公开(公告)号：US07432517B2

公开(公告)日：2008-10-07

申请号：US11270898

申请日：2005-11-10

Applicant: Hako Botma ,  Joerg Bruebach ,  Mark Trentelman ,  Adel Joobeur

Inventor： Hako Botma ,  Joerg Bruebach ,  Mark Trentelman ,  Adel Joobeur

IPC: G01R23/02

CPC classification number: B23K26/0613 ,  B23K26/0622 ,  B23K26/066 ,  B23K26/067 ,  G03F7/7055

Abstract: A pulse modifying unit is provided in the illumination system of the lithographic apparatus to reduce the degradation of the expensive lens elements by billions of the high intensity ultraviolet pulses from the laser is configured to receive an input pulse of radiation along a first optical axis and further configured to emit one or more corresponding output pulses of radiation along a second optical axis, including a divider disposed along the first optical axis and configured to divide the incoming pulse into a first and a second pulse portion, wherein the divider is further configured to direct the first pulse portion along the second optical axis. A first and a second mirror, each with a radius of curvature, are disposed facing each other with a predetermined separation, configured to receive the second pulse portion and to redirect the second portion along the second optical axis. The optical path of the second portion through the pulse modifier is longer than that of the first portion, and the separation is less than radius of curvature.

Abstract translation: 在光刻设备的照明系统中提供脉冲修改单元以减少昂贵的透镜元件的劣化，数十亿的来自激光器的高强度紫外线脉冲被配置成沿第一光轴接收辐射的输入脉冲 被配置为沿着第二光轴发射一个或多个对应的辐射输出脉冲，包括沿着所述第一光轴设置的分配器，并且被配置为将所述输入脉冲分成第一和第二脉冲部分，其中所述除法器还被配置为引导 沿第二光轴的第一脉冲部分。 每个具有曲率半径的第一和第二反射镜以预定间隔彼此面对地布置，被配置为接收第二脉冲部分并且沿着第二光轴重定向第二部分。 通过脉冲调制器的第二部分的光路比第一部分的光路长，并且分离小于曲率半径。

公开(公告)号：US07333178B2

公开(公告)日：2008-02-19

申请号：US11139990

申请日：2005-05-31

Applicant: Marcel Mathijs Theodore Marie Dierichs ,  Hako Botma ,  Markus Franciscus Antonius Eurlings

Inventor： Marcel Mathijs Theodore Marie Dierichs ,  Hako Botma ,  Markus Franciscus Antonius Eurlings

IPC: G03B27/54 ,  G03B27/42

CPC classification number: G03F7/70191 ,  G03F7/70075 ,  G03F7/70091 ,  G03F7/70108 ,  G03F7/702

Abstract: A lithographic apparatus includes an illumination system including a field faceted mirror including a plurality of field facets and configured to receive radiation from a radiation source and form a plurality of images of the radiation source on corresponding pupil facets of a pupil faceted mirror. Each of the field facets is configured to provide an illumination slit at a level of a patterning device. The illumination slits are summed together at the level of the patterning device to illuminate the patterning device. First blades are configured to block radiation from a radiation source and each first blade is selectively actuable to cover a portion of a selectable number of field facets. The field faceted mirror further comprises partial field facets, the partial field facets being configured to produce a partial illumination slit at the level of the patterning device, and the pupil faceted mirror further includes pupil facets corresponding to the partial field facets. The partial field facets are configured to produce an illumination slit that is summed with the summed illumination slits of the field facets and/or correct for non-uniformity in the summed illumination slits of the field facets. Second blades are selectively actuable to cover a portion of a selectable number of partial field facets.

Abstract translation: 光刻设备包括照明系统，该照明系统包括包括多个场面的场分面反射镜，并且被配置为从辐射源接收辐射并且在瞳孔面镜的相应光瞳面上形成辐射源的多个图像。 每个场面被配置为在图案形成装置的水平面上提供照明狭缝。 照明狭缝在图案形成装置的水平面相加在一起，以照亮图案形成装置。 第一刀片被配置为阻挡来自辐射源的辐射，并且每个第一刀片可选择性地致动以覆盖可选择数量的场面的一部分。 场分面镜还包括部分场面，部分场面被配置为在图案形成装置的高度处产生局部照明狭缝，并且瞳孔面镜还包括对应于部分场面的光瞳面。 部分场面被配置为产生与场面的相加的照明狭缝相加的照明狭缝和/或校正场面的相加的照明狭缝中的不均匀性。 第二刀片可选择性地致动以覆盖可选数量的部分场面的一部分。

