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公开(公告)号:US20220189933A1
公开(公告)日:2022-06-16
申请号:US17587524
申请日:2022-01-28
Applicant: Applied Materials, Inc.
Inventor: Daihua Zhang , Yingdong Luo , Mingwei Zhu , Hou T. Ng , Sivapackia Ganapathiappan , Nag B. Patibandla
IPC: H01L25/075 , H01L33/00 , H01L33/50 , H01L33/32
Abstract: A multi-color display includes a backplane having backplane circuitry, an array of micro-LEDs electrically integrated with backplane circuitry of the backplane, a cover layer spanning the LEDs and having a plurality of recesses, and first and second color conversion layers. Each recess of the plurality of recesses positioned over a corresponding micro-LED from the plurality of micro-LEDs, the first color conversion layer is in each recess over a first plurality of LEDs to convert the illumination from the first plurality of LEDs to light of a first color, and the second color conversion layer is in each recess over a second plurality of LEDs to convert the illumination from the second plurality of LEDs to light of a different second color.
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公开(公告)号:US20220165789A1
公开(公告)日:2022-05-26
申请号:US17670374
申请日:2022-02-11
Applicant: Applied Materials, Inc.
Inventor: Mingwei Zhu , Sivapackia Ganapathiappan , Boyi Fu , Hou T. Ng , Nag B. Patibandla
Abstract: An apparatus for positioning micro-devices on a substrate includes one or more supports to hold a donor substrate and a destination substrate, an adhesive dispenser to deliver adhesive on micro-devices on the donor substrate, a transfer device including a transfer surface to transfer the micro-devices from the donor substrate to the destination substrate, and a controller. The controller is configured to operate the adhesive dispenser to selectively dispense the adhesive onto selected micro-devices on the donor substrate based on a desired spacing of the selected micro-devices on the destination substrate. The controller is configured to operate the transfer device such that the transfer surface engages the adhesive on the donor substrate to cause the selected micro-devices to adhere to the transfer surface and the transfer surface then transfers the selected micro-devices from the donor substrate to the destination substrate
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23.
公开(公告)号:US20220069173A1
公开(公告)日:2022-03-03
申请号:US17006624
申请日:2020-08-28
Applicant: Applied Materials, Inc.
Inventor: Yingdong Luo , Daihua Zhang , Hou T. Ng , Sivapackia Ganapathiappan , Nag B. Patibandla
Abstract: A photocurable composition includes quantum dots, quantum dot precursor materials, a chelating agent, one or more monomers, and a photoinitiator. The quantum dots are selected to emit radiation in a first wavelength band in the visible light range in response to absorption of radiation in a second wavelength band in the UV or visible light range. The second wavelength band is different than the first wavelength band. The quantum dot precursor materials include metal atoms or metal ions corresponding to metal components present in the quantum dots. The chelating agent is configured to chelate the quantum dot precursor materials. The photoinitiator initiates polymerization of the one or more monomers in response to absorption of radiation in the second wavelength band.
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公开(公告)号:US20220029068A1
公开(公告)日:2022-01-27
申请号:US17380998
申请日:2021-07-20
Applicant: Applied Materials, Inc.
Inventor: Yingdong Luo , Sivapackia Ganapathiappan , Daihua Zhang , Hou T. Ng , Nag B. Patibandla
Abstract: A photocurable composition includes a nanomaterial selected to emit radiation in a first wavelength band in the visible light range in response to absorption of radiation in a second wavelength band in the UV or visible light range. The second wavelength band is different than the first wavelength band. The photocurable composition further includes one or more (meth)acrylate monomers, a thiol crosslinker, and a photoinitiator that initiates polymerization of the one or more (meth)acrylate monomers in response to absorption of radiation in the second wavelength band. A light-emitting device includes a plurality of light-emitting diodes and the cured photocurable composition in contact with a surface through which radiation in a first wavelength band in the UV or visible light range is emitted from each of the light-emitting diodes
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公开(公告)号:US11137243B2
公开(公告)日:2021-10-05
申请号:US15494332
申请日:2017-04-21
Applicant: Applied Materials, Inc.
Inventor: Hou T. Ng , Nag B. Patibandla , Sivapackia Ganapathiappan
IPC: G01B11/06 , B33Y10/00 , B33Y30/00 , B24D18/00 , B29C64/112 , B29C64/277 , B29C64/245 , B29C64/236 , B29C64/227 , B29C64/209 , B33Y80/00 , B29C64/129 , B29C64/386 , B29L31/00 , B24B37/24 , B24B37/26 , B24B37/20 , B33Y40/00 , G01N15/10 , G01N15/14
Abstract: A method of additive manufacturing includes dispensing successive layers of feed material to form a polishing pad, and directing first and second radiation beams toward the layers of feed material to form a polishing pad. Dispensing each successive layer of the layers of feed material includes dispensing a drop of feed material, and directing the first and second radiation beams toward the layers of feed material includes, for each successive layer, directing the first radiation beam toward the drop of feed material to cure an exterior surface of the drop of feed material, and directing the second radiation beam toward the drop of feed material to cure an interior volume of the drop of feed material.
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公开(公告)号:US11002530B2
公开(公告)日:2021-05-11
申请号:US15494302
申请日:2017-04-21
Applicant: Applied Materials, Inc.
