DISPLAY DEVICE, METHOD OF DRIVING DISPLAY DEVICE, AND COMPUTER PROGRAM
    21.
    发明申请
    DISPLAY DEVICE, METHOD OF DRIVING DISPLAY DEVICE, AND COMPUTER PROGRAM 有权
    显示设备,驱动显示设备的方法和计算机程序

    公开(公告)号:US20100118062A1

    公开(公告)日:2010-05-13

    申请号:US12595246

    申请日:2008-05-15

    IPC分类号: G09G5/02 G09G5/10 G09G3/30

    摘要: There is provided a display device including a display unit having pixels, each of which includes a luminescence element for individually emitting light depending on a current amount and a pixel circuit for controlling a current applied to the luminescence element according to a picture signal, scan lines which supply a selection signal for selecting the pixels to emit light to the pixels in a predetermined scanning cycle, and data lines which supply the picture signal to the pixels, the pixels, the scan lines, and the data lines arranged in a matrix pattern, the display device including: a luminescence amount detector for inputting a picture signal with a linear characteristic to detect a luminescence amount from the picture signal; a luminescence time calculator for calculating a luminescence time for the luminescence element based on the luminescence amount detected by the luminescence amount detector; a luminescence time recorder for recording the calculated luminescence time; a luminance acquirer for acquiring luminance information of the luminescence element by use of the luminescence time recorded in the luminescence time recorder; a coefficient calculator for calculating a coefficient by which the picture signal is multiplied, based on the luminance information acquired by the luminance acquirer; and a coefficient multiplier for multiplying the picture signal by the coefficient calculated by the coefficient calculator.

    摘要翻译: 提供了一种显示装置,包括具有像素的显示单元,每个显示单元包括用于根据电流量单独发光的发光元件和用于根据图像信号控制施加到发光元件的电流的像素电路,扫描线 其提供用于选择在预定扫描周期中向像素发光的像素的选择信号,以及将图像信号提供给以矩阵图案排列的像素,像素,扫描线和数据线的数据线, 所述显示装置包括:发光量检测器,用于输入具有线性特征的图像信号,以从所述图像信号检测发光量; 发光时间计算器,用于基于由发光量检测器检测的发光量来计算发光元件的发光时间; 用于记录计算出的发光时间的发光时间记录器; 用于通过使用记录在发光时间记录器中的发光时间来获取发光元件的亮度信息的亮度获取器; 系数计算器,用于基于由所述亮度获取器获取的亮度信息来计算所述图像信号相乘的系数; 以及系数乘法器,用于将图像信号乘以由系数计算器计算的系数。

    Substrate processing apparatus, method for processing substrate, and storage medium
    22.
    发明授权
    Substrate processing apparatus, method for processing substrate, and storage medium 有权
    基板处理装置,基板处理方法和存储介质

    公开(公告)号:US08992687B2

    公开(公告)日:2015-03-31

    申请号:US13218983

    申请日:2011-08-26

    CPC分类号: H01L21/67017

    摘要: Processing gas is supplied from the central upper part of a processing chamber to a wafer on a mounting board, while the processing chamber is exhausted from processing gas exhaust passages at areas outside of the wafer. In addition, purge gas is supplied from purge gas supply passages to a buffer chamber formed between the peripheral part of a container main body and that of a cover body. The supplied flow-rate of the processing gas is made less than the exhaust flow-rate in the processing gas exhaust passages. Accordingly, the purge gas in the buffer chamber is drawn into the processing chamber via a purge gas supply hole formed of a gap between the container main body and the cover body due to a negative pressure inside the processing chamber caused by a difference between the flow rates.

