公开(公告)号：US07474409B2

公开(公告)日：2009-01-06

申请号：US10995545

申请日：2004-11-24

申请人： Emiel Jozef Melanie Eussen ,  Marcel Hendrikus Maria Beems ,  Engelbertus Antonius Fransiscus Van Der Pasch

发明人： Emiel Jozef Melanie Eussen ,  Marcel Hendrikus Maria Beems ,  Engelbertus Antonius Fransiscus Van Der Pasch

IPC分类号： G01B11/02

CPC分类号： G03F7/70775 ,  G01B9/02018 ,  G01B9/02019 ,  G01B9/02021 ,  G01B9/02027 ,  G01B2290/70

摘要： An improved lithographic interferometer system, is presented herein. The lithographic interferometer system comprises a beam generating mechanism, mirrors which reflect those beams, and detection devices for detecting an interference pattern of overlapping reflected beams. The beam generating mechanism comprises a beam-splitter, which splits the beams into reference beams and measuring beams, a reference mirror that provides a plane mirror interferometer, and a reflective surface that emits at least one reference beam used in a differential plane mirror interferometer.

摘要翻译： 本文提出了一种改进的光刻干涉仪系统。 光刻干涉仪系统包括光束产生机构，反射这些光束的反射镜和用于检测重叠反射光束的干涉图案的检测装置。 光束产生机构包括分束器，其将光束分成参考光束和测量光束，提供平面镜干涉仪的参考镜和发射在差分平面镜干涉仪中使用的至少一个参考光束的反射表面。

公开(公告)号：US20080278702A1

公开(公告)日：2008-11-13

申请号：US11797901

申请日：2007-05-08

申请人： Engelbertus Antonius Fransiscus Van Der Pasch ,  Emiel Jozef Melanie Eussen ,  Stefan Gertrud Marie Hendriks ,  Erik Roelof Loopstra ,  Jacob Willem Vink ,  Ruud Antonius Catharina Maria Beerens ,  Lodewijk Alexander Schijvenaars ,  Tom Van Zutphen

发明人： Engelbertus Antonius Fransiscus Van Der Pasch ,  Emiel Jozef Melanie Eussen ,  Stefan Gertrud Marie Hendriks ,  Erik Roelof Loopstra ,  Jacob Willem Vink ,  Ruud Antonius Catharina Maria Beerens ,  Lodewijk Alexander Schijvenaars ,  Tom Van Zutphen

IPC分类号： G03B27/42

CPC分类号： G03F7/70775 ,  G03F7/70516

摘要： A method for calibrating an auxiliary sensor system is provided. The auxiliary sensor system measures a position of a grating relative to a reference, the grating forming part of an encoder measurement system. The encoder measurement system is adapted to measure a position of a substrate table of a lithographic apparatus and further comprises a sensor mounted to the substrate table. The method comprises exciting the grating to make a movement in at least one measurement direction of the auxiliary sensor system, obtaining an auxiliary sensor system output signal from the sensor system during the movement, and adjusting a parameter of the auxiliary sensor system based on the output signal obtained during the movement to thereby calibrate the auxiliary sensor system.

摘要翻译： 提供了一种用于校准辅助传感器系统的方法。 辅助传感器系统测量光栅相对于参考的位置，光栅形成编码器测量系统的一部分。 编码器测量系统适于测量光刻设备的衬底台的位置，还包括安装到衬底台的传感器。 该方法包括激励光栅以在辅助传感器系统的至少一个测量方向上移动，在运动期间从传感器系统获得辅助传感器系统输出信号，并且基于输出调整辅助传感器系统的参数 信号，从而校准辅助传感器系统。

公开(公告)号：US07265366B2

公开(公告)日：2007-09-04

申请号：US10813682

申请日：2004-03-31

申请人： Engelbertus Antonius Fransiscus Van Der Pasch ,  Marcel Hendrikus Maria Beems ,  Martinus Hendrikus Antonius Leenders

发明人： Engelbertus Antonius Fransiscus Van Der Pasch ,  Marcel Hendrikus Maria Beems ,  Martinus Hendrikus Antonius Leenders

