公开(公告)号：US20150132687A1

公开(公告)日：2015-05-14

申请号：US14605264

申请日：2015-01-26

Applicant: FUJIFILM Corporation

Inventor： Shuji HIRANO ,  Natsumi YOKOKAWA ,  Hiroo TAKIZAWA ,  Wataru NIHASHI

IPC: G03F7/038 ,  G03F7/20 ,  C08F22/10 ,  G03F7/30

CPC classification number: G03F7/0388 ,  C08F22/10 ,  C08F212/14 ,  C08F220/28 ,  G03F7/0002 ,  G03F7/0392 ,  G03F7/0397 ,  G03F7/11 ,  G03F7/2002 ,  G03F7/2037 ,  G03F7/2041 ,  G03F7/30 ,  G03F7/325 ,  G03F7/38 ,  H01L21/0274 ,  C08F2220/281 ,  C08F2220/283

Abstract: There is provided an actinic ray-sensitive or radiation-sensitive resin composition comprising (P) a resin containing a repeating unit represented by the specific formula (1) and a repeating unit represented by the specific formula (A); a resist film formed using the actinic ray-sensitive or radiation-sensitive resin composition; a pattern forming method comprising (i) a step of forming a film from the actinic ray-sensitive or radiation-sensitive resin composition, (ii) a step of exposing the film, and (iii) a step of developing the exposed film by using a developer to form a pattern; a method for manufacturing an electronic device, comprising the pattern forming method, and an electronic device manufactured by the manufacturing method of an electronic device.

Abstract translation: 提供了包含（P）包含由特定式（1）表示的重复单元的树脂和由特定式（A）表示的重复单元的光化射线敏感或辐射敏感性树脂组合物。 使用光化射线敏感性或辐射敏感性树脂组合物形成的抗蚀剂膜; 一种图案形成方法，包括（i）从光化射线敏感或辐射敏感性树脂组合物形成膜的步骤，（ii）曝光所述膜的步骤，以及（iii）通过使用 开发人员形成一个模式; 一种用于制造电子设备的方法，包括图案形成方法，以及通过电子设备的制造方法制造的电子设备。

公开(公告)号：US20190018317A1

公开(公告)日：2019-01-17

申请号：US16132671

申请日：2018-09-17

Applicant: FUJIFILM Corporation

Inventor： Hideaki TSUBAKI ,  Wataru NIHASHI

IPC: G03F7/004 ,  G03F7/16 ,  G03F7/20 ,  G03F7/38 ,  G03F7/32 ,  G03F7/40

Abstract: An actinic ray-sensitive or radiation-sensitive composition, and an actinic ray-sensitive or radiation-sensitive composition obtained from a method for purifying an actinic ray-sensitive or radiation-sensitive composition and a method for producing an actinic ray-sensitive or radiation-sensitive composition contain a cation having a metal atom and a ligand, and have each of a content of sodium, a content of magnesium, and a content of iron of 50 ppm by mass or less with respect to the total solid content of the actinic ray-sensitive or radiation-sensitive composition. A pattern forming method includes the method for producing or purifying the actinic ray-sensitive or radiation-sensitive composition. A method for producing an electronic device includes the pattern forming method.

公开(公告)号：US20180364568A1

公开(公告)日：2018-12-20

申请号：US16108893

申请日：2018-08-22

Applicant: FUJIFILM Corporation

Inventor： Hideaki TSUBAKI ,  Wataru NIHASHI

IPC: G03F7/004 ,  G03F7/09 ,  G03F7/32

Abstract: An actinic ray-sensitive or radiation-sensitive composition contains a cation including a metal atom and a ligand, in which the number of particles in liquid having particle diameters of 0.15 μm or less included in 1 mL of the actinic ray-sensitive or radiation-sensitive composition is 10 or less.