    摘要翻译: 处理气体从处理室的中央上部供应到安装板上的晶片,同时处理室从在晶片外部的区域处理气体排出通道排出。 此外,净化气体从吹扫气体供给通道供应到形成在容器主体的周边部分与盖体的周边部分之间的缓冲室。 处理气体的供给流量比处理气体排出通道中的排气流量低。 因此,缓冲室中的净化气体由于流体之间的差异而由于处理室内部的负压而经由由容器主体和盖体之间的间隙形成的吹扫气体供给孔而被吸入处理室 价格。

    SUBSTRATE PROCESSING APPARATUS, METHOD FOR PROCESSING SUBSTRATE, AND STORAGE MEDIUM
    23.
    发明申请
    SUBSTRATE PROCESSING APPARATUS, METHOD FOR PROCESSING SUBSTRATE, AND STORAGE MEDIUM 审中-公开
    基板处理装置,处理基板的方法和存储介质

    公开(公告)号:US20110308464A1

    公开(公告)日:2011-12-22

    申请号:US13218983

    申请日:2011-08-26

    CPC分类号: H01L21/67017

    摘要: Processing gas is supplied from the central upper part of a processing chamber to a wafer on a mounting board, while the processing chamber is exhausted from processing gas exhaust passages at areas outside of the wafer. In addition, purge gas is supplied from purge gas supply passages to a buffer chamber formed between the peripheral part of a container main body and that of a cover body. The supplied flow-rate of the processing gas is made less than the exhaust flow-rate in the processing gas exhaust passages. Accordingly, the purge gas in the buffer chamber is drawn into the processing chamber via a purge gas supply hole formed of a gap between the container main body and the cover body due to a negative pressure inside the processing chamber caused by a difference between the flow rates.

    摘要翻译: 处理气体从处理室的中央上部供应到安装板上的晶片,同时处理室从在晶片外部的区域处理气体排出通道排出。 此外,净化气体从吹扫气体供给通道供应到形成在容器主体的周边部分与盖体的周边部分之间的缓冲室。 处理气体的供给流量比处理气体排出通道中的排气流量低。 因此,缓冲室中的净化气体由于流体之间的差异而由于处理室内部的负压而经由由容器主体和盖体之间的间隙形成的吹扫气体供给孔而被吸入处理室 价格。

    Process for preparing 3-aminophenylacetylenes
    24.
    发明授权
    Process for preparing 3-aminophenylacetylenes 有权
    制备3-氨基苯乙炔的方法

    公开(公告)号:US07390927B2

    公开(公告)日:2008-06-24

    申请号:US11392717

    申请日:2006-03-30

    IPC分类号: C07C209/68

    CPC分类号: C07C209/68 C07C211/46

    摘要: A process for preparing a 3-aminophenylacetylene compound of formula (5), including: a) reacting a 3-haloaniline compound of formula (1) with an acetylene compound of formula (2) in the presence of a palladium compound, a copper compound, and an amine compound of formula (3) to form an aniline compound of formula (4); b) precipitating the aniline compound of formula (4) in the form of a crystal, and isolating it by solid/liquid separation; and c) reacting the aniline compound of formula (4) with a base to obtain 3-aminophenylacetylene.

    摘要翻译: 一种制备式(5)的3-氨基苯基乙炔化合物的方法,包括:a)使式(1)的3-卤代苯胺化合物与式(2)的炔属化合物在钯化合物,铜化合物 和式(3)的胺化合物以形成式(4)的苯胺化合物; b)沉淀出结晶形式的式(4)的苯胺化合物,并通过固/液分离来分离; 和c)使式(4)的苯胺化合物与碱反应得到3-氨基苯基乙炔。

    Process for producing bipyridinium compound
    25.
    发明申请
    Process for producing bipyridinium compound 审中-公开
    联吡啶鎓化合物的制备方法

    公开(公告)号:US20060258870A1

    公开(公告)日:2006-11-16

    申请号:US10556672

    申请日:2005-03-30

    IPC分类号: C07D401/04

    CPC分类号: C07D213/22 C07D417/14

    摘要: A process for producing a bipyridinium compound represented by formula (4), the process comprises: reacting a bipyridine which may have a substituent with a halogenated (hetero)aryl compound represented by formula (1), so as to produce N,N′-bis((hetero)asyl)-bipyridimium compound represented by formula (2); and reacting the N,N′-bis((hetero)aryl)-bipyridinium compound with an amine compound represented by formula (3), without subjecting the N,N′-bis((hetero)aryl)-bipyridinium compound to an isolation treatment, In formula, R represents a (hetero)aryl group; X represents a halogen atom; R11, R12, R13, R14, R15, R16, R17 and R18 each independently represents a hydrogen atom or a substituent; and R1 represents a (hetero)aryl group which may have a substituent or an alkyl group, wherein a polyhychic alcohol is used as a reaction solvent.