IPC分类号： A61N5/00 ,  G21G5/00

CPC分类号： G03F7/70575 ,  G03F7/7005

摘要： A lithographic apparatus includes a radiation source configured to provide radiation to an illumination system, the radiation source configured to provide radiation in a first wavelength range and in a second wavelength range, the second wavelength range being different from the first wavelength range. A support is configured to support a patterning device, the patterning device is configured to impart the radiation with a pattern in its cross-section. A substrate table is configured to hold a substrate, and a projection system is configured to project the patterned radiation onto a target portion of a substrate. The first wavelength range is the primary wavelength of the lithographic apparatus. The second wavelength range is used for setup of the lithographic apparatus, the setup including one or more of calibration, qualification, performance test, and alignment. The second wavelength range may also be used for exposure of a further substrate.

摘要翻译： 光刻设备包括被配置为向照明系统提供辐射的辐射源，所述辐射源被配置为提供在第一波长范围内且在第二波长范围内的第二波长范围与第一波长范围不同的辐射。 支撑件被构造成支撑图案形成装置，图案形成装置被配置成在其横截面中赋予辐射图案。 衬底台被配置为保持衬底，并且投影系统被配置为将图案化的辐射投影到衬底的目标部分上。 第一波长范围是光刻设备的主要波长。 第二波长范围用于设置光刻设备，该设置包括校准，鉴定，性能测试和对准中的一个或多个。 第二波长范围也可以用于另外的基底的曝光。

公开(公告)号：US08687166B2

公开(公告)日：2014-04-01

申请号：US11802770

申请日：2007-05-24

申请人： Peter Paul Steijaert ,  Wilhelmus Josephus Box ,  Emiel Jozef Melanie Eussen ,  Erik Roelof Loopstra ,  Engelbertus Antonius Fransiscus Van Der Pasch ,  Ruud Antonius Catharina Maria Beerens ,  Albertus Adrianus Smits

发明人： Peter Paul Steijaert ,  Wilhelmus Josephus Box ,  Emiel Jozef Melanie Eussen ,  Erik Roelof Loopstra ,  Engelbertus Antonius Fransiscus Van Der Pasch ,  Ruud Antonius Catharina Maria Beerens ,  Albertus Adrianus Smits

IPC分类号： G03B27/52 ,  G03B27/42 ,  G03B27/54 ,  G03B27/68

CPC分类号： G03F7/70775

摘要： A lithographic apparatus is disclosed that includes an encoder type sensor system configured to measure a position of a substrate table of the lithographic apparatus relative to a reference structure. The encoder type sensor system includes an encoder sensor head and an encoder sensor target and the lithographic apparatus comprises a recess to accommodate the encoder sensor target.

摘要翻译： 公开了一种光刻设备，其包括编码器型传感器系统，其被配置为相对于参考结构测量光刻设备的衬底台的位置。 编码器型传感器系统包括编码器传感器头和编码器传感器目标，并且光刻设备包括用于容纳编码器传感器目标的凹部。

公开(公告)号：US08457385B2

公开(公告)日：2013-06-04

申请号：US13019587

申请日：2011-02-02

申请人： Marc Wilhelmus Maria Van Der Wijst ,  Engelbertus Antonius Fransiscus Van Der Pasch ,  Koen Jacobus Johannes Maria Zaal

发明人： Marc Wilhelmus Maria Van Der Wijst ,  Engelbertus Antonius Fransiscus Van Der Pasch ,  Koen Jacobus Johannes Maria Zaal

IPC分类号： G06K9/00

CPC分类号： G03F7/7085 ,  G03F7/70425 ,  G03F7/70775 ,  G03F7/70783

摘要： An encoder-type measurement system is configured to measure a position dependent signal of a movable object, the measurement system including at least one sensor mountable on the movable object a sensor target object mountable on a substantially stationary frame, and a mounting device configured to mount the sensor target object on the substantially stationary frame. The measurement system further includes a compensation device configured to compensate movements and/or deformations of the sensor target object with respect to the substantially stationary frame. The compensation device may include a passive or an active damping device and/or a feedback position control system. In an alternative embodiment, the compensation device includes a gripping device which fixes the position of the sensor target object during a high accuracy movement of the movable object.

