摘要:
There is provided a display device including a display unit having pixels, each of which includes a luminescence element for individually emitting light depending on a current amount and a pixel circuit for controlling a current applied to the luminescence element according to a picture signal, scan lines which supply a selection signal for selecting the pixels to emit light to the pixels in a predetermined scanning cycle, and data lines which supply the picture signal to the pixels, the pixels, the scan lines, and the data lines arranged in a matrix pattern, the display device including: a luminescence amount detector for inputting a picture signal with a linear characteristic to detect a luminescence amount from the picture signal; a luminescence time calculator for calculating a luminescence time for the luminescence element based on the luminescence amount detected by the luminescence amount detector; a luminescence time recorder for recording the calculated luminescence time; a luminance acquirer for acquiring luminance information of the luminescence element by use of the luminescence time recorded in the luminescence time recorder; a coefficient calculator for calculating a coefficient by which the picture signal is multiplied, based on the luminance information acquired by the luminance acquirer; and a coefficient multiplier for multiplying the picture signal by the coefficient calculated by the coefficient calculator.
摘要:
Processing gas is supplied from the central upper part of a processing chamber to a wafer on a mounting board, while the processing chamber is exhausted from processing gas exhaust passages at areas outside of the wafer. In addition, purge gas is supplied from purge gas supply passages to a buffer chamber formed between the peripheral part of a container main body and that of a cover body. The supplied flow-rate of the processing gas is made less than the exhaust flow-rate in the processing gas exhaust passages. Accordingly, the purge gas in the buffer chamber is drawn into the processing chamber via a purge gas supply hole formed of a gap between the container main body and the cover body due to a negative pressure inside the processing chamber caused by a difference between the flow rates.
摘要:
Processing gas is supplied from the central upper part of a processing chamber to a wafer on a mounting board, while the processing chamber is exhausted from processing gas exhaust passages at areas outside of the wafer. In addition, purge gas is supplied from purge gas supply passages to a buffer chamber formed between the peripheral part of a container main body and that of a cover body. The supplied flow-rate of the processing gas is made less than the exhaust flow-rate in the processing gas exhaust passages. Accordingly, the purge gas in the buffer chamber is drawn into the processing chamber via a purge gas supply hole formed of a gap between the container main body and the cover body due to a negative pressure inside the processing chamber caused by a difference between the flow rates.
摘要:
A process for preparing a 3-aminophenylacetylene compound of formula (5), including: a) reacting a 3-haloaniline compound of formula (1) with an acetylene compound of formula (2) in the presence of a palladium compound, a copper compound, and an amine compound of formula (3) to form an aniline compound of formula (4); b) precipitating the aniline compound of formula (4) in the form of a crystal, and isolating it by solid/liquid separation; and c) reacting the aniline compound of formula (4) with a base to obtain 3-aminophenylacetylene.
摘要:
A process for producing a bipyridinium compound represented by formula (4), the process comprises: reacting a bipyridine which may have a substituent with a halogenated (hetero)aryl compound represented by formula (1), so as to produce N,N′-bis((hetero)asyl)-bipyridimium compound represented by formula (2); and reacting the N,N′-bis((hetero)aryl)-bipyridinium compound with an amine compound represented by formula (3), without subjecting the N,N′-bis((hetero)aryl)-bipyridinium compound to an isolation treatment, In formula, R represents a (hetero)aryl group; X represents a halogen atom; R11, R12, R13, R14, R15, R16, R17 and R18 each independently represents a hydrogen atom or a substituent; and R1 represents a (hetero)aryl group which may have a substituent or an alkyl group, wherein a polyhychic alcohol is used as a reaction solvent.