    摘要翻译: 一种制备由式(4)表示的联吡啶鎓化合物的方法,该方法包括:使可具有取代基的联吡啶与由式(1)表示的卤代(杂)芳基化合物反应,生成N, 由式(2)表示的双((异)烷基) - 联吡啶鎓化合物; 并且使N,N'-双((杂)芳基) - 联吡啶鎓化合物与式(3)表示的胺化合物反应而不使N,N'-双((杂)芳基) - 联吡啶鎓化合物进行分离 式中,R表示(杂)芳基; X表示卤原子; R 11,R 12,R 13,R 14,R 15, R 16,R 17和R 18各自独立地表示氢原子或取代基; R 1表示可以具有取代基或烷基的(杂)芳基,其中使用多羟基醇作为反应溶剂。

    Alkyl phosphates having a branched alkyl group
    27.
    发明授权
    Alkyl phosphates having a branched alkyl group 失效
    具有支链烷基的烷基磷酸酯

    公开(公告)号:US5245070A

    公开(公告)日:1993-09-14

    申请号:US847186

    申请日:1992-03-06

    摘要: A compound represented by the following general formula I; ##STR1## wherein R.sup.1, R.sup.2 and R.sup.3 independently represent a hygrogen atom, alkyl group or aryl group, provided that at least one of R.sup.1, R.sup.2 and R.sup.3 represents 3,7,11,15-tetramethylhexadecyl group, 3,7,11-trimethyldodecyl group or 3,7-dimethyloctyl group, or a salt thereof. The compound may have R- or S- configuration with respect to each asymmetric carbon contained therein and it may be present as a racemate. The compounds of the present invention are useful as surfactants, lubricants, dispersants, emulsifiers, additives, stabilizers, solubilizers, water-repellants, antistatic agents and the like.

    摘要翻译: 由以下通式I表示的化合物: (I)其中R1,R2和R3独立地表示氢原子,烷基或芳基,条件是R1,R2和R3中的至少一个表示3,7,11,15-四甲基十六烷基,3,7 ,11-三甲基十二烷基或3,7-二甲基辛基,或其盐。 化合物可以相对于其中包含的每个不对称碳具有R-或S-构型,并且其可以外消旋物存在。 本发明的化合物可用作表面活性剂,润滑剂,分散剂,乳化剂,添加剂,稳定剂,增溶剂,防水剂,抗静电剂等。

    Self light emitting display device for adjusting a necessary brightness based on user setting, outside light or video signal
    28.
    发明授权
    Self light emitting display device for adjusting a necessary brightness based on user setting, outside light or video signal 有权
    自发光显示装置,用于根据用户设置,外部光线或视频信号调节必要的亮度

    公开(公告)号:US08659627B2

    公开(公告)日:2014-02-25

    申请号:US12796090

    申请日:2010-06-08

    申请人: Hideto Mori

    发明人: Hideto Mori

    IPC分类号: G09G5/10

    摘要: A self light emitting display device is provided which includes a panel driver which changes a maximum voltage supplied to the self light emitting display panel according to the necessary maximum brightness, a storage unit which holds data related to a reverse gamma characteristic that is opposite to a gamma characteristic between an amount of light emitted from the self light emitting display panel and a voltage supplied from the panel driver to the self light emitting display panel, and a panel gamma generation unit which generates an output signal based on the reverse gamma characteristic by changing an applicable range of the reverse gamma characteristic according to the necessary maximum brightness while maintaining the same gradations as those when the self light emitting display panel emits light at a displayable maximum brightness. The panel driver drives the self light emitting display panel based on the output signal.