Inventor: Hou T. Ng , Nag B. Patibandla , Sivapackia Ganapathiappan
IPC: B29C64/227 , G01B11/06 , B33Y10/00 , B33Y30/00 , B24D18/00 , B29C64/112 , B29C64/277 , B29C64/245 , B29C64/236 , B29C64/209 , B33Y80/00 , B29C64/129 , B29C64/386 , B29L31/00 , B24B37/24 , B24B37/26 , B24B37/20 , B33Y40/00 , G01N15/10 , G01N15/14
Abstract: An additive manufacturing apparatus for forming a polishing pad for chemical mechanical polishing includes a platform, an actuator system coupled to the platform to adjust a tilt of the platform, one or more printheads supported above the platform, the one or more printheads configured to dispense successive layers of feed material on the platform to be form the polishing pad, a sensing system to detect a height of a surface on or above the platform at each of a plurality of horizontally spaced points, and a controller configured to selectively operate the actuator system to adjust the tilt of the platform based on the detected height of the platform at each of the points such that the surface is moved closer to horizontal.
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公开(公告)号:US20210013258A1
公开(公告)日:2021-01-14
申请号:US16908462
申请日:2020-06-22
Applicant: Applied Materials, Inc.
Inventor: Mingwei Zhu , Sivapackia Ganapathiappan , Boyi Fu , Hou T. Ng , Nag B. Patibandla
Abstract: An apparatus for positioning micro-devices on a substrate includes one or more supports to hold a donor substrate and a destination substrate, an adhesive dispenser to deliver adhesive on micro-devices on the donor substrate, a transfer device including a transfer surface to transfer the micro-devices from the donor substrate to the destination substrate, and a controller. The controller is configured to operate the adhesive dispenser to selectively dispense the adhesive onto selected micro-devices on the donor substrate based on a desired spacing of the selected micro-devices on the destination substrate. The controller is configured to operate the transfer device such that the transfer surface engages the adhesive on the donor substrate to cause the selected micro-devices to adhere to the transfer surface and the transfer surface then transfers the selected micro-devices from the donor substrate to the destination substrate
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公开(公告)号:US20180079152A1
公开(公告)日:2018-03-22
申请号:US15494302
申请日:2017-04-21
Applicant: Applied Materials, Inc.
Inventor: Hou T. Ng , Nag B. Patibandla , Sivapackia Ganapathiappan
CPC classification number: G01B11/0608 , B24B37/20 , B24B37/245 , B24B37/26 , B24D18/009 , B29C64/112 , B29C64/129 , B29C64/277 , B29C64/386 , B29L2031/736 , B33Y10/00 , B33Y30/00 , B33Y40/00 , B33Y80/00 , G01N2015/1075 , G01N2015/1493
Abstract: An additive manufacturing apparatus for forming a polishing pad for chemical mechanical polishing includes a platform, an actuator system coupled to the platform to adjust a tilt of the platform, one or more printheads supported above the platform, the one or more printheads configured to dispense successive layers of feed material on the platform to be form the polishing pad, a sensing system to detect a height of a surface on or above the platform at each of a plurality of horizontally spaced points, and a controller configured to selectively operate the actuator system to adjust the tilt of the platform based on the detected height of the platform at each of the points such that the surface is moved closer to horizontal.
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公开(公告)号:US12187935B1
公开(公告)日:2025-01-07
申请号:US18537051
申请日:2023-12-12
Applicant: Applied Materials, Inc.
Inventor: Sivapackia Ganapathiappan , Kulandaivelu Sivanandan , Nag Bhushanam Patibandla , Anthony Kipkorir
IPC: C09K11/06 , C09K11/02 , H10K50/115 , H10K71/00
Abstract: Liquid dispersions of quantum dot particles comprise an acrylic medium and quantum dot particles dispersed in the acrylic medium have an initial viscosity. The quantum particles comprise ligands attached to the quantum dot particles, the ligands comprising functional groups configured to stabilize the initial viscosity liquid dispersion of the quantum dot particles. The liquid dispersions of quantum dot particles are useful as stable liquid formulations that resist gelling for spin-coating and inkjet printing of color conversion layers in the manufacture of LED and micro-LED panel for advanced displays. Methods of manufacturing light-emitting devices using the liquid dispersions of quantum dot particles are disclosed.
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30.
公开(公告)号:US20240194836A1
公开(公告)日:2024-06-13
申请号:US18444277
申请日:2024-02-16
Applicant: Applied Materials, Inc.
Inventor: Yingdong Luo , Daihua Zhang , Hou T. Ng , Sivapackia Ganapathiappan , Nag B. Patibandla
CPC classification number: H01L33/504 , H01L27/156 , H01L33/30
Abstract: A photocurable composition includes quantum dots, quantum dot precursor materials, a chelating agent, one or more monomers, and a photoinitiator. The quantum dots are selected to emit radiation in a first wavelength band in the visible light range in response to absorption of radiation in a second wavelength band in the UV or visible light range. The second wavelength band is different than the first wavelength band. The quantum dot precursor materials include metal atoms or metal ions corresponding to metal components present in the quantum dots. The chelating agent is configured to chelate the quantum dot precursor materials. The photoinitiator initiates polymerization of the one or more monomers in response to absorption of radiation in the second wavelength band.
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