公开(公告)号：US20180321589A1

公开(公告)日：2018-11-08

申请号：US16039450

申请日：2018-07-19

Applicant: FUJIFILM Corporation

Inventor： Tomotaka TSUCHIMURA ,  Akihiro KANEKO ,  Wataru NIHASHI

IPC: G03F7/038 ,  G03F7/40 ,  H01L21/027 ,  G03F7/20 ,  G03F7/16 ,  G03F7/32 ,  C08F212/14 ,  C08F220/58 ,  C08F220/16 ,  C08F212/32 ,  G03F7/039 ,  G03F7/38

CPC classification number: G03F7/038 ,  C08F212/12 ,  C08F212/14 ,  C08F212/32 ,  C08F220/16 ,  C08F220/58 ,  G03F7/039 ,  G03F7/16 ,  G03F7/168 ,  G03F7/20 ,  G03F7/2004 ,  G03F7/2037 ,  G03F7/32 ,  G03F7/325 ,  G03F7/38 ,  G03F7/40 ,  H01L21/0274

Abstract: The pattern forming method includes (1) a step of forming a film using an actinic ray-sensitive or radiation-sensitive resin composition, (2) a step of exposing the film with actinic rays or radiation, and (3) a step of developing the exposed film using a developer containing an organic solvent, in which the actinic ray-sensitive or radiation-sensitive resin composition contains an acid-decomposable resin (1) having a repeating unit (a) having an aromatic ring and a repeating unit (b) represented by a specific general formula, and the content of the repeating unit (a) is 55% by mole or more with respect to all the repeating units of the acid-decomposable resin (1). The method for manufacturing an electronic device includes the pattern forming method.

公开(公告)号：US20180267404A1

公开(公告)日：2018-09-20

申请号：US15987433

申请日：2018-05-23

Applicant: FUJIFILM Corporation

Inventor： Akihiro KANEKO ,  Tomotaka TSUCHIMURA ,  Shuji HIRANO ,  Hideaki TSUBAKI ,  Wataru NIHASHI

IPC: G03F7/038 ,  G03F7/16 ,  G03F7/20 ,  G03F7/38 ,  G03F7/32 ,  G03F7/40 ,  C08F212/14 ,  C08F220/16 ,  C08F220/28 ,  G03F7/039 ,  G03F7/004 ,  H01L21/027

CPC classification number: G03F7/038 ,  C08F12/22 ,  C08F12/24 ,  C08F212/14 ,  C08F212/145 ,  C08F212/32 ,  C08F220/16 ,  C08F220/28 ,  C08F2220/1841 ,  C08F2220/283 ,  C09D125/18 ,  G03F7/0045 ,  G03F7/039 ,  G03F7/0397 ,  G03F7/16 ,  G03F7/168 ,  G03F7/2004 ,  G03F7/32 ,  G03F7/325 ,  G03F7/38 ,  G03F7/40 ,  H01L21/0274 ,  C08F226/12

Abstract: Provided are a pattern forming method for obtaining a pattern which is excellent in etching resistance and in which occurrence of pattern collapse can be suppressed, and a method for manufacturing an electronic device including the pattern forming method. The pattern forming method includes a step of forming a film using an actinic ray-sensitive or radiation-sensitive resin composition that contains a resin A having a repeating unit represented by General Formula (I) and a repeating unit represented by General Formula (BII), a step of exposing the film, and a step of developing the exposed film using a developer containing an organic solvent, to form a pattern.

公开(公告)号：US20180186907A1

公开(公告)日：2018-07-05

申请号：US15849690

申请日：2017-12-21

Applicant: FUJIFILM Corporation

Inventor： Hideaki TSUBAKI ,  Toru TSUCHIHASHI ,  Wataru NIHASHI

IPC: C08F12/24 ,  G03F7/038 ,  G03F7/039 ,  G03F7/32 ,  H01L21/027

Abstract: Provided is a pattern forming method including the successive steps of: a resist film forming step of forming a resist film using an actinic ray-sensitive or radiation-sensitive composition; an exposure step of exposing the resist film; a step of developing the exposed resist film using a developer, and a step of rinsing the developed resist film using a rinsing liquid containing an organic solvent. The developer includes a ketone-based or ether-based solvent having a branched alkyl group. The organic solvent contained in the rinsing liquid includes an ether-based solvent having a branched alkyl group.

公开(公告)号：US20170075222A1

公开(公告)日：2017-03-16

申请号：US15358537

申请日：2016-11-22

Applicant: FUJIFILM Corporation

Inventor： Toru TSUCHIHASHI ,  Wataru NIHASHI ,  Hideaki TSUBAKI

IPC: G03F7/039 ,  G03F7/20 ,  C08F220/18 ,  G03F7/32 ,  G03F7/40 ,  G03F7/004 ,  G03F7/16

Abstract: A pattern forming method includes, in this order, forming a film on a substrate, using an active-light-sensitive or radiation-sensitive resin composition containing a resin (A) which has a repeating unit having a phenolic hydroxyl group, and a repeating unit having a group that decomposes by the action of an acid to generate a carboxyl group, and a compound (B) that generates an acid upon irradiation with active light or radiation; exposing the film; and developing the exposed film using a developer including an organic solvent, in which the developer including an organic solvent contains an organic solvent having 8 or more carbon atoms and 2 or less heteroatoms in the amount of 50% by mass or more.