公开(公告)号：US20070090278A1

公开(公告)日：2007-04-26

申请号：US11203413

申请日：2005-08-15

Applicant: Hako Botma

Inventor： Hako Botma

IPC: H01J5/16 ,  H01J3/14

CPC classification number: G03F7/7055

Abstract: A beam modifying device configured to receive an input radiation beam along a first optical axis, and configured to emit an output radiation beam along a second optical axis. The beam modifying device includes a divider disposed along the first optical axis and configured to divide the incoming radiation beam into a first part and a second part, the divider being configured to direct the first part along the second optical axis and to direct the second part via a delay path. The beam modifying device further includes optics forming the delay path, the optics being configured to receive the second part and to direct the second part via the delay path and then along the second optical axis. The optics are arranged to mirror the second part such that the second part is mirrored with respect to the first part.

Abstract translation: 光束修改装置，被配置为沿着第一光轴接收输入辐射束，并且被配置为沿着第二光轴发射输出辐射束。 光束修改装置包括沿着第一光轴设置的分配器，其被配置为将进入的辐射束分成第一部分和第二部分，分配器被配置为沿着第二光轴引导第一部分并且引导第二部分 通过延迟路径。 光束修改装置还包括形成延迟路径的光学器件，光学器件被配置为接收第二部分并且经由延迟路径然后沿着第二光轴引导第二部分。 光学器件布置成镜像第二部分，使得第二部分相对于第一部分被镜像。

公开(公告)号：US07030958B2

公开(公告)日：2006-04-18

申请号：US10748849

申请日：2003-12-31

Applicant: Cornelis Petrus Andreas Marie Luijkx ,  Vadim Yevgenyevich Banine ,  Hako Botma ,  Martinus Van Duijnhoven ,  Markus Franciscus Antonius Eurlings ,  Heine Melle Mulder ,  Johannes Hendrik Everhardus Aldegonda Muijderman ,  Cornelis Jacobus Van Duijn ,  Jan Jaap Krikke

Inventor： Cornelis Petrus Andreas Marie Luijkx ,  Vadim Yevgenyevich Banine ,  Hako Botma ,  Martinus Van Duijnhoven ,  Markus Franciscus Antonius Eurlings ,  Heine Melle Mulder ,  Johannes Hendrik Everhardus Aldegonda Muijderman ,  Cornelis Jacobus Van Duijn ,  Jan Jaap Krikke

IPC: G03B27/52

CPC classification number: G03F7/70191 ,  G03F7/70066 ,  G03F7/70116 ,  G03F7/70558

Abstract: An optical attenuator device operates to remove a part of a beam of radiation having a higher than average intensity using at least one optical attenuator element. The device has application in a radiation system, and/or a lithographic apparatus, in particular a scanning lithographic apparatus, wherein the optical attenuator element(s) are provided in a central part of the beam, for example perpendicularly to a scanning direction.

Abstract translation: 光衰减器装置使用至少一个光衰减器元件来操作以去除具有高于平均强度的辐射束的一部分。 该装置具有应用于辐射系统和/或光刻设备，特别是扫描光刻设备中，其中光学衰减器元件设置在光束的中心部分，例如垂直于扫描方向。

公开(公告)号：US20050270510A1

公开(公告)日：2005-12-08

申请号：US10858409

申请日：2004-06-02

Applicant: Hako Botma

Inventor： Hako Botma

IPC: G02B5/00 ,  G02B27/10 ,  G03B27/54 ,  G03F7/20 ,  H01L21/027

CPC classification number: G03F7/70158 ,  G03F7/70141

Abstract: The invention relates to an illumination assembly, including a beam expander being arranged for receiving from a radiation source a radiation beam directed in a first direction (z) and for expanding the beam with a first magnification factor in a second direction (x) and with a second magnification factor in a third direction (y). The first, second and third directions being substantially mutually orthogonal. The illumination assembly further includes a beam splitter that is arranged for splitting the radiation beam in two split radiation beams split in at least one of the second and third direction, the propagation direction of the split radiation beams being substantially in the first direction. The beam splitter is further arranged for delivering the split radiation beams to the beam expander, of which at least one of the magnification factors is adjustable.

