-
公开(公告)号:US11536914B2
公开(公告)日:2022-12-27
申请号:US17099834
申请日:2020-11-17
Applicant: GLOBALFOUNDRIES U.S. Inc.
Inventor: Yusheng Bian , Siva P. Adusumilli , Mark D. Levy
IPC: G02B6/42 , H01L31/0256 , H01L31/02 , G02B6/12
Abstract: A photodetector array includes a substrate, and an array of pixels over the substrate. Each pixel includes a set of diffraction gratings directly on a semiconductor photodetector. A pitch of the set of diffraction gratings associated with each pixel in the array of pixels are different to enable each pixel to detect a specific wavelength of light different than other pixels of the array of pixels. An air cavity may be provided in the substrate under the germanium photodetector to improve light absorption. A method of forming the photodetector array is also disclosed.
-
公开(公告)号:US20220223694A1
公开(公告)日:2022-07-14
申请号:US17146513
申请日:2021-01-12
Applicant: GLOBALFOUNDRIES U.S. Inc.
Inventor: Johnatan A. Kantarovsky , Mark D. Levy , Jeonghyun Hwang , Siva P. Adusumilli , Ajay Raman
IPC: H01L29/40 , H01L29/778 , H01L29/66 , H01L29/417 , H01L29/423 , H01L21/768
Abstract: Disclosed are a transistor and a method for forming the transistor. The method includes concurrently forming gate and source/drain openings through an uppermost layer (i.e., a dielectric layer) in a stack of layers. The method can further include: depositing and patterning gate conductor material so that a first gate section is in the gate opening and a second gate section is above the gate opening and so that the source/drain openings are exposed; extending the depth of the source/drain openings; and depositing and patterning source/drain conductor material so that a first source/drain section is in each source/drain opening and a second source/drain section is above each source/drain opening. Alternatively, the method can include: forming a plug in the gate opening and sidewall spacers in the source/drain openings; extending the depth of source/drain openings; depositing and patterning the source/drain conductor material; and subsequently depositing and patterning the gate conductor material.
-
公开(公告)号:US20210351306A1
公开(公告)日:2021-11-11
申请号:US16868773
申请日:2020-05-07
Applicant: GLOBALFOUNDRIES U.S. INC.
Inventor: Siva P. Adusumilli , Mark D. Levy , Vibhor Jain , John J. Ellis-Monaghan
IPC: H01L31/0232 , H01L27/144 , H01L31/028 , H01L31/105 , H01L31/18
Abstract: A photodetector includes a photodetecting region in a semiconductor substrate, and a reflector extending at least partially along a sidewall of the photodetecting region in the semiconductor substrate. The reflector includes an air gap defined in the semiconductor substrate. The reflector allows use of thinner germanium for the photodetecting region. The air gap may have a variety of internal features to direct electromagnetic radiation towards the photodetecting region.
-
公开(公告)号:US20250072024A1
公开(公告)日:2025-02-27
申请号:US18237195
申请日:2023-08-23
Applicant: GlobalFoundries U.S. Inc.
Inventor: Alvin J. Joseph , Mark D. Levy , Rajendran Krishnasamy , Johnatan A. Kantarovsky , Ajay Raman , Ian A. McCallum-Cook
IPC: H01L29/66 , H01L29/20 , H01L29/45 , H01L29/778
Abstract: The present disclosure relates to semiconductor structures and, more particularly, to a transistor with a thermal plug and methods of manufacture. The structure includes: a semiconductor substrate; a gate structure over the semiconductor substrate; a source region on a first side of the gate structure; a drain region on a second side of the gate structure; and a thermal plug extending from a top side of the semiconductor substrate into an active region of the semiconductor substrate.
-
公开(公告)号:US12183814B1
公开(公告)日:2024-12-31
申请号:US18615615
申请日:2024-03-25
Applicant: GlobalFoundries U.S. Inc.
Inventor: Steven J. Bentley , Francois Hebert , Lawrence Selvaraj Susai , Johnatan A Kantarovsky , Michael Zierak , Mark D. Levy , John Ellis-Monaghan
IPC: H01L29/778 , H01L29/20 , H01L29/66
Abstract: The present disclosure relates to semiconductor structures and, more particularly, to multi-channel transistors and methods of manufacture. The structure includes: a gate structure; a single channel layer in a channel region under the gate structure; a drift region adjacent to the gate structure; and multiple channel layers in the drift region coupled to the single channel layer under the gate structure.