    摘要翻译: 提供了一种自发光显示装置,其包括:面板驱动器,其根据所需的最大亮度改变提供给自发光显示面板的最大电压;存储单元,其保存与反向伽马特性相关的数据,该反向伽马特性与 从自发光显示面板发射的光量与从面板驱动器供给到自发光显示面板的电压之间的伽马特性,以及面板伽马生成单元,其通过改变反向伽马特性来生成基于反向伽马特性的输出信号 根据必要的最大亮度,反转伽马特性的适用范围,同时保持与自发光显示面板以可显示的最大亮度发光的那些相同的等级。 面板驱动器基于输出信号驱动自发光显示面板。

    DISPLAY DEVICE, BRIGHTNESS ADJUSTMENT DEVICE, METHOD OF ADJUSTING BRIGHTNESS, AND PROGRAM
    29.
    发明申请
    DISPLAY DEVICE, BRIGHTNESS ADJUSTMENT DEVICE, METHOD OF ADJUSTING BRIGHTNESS, AND PROGRAM 有权
    显示设备,亮度调整设备,调节亮度的方法和程序

    公开(公告)号:US20110227966A1

    公开(公告)日:2011-09-22

    申请号:US13131617

    申请日:2009-12-02

    申请人: Hideto Mori

    发明人: Hideto Mori

    IPC分类号: G09G5/10

    摘要: Provided is a display device including a setting condition acquisition unit for obtaining various conditions for adjusting a gain of a video-signal, a current-brightness table calculation unit that calculates a table representing a relationship between an average brightness and a gain of a video-signal, and that calculates the table capable of setting a peak-brightness and power consumption of the video-signal independently, based on the various conditions acquired by the setting condition acquisition unit, a video-average brightness conversion block that calculates average-brightness of the video-signal input for each frame, a current-brightness control table that calculates a gain of the video-signal from the table based on the average-brightness calculated above, a video gain block that adjusts the video-signal using the gain calculated above, and a display panel that includes a plurality of pixels that emit light in response to a video-signal and displays a video based on the video-signal adjusted above.

    摘要翻译: 提供了一种显示装置,包括:设定条件获取单元,用于获得用于调整视频信号的增益的各种条件;当前亮度表计算单元,计算表示平均亮度和视频信号的增益之间的关系的表; 信号,并且基于由设置条件获取单元获取的各种条件,计算能够独立地设置视频信号的峰值亮度和功率消耗的表,计算平均亮度的视频平均亮度转换块 每个帧的视频信号输入,基于上述计算的平均亮度从表中计算视频信号的增益的当前亮度控制表,使用所计算的增益来调整视频信号的视频增益块 以及显示面板,其包括响应于视频信号发光的多个像素,并且基于视频显示视频 - 信号调整以上。

    SUBSTRATE PROCESSING APPARATUS, METHOD FOR PROCESSING SUBSTRATE, AND STORAGE MEDIUM
    30.
    发明申请
    SUBSTRATE PROCESSING APPARATUS, METHOD FOR PROCESSING SUBSTRATE, AND STORAGE MEDIUM 审中-公开
    基板处理装置,处理基板的方法和存储介质

    公开(公告)号:US20090029046A1

    公开(公告)日:2009-01-29

    申请号:US12163163

    申请日:2008-06-27

    IPC分类号: C23C16/455 C23C16/458

    CPC分类号: H01L21/67017

    摘要: Processing gas is supplied from the central upper part of a processing chamber to a wafer on a mounting board, while the processing chamber is exhausted from processing gas exhaust passages at areas outside of the wafer. In addition, purge gas is supplied from purge gas supply passages to a buffer chamber formed between the peripheral part or a container main body and that of a cover body. The supplied flow-rate of the processing gas is made less than the exhaust flow-rate in the processing gas exhaust passages. Accordingly, the purge gas in the buffer chamber is drawn into the processing chamber via a purge gas supply hole formed of a gap between the container main body and the cover body due to a negative pressure inside the processing chamber caused by a difference between the flow rates.

    摘要翻译: 处理气体从处理室的中央上部供应到安装板上的晶片,同时处理室从在晶片外部的区域处理气体排出通道排出。 此外,净化气体从净化气体供给通道供给到形成在周边部分或容器主体与盖体之间的缓冲室。 处理气体的供给流量比处理气体排出通道中的排气流量低。 因此,缓冲室中的净化气体由于流体之间的差异而由于处理室内部的负压而经由由容器主体和盖体之间的间隙形成的吹扫气体供给孔而被吸入处理室 价格。