Abstract translation: 图案形成方法依次包括使用含有具有酚羟基的重复单元的树脂（A）的活性光敏感或辐射敏感性树脂组合物在基材上形成膜，并且重复 具有通过酸的作用分解以产生羧基的基团的单元和在用活性光或辐射照射时产生酸的化合物（B）; 曝光电影; 并使用包括有机溶剂的显影剂显影所述曝光的膜，其中包含有机溶剂的显影剂含有具有8个或更多个碳原子的有机溶剂和2个或更少的杂原子的量为50质量％以上。

公开(公告)号：US20160147154A1

公开(公告)日：2016-05-26

申请号：US15011813

申请日：2016-02-01

Applicant: FUJIFILM Corporation

Inventor： Hiroo TAKIZAWA ,  Toru FUJIMORI ,  Wataru NIHASHI ,  Shuji HIRANO ,  Natsumi YOKOKAWA

IPC: G03F7/32 ,  G03F7/038 ,  G03F7/20

CPC classification number: G03F7/325 ,  G03F7/0045 ,  G03F7/0046 ,  G03F7/038 ,  G03F7/0382 ,  G03F7/0392 ,  G03F7/0397 ,  G03F7/20 ,  G03F7/2004 ,  G03F7/2065 ,  G03F7/26 ,  G03F7/30 ,  G03F7/40

Abstract: There are provided a pattern formation method, including: (1) forming a film using an active light-sensitive or radiation-sensitive resin composition; (2) exposing the film to active light or radiation; and (3) developing the exposed film using a developer including an organic solvent, wherein the active light-sensitive or radiation-sensitive resin composition contains a resin (A) having specific repeating units, and a crosslinking agent (C).

Abstract translation: 提供了图案形成方法，其包括：（1）使用活性光敏或辐射敏感性树脂组合物形成膜; （2）将膜暴露于活性光或辐射; 和（3）使用包含有机溶剂的显影剂显影曝光的膜，其中活性光敏或辐射敏感性树脂组合物含有具有特定重复单元的树脂（A）和交联剂（C）。

公开(公告)号：US20150185610A1

公开(公告)日：2015-07-02

申请号：US14605292

申请日：2015-01-26

Applicant: FUJIFILM Corporation

Inventor： Shuji HIRANO ,  Natsumi YOKOKAWA ,  Hiroo TAKIZAWA ,  Wataru NIHASHI

IPC: G03F7/038 ,  G03F7/20 ,  C08F212/32 ,  C08F212/14 ,  C08F222/14 ,  G03F7/30 ,  C08F220/28

CPC classification number: G03F7/0388 ,  C08F12/20 ,  C08F12/24 ,  C08F12/30 ,  C08F212/14 ,  C08F220/18 ,  C08F220/26 ,  C08F220/28 ,  C08F222/14 ,  C08F232/08 ,  C08F2220/281 ,  C09D125/18 ,  G03F7/0392 ,  G03F7/0395 ,  G03F7/0397 ,  G03F7/2002 ,  G03F7/2037 ,  G03F7/30 ,  G03F7/325 ,  H01L21/0274 ,  C08F2220/282 ,  C08F220/06 ,  C08F2220/1858 ,  C08F2220/283 ,  C08F2220/301 ,  C08F2220/302 ,  C08F220/10

Abstract: There is provided a pattern forming method comprising, in order, (1) a step of forming a film by using an actinic ray-sensitive or radiation-sensitive resin composition containing (Ab) a resin having specific repeating units, (2) a step of exposing the film by using an electron beam or an extreme-ultraviolet ray, and (3) a step of developing the exposed film by using an organic solvent-containing developer to form a negative pattern.

Abstract translation: 提供一种图案形成方法，其顺序包括：（1）通过使用含有（Ab）具有特定重复单元的树脂的光化射线敏感性或辐射敏感性树脂组合物形成膜的步骤，（2）步骤 通过使用电子束或极紫外线曝光膜，以及（3）通过使用含有机溶剂的显影剂显影曝光的膜以形成负图案的步骤。