摘要翻译： 编码器型测量系统被配置为测量可移动物体的位置相关信号，所述测量系统包括可安装在可移动物体上的至少一个传感器，可安装在基本上固定的框架上的传感器目标物体，以及安装装置， 传感器目标物体在基本上固定的框架上。 测量系统还包括补偿装置，其被配置为补偿传感器目标物体相对于基本上静止的框架的运动和/或变形。 补偿装置可以包括无源或主动阻尼装置和/或反馈位置控制系统。 在替代实施例中，补偿装置包括夹持装置，其在可移动物体的高精度运动期间固定传感器目标物体的位置。

公开(公告)号：US08451454B2

公开(公告)日：2013-05-28

申请号：US12268659

申请日：2008-11-11

申请人： Willem Herman Gertruda Anna Koenen ,  Emiel Jozef Melanie Eussen ,  Engelbertus Antonius Fransiscus Van Der Pasch

发明人： Willem Herman Gertruda Anna Koenen ,  Emiel Jozef Melanie Eussen ,  Engelbertus Antonius Fransiscus Van Der Pasch

IPC分类号： G01B11/14 ,  G03B27/42 ,  G03B27/58 ,  G03F7/20

CPC分类号： G03F7/70775 ,  G03F7/70508 ,  G03F7/7085

摘要： A position measurement system to measure a position of a movable stage includes a reference plate; a plurality of sensors arranged such that, depending on a position of the movable stage relative to the reference plate, at least a subset of the plurality of sensors is configured to cooperate with the reference plate to provide for each of the sensors in the subset respective sensor signals representative of a position of the respective sensor relative to the reference plate; and a processor arranged to determine from the sensor signals a stage position, the processing device configured so as to, when the stage is in a position where an over-determined number of sensor signals is provided by at least the subset of the sensors that are in operational cooperation with the reference plate, (a) determine the stage position from a subset of the over-determined number of sensor signals, and (b) correct a sensor signal of one or more of the sensors from a discrepancy between the determined stage position and a remainder of the sensors signals.

公开(公告)号：US08279407B2

公开(公告)日：2012-10-02

申请号：US12408936

申请日：2009-03-23

申请人： Ramidin Izair Kamidi ,  Henrikus Herman Marie Cox ,  Emiel Jozef Melanie Eussen ,  Ronald Casper Kunst ,  Engelbertus Antonius Fransiscus Van Der Pasch ,  Marcel François Heertjes ,  Mark Constant Johannes Baggen

发明人： Ramidin Izair Kamidi ,  Henrikus Herman Marie Cox ,  Emiel Jozef Melanie Eussen ,  Ronald Casper Kunst ,  Engelbertus Antonius Fransiscus Van Der Pasch ,  Marcel François Heertjes ,  Mark Constant Johannes Baggen

IPC分类号： G03B27/58 ,  G03B27/42

CPC分类号： G03F7/70775

摘要： A stage system includes a movable stage, at least two encoder heads each constructed to provide an encoder signal representative of a position of the movable stage with respect to an encoder target structure, and a controller to control a position of the stage. The controller is provided with the encoder signals of each of the encoder heads. The controller is arranged to apply a weighting function to the encoder signals and to derive a position of the stage from the weighted encoder signals.

摘要翻译： 舞台系统包括可移动舞台，至少两个编码器头，每个编码器头被构造成提供代表可移动平台相对于编码器目标结构的位置的编码器信号，以及控制器来控制舞台的位置。 控制器具有每个编码器头的编码器信号。 控制器被布置为对编码器信号应用加权函数并且从加权的编码器信号导出级的位置。

公开(公告)号：US20080105026A1

公开(公告)日：2008-05-08

申请号：US11594230

申请日：2006-11-08

申请人： Erik Roelof Loopstra ,  Emiel Jozef Melanie Eussen ,  Engelbertus Antonius Fransiscus Van Der Pasch ,  Onno Bram Loopstra