摘要翻译:一种制备由式(4)表示的联吡啶鎓化合物的方法,该方法包括:使可具有取代基的联吡啶与由式(1)表示的卤代(杂)芳基化合物反应,生成N, 由式(2)表示的双((异)烷基) - 联吡啶鎓化合物; 并且使N,N'-双((杂)芳基) - 联吡啶鎓化合物与式(3)表示的胺化合物反应而不使N,N'-双((杂)芳基) - 联吡啶鎓化合物进行分离 式中,R表示(杂)芳基; X表示卤原子; R 11,R 12,R 13,R 14,R 15, R 16,R 17和R 18各自独立地表示氢原子或取代基; R 1表示可以具有取代基或烷基的(杂)芳基,其中使用多羟基醇作为反应溶剂。
摘要:
A peptide derivative containing 1 to 20 units of peptide unit represented by the following general formula [I] or a pharmaceutically acceptable salt thereof;[Z]--Arg--X--Asp--[Y] [I]wherein Arg represents L- or D-arginine residue, Asp represents L-aspartic acid residue, X represents L- or D-leucine, D-isoleucine, L- or D-norleucine, L- or D-phenylalanine, D-phenylglycine or D-alanine residue, and [Z] and [Y] each represents an amino acid or a peptide residue, which may be present or absent, selected from glycine, L-serine, L-threonine, L- and D-aspartic acid, L-alanine, L- and D-glutamic acid, L-proline residues and a peptide residue constituted by the foregoing amino acid residues, and a pharmaceutical composition comprising the peptide derivative. The composition of the present invention is useful as an agent for inhibiting tumor metastasis.
摘要:
A compound represented by the following general formula I; ##STR1## wherein R.sup.1, R.sup.2 and R.sup.3 independently represent a hygrogen atom, alkyl group or aryl group, provided that at least one of R.sup.1, R.sup.2 and R.sup.3 represents 3,7,11,15-tetramethylhexadecyl group, 3,7,11-trimethyldodecyl group or 3,7-dimethyloctyl group, or a salt thereof. The compound may have R- or S- configuration with respect to each asymmetric carbon contained therein and it may be present as a racemate. The compounds of the present invention are useful as surfactants, lubricants, dispersants, emulsifiers, additives, stabilizers, solubilizers, water-repellants, antistatic agents and the like.
摘要:
A self light emitting display device is provided which includes a panel driver which changes a maximum voltage supplied to the self light emitting display panel according to the necessary maximum brightness, a storage unit which holds data related to a reverse gamma characteristic that is opposite to a gamma characteristic between an amount of light emitted from the self light emitting display panel and a voltage supplied from the panel driver to the self light emitting display panel, and a panel gamma generation unit which generates an output signal based on the reverse gamma characteristic by changing an applicable range of the reverse gamma characteristic according to the necessary maximum brightness while maintaining the same gradations as those when the self light emitting display panel emits light at a displayable maximum brightness. The panel driver drives the self light emitting display panel based on the output signal.
摘要:
Provided is a display device including a setting condition acquisition unit for obtaining various conditions for adjusting a gain of a video-signal, a current-brightness table calculation unit that calculates a table representing a relationship between an average brightness and a gain of a video-signal, and that calculates the table capable of setting a peak-brightness and power consumption of the video-signal independently, based on the various conditions acquired by the setting condition acquisition unit, a video-average brightness conversion block that calculates average-brightness of the video-signal input for each frame, a current-brightness control table that calculates a gain of the video-signal from the table based on the average-brightness calculated above, a video gain block that adjusts the video-signal using the gain calculated above, and a display panel that includes a plurality of pixels that emit light in response to a video-signal and displays a video based on the video-signal adjusted above.
摘要:
Processing gas is supplied from the central upper part of a processing chamber to a wafer on a mounting board, while the processing chamber is exhausted from processing gas exhaust passages at areas outside of the wafer. In addition, purge gas is supplied from purge gas supply passages to a buffer chamber formed between the peripheral part or a container main body and that of a cover body. The supplied flow-rate of the processing gas is made less than the exhaust flow-rate in the processing gas exhaust passages. Accordingly, the purge gas in the buffer chamber is drawn into the processing chamber via a purge gas supply hole formed of a gap between the container main body and the cover body due to a negative pressure inside the processing chamber caused by a difference between the flow rates.