Method for Providing Calibration Data for a Gas Sensor Device, Method of Calibrating a Gas Sensor Device, and Processing Device for a Gas Sensor Device

    公开(公告)号:US20200166492A1

    公开(公告)日:2020-05-28

    申请号:US16692489

    申请日:2019-11-22

    Abstract: A method includes exposing gas sensitive material of a gas sensor device to different adjusted target gas concentrations, determining measurement values of the resistance of the gas sensitive material between first and second contact regions in response to the adjusted target gas concentration, determining a first gas sensor behavior model based on the measurement values of the resistance of the gas sensitive material as a function of the adjusted target gas concentration, translating the first gas sensor behavior model into a corresponding second gas sensor behavior model for the resistance of the gas sensitive material as a function of a control voltage, and sweeping the control voltage based on the second gas sensor behavior model over a control voltage range for providing control voltage dependent resistance data, wherein the control voltage dependent resistance data over the control voltage range form the calibration data for the gas sensor device.

    Sound transducer with housing and MEMS structure

    公开(公告)号:US10231061B2

    公开(公告)日:2019-03-12

    申请号:US15581744

    申请日:2017-04-28

    Abstract: A sound transducer includes a housing with a sound port and a MEMS structure disposed in an interior space of the housing. The MEMS structure and the sound port are acoustically coupled to each other. The MEMS structure separates a front volume from a back volume of the housing. At least one vent hole of the MEMS structure allows a gas exchange between the front volume and the back volume. The sound port allows a liquid to enter the front volume. Further, the MEMS structure prevents liquid from entering the back volume.

    Method for forming a microelectromechanical device

    公开(公告)号:US09902612B2

    公开(公告)日:2018-02-27

    申请号:US15629834

    申请日:2017-06-22

    CPC classification number: B81B3/0072 B81B2203/0109 B81C1/00325

    Abstract: A method for forming a microelectromechanical device may provide forming a first layer at least one of in or over a semiconductor carrier; forming a second layer at least one of in or over at least a central region of the first layer, such that a peripheral region of the first layer is at least partially free of the second layer; removing material under at least a central region of the second layer to release at least one of the central region of the second layer or a central region of the first layer; and/or removing material under at least the peripheral region of the first layer to such that the second layer is supported by the semiconductor carrier via the first layer.

    Method and Structure for Sensors on Glass

    公开(公告)号:US20220009771A1

    公开(公告)日:2022-01-13

    申请号:US17357234

    申请日:2021-06-24

    Abstract: A method for providing a semiconductor layer arrangement on a substrate which comprises providing a semiconductor layer arrangement having a functional layer and a semiconductor substrate layer, attaching the semiconductor layer arrangement to a glass substrate layer such that the functional layer is arranged between the glass substrate layer and the semiconductor substrate layer, and removing the semiconductor substrate layer at least partially such that the glass substrate layer substitutes the semiconductor substrate layer as the substrate of the semiconductor layer arrangement.

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