发明人： Erik Roelof Loopstra ,  Emiel Jozef Melanie Eussen ,  Engelbertus Antonius Fransiscus Van Der Pasch ,  Onno Bram Loopstra

IPC分类号： G01B3/00

CPC分类号： G03F9/7011 ,  G03F7/70516 ,  G03F7/70775 ,  G03F9/7019

摘要： The present invention relates to a method for calibrating a grating of an encoder measurement system between two adjacent calibrated locations, the method includes moving one of a sensor object including an encoder-type sensor and a grating along the other one of the sensor object and the grating with a speed, wherein the speed is selected such that disturbances in the grating substantially extending over a distance smaller than a distance between the two calibrated locations can not or only partly be followed by the one of the sensor object and the grating, and measuring during the moving the position of the sensor object with respect to the grating at a plurality of locations between the two calibrated locations.

摘要翻译： 本发明涉及一种用于在两个相邻校准位置之间校准编码器测量系统的光栅的方法，所述方法包括沿着传感器对象中的另一个移动包括编码器型传感器和光栅的传感器对象中的一个， 光栅的速度，其中选择速度，使得光栅中基本上延伸的距离小于两个校准位置之间的距离的干扰不能或仅部分地由传感器对象和光栅之一进行跟踪，并且测量 在两个校准位置之间的多个位置移动传感器对象相对于光栅的位置。

公开(公告)号：US07362446B2

公开(公告)日：2008-04-22

申请号：US11226460

申请日：2005-09-15

申请人： Engelbertus Antonius Fransiscus Van Der Pasch ,  Erik Roelof Loopstra

发明人： Engelbertus Antonius Fransiscus Van Der Pasch ,  Erik Roelof Loopstra

IPC分类号： G01B11/02

CPC分类号： G01B9/02051 ,  G01B9/02029 ,  G01B2290/70 ,  G03F7/70775

摘要： A measurement unit to determine a position in a first and second dimension includes a diffraction type encoder and an interferometer. The diffraction type encoder determines by means of a diffraction on a first and a second diffraction grating the position in the first dimension of the second grating with respect to the first grating, The interferometer determines the position in the second dimension of a mirror. The measurement unit includes a combined optical unit to transfer an encoder measurement beam as well as an interferometer measurement beam. Further, the measurement unit may include a combined light source for the encoder as well as the interferometer. One of the first and second diffraction gratings may further show some degree of zero order reflection to provide the mirror of the interferometer.

摘要翻译： 用于确定第一和第二维度中的位置的测量单元包括衍射型编码器和干涉仪。 衍射型编码器通过第一和第二衍射光栅上的衍射来确定第二光栅相对于第一光栅的第一维度中的位置。干涉仪确定反射镜的第二维度中的位置。 测量单元包括用于传送编码器测量光束以及干涉仪测量光束的组合光学单元。 此外，测量单元可以包括用于编码器的组合光源以及干涉仪。 第一和第二衍射光栅中的一个可进一步示出一些零级反射以提供干涉仪的反射镜。

公开(公告)号：US07352473B2

公开(公告)日：2008-04-01

申请号：US10825221

申请日：2004-04-16

申请人： Johannes Mathias Theodorus Antonius Adriaens ,  Marcel Hendrikus Maria Beems ,  Engelbertus Antonius Fransiscus Van Der Pasch

发明人： Johannes Mathias Theodorus Antonius Adriaens ,  Marcel Hendrikus Maria Beems ,  Engelbertus Antonius Fransiscus Van Der Pasch

IPC分类号： G01B11/02

CPC分类号： G01B9/02027 ,  G01B9/02018 ,  G01B9/0207 ,  G03F7/70775 ,  G03F9/7003

摘要： In an interferometric displacement measuring system, a correction for beamshear is made. The correction may be a polynomial of a variable proportional to the length of the optical path traversed by the measurement beam and the angle of the measurement mirror. The correction compensates for errors caused by non-planarity of the wavefront of the measurement beam.

摘要翻译： 在干涉位移测量系统中，进行横梁的校正。 校正可以是与由测量光束穿过的光路的长度和测量镜的角度成比例的变量的多项式。 校正补偿由测量光束的波前的非平面性引起的误差。