-
公开(公告)号:US12046633B2
公开(公告)日:2024-07-23
申请号:US17157269
申请日:2021-01-25
Applicant: GLOBALFOUNDRIES U.S. Inc.
Inventor: Mark D. Levy , Siva P. Adusumilli , Johnatan A. Kantarovsky , Vibhor Jain
IPC: H01L29/06 , H01L21/308 , H01L21/764 , H01L27/06 , H01L27/07 , H01L29/08
CPC classification number: H01L29/0657 , H01L21/308 , H01L21/764 , H01L27/0635 , H01L27/0755 , H01L29/0653 , H01L29/0821
Abstract: The present disclosure relates to semiconductor structures and, more particularly, to airgap structures in a doped region under one or more transistors and methods of manufacture. The structure includes: a semiconductor material comprising a doped region; one or more sealed airgap structures breaking up the doped region of the semiconductor material; and a field effect transistor over the one or more sealed airgap structures and the semiconductor material.
-
公开(公告)号:US20230324332A1
公开(公告)日:2023-10-12
申请号:US17715282
申请日:2022-04-07
Applicant: GlobalFoundries U.S. Inc.
Inventor: Mark D. Levy , Siva P. Adusumilli , Aaron L. Vallett
IPC: G01N27/414
CPC classification number: G01N27/4148 , G01N27/4145
Abstract: Disclosed is a semiconductor structure including a device (e.g., a field effect transistor (FET), a biosensor FET (bioFET) or an ion-sensitive FET (ISFET)) with a fluid-based gate. The structure includes a substrate, an intermediate layer on the substrate, and a semiconductor layer on the intermediate layer. The device includes, within the semiconductor layer, a source region, a drain region, and a channel region between the source and drain regions. The structure includes, for the fluid-base gate, a cavity within the intermediate layer below the channel region and lined with a dielectric liner. Optionally, the exposed surface of the dielectric liner within the cavity is functionalized. Additional dielectric layers are stacked on the semiconductor layer and at least one port extends essentially vertically through the dielectric layers, the semiconductor layer and the dielectric liner to the cavity so as to allow fluid for the fluid-based gate to flow into the cavity.
-
公开(公告)号:US20230037420A1
公开(公告)日:2023-02-09
申请号:US17386062
申请日:2021-07-27
Applicant: GLOBALFOUNDRIES U.S. Inc.
Inventor: Johnatan A. Kantarovsky , Mark D. Levy , Brett T. Cucci , Jeonghyun Hwang , Siva P. Adusumilli
IPC: H01L29/06 , H01L21/8234 , H01L29/66 , H01L29/778
Abstract: The present disclosure relates to semiconductor structures and, more particularly, to gate structures and methods of manufacture. The structure includes: a gate structure comprising a horizontal portion and a substantially vertical stem portion; and an air gap surrounding the substantially vertical stem portion and having a curved surface under the horizontal portion.
-
公开(公告)号:US11422303B2
公开(公告)日:2022-08-23
申请号:US17108732
申请日:2020-12-01
Applicant: GLOBALFOUNDRIES U.S. Inc.
Inventor: Mark D. Levy , Siva P. Adusumilli , Yusheng Bian
Abstract: The present disclosure relates to semiconductor structures and, more particularly, to a waveguide structure with attenuator and methods of manufacture. The structure includes: a waveguide structure including semiconductor material; an attenuator underneath the waveguide structure; an airgap structure vertically aligned with and underneath the waveguide structure and the attenuator; and shallow trench isolation structures on sides of the waveguide structure and merging with the airgap structure.
-
公开(公告)号:US20220155535A1
公开(公告)日:2022-05-19
申请号:US17099834
申请日:2020-11-17
Applicant: GLOBALFOUNDRIES U.S. Inc.
Inventor: Yusheng Bian , Siva P. Adusumilli , Mark D. Levy
IPC: G02B6/42 , H01L31/0256 , H01L31/02
Abstract: A photodetector array includes a substrate, and an array of pixels over the substrate. Each pixel includes a set of diffraction gratings directly on a semiconductor photodetector. A pitch of the set of diffraction gratings associated with each pixel in the array of pixels are different to enable each pixel to detect a specific wavelength of light different than other pixels of the array of pixels. An air cavity may be provided in the substrate under the germanium photodetector to improve light absorption. A method of forming the photodetector array is also disclosed.
-
-
-
-
-
-
-
-
-