Abstract translation: 本发明涉及一种照明组件，其包括光束扩展器，其布置成用于从辐射源接收沿第一方向（z）指向的辐射束，并且用于沿第二方向（x）以第一放大系数扩展光束，并且 第三方向（y）的第二放大系数。 第一，第二和第三方向基本上相互正交。 照明组件还包括分束器，其被布置成用于将辐射束分裂成分成第二和第三方向中的至少一个的两个分裂的辐射束，分束辐射束的传播方向基本上在第一方向上。 分束器还被布置成用于将分束辐射束传送到扩束器，其中至少一个放大因子是可调节的。

公开(公告)号：US20050264784A1

公开(公告)日：2005-12-01

申请号：US10853723

申请日：2004-05-26

Applicant: Hako Botma

Inventor： Hako Botma

IPC: G03F7/20 ,  G03B27/54 ,  H01L21/027

CPC classification number: G03F7/70158 ,  G03F7/70066

Abstract: A lithographic apparatus comprises an illumination system for providing a projection beam of radiation. A support structure is provided for supporting a patterning device, the patterning device serving to impart the projection beam with a pattern in its cross-section. A substrate table holds a substrate, while a projection system projects the patterned beam onto a target portion of the substrate. The illumination system comprises a field defining element arranged to define an illuminating field in the plane of the patterning device or in a plane conjugate thereto, the field being off-axis with respect to the optical axis of the illuminating system.

Abstract translation: 光刻设备包括用于提供投影辐射束的照明系统。 提供了用于支撑图案形成装置的支撑结构，图案形成装置用于使投影光束在其横截面上具有图案。 衬底台保持衬底，而投影系统将图案化的光束投射到衬底的目标部分上。 所述照明系统包括场限定元件，所述场限定元件布置成在所述图案形成装置的平面中或在与其共同的平面中限定照明场，所述场相对于照明系统的光轴偏离轴。

公开(公告)号：US20050146702A1

公开(公告)日：2005-07-07

申请号：US10976314

申请日：2004-10-29

Applicant: Markus Eurlings ,  Johannes Baselmans ,  Hako Botma ,  Jan Bruining ,  Marcel Mathijs Dierichs ,  Antonius Johannes Dijsseldonk ,  Judocus Stoeldraijer

Inventor： Markus Eurlings ,  Johannes Baselmans ,  Hako Botma ,  Jan Bruining ,  Marcel Mathijs Dierichs ,  Antonius Johannes Dijsseldonk ,  Judocus Stoeldraijer

IPC: G03B27/54 ,  G03F7/20 ,  H01L21/027

CPC classification number: G03F7/70075

Abstract: The present invention provides a lithographic apparatus comprising an illumination system for providing a projection beam of radiation. The illumination system comprises at least one movable optical element (7), such that a projection beam of radiation (4) can be shifted around a central position. This ensures that inhomogeneities in the intensity distribution in the projection beam (4) will be smeared out, which in turn provides an improved homogeneity of the exposure of a surface to be illuminated by the system, such as a wafer or other substrate. The optical element (7) may comprise a motor movable mirror, prism, filter, lens, axicon, diffuser, diffractive optical array, optical integrator, etc. The invention further provides a device manufacturing method, using a lithographic apparatus according to the invention, wherein the optical element is moved, in order to provide an optimum homogeneity for the projection beam of radiation.

Abstract translation: 本发明提供了一种包括用于提供投影射线束的照明系统的光刻设备。 照明系统包括至少一个可移动光学元件（7），使得投影射线束（4）能够围绕中心位置移动。 这确保了投影束（4）中的强度分布中的不均匀性将被涂抹，这反过来提供了由诸如晶片或其它基底的系统照射的表面的曝光的改进的均匀性。 光学元件（7）可以包括电动机可移动镜，棱镜，滤镜，透镜，旋转三棱镜，漫射器，衍射光学阵列，光学积分器等。本发明还提供了一种使用根据本发明的光刻设备的器件制造方法， 其中所述光学元件被移动，以便为所述投影射束提供最佳均匀性。