摘要:
Disclosed is a method of fabricating a microlens. The method includes forming a self assembly monolayer having a strong hydrophobicity on a substrate; forming a plurality of ink droplets on the self assembly monolayer by jetting a transparent ink using an inkjet apparatus, the transparent ink including a first solvent having a first boiling point, a second solvent having a second boiling point lower than the first boiling point and a silicon oxide (SiOx) solid material dispersed in the first and second solvents; and drying the plurality of ink droplets.
摘要:
A polymer which has siloxane group at a main chain thereof and a composition including the same, for forming an organic anti-reflective coating layer are disclosed. The polymer for forming an organic anti-reflective coating layer is represented by following Formula. In Formula, R is hydrogen atom, C1˜C20 alkyl group, C1˜C10 alcohol group or epoxy group, R1 is independently hydrogen atom, n is an integer of 1-50, R2 is C1˜C20 alkyl group, C3˜C20 cycloalkyl group, C6˜C20 aryl group or C7˜C12 arylalkyl group, R3 is hydrogen atom, C1˜C10 alcohol group or epoxy group and POSS is a polyhedral oligosilsesquioxane.
摘要:
A liquid crystal display according to an exemplary embodiment of the present invention includes a first substrate and a second substrate. Gate lines are arranged on the first substrate, and an insulating layer is arranged on the gate lines. Data lines, first drain electrodes, and second drain electrodes are arranged on the insulating layer. First sub-pixel electrodes and second sub-pixel electrodes are connected to the first drain electrodes and second drain electrodes, respectively. Storage electrode lines are parallel to the gate lines, and traverse at least one of the first sub-pixel electrodes and second sub-pixel electrodes. A first polarizer is disposed on an outer surface of the first substrate, and a second polarizer is disposed on an outer surface of the second substrate. A first λ/4 plate is disposed between the first substrate and the first polarizer, and a second λ/4 plate is disposed between the second substrate and the second polarizer. A diffuser is disposed on an outer surface of the second polarizer. The storage electrode lines receive storage voltages that vary periodically.
摘要:
The present invention provides a photosensitive resin composition for a pad protective layer that includes (A) an alkali soluble resin, (B) a reactive unsaturated compound, (C) a photoinitiator, and (D) a solvent. The (A) alkali soluble resin includes a copolymer including about 5 to about 50 wt % of a unit having the Chemical Formula 1, about 1 to about 25 wt % of a unit having the Chemical Formula 2, and about 45 to about 90 wt % of a unit having the Chemical Formula 3, and a method of making an image sensor using the photosensitive resin composition.
摘要:
The photosensitive resin composition for a color filter according to one embodiment of the present invention includes (A) a pigment including a repeating unit of the following Formula 1, (B) a binder resin, (C) a photopolymerization initiator, (D) a photopolymerizable monomer, and (E) a solvent: wherein in the above formula, X, m, and n are the same as in the description.
摘要:
A method and apparatus are provided for monitoring an immersion photolithography process, the method including supplying an immersion fluid having an initial refractive index, performing photolithography using the supplied immersion fluid, recovering the used immersion fluid; and the apparatus including a light source, one or more fluid passageways disposed relative to the light source, and a light detector disposed on an opposite side of the fluid passageways relative to the light source for measuring a refractive index of a fluid in the fluid passageways.
摘要:
A transflective LCD having a transmissive area and a reflective area according to an exemplary embodiment of the present invention includes a first substrate, a plurality of pixel electrodes formed on the first substrate and including a plurality of reflective electrodes having protrusion patterns and depression patterns, a second substrate facing the first substrate, a plurality of color filters formed on the second substrate and having a light hole in the reflective area, and a common electrode formed on the color filters. The size of the protrusion patterns in a first reflective area having the light hole is different from that in a second reflective area having no light hole, and the size of the protrusion patterns at the center of the first reflective area may be larger than that in the second reflective area.
摘要:
A color filter substrate includes a base substrate, a first common electrode layer, a second common electrode layer, and a color filter layer. The base substrate includes a plurality of pixel parts. The first common electrode layer is on the base substrate and receives a first voltage. The second common electrode layer faces the first common electrode and receives a second voltage. The color filter layer is interposed between the first and second common electrode layers, and includes a plurality of electrochromic patterns corresponding to the pixel parts, respectively. A color purity of the color filter layer is changed based on the first and second voltages. The color filter layer displays an image of high color purity in a first mode transmitting a first light, and displays an image of low color purity in a second mode transmitting a second light. Therefore, a color reproducibility is improved.
摘要:
A wafer supporting structure includes a supporting substrate for supporting a wafer, a release layer for detaching the wafer from the supporting substrate, and an adhesive layer for attaching the wafer to the supporting substrate.
摘要:
A vapor deposition apparatus includes at least one first region and at least one second region. A first blocking unit is arranged between a first exhausting unit and a first injecting unit and between the first exhausting unit and a first purging unit in the first region so as to avoid any common region between the first exhausting unit and the first injecting unit and to avoid any common region between the first exhausting unit and the first purging unit. The vapor deposition apparatus also includes another first blocking unit arranged between a second exhausting unit and a second injecting unit and between the second exhausting unit and a second purging unit in the second region so as to avoid any common region between the second exhausting unit and the second injecting unit and to avoid any common region between the second exhausting unit and the second purging unit.