich Yakunin
发明人： Jan Bernard Plechelmus Van Schoot , Vadim Yevgenyevich Banine , Olav Waldemar Vladimir Frijns , Hermanus Kreuwel , Johannes Hubertus Josephina Moors , Uwe Bruno Heini Stamm , Gerardus Hubertus Petrus Maria Swinkels , Ivo Vanderhallen , Andrei Mikhailovich Yakunin
CPC分类号： G03F7/70058 , G03F7/70033 , H05G2/005 , H05G2/008
摘要： A radiation source having a fuel stream generator (110) that generates and directs a fuel stream (102) along a trajectory towards a plasma formation location (104). A pre-pulse laser radiation assembly directs a first beam of laser radiation (100) at the fuel stream at the plasma formation location to generate a modified fuel target (106). A main pulse laser radiation assembly directs a second beam of laser radiation (108) at the modified fuel target at the plasma formation location to generate a radiation generating plasma (117). A collector (122) collects the radiation and directs it along an optical axis (105) of the radiation source. The first beam of laser radiation being directed toward the fuel stream substantially along the optical axis.
-
-
-
-
-
-
-
-
-
搜索结果
10 条记录 (耗时 0.